Type
Equipment
Acronym
MA6-2
Code
APP/00248
Date of commissioning
01 January 2016 → …
Research disciplines
-
Natural sciences
- Photonics, optoelectronics and optical communications
Keywords
UV exposure
mask aligner
photolithography
Brand Name/manufacturer
Suss Microtech MA6
Other information
Description
Optical Lithography system. Definition of patterns in photosensitive layers with resolution down to 600nm. Option for deep UV lithography (248nm). For samples and wafers up to 150mm.