Research Explorer

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Researcher

Matthias Minjauw

Awards & Distinctions

90 Results

2025

Atomic layer deposition of lithium borate and lithium borophosphate for lithium-ion batteries

Tippi VerhelleArpan DharaLowie HenderickMatthias MinjauwLouis De TaeyeJohan MeersschautJolien DendoovenChristophe Detavernier

A1 Journal Article in CHEMISTRY OF MATERIALS

2024

Atomic layer deposition for tuning the surface chemical composition of nickel iron phosphates for oxygen evolution reaction in alkaline electrolyzers

Ruben BlommeRahul RameshLowie HenderickMatthias MinjauwPhilippe VereeckenMieke AdriaensChristophe DetavernierJolien Dendooven

A1 Journal Article in NANOTECHNOLOGY

Catalyst on Top? Importance of the Final Layer of an ALD Deposited Catalyst. Ni-Fe Catalysts Deposited by ALD

Ruben BlommeRahul RameshLowie HenderickMatthias MinjauwPhilippe VereeckenMieke AdriaensChristophe DetavernierJolien Dendooven

Chemical triggers behind Pt nanoparticle growth during post-deposition O2 annealing by in situ near-ambient pressure X-ray photoelectron spectroscopy

Matthias FilezMatthias MinjauwEduardo Solano MinuesaGiulio D’AcuntoPayam ShayestehJoachim SchnadtChristophe DetavernierJolien Dendooven

Controlling Pt nanoparticle sintering by sub-monolayer MgO ALD thin films

Zhang ZhiweiMatthias FilezEduardo SolanoNithin PoonkottilJin LiMatthias MinjauwHilde PoelmanMartin RosenthalPhilipp BrünerVladimir Galvita et al.

A1 Journal Article in NANOSCALE

In vacuo XPS study on Pt growth by atomic layer deposition using MeCpPtMe3 and N2/NH3 plasma

Jin LiMatthias MinjauwEduardo SolanoGiulio D’AcuntoPayam ShayestehJoachim SchnadtChristophe DetavernierJolien Dendooven

A1 Journal Article in JOURNAL OF PHYSICAL CHEMISTRY C

Optimization of non-alloyed backside ohmic contacts to N-face GaN for fully vertical GaN-on-silicon-based power devices

Youssef HamdaouiSofie VandenbrouckeSondre MichlerKatir ZioucheMatthias MinjauwChristophe DetavernierFarid Medjdoub

A1 Journal Article in MICROMACHINES

Role of the oxidizing co-reactant in Pt growth by atomic layer deposition using MeCpPtMe3 and O2/O3/O2-plasma

Jin LiSylwia KlejnaMatthias MinjauwJolien DendoovenChristophe Detavernier

A1 Journal Article in JOURNAL OF PHYSICAL CHEMISTRY C

Short‐wave infrared colloidal QDs photodetector with nanosecond response times enabled by ultrathin absorber layers

Yuhao DengChao PangEzat KheradmandJari LeemansJing BaiMatthias MinjauwJiayi LiuKorneel MolkensJeroen BeeckmanChristophe Detavernier et al.

A1 Journal Article in ADVANCED MATERIALS

2023

Depositing ALD-oxides on MLD-metalcones : enhancing initial growth through O2 plasma densification

Juan Santo-Domingo PeñarandaMatthias MinjauwSofie VandenbrouckeRobin PetitJin LiJolien DendoovenChristophe Detavernier

Depositing ALD-oxides on MLD-metalcones : enhancing initial growth through O2 plasma densification

Juan Santo-Domingo PeñarandaMatthias MinjauwSofie VandenbrouckeRobin PetitJin LiJolien DendoovenChristophe Detavernier

A1 Journal Article in DALTON TRANSACTIONS

Molecular mechanism of low-temperature passive NOx adsorption (PNA) on palladium-loaded FER zeolite

Hannelore Geerts-ClaesSam SmetChristoph HengstFrank-Walter SchuetzeElke VerheyenMatthias MinjauwChristophe DetavernierSreeprasanth Pulinthanathu SreeJohan Martens

A1 Journal Article in JOURNAL OF PHYSICAL CHEMISTRY C

Surface chemistry of InP quantum dots, amine-halide co- passivation, and binding of Z-type ligands

