Electron Beam Lithography System

01 May 2014 → 30 April 2020
Research Foundation - Flanders (FWO)
Research disciplines
  • Engineering and technology
    • Other engineering and technology
electron beam lithography system
Project description

We strongly believe acquiring a state-of-the-art electron beam lithography system is key in ensuring continued high impact research output from Flemish Researchers working in a wide range of scientific fields. Thereby it is particularly important that this new lithography tool gets seamlessly integrated with the existing nano- and micropatterning infrastructure installed in the UGent Cleanroom, without which, on the one hand the new tool is irrelevant, and for which, on the other hand the new tool will exhibit a strong catalyst function, opening it up to a much wider research field.