Infrastructure

Semi-Automated Resist Processing System (8" wafers)

Type
Equipment
Acronym
MCS8
Code
APP/00250
Date of commissioning
01 January 2025 → …
Research disciplines
  • Natural sciences
    • Photonics, optoelectronics and optical communications
Keywords
photoresist spin coating semi-automated coating photoresist developing photolithography
Brand Name/manufacturer
SUSS MicroTec
Other information
 
Description

The MCS8 system is configured for semi-automated resist processing on 100 mm and 200 mm wafers. It includes one RCD8 module for resist coating, one RCD8 module for resist developing, and two HP8 hotplates equipped with proximity pins for precise thermal processing.