Kim Corinna DümbgenJari LeemansVic De RooMatthias MinjauwChristophe DetavernierZeger Hens

A1 Journal Article in CHEMISTRY OF MATERIALS

2022

Atomic layer deposition of ruthenium dioxide based on redox reactions between alcohols and ruthenium tetroxide

Nithin PoonkottilMatthias MinjauwAndreas WerbrouckStefano ChecchiaEduardo SolanoMikko NisulaAlexis FranquetChristophe DetavernierJolien Dendooven

A1 Journal Article in CHEMISTRY OF MATERIALS

Atomic layer deposition of ruthenium dioxide thin films using RuO4 and alcohols as reactants

Matthias MinjauwNithin PoonkottilAndreas WerbrouckChristophe DetavernierJolien Dendooven

Atomic layer deposition of ternary ruthenates by combining metalorganic precursors with RuO4 as the co-reactant

Matthias MinjauwJi-Yu FengTimo SajavaaraChristophe DetavernierJolien Dendooven

A1 Journal Article in DALTON TRANSACTIONS

Colloidal III-V quantum dot photodiodes for short-wave infrared photodetection

Jari LeemansVladimir PejovicEpimitheas GeorgitzikisMatthias MinjauwAbu Bakar SiddikYuhao DengYinghuan KuangGünther RoelkensChristophe DetavernierItai Lieberman et al.

A1 Journal Article in ADVANCED SCIENCE

Depositing ALD-oxides on MLD-metalcones : enhancing initial growth through O2 plasma densification

Juan Santo-Domingo PeñarandaMatthias MinjauwSofie VandenbrouckeRobin PetitJin LiJolien DendoovenChristophe Detavernier

Increasing ALD complexity : how to transform ternary oxide films into tunable bimetallic thin films and nanoparticles

Ji-Yu FengMatthias FilezMatthias MinjauwEduardo Solano MinuesaChristophe DetavernierJolien Dendooven

Plasma-enhanced atomic layer deposition of nickel and cobalt phosphate for lithium ion batteries

Lowie HenderickRuben BlommeMatthias MinjauwJonas KeukelierJohan MeersschautJolien DendoovenPhilippe VereeckenChristophe Detavernier

A1 Journal Article in DALTON TRANSACTIONS

Selective vapor-phase doping of Pt nanoparticles into phase-controlled nanoalloys

Nithin PoonkottilRanjith Karuparambil RamachandranEduardo Solano MinuesaNadadur Veeraraghavan SrinathJi-Yu FengAndreas WerbrouckMichiel Van DaeleMatthias FilezMatthias MinjauwHilde Poelman et al.

A1 Journal Article in JOURNAL OF PHYSICAL CHEMISTRY C

Shuffling atomic layer deposition gas sequences to modulate bimetallic thin films and nanoparticle properties

Matthias FilezJi-Yu FengMatthias MinjauwEduardo Solano MinuesaNithin PoonkottilMichiel Van DaeleRanjith Karuparambil RamachandranChen LiSara BalsHilde Poelman et al.

A1 Journal Article in CHEMISTRY OF MATERIALS

Spatially templated nanolines of Ru and RuO2 by sequential infiltration synthesis

Nithin PoonkottilEduardo SolanoArbresha MuriqiMatthias MinjauwMatthias FilezMichael NolanChristophe DetavernierJolien Dendooven

A1 Journal Article in CHEMISTRY OF MATERIALS

Surface reactions between LiHMDS, TMA and TMP leading to deposition of amorphous lithium phosphate

Andreas WerbrouckFelix MattelaerArpan DharaMikko NisulaMatthias MinjauwFrans MunnikJolien DendoovenChristophe Detavernier

A1 Journal Article in JOURNAL OF MATERIALS CHEMISTRY A

Thickness matters : sintering inhibition in Pt nanoparticle catalysts via step-by-step control of MgO overcoats

Zhiwei ZhangMatthias FilezMatthias MinjauwJin LiChristophe DetavernierJolien Dendooven

2021

Acid-base mediated ligand exchange on near-infrared absorbing, indium-based III-V colloidal quantum dots

