Fundamental study of the formation of silicide nanocontacts by means of in situ characterization techniques

01 January 2008 → 30 December 2013
Research Foundation - Flanders (FWO)
Research disciplines
  • Natural sciences
    • Condensed matter physics and nanophysics
in-situ characterization silicide nanowires
Project description

The project consists of a fundamental study of the formation and properties of silicides as contacting materials for semiconducting nanowires. It aims at a better understanding of the formation kinetics of silicides through in-situ x-ray diffraction and in-situ Rutherford backscattering experiments on planar structures. Secondly, the formation, texture and electrical properties of silicide contacts on nanowires will be investigated.