Research Explorer

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Researcher

Wouter Leroy

Awards & Distinctions

75 Results

2015

Study on reactive sputtering of yttrium oxide: process and thin film properties

Pei LeiWouter LeroyBing DaiJiaqi ZhuXiaoting ChenJiecai HanDiederik Depla

A1 Journal Article in SURFACE & COATINGS TECHNOLOGY

2014

Influence of oxygen flow and film thickness on the texture and microstructure of sputtered ceria thin films

Sigelinde Van SteenbergeWouter LeroyDiederik Depla

A1 Journal Article in THIN SOLID FILMS

Influence of the target-substrate distance on the growth of YSZ thin films

Jérika LamasWouter LeroyDiederik Depla

A1 Journal Article in SURFACE & COATINGS TECHNOLOGY

Momentum transfer driven textural changes of CeO2 thin films

Sigelinde Van SteenbergeWouter LeroyA HubinDiederik Depla

A1 Journal Article in APPLIED PHYSICS LETTERS

The effect of negative oxygen ions on the growth of sputter deposited ceria thin films

Sigelinde Van SteenbergeWouter LeroyDiederik Depla

Using the macroscopic scale to predict the nano-scale behavior of YSZ thin films

Jérika LamasWouter LeroyY-G LuJ VerbeeckG Van TendelooDiederik Depla

A1 Journal Article in SURFACE & COATINGS TECHNOLOGY

2013

A growth model for sputter deposited ceria thin films

Sigelinde Van SteenbergeWouter LeroyDiederik Depla

How does redeposition influence reactive sputtering?

Koen StrijckmansWouter LeroyDiederik Depla

Influence of particle and energy flux on stress and texture development in magnetron sputtered TiN films

Grégory AbadiasWouter LeroyStijn MahieuDiederik Depla

A1 Journal Article in JOURNAL OF PHYSICS D-APPLIED PHYSICS

Linking functional properties of transition metals to growth parameters

Wouter LeroyDiederik Depla

The influence of target surface morphology on the deposition flux during direct-current magnetron sputtering

Francis BoydensWouter LeroyRosita PersoonsDiederik Depla

A1 Journal Article in THIN SOLID FILMS

Yttria-stabilized zirconia thin films as oxygen ion conductor for solid oxide fuel cells

Jérika LamasWouter LeroyDiederik Depla

2012

A dynamic simulation tool for reactive sputtering

Koen StrijckmansWouter LeroyDiederik Depla

Angle-resolved energy flux measurements of a HIPIMS-powered rotating cylindrical magnetron in reactive and nonreactive atmosphere

Stephanos KonstantinidisWouter LeroyRony SnydersDiederik Depla

Deposition of thin films by sputtering cold isostatically pressed powder targets: a case study

Francis BoydensWouter LeroyRosita PersoonsDiederik Depla

A1 Journal Article in PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE

Influence of target-substrate distance and composition on the preferential orientation of yttria-stabilized zirconia thin films

Jérika LamasWouter LeroyDiederik Depla

A1 Journal Article in THIN SOLID FILMS

Linking functional properties of transition metals to growth parameters

Wouter LeroyDiederik Depla

Magnetron sputter deposition as visualized by Monte Carlo modeling

Diederik DeplaWouter Leroy

A1 Journal Article in THIN SOLID FILMS

Modeling reactive magnetron sputtering: fixing the parameter set

Koen StrijckmansWouter LeroyRoger De GryseDiederik Depla

A1 Journal Article in SURFACE & COATINGS TECHNOLOGY

Modeling the time dependency of the reactive sputter process

Koen StrijckmansWouter LeroyDiederik Depla

Nanostructured thin films for solid oxide fuel cells: crystallographic properties

Jérika LamasWouter LeroyDiederik Depla

Nanostructured thin films of yttria-stabilized zirconia

Jérika LamasWouter LeroyDiederik Depla

The fictional transition of the preferential orientation of yttria-stabilized zirconia thin films

Jérika LamasWouter LeroyDiederik Depla

A1 Journal Article in THIN SOLID FILMS

Thirty years of rotatable magnetrons

Roger De GryseJohan HaemersWouter LeroyDiederik Depla

A1 Journal Article in THIN SOLID FILMS

Understanding the growth of doped CeO2

Sigelinde Van SteenbergeWouter LeroyDiederik Depla

Understanding the growth of doped ceria thin films

Sigelinde Van SteenbergeWouter LeroyDiederik Depla

2011

A two-dimensional view on the preferential orientation of Yttria-Stabilized zirconia thin films

Jérika LamasWouter LeroyDiederik Depla

Angular-resolved energy flux measurements of a dc- and HIPIMS-powered rotating cylindrical magnetron in reactive and non-reactive atmosphere

