Type
Equipment
Acronym
Ebeam
Code
APP/00267
Date of commissioning
01 January 2016 → …
Research disciplines
-
Natural sciences
- Photonics, optoelectronics and optical communications
Keywords
nanopatterning
e-beam lithography
electron beam
high-resolution lithography
Brand Name/manufacturer
Raith - Voyager
Other information
Description
50kEV Electron beam lithography for defining patterns with resolution down to 10 nm. Pattern generator 20bits, 500μm writing field. For samples and wafers up to 200mm. Traxx option for continuous writing of structures (fixed beam, moving stage).