Type
Equipment
Acronym
ICP2-III-V
Code
APP/00228
Date of commissioning
01 January 2013 → …
Research disciplines
-
Natural sciences
- Photonics, optoelectronics and optical communications
Keywords
ICP etching
inductively coupled plasma
microfabrication
deep etching
Brand Name/manufacturer
Oxford Plasmalab 100
Other information
Description
ICP plasma etch system for etching of diverse materials including III-V semiconductors.