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Onderzoeker
Roger Loo
Profiel
Projecten
Publicaties
Activiteiten
Prijzen & Erkenningen
33
Resultaten
2025
3D-DRAM Si/SiGe superlattices: inspection strategies and evaluation
M. Beggiato
Roger Loo
W. Sun
A. Moussa
G. Bast
K. Fukaya
D. Cerbu
N. Janardan
K. Chirko
T. Sipőcz
et al.
U
Conferentie
2025
3D-DRAM Si/SiGe superlattices: inspection strategies and evaluation
Matteo Beggiato
Roger Loo
Sun Wei
Alain Moussa
Gerhard Bast
Kaoru Fukaya
Dorin Cerbu
Nachiketa Janardan
Konstantin Chirko
Han Han
et al.
U
Conferentie
2025
64 Gb/s O-band GeSi quantum-confined stark effect electro-absorption modulators integrated in a 300mm silicon photonics platform
Ahmed Kandeel
Gaspard Hiblot
Clement Porret
Srinivasan Ashwyn Srinivasan
Yosuke Shimura
Roger Loo
Mathias Berciano
Chih-Kuo Neil Tseng
Dharmander Malik
Alexey Milenin
et al.
A1
Artikel in een tijdschrift
in
JOURNAL OF LIGHTWAVE TECHNOLOGY
2025
Crystallographic defects in orthorhombic ScSi / Si(001) contacts
Bert Pollefliet
Clement Porret
Olivier Richard
Jean-Luc Everaert
Roger Loo
Christophe Detavernier
André Vantomme
Clement Merckling
U
Conferentie
2025
Epitaxial Si/SiGe multi-stacks : from stacked nano-sheet to fork-sheet and CFET devices
Roger Loo
A. Akula
Y. Shimura
C. Porret
E. Rosseel
T. Dursap
A. Y. Hikavyy
M. Beggiato
J. Bogdanowicz
A. Merkulov
et al.
A1
Artikel in een tijdschrift
in
ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY
2025
In situ p-type doping in epitaxial Si1-xGex for advanced MOSFET devices
Gianluca Rengo
André Vantomme
Roger Loo
Proefschrift
2025
Industrial 300 mm wafer processed spin qubits in natural silicon/silicon-germanium
Thomas Koch
Clement Godfrin
Viktor Adam
Julian Ferrero
Daniel Schroller
Noah Glaeser
Stefan Kubicek
Ruoyu Li
Roger Loo
Shana Massar
et al.
A1
Artikel in een tijdschrift
in
NPJ QUANTUM INFORMATION
2025
Inline X-ray metrology for Complementary Field-Effect Transistors (CFET)
Janusz Bogdanowicz
Andrea Mingardi
Vincent Brissonneau
Roger Loo
Yosuke Shimura
Anjani Akula
Pallavi P. Gowda
Daisy Zhou
Naoto Horiguchi
Serge Biesemans
et al.
U
Conferentie
2025
Inline X-ray metrology for Complementary Field-Effect Transistors (CFET)
J. Bogdanowicz
A. Mingardi
V. Brissonneau
Roger Loo
Y. Shimura
A. Akula
P. P. Gowda
D. Zhou
N. Horiguchi
S. Biesemans
et al.
U
Conferentie
2025
Precise optical characterization of SiGe thin films for next generation transistor metrology
Samira Naghdi
Richard Ciesielski
Roger Loo
Janusz Bogdanowicz
Victor Soltwisch
U
Conferentie
2025
Radio frequency single electron transmission spectroscopy of a semiconductor Si/SiGe quantum dot
I. Fattal
J. Van Damme
B. Raes
C. Godfrin
G. Jaliel
K. Chen
T. Van Caekenberghe
A. Loenders
S. Kubicek
S. Massar
et al.
Preprint
2025
SiGe:B Source/Drain epitaxy for advanced device applications
T. Dursap
C. Porret
E. Rosseel
A. Akula
A. Pondini
H. Mertens
J. Ganguly
R. Sarkar
N. Horiguchi
R. Langer
et al.
