Infrastructure

Reactive Ion Etching System

Type
Equipment
Acronym
AV RIE
Code
APP/00227
Date of commissioning
01 October 2009 → …
Research disciplines
  • Natural sciences
    • Photonics, optoelectronics and optical communications
Keywords
RIE semiconductor etching plasma etching anisotropic etching
Brand Name/manufacturer
Advanced Vacuum Vision 320 RIE
Other information
 
Description

RIE plasma etch system for etching of diverse materials including glasses, SiO2, Si3N4, Silicon, Germanium, polymers ...