Type
Equipment
Acronym
MA6/BA6-1
Code
APP/00247
Date of commissioning
01 January 2005 → …
Research disciplines
-
Natural sciences
- Photonics, optoelectronics and optical communications
Keywords
mask aligner
photolithography
backside alignment
UV exposure
Brand Name/manufacturer
Suss Microtech MA6/BA6
Other information
Description
Optical Lithography system. Definition of patterns in photosensitive layers with resolution down to 800nm. Option for backside alignment. For samples and wafers up to 150mm.