Wouter LeroyStephanos KonstantinidisStijn MahieuRony SnydersDiederik Depla

A1 Journal Article in JOURNAL OF PHYSICS D-APPLIED PHYSICS

Depositie van complexe materialen

Diederik DeplaWouter Leroy

Editorial material

Fundamental aspects of home made targets for magnetron sputtering

Francis BoydensWouter LeroyRosita PersoonsDiederik Depla

Fundamental aspects of mixed oxide thin film growth

Marta Martins SaraivaV GeorgievaN JehanathanStijn MahieuWouter LeroyR PersoonsG Van TendelooA BogaertsDiederik Depla

In search for the ultimate model parameters of reactive magnetron sputtering

Koen StrijckmansWouter LeroyDiederik Depla

Reactive sputtering in 5D

Koen StrijckmansWouter LeroyDiederik Depla

Smart textiles: an explorative study of the use of magnetron sputter deposition

Diederik DeplaSiegfried SegersWouter LeroyTom Van HoveMarc Van Parys

A1 Journal Article in TEXTILE RESEARCH JOURNAL

Sputter deposited transition metal nitrides as back electrode for CIGS solar cells

Stijn MahieuWouter LeroyKoen Van AekenM WolterJ ColauxS LucasG AbadiasPaul MatthysDiederik Depla

A1 Journal Article in SOLAR ENERGY

Sputter deposited transition metal nitrides as back electrode for CIGS solar cells

Wouter LeroyStijn MahieuDiederik Depla

The energy and particle fluxes during the growth of multifunctional ZrN thin films deposited by reactive magnetron sputtering

Wouter LeroyDiederik Depla

2010

Analysis of the behaviour of the reactive species in reactive magnetron sputtering of oxides

Wouter LeroyStijn MahieuRosita PersoonsDiederik Depla

Experimental determination and simulation of the angular distribution of the metal flux during magnetron sputter deposition

Max HorkelKoen Van AekenChristophe Eisenmenger-SittnerDiederik DeplaStijn MahieuWouter Leroy

A1 Journal Article in JOURNAL OF PHYSICS D-APPLIED PHYSICS

Fixing the parameter set for reactive sputtering modelling

Koen StrijckmansWouter LeroyAnemie BogaertsDiederik Depla

High power impulse magnetron sputtering using a rotating cylindrical magnetron

Wouter LeroyArutiun EhiasarianStijn MahieuDiederik Depla

A1 Journal Article in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

In search for the limits of rotating cylindrical magnetron sputtering

Wouter LeroyStijn MahieuRoger De GryseDiederik Depla

Powder mixtures as deposition targets for multicomponent thin films: a case study

Francis BoydensWouter LeroyDiederik Depla

Powder mixtures as deposition targets for multicomponent thin films: a case study

Francis BoydensWouter LeroyDiederik Depla

Putting a rotatable magnetron to the test with high power impulse magnetron sputtering

Wouter LeroyStijn MahieuDiederik DeplaArutiun Ehiasarian

A4 Journal Article in BELVAC NEWS

Rotating cylindrical magnetron sputtering: simulation of the reactive process

Diederik DeplaXiuyang LiStijn MahieuKoen Van AekenWouter LeroyJohan HaemersRoger De GryseAnnemie Bogaerts

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Simulation of an Ar/O2 magnetron discharge in single and dual configurations with a hybrid model

M YusupovE BultinckMarta Martins SaraivaWouter LeroyDiederik DeplaA Bogaerts

2009

Influence of Al content on the properties of MgO grown by reactive magnetron sputtering

Marta Martins SaraivaChen HongWouter LeroyStijn MahieuNeerushana JehanathanOleg LebedevVioletta GeorgievaRosita PersoonsDiederik Depla

A1 Journal Article in PLASMA PROCESSES AND POLYMERS

Investigation of the O- ion emission during reactive magnetron sputtering

Stijn MahieuWouter LeroyDiederik Depla

Linking reactive sputtering models to experimental reality by determining the real-time parameters

Wouter LeroyKoen Van AekenKoen StrijckmansStijn MahieuRosita PersoonsDiederik Depla

Linking reactive sputtering models to experimental reality by determining the real-time parameters

Wouter LeroyKoen Van AekenKoen StrijckmansStijn MahieuRosita PersoonsDiederik Depla

Magnetron sputter depositie van dunne filmen

Diederik DeplaStijn MahieuWouter Leroy

Bookchapter in Micro, macro, mega : collectie Ocsinberg, keerpunt in de geschiedenis van de microscopie

