Research Explorer

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Researcher

Roeland Schelfhout

Awards & Distinctions

13 Results

2020

Sputter yield measurements to evaluate the target state during reactive magnetron sputtering

Roeland SchelfhoutKoen StrijckmansDiederik Depla

A1 Journal Article in SURFACE & COATINGS TECHNOLOGY

2019

Modeling reactive magnetron sputtering : opportunities and challenges

Diederik DeplaKoen StrijckmansDulmaa AltangerelFlorian CougnonRobin DedonckerRoeland SchelfhoutIsabella SchrammFilip MoensRoger De Gryse

A1 Journal Article in THIN SOLID FILMS

2018

An X-ray photoelectron spectroscopy study of the target surface composition after reactive magnetron sputtering

Roeland SchelfhoutKoen StrijckmansDiederik Depla

A1 Journal Article in SURFACE & COATINGS TECHNOLOGY

Anomalous effects in the aluminum oxide sputtering yield

Roeland SchelfhoutKoen StrijckmansDiederik Depla

A1 Journal Article in JOURNAL OF PHYSICS D-APPLIED PHYSICS

The (in)stability of process control mechanisms in reactive DC sputtering deposition

Koen StrijckmansRoeland SchelfhoutDiederik Depla

Tutorial: Hysteresis during the reactive magnetron sputtering process

Koen StrijckmansRoeland SchelfhoutDiederik Depla

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

2017

On the cause of a double hysteresis during reactive magnetron sputtering

Koen StrijckmansRoeland SchelfhoutDiederik Depla

Reactive (HiPIMS) through the eyes of a 'simple' model

Koen StrijckmansRoeland SchelfhoutFilip MoensDiederik Depla

2016

Hysteresis behavior during facing target magnetron sputtering

Florian CougnonKoen StrijckmansRoeland SchelfhoutDiederik Depla

A1 Journal Article in SURFACE & COATINGS TECHNOLOGY

The existence of a double S-shaped process curve during reactive magnetron sputtering

Roeland SchelfhoutKoen StrijckmansDiederik Depla

A1 Journal Article in APPLIED PHYSICS LETTERS

2015

Highlights in modeling the reactive magnetron sputtering process with RSD2013

Koen StrijckmansRoeland SchelfhoutFlorian CougnonDiederik Depla

On the target surface cleanness during magnetron sputtering

Roeland SchelfhoutDiederik Depla

On the target surface cleanness during magnetron sputtering

Roeland SchelfhoutKoen StrijckmansFrancis BoydensDiederik Depla

A1 Journal Article in APPLIED SURFACE SCIENCE