U
Conferentie
2025
Source/drain and silicides for nanosheet device applications
Clement Porret
Thomas Dursap
Bert Pollefliet
Alex Merkulov
Roger Loo
U
Conferentie
2025
2024
Complementary Field-Effect Transistors (CFET): Metrology Challenges and Solutions
J. Bogdanowicz
A.-L. Charley
M. Saib
M. Beggiato
G. Lorusso
V. Brissonneau
E. Dupuy
Roger Loo
Y. Shimura
A. Akula
et al.
U
Conferentie
2024
Compressively strained epitaxial Ge layers for quantum computing applications
Yosuke Shimura
Clement Godfrin
Andriy Hikavyy
Roy Li
Juan Aguilera
Georgios Katsaros
Paola Favia
Han Han
Danny Wan
Kristiaan De Greve
et al.
A1
Artikel in een tijdschrift
in
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
2024
Crystallinity and composition of Sc1-x(-y)Si x(P y) silicides in annealed TiN/Sc/Si:P stacks for advanced contact applications
Bert Pollefliet
Clement Porret
Jean-Luc Everaert
Kiroubanand Sankaran
Xiaoyu Piao
Erik Rosseel
Thierry Conard
Andrea Impagnatiello
Yosuke Shimura
Naoto Horiguchi
et al.
A1
Artikel in een tijdschrift
in
JAPANESE JOURNAL OF APPLIED PHYSICS
2024
DLTS assessment of grown-in defects in hetero-epitaxial gate stacks for stacked silicon nanosheet channels
Eddy Simoen
Samira Khelifi
Henk Vrielinck
A. Akula
Roger Loo
U
Conferentie
2024
Detection of crystalline defects in Si/SiGe superlattices towards 3D-DRAM applications
Matteo Beggiato
Dorin Cerbu
Roger Loo
Wei Sun
Alain Moussa
Gerhard Bast
Kaoru Fukaya
Christophe Beral
Anne-Laure Charley
Nachiketa Janardan
et al.
P1
Conferentie
2024
Effects of strain on diborane dissociative adsorption and boron incorporation on Si0.5Ge0.5(001)-2×1 surfaces
Gianluca Rengo
Geoffrey Pourtois
Clement Porret
Roger Loo
André Vantomme
A1
Artikel in een tijdschrift
in
JOURNAL OF PHYSICAL CHEMISTRY C
2024
Epitaxial Si/SiGe multi-stacks : from stacked nano-sheet to fork-sheet and CFET devices
Roger Loo
Anjani Akula
Yosuke Shimura
Clement Porret
Erik Rosseel
Thomas Dursap
Andriy Yakovitch Hikavyy
Matteo Beggiato
Janusz Bogdanowicz
Alex Merkulov
et al.
A2
Artikel in een tijdschrift
in
ECS TRANSACTIONS
2024
Epitaxial SiGe/Si multi-stacks : stacked nano-sheet to fork-sheet and CFET devices
Roger Loo
Clement Porret
Erik Rosseel
Anjani Akula
Yosuke Shimura
Thomas Dursap
Andriy Hikavyy
Hans Mertens
Naoto Horiguchi
Robert Langer
C3
Conferentie
2024
Extreme silicon thinning for back side power delivery network : Si thinning stopping on scaled SiGe etch stop layer
Farid Sebaai
Roger Loo
Anne Jourdain
Eric Beyne
Hikaru Kawarazaki
Teppei Nakano
Efrain Altamirano Sanchez
A1
Artikel in een tijdschrift
in
MICROELECTRONIC ENGINEERING
2024
Ge-on-insulator fabrication based on Ge-on-nothing technology
Keisuke Yamamoto
Dong Wang
Roger Loo
Clément Porret
Jinyoun Cho
Kristof Dessein
Valérie Depauw
A1
Artikel in een tijdschrift
in
JAPANESE JOURNAL OF APPLIED PHYSICS
2024
Industrial 300 mm wafer processed spin qubits in natural silicon/silicon-germanium
Thomas Koch
Clement Godfrin
Viktor Adam
Julian Ferrero
Daniel Schroller
Noah Glaeser
Stefan Kubicek
Ruoyu Li
Roger Loo
Shana Massar
et al.
