In situ study of nucleation and growth during atomic layer deposition using synchrotron-based X-ray fluorescence and scattering techniques

01 October 2012 → 01 October 2013
Regional and community funding: Special Research Fund
Research disciplines
  • Natural sciences
    • Condensed matter physics and nanophysics
    • Analytical chemistry
    • Macromolecular and materials chemistry
  • Engineering and technology
    • Ceramic and glass materials
    • Materials science and engineering
    • Semiconductor materials
    • Other materials engineering
nucleation X-ray flueorescence atomic layer deposition growth kinetics GISAXS ALD
Project description

This project aims at an improved understanding of the nucleation and growth of atomic layer deposition (ALD) processes. In situ synchrotron-based x-ray fluorescence and grazing incidence small angle x-ray scattering will be used to obtain insights in the initial growth phase, in the evolution of the internal film structure, and in the evolution of surface topography during ALD on nanoparticles.