Method to determine the sticking coefficient of O₂ on deposited Al during reactive magnetron sputtering, using mass spectrometry

Wouter LeroyStijn MahieuRosita PersoonsDiederik Depla

A1 Journal Article in PLASMA PROCESSES AND POLYMERS

Modeling the flux of high energy negative ions during reactive magnetron sputtering

Stijn MahieuWouter LeroyKoen Van AekenDiederik Depla

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Quantification of the incorporation coefficient of a reactive gas on a metallic film during magnetron sputtering : the method and results

Wouter LeroyStijn MahieuRosita PersoonsDiederik Depla

Quantification of the incorporation coefficient of a reactive gas on a metallic film during magnetron sputtering: the method and results

Wouter LeroyStijn MahieuRosita PersoonsDiederik Depla

A1 Journal Article in THIN SOLID FILMS

Using Mass Spectrometry to gather some insights in the fundamentals if the reactive magnetron sputtering process of Al with O2

Wouter LeroyStijn MahieuRosita PersoonsDiederik Depla

A4 Journal Article in Nevac Blad

2008

Characterization of Mg-Al oxides grown by reactive magnetron sputtering

Marta Martins SaraivaStijn MahieuWouter LeroyRosita PersoonsDiederik Depla

Characterization of MgxAlyOz thin films grown by reactive magnetron sputtering

Marta Martins SaraivaHong ChenWouter LeroyStijn MahieuNeeru JehanathanOleg LebedevVioletta GeorgievaRosita PersoonsDiederik Depla

Diagnostics of an argon/oxygen magnetron plasma and comparison with Monte Carlo simulation

Mireille GaillardLaurent SchwaederléStijn MahieuWouter LeroyDiederik DeplaAnnemie Bogaerts

Influence of deposition on the reactive sputter behaviour during rotating cylindrical magnetron sputtering

XiuYang LiDiederik DeplaWouter LeroyJohan HaemersRoger De Gryse

A1 Journal Article in JOURNAL OF PHYSICS D-APPLIED PHYSICS

Noble gas retention in the target during rotating cylindrical magnetron sputtering

Stijn MahieuWouter LeroyDiederik DeplaS SchreiberW Möller

A1 Journal Article in APPLIED PHYSICS LETTERS

Proceedings of ICTF 14 & RSD 2008

Some more equations describing reactive magnetron sputtering

Diederik DeplaStijn MahieuWouter LeroyJohan HaemersRoger De Gryse

Studying the reactive magnetron sputtering deposition of oxides, with mass spectrometry

Wouter LeroyStijn MahieuYolanda Aranda-GonzalvoDiederik Depla

Templated growth of europium-doped sulfide thin films by a solvothermal method

Philippe SmetDirk Poelman

Using mass spectrometry to gather some insights in the fundamentals of the reactive magnetron sputtering process of Al with O2

Wouter LeroyStijn MahieuR PersoonsDiederik Depla

A4 Journal Article in BELVAC NEWS

2007

Depositing aluminium oxide to study reactive magnetron sputtering

Wouter LeroyStijn MahieuDiederik Depla

Thin film solid-state reactions forming carbides as contact materials for carbon-containing semiconductors

Wouter LeroyChristophe DetavernierRoland VanmeirhaegheC LAVOIE

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

2006

A fundamental study of advanced metal/semiconductor contacts

Wouter LeroyRoland VanmeirhaegheChristophe Detavernier

In-situ X-ray diffraction measurements for monitoring carbide and silicide phase formation

Wouter LeroyDavy DeduytscheChristophe DetavernierRoland VanmeirhaegheDirk PoelmanC LAVOIE

In-situ X-ray diffraction measurements for monitoring carbide and silicide phase formation

Wouter LeroyDavy DeduytscheChristophe DetavernierRoland VanmeirhaegheDirk PoelmanC LAVOIE

Solid-state formation of titanium carbide and molybdenum carbide as contacts for carbon-containing semiconductors

Wouter LeroyChristophe DetavernierRoland VanmeirhaegheAJ KELLOCKC LAVOIE

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

2005

The barrier height inhomogeneity in identically prepared Au/n-GaAs Schottky barrier diodes

Wouter LeroyKarl OPSOMERStefaan FormentRoland Vanmeirhaeghe

A1 Journal Article in SOLID-STATE ELECTRONICS

2004

Influence of hydrogen treatment and annealing processes upon the Schottky barrier height of Au/n-GaAs and Ti/n-GaAs diodes

Stefaan FormentM BIBERRoland VanmeirhaegheWouter LeroyA TURUT

A1 Journal Article in SEMICONDUCTOR SCIENCE AND TECHNOLOGY