Jari LeemansKim Corinna DümbgenMatthias MinjauwQiang ZhaoAndre VantommeIvan InfanteChristophe DetavernierZeger Hens

A1 Journal Article in JOURNAL OF THE AMERICAN CHEMICAL SOCIETY

Atomic layer deposition of ruthenium dioxide thin films using RuO4 and alcohols as reactants

Nithin PoonkottilMatthias MinjauwAndreas WerbrouckChristophe DetavernierJolien Dendooven

Controlled graphite surface functionalization using contact and remote photocatalytic oxidation

Niels R. OstynBarbara ThijsJulian A. SteeleSreeprasanth Pulinthanathu SreeWauter WangermezJoan TeyssandierMatthias MinjauwJin LiChristophe DetavernierMaarten B. J. Roeffaers et al.

A1 Journal Article in CARBON

Converting molecular layer deposited alucone films into Al2O3/alucone hybrid multilayers by plasma densification

Juan Santo-Domingo PeñarandaMikko NisulaSofie VandenbrouckeMatthias MinjauwJin LiAndreas WerbrouckJonas KeukelierAndrea Itziar Pitillas MartinezJolien DendoovenChristophe Detavernier

Converting molecular layer deposited alucone films into Al2O3/alucone hybrid multilayers by plasma densification

Juan Santo-Domingo PeñarandaMikko NisulaSofie VandenbrouckeMatthias MinjauwJin LiAndreas WerbrouckJonas KeukelierAndrea Itziar Pitillas MartinezJolien DendoovenChristophe Detavernier

A1 Journal Article in DALTON TRANSACTIONS

Emergence of metallic conductivity in ordered one-dimensional coordination polymer thin films upon reductive doping

Mikko NisulaAntti. KarttunenEduardo Solano MinuesaGirish TewariMaarit KarppinenMatthias MinjauwJena HimanshuPascal Van Der VoortDirk PoelmanChristophe Detavernier

A1 Journal Article in ACS APPLIED MATERIALS & INTERFACES

In situ study of noble metal atomic layer deposition processes using grazing incidence small angle X-ray scattering

Jolien DendoovenE. SolanoJi-Yu FengRanjith Karuparambil RamachandranMatthias MinjauwMichiel Van DaeleA. CoatiD. Hermida-MerinoChristophe Detavernier

Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries

Lowie HenderickHamid HamedFelix MattelaerMatthias MinjauwMikko NisulaJohan MeersschautJolien DendoovenMohammadhosein SafariPhilippe VereeckenChristophe Detavernier

A1 Journal Article in JOURNAL OF POWER SOURCES

Tuning size and coverage of Pd nanoparticles using atomic layer deposition

Ji-Yu FengRanjith Karuparambil RamachandranEduardo Solano MinuesaMatthias MinjauwMichiel Van DaeleAndre VantommeDaniel Hermida-MerinoAlessandro CoatiHilde PoelmanChristophe Detavernier et al.

A1 Journal Article in APPLIED SURFACE SCIENCE

Vapor phase conversion of Pt nanoparticles into Pt-Sn bimetallic nanoparticles

Nithin PoonkottilRanjith Karuparambil RamachandranEduardo Solano MinuesaNadadur Veeraraghavan SrinathJi-Yu FengAndreas WerbrouckMichiel Van DaeleMatthias MinjauwMatthias FilezHilde Poelman et al.

2020

Area-selective growth and nucleation enhancement during Ru ALD using the RuO4 precursor and H2-gas

Matthias MinjauwHannes RijckaertIsabel Van DriesscheChristophe DetavernierJolien Dendooven

Atomic Layer Deposition of Ru-containing materials using RuO4 as both the co-reactant and the metal source

Matthias MinjauwJi-Yu FengJolien DendoovenChristophe Detavernier

Atomic layer deposition of localized boron- and hydrogen-doped aluminum oxide using trimethyl borate as a dopant precursor

Felix MattelaerMichiel Van DaeleMatthias MinjauwMikko NisulaSimon D. ElliottTimo SajavaaraJolien DendoovenChristophe Detavernier

A1 Journal Article in CHEMISTRY OF MATERIALS

Atomic layer deposition of nitrogen-doped Al phosphate coatings for Li-ion battery applications