Preprint
2024
Interface sharpness in stacked thin film structures : a comparison of soft X-ray reflectometry and transmission electron microscopy
Richard Ciesielski
Janusz Bogdanowicz
Roger Loo
Yosuke Shimura
Antonio Mani
Christoph Mitterbauer
Michael Kolbe
Victor Soltwisch
A1
Artikel in een tijdschrift
in
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
2024
Low-temperature epitaxial SiGe:P for gate-all-around n-channel metal-oxide-semiconductor devices
Yuta Fujimoto
Andriy Hikavyy
Clement Porret
Erik Rosseel
Gianluca Rengo
Roger Loo
A1
Artikel in een tijdschrift
in
JAPANESE JOURNAL OF APPLIED PHYSICS
2024
Overview of engineered germanium substrate development for affordable large-volume multijunction solar cells
Jinyoun Cho
Valérie Depauw
Alexandre Chapotot
Waldemar Schreiber
Tadeáš Hanuš
Nicolas Paupy
Valentin Daniel
Guillaume Courtois
Bouraoui Ilahi
Abderraouf Boucherif
et al.
A1
Artikel in een tijdschrift
in
IEEE JOURNAL OF PHOTOVOLTAICS
2024
Soft x-ray reflectometry for the inspection of interlayer roughness in stacked thin film structures
Richard Ciesielski
Roger Loo
Yosuke Shimura
Janusz Bogdanowicz
Antonio Mani
Christoph Mitterbauer
Vinh-Binh Truong
Michael Kolbe
Victor Soltwisch
P1
Conferentie
2024
Source/drain epitaxy for nanosheet-based CFET devices
Erik Rosseel
Clement Porret
Thomas Dursap
Roger Loo
Hans Mertens
Jishnu Ganguly
Ritam Sarkar
Camila Cavalcante
Olivier Richard
Jef Geypen
et al.
A2
Artikel in een tijdschrift
in
ECS TRANSACTIONS
2024
Texture of Orthorhombic ScSi in Annealed TiN / Sc / Si(:P)(001) Contact Stacks
Bert Pollefliet
Clement Porret
Christophe Detavernier
Jean-Luc Everaert
Kiroubanand Sankaran
Erik Rosseel
Roger Loo
André Vantomme
Clement Merckling
U
Conferentie
2024
Thin and locally dislocation-free SiGe virtual substrate fabrication by lateral selective growth
Yuji Yamamoto
Wei-Chen Wen
Markus Andreas Schubert
Agnieszka Anna Corley-Wiciak
Sho Sugawa
Yuta Ito
Ryo Yokogawa
Han Han
Roger Loo
Atsushi Ogura
et al.
A1
Artikel in een tijdschrift
in
JAPANESE JOURNAL OF APPLIED PHYSICS
2024
2023
Epitaxial SiGe/Si multi-stacks for complementary FET devices
Roger Loo
Anjani Akula
Clement Porret
Dong Wang
Keisuke Yamamoto
Tamás Sipőcz
Árpád Kerekes
Alex Merkulov
Mustafa Ayyad
Han Han
et al.
C1
Conferentie
2023
Lateral selective epitaxial SiGe growth for locally dislocation-free virtual substrate fabrication
Yuji Yamamoto
Wei-Chen Wen
Markus Andreas Schubert
Agnieszka Anna Corley-Wiciak
Sho Sugawa
Yuta Ito
Ryo Yokogawa
Han Han
Roger Loo
Atsushi Ogura
et al.
C1
Conferentie
2023