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Researcher
Johan Haemers
Profile
Projects
Publications
Activities
Awards & Distinctions
51
Results
2016
Plasma-enhanced ALD on particles and powders
Geert Rampelberg
Delphine Longrie
Davy Deduytsche
Johan Haemers
Christophe Detavernier
C3
Conference
2016
Thermal and plasma enhanced atomic layer deposition on powders and particles
Geert Rampelberg
Véronique Cremers
Delphine Longrie
Davy Deduytsche
Johan Haemers
Christophe Detavernier
C3
Conference
2016
2014
Conformal nanocoatings for surface engineering of particles by thermal and plasma-enhanced atomic layer deposition using a rotary reactor
Geert Rampelberg
Delphine Longrie
Davy Deduytsche
Johan Haemers
Kris Driesen
Christophe Detavernier
C3
Conference
2014
Thermal and plasma-enhanced atomic layer deposition of TiN using TDMAT and NH3 on particles agitated in a rotary reactor
Delphine Longrie
Davy Deduytsche
Johan Haemers
Philippe Smet
Kris Driesen
Christophe Detavernier
A1
Journal Article
in
ACS APPLIED MATERIALS & INTERFACES
2014
2013
A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
Delphine Longrie
Davy Deduytsche
Johan Haemers
Kris Driesen
Christophe Detavernier
C1
Conference
2013
Influencing the hysteresis during reactive magnetron sputtering by gas separation
Diederik Depla
Johan Haemers
Roger De Gryse
A1
Journal Article
in
SURFACE & COATINGS TECHNOLOGY
2013
Thermal and plasma-enhanced ALD of TiN on powders using a rotary reactor
Delphine Longrie
Davy Deduytsche
Johan Haemers
Kris Driesen
Christophe Detavernier
C3
Conference
2013
2012
A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
Delphine Longrie
Davy Deduytsche
Johan Haemers
Kris Driesen
Christophe Detavernier
A1
Journal Article
in
SURFACE & COATINGS TECHNOLOGY
2012
A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects
Delphine Longrie
Kilian Devloo-Casier
Johan Haemers
Kris Driesen
Christophe Detavernier
C3
Conference
2012
Conformality of thermal and plasma enhanced atomic layer deposition on a non-woven fibrous substrate
Jan Musschoot
Jolien Dendooven
Davy Deduytsche
Johan Haemers
G Buyle
Christophe Detavernier
A1
Journal Article
in
SURFACE & COATINGS TECHNOLOGY
2012
Thirty years of rotatable magnetrons
Roger De Gryse
Johan Haemers
Wouter Leroy
Diederik Depla
A1
Journal Article
in
THIN SOLID FILMS
2012
2011
Rotatable magnetron sputtering: downscaling for better understanding
Roger De Gryse
Diederik Depla
Stijn Mahieu
Johan Haemers
A1
Journal Article
in
MATERIALS TECHNOLOGY
2011
2010
Influence of the magnetic field configuration on the reactive sputter deposition of TiN
Francis Boydens
Stijn Mahieu
Johan Haemers
Diederik Depla
A1
Journal Article
in
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE
2010
Qualitative model of the magnetron discharge
Jan Musschoot
Johan Haemers
A1
Journal Article
in
VACUUM
2010
Rotating cylindrical magnetron sputtering: simulation of the reactive process
Diederik Depla
Xiuyang Li
Stijn Mahieu
Koen Van Aeken
Wouter Leroy
Johan Haemers
Roger De Gryse
Annemie Bogaerts
A1
Journal Article
in
JOURNAL OF APPLIED PHYSICS
2010
Texture of atomic layer deposited ruthenium
Jan Musschoot
Qi Xie
Davy Deduytsche
Koen De Keyser
Delphine Longrie
Johan Haemers
Sven Van den Berghe
Roland Van Meirhaeghe
Jan D'Haen
Christophe Detavernier
A1
Journal Article
in
MICROELECTRONIC ENGINEERING
2010
2009
Comparison of thermal and plasma enhanced ALD/CVD of vanadium pentoxide
Jan Musschoot
Davy Deduytsche
Hilde Poelman
Johan Haemers
Roland Vanmeirhaeghe
Sven Van den Berghe
Christophe Detavernier
A1
Journal Article
in
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
2009
2008