Lowie HenderickHamid HamedFelix MattelaerMatthias MinjauwJohan MeersschautJolien DendoovenMohammadhosein SafariPhilippe VereeckenChristophe Detavernier

A1 Journal Article in ACS APPLIED MATERIALS & INTERFACES

Design of Li-containing layers with LiHMDS

Andreas WerbrouckFelix MattelaerMatthias MinjauwFrans MunnikJaakko JulinJolien DendoovenChristophe Detavernier

In situ study of the thermal stability of supported Pt nanoparticles and their stabilization via atomic layer deposition overcoating

Eduardo Solano MinuesaJolien DendoovenJi-Yu FengPhilipp BruenerMatthias MinjauwRanjith Karuparambil RamachandranMichiel Van DaeleKevin Van de KerckhoveThomas DobbelaereAlessandro Coati et al.

A1 Journal Article in NANOSCALE

Molecular layer deposition of 'magnesicone', a magnesium-based hybrid material

Jeroen KintFelix MattelaerSofie VandenbrouckeArbersha MuriqiMatthias MinjauwMikko NisulaPhilippe M. VereeckenMichael NolanJolien DendoovenChristophe Detavernier

A1 Journal Article in CHEMISTRY OF MATERIALS

Nitrogen doping of Al- and Ti-phosphate through plasma-enhanced ALD

Lowie HenderickHamid HamedFelix MattelaerMatthias MinjauwMomo SafariPhilippe VereeckenChristophe Detavernier

Plasmonic gold-embedded TiO2 thin films as photocatalytic self-cleaning coatings

Hannelore PeetersMaarten KeulemansGert NuytsFrederik VanmeertChen LiMatthias MinjauwChristophe DetavernierSara BalsSilvia LenaertsSammy W. Verbruggen

A1 Journal Article in APPLIED CATALYSIS B-ENVIRONMENTAL

Reaction mechanism of the Me3AuPMe3-H-2 plasma-enhanced ALD process

Michiel Van DaeleMatthew B. E. GriffithsMatthias MinjauwSean T. BarryChristophe DetavernierJolien Dendooven

A1 Journal Article in PHYSICAL CHEMISTRY CHEMICAL PHYSICS

Reaction pathways for atomic layer deposition with lithium hexamethyl disilazide, trimethyl phosphate, and oxygen plasma

Andreas WerbrouckFelix MattelaerMatthias MinjauwMikko NisulaJaakko JulinFrans MunnikJolien DendoovenChristophe Detavernier

A1 Journal Article in JOURNAL OF PHYSICAL CHEMISTRY C

Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy

Sofie VandenbrouckeElisabeth LevrauMatthias MinjauwMichiel Van DaeleEduardo Solano MinuesaRita VosJolien DendoovenChristophe Detavernier

Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy

Sofie VandenbrouckeElisabeth LevrauMatthias MinjauwMichiel Van DaeleEduardo Solano MinuesaRita VosJolien DendoovenChristophe Detavernier

A1 Journal Article in PHYSICAL CHEMISTRY CHEMICAL PHYSICS

Surface mobility and impact of precursor dosing during atomic layer deposition of platinum : in situ monitoring of nucleation and island growth

Jolien DendoovenMichiel Van DaeleEduardo SolanoRanjith Karuparambil RamachandranMatthias MinjauwAndrea RestaAlina VladYves GarreauAlessandro CoatiGiuseppe Portale et al.

A1 Journal Article in PHYSICAL CHEMISTRY CHEMICAL PHYSICS

The co-reactant role during plasma enhanced atomic layer deposition of palladium

Ji-Yu FengMatthias MinjauwRanjith Karuparambil RamachandranMichiel Van DaeleHilde PoelmanTimo SajavaaraJolien DendoovenChristophe Detavernier

A1 Journal Article in PHYSICAL CHEMISTRY CHEMICAL PHYSICS

2019

Atomic layer deposition of ZnO-SnO2 composite thin film : the influence of structure, composition and crystallinity on lithium-ion battery performance

Bo ZhaoFelix MattelaerJeroen KintAndreas WerbrouckLowie HenderickMatthias MinjauwJolien DendoovenChristophe Detavernier

