A fundamental study of nucleation and growth during thermal and plasma-enhanced atomic layer deposition of noble metals using in situ synchtron-based characterization techniques.

01 October 2013 → 01 March 2020
Regional and community funding: Special Research Fund, Research Foundation - Flanders (FWO)
Research disciplines
  • Natural sciences
    • Condensed matter physics and nanophysics
    • Analytical chemistry
    • Macromolecular and materials chemistry
  • Engineering and technology
    • Ceramic and glass materials
    • Materials science and engineering
    • Semiconductor materials
    • Other materials engineering
X-ray flueorescence ALD GISAXS growth kinetics nucleation atomic layer deposition
Project description

This project aims at an improved understanding of atomic layer deposition (ALD) of noble metals. In situ x-ray fluorescence and scattering techniques will be used to obtain insights in the formation of nanoparticles during the initial growth phase. The coarsening behavior of the nanoparticles at elevated temperatures and the effect of stabilizingultrathin ALD coatings will be studied as well.