Influence of deposition on the reactive sputter behaviour during rotating cylindrical magnetron sputtering
XiuYang Li
Diederik Depla
Wouter Leroy
Johan Haemers
Roger De Gryse
A1
Journal Article
in
JOURNAL OF PHYSICS D-APPLIED PHYSICS
2008
Investigation of the sustaining mechanisms of dc magnetron discharges and consequences for I-V characteristics
Jan Musschoot
Diederik Depla
Guy Buyle
Johan Haemers
Roger De Gryse
A1
Journal Article
in
Journal of Phyics D: Applied Physics
2008
Observation of hysteresis in a non-reactive magnetron discharge
Jan Musschoot
Diederik Depla
Johan Haemers
Roger De Gryse
A1
Journal Article
in
Plasma Sources Science and Technology
2008
Some more equations describing reactive magnetron sputtering
Diederik Depla
Stijn Mahieu
Wouter Leroy
Johan Haemers
Roger De Gryse
C3
Conference
2008
2007
Understanding the discharge voltage behavior during reactive sputtering of oxides
Diederik Depla
Sarah Heirwegh
Stijn Mahieu
Johan Haemers
Roger De Gryse
A1
Journal Article
in
JOURNAL OF APPLIED PHYSICS
2007
2006
A Monte Carlo simulation of the erosion profile of a rotating cylindrical magnetron
Jan Musschoot
Diederik Depla
G Buyle
Johan Haemers
Roger De Gryse
A4
Journal Article
in
BELVAC NEWS
2006
Discharge voltage measurements during magnetron sputtering
Diederik Depla
G BUYLE
Johan Haemers
Roger De Gryse
A1
Journal Article
in
SURFACE & COATINGS TECHNOLOGY
2006
Discharge voltage measurements during reactive sputtering of oxides
Diederik Depla
Johan Haemers
Roger De Gryse
A1
Journal Article
in
THIN SOLID FILMS
2006
Hysteresis behavior during reactive magnetron sputtering of A(2)O(3) using a rotating cylindrical magnetron
Diederik Depla
Johan Haemers
G BUYLE
Roger De Gryse
A1
Journal Article
in
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
2006
Influence of the geometrical configuration on the plasma ionization distribution and erosion profile of a rotating cylindrical magnetron: a Monte Carlo simulation
Jan Musschoot
Diederik Depla
G BUYLE
Johan Haemers
Roger De Gryse
A1
Journal Article
in
JOURNAL OF PHYSICS D-APPLIED PHYSICS
2006
2004
Characterization of the Electron Movement in Varying Magnetic Fields and the Resulting Anomalous Erosion
Guy Buyle
Diederik Depla
Karin Eufinger
Johan Haemers
Roger De Gryse
W DE BOSSCHER
C1
Conference
2004
Simplified model for the DC planar magnetron discharge
Guy Buyle
Diederik Depla
Karin Eufinger
Johan Haemers
W DE BOSSCHER
Roger De Gryse
A1
Journal Article
in
VACUUM
2004
2003
Dissection of the Planar Magnetron Discharge
Guy Buyle
Diederik Depla
Karin Eufinger
Johan Haemers
Roger De Gryse
W DE BOSSCHER
C1
Conference
2003
Implantation of the sputtering gas as a factor in the target voltage behaviour during reactive sputtering
Roger De Gryse
Diederik Depla
Johan Haemers
A4
Journal Article
in
BELVAC NEWS
2003
Instabilities in the reactive sputtering of electrical insulating compounds
A Segers
Diederik Depla
Karin Eufinger
Johan Haemers
Roger De Gryse
A4
Journal Article
in
BELVAC NEWS
2003
Recapture of secondary electrons by the target in a DC planar magnetron discharge
Guy Buyle
W DE BOSSCHER
D DOPLA
Karin Eufinger
Johan Haemers
Roger De Gryse
A1
Journal Article
in
VACUUM
2003
Simplified model for calculating the pressure dependence of a direct current planar magnetron discharge
Guy Buyle
Diederik Depla
Karin Eufinger
Johan Haemers
Roger De Gryse
W DE BOSSCHER
A1
Journal Article
in
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
2003
Simplified model for the DC planar magnetron discharge
Guy Buyle
Diederik Depla
Johan Haemers
Roger De Gryse
A4
Journal Article
in
BELVAC NEWS
2003
2002
Arc Discharges in the Reactive Sputtering of Electrical Insulating Compounds.
