Infrastructure

Advanced Mask Aligner (8" wafers)

Type
Equipment
Acronym
MA8/BA8
Code
APP/00261
Date of commissioning
01 November 2024 → …
Research disciplines
  • Natural sciences
    • Photonics, optoelectronics and optical communications
Keywords
UV exposure mask aligner photolithography backside alignment
Brand Name/manufacturer
Suss Microtec MA8/BA8
Other information
 
Description

The MA/BA Gen4 series’ high degree of automation enables outstanding process results. Functions such as constant dose mode, an automated control unit for exposure time as well as auto-alignment all help optimize process parameters. Additionally equipped with the high-grade MO Exposure Optics system, the MA/BA Gen4 series provides ideal exposure conditions and thus achieves top results. Sophisticated mechanical workings ensure high adjustment precision: a special design of the top- and bottom-side microscope unit (TSA and BSA) eliminates the long travel of the TSA microscope and the disturbing vibrations.Processes developed on the MA/BA Gen4 series can be quickly transferred onto SUSS MicroTec‘s automated mask alignment platforms for high-volume production.