Anneke Segers
Diederik Depla
Karin Eufinger
Johan Haemers
Roger De Gryse
C1
Conference
2002
Importance of recapture of secondary electrons in cylindrical and planar magnetron discharges.
Guy Buyle
Diederik Depla
Karin Eufinger
Johan Haemers
Roger De Gryse
W DE BOSSCHER
A1
Journal Article
in
CZECHOSLOVAK JOURNAL OF PHYSICS
2002
Influence of recapture of secondary electrons on the magnetron sputtering deposition process.
Guy Buyle
Diederik Depla
Karin Eufinger
Johan Haemers
Roger De Gryse
C1
Conference
2002
Low pressure Behaviour of the sputter magnetron discharge
Guy Buyle
Diederik Depla
W DE BOSSCHER
Karin Eufinger
Johan Haemers
Roger De Gryse
C1
Conference
2002
Poisoning during sputtering of an Al-target in a mixture of Ar and O2.
Roger De Gryse
Diederik Depla
Johan Haemers
A2
Journal Article
in
VACUUM TECHNOLOGY AND COATING
2002
Reactive DC sputtering of silver in a nitrogen/argon mixture
Roger De Gryse
Diederik Depla
Johan Haemers
A4
Journal Article
in
BELVAC NEWS
2002
Sputtering of an Al-target in a mixture of Ar and O2
Roger De Gryse
Diederik Depla
Johan Haemers
A4
Journal Article
in
BELVAC NEWS
2002
Target surface condition during reactive glow discharge sputtering of copper.
Diederik Depla
Johan Haemers
Roger De Gryse
A1
Journal Article
in
PLASMA SOURCES SCIENCE & TECHNOLOGY
2002
Target voltage behaviour during DC sputtering of silicon in an argon/nitrogen mixture.
Diederik Depla
A COLPAERT
Karin Eufinger
Anneke Segers
Johan Haemers
Roger De Gryse
A1
Journal Article
in
VACUUM
2002
1998
Chemical instability of the target surface during DC-magnetron sputtering of ITO-coatings.
P LIPPENS
A SEGERS
Johan Haemers
Roger De Gryse
A1
Journal Article
in
THIN SOLID FILMS
1998
1997
Yttria-stabilized zirconia thin films grown by r.f. magnetron sputtering from an oxide target
Henryk Tomaszewski
Johan Haemers
Nico De Roo
Jurgen Denul
Roger De Gryse
A1
Journal Article
in
THIN SOLID FILMS
1997
1996
Yttria-stabilized zirconia thin films grown by reactive rf magnetron sputtering
Henryk Tomaszewski
Johan Haemers
Jurgen Denul
Nico De Roo
Roger De Gryse
A1
Journal Article
in
THIN SOLID FILMS
1996
1993
Statistical analysis of a V2O5/TiO2 model catalyst, prepared by magnetron sputtering
Hilde Poelman
Peter Persoone
Johan Haemers
Lucien Fiermans
A4
Journal Article
in
BELVAC NEWS
1993
1973
On the electrical conductivity of V2O5 single crystals
Johan Haemers
E. Baetens
Joost Vennik
A1
Journal Article
in
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH
1973
1970
Purification and single crystal growth of V2O5
Johan Haemers
A1
Journal Article
in
BULLETIN DES SOCIETES CHIMIQUES BELGES
1970
1964
Sur la conductivité électrique du V2O5
Johan Haemers
A1
Journal Article
in
COMPTES RENDUS HEBDOMADAIRES DES SEANCES DE L ACADEMIE DES SCIENCES
1964