A1 Journal Article in ELECTROCHIMICA ACTA

Atomic layer deposition of localised boron- and hydrogen-doped aluminium oxide using trimethyl borate as a dopant precursor

Felix MattelaerMichiel Van DaeleMatthias MinjauwTimo SajavaaraJolien DendoovenChristophe Detavernier

Atomic layer deposition of ruthenium and silver

Matthias MinjauwChristophe DetavernierJolien Dendooven

Atomic layer deposition of thin films as model electrodes : a case study of the synergistic effect in Fe2O3-SnO2

Jeroen KintFelix MattelaerMatthias MinjauwBo ZhaoChristophe Detavernier

A1 Journal Article in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Bifunctional earth-abundant phosphate/phosphide catalysts prepared via atomic layer deposition for electrocatalytic water splitting

Jan RongéThomas DobbelaereLowie HenderickMatthias MinjauwSreeprasanth Pulinthanathu SreeJolien DendoovenJohan A MartensChristophe Detavernier

A1 Journal Article in NANOSCALE ADVANCES

Chemical and structural configuration of Pt-doped metal oxide thin films prepared by atomic layer deposition

Ranjith Karuparambil RamachandranMatthias FilezEduardo Solano MinuesaHilde PoelmanMatthias MinjauwMichiel Van DaeleJi-Yu FengAndrea La PortaThomas AltantzisEmiliano Fonda et al.

A1 Journal Article in CHEMISTRY OF MATERIALS

Chemical selectivity and nucleation during ALD of Ru with the RuO4 precursor

Matthias MinjauwHannes RijckaertIsabel Van DriesscheChristophe DetavernierJolien Dendooven

Electron transfer and near-field mechanisms in plasmonic gold-nanoparticle-modified TiO2 photocatalytic systems

Ramesh AsapuNathalie ClaesRadu-George CiocarlanMatthias MinjauwChristophe DetavernierPegie CoolSara BalsSammy W. Verbruggen

A1 Journal Article in ACS APPLIED NANO MATERIALS

In situ X-ray based characterization of atomic layer deposition

Matthias MinjauwChristophe DetavernierJolien Dendooven

Near room temperature plasma enhanced atomic layer deposition of gold metal

Michiel Van DaeleMatthew BE GriffithsAli RazaMatthias MinjauwSeán T BarryRoel BaetsChristophe DetavernierJolien Dendooven

Near room temperature plasma enhanced atomic layer deposition of gold metal

Michiel Van DaeleMatthew BE GriffithsAli RazaMatthias MinjauwSeán T BarryRoel BaetsChristophe DetavernierJolien Dendooven

Nitrogen doping of Al- and Ti-phosphate through plasma-enhanced ALD

Lowie HenderickFelix MattelaerMatthias MinjauwChristophe Detavernier

Nucleation enhancement and area-selective atomic layer deposition of ruthenium using RuO4 and H2 gas

Matthias MinjauwHannes RijckaertIsabel Van DriesscheChristophe DetavernierJolien Dendooven

A1 Journal Article in CHEMISTRY OF MATERIALS

Plasma-enhanced atomic layer deposition of nanostructured gold near room temperature

Michiel Van DaeleMatthew BE GriffithsAli RazaMatthias MinjauwEduardo SolanoJi-Yu FengRanjith Karuparambil RamachandranStéphane ClemmenRoel BaetsSeán T Barry et al.

A1 Journal Article in ACS APPLIED MATERIALS & INTERFACES

Surface reactions during thermal and plasma-enhanced atomic layer deposition of titanium dioxide films using tetrakis(dimethylamino)titanium

Sofie VandenbrouckeElisabeth LevrauMatthias MinjauwKevin Van de KerckhoveKilian Devloo-CasierSreeprasanth Pulinthanathu SreeJohan A MartensRita VosKarolien JansJolien Dendooven et al.

2018

Effect of thermal annealing and chemical treatments on secondary electron emission properties of atomic layer deposited MgO

Violeta ProdanovicHong Wah ChanAnil U ManeJeffrey W ElamMatthias MinjauwChristophe DetavernierHarry van der GraafPasqualina M. Sarro

A1 Journal Article in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Influence of the chalcogen element on the filament stability in Culn(Te,Se,S)(2)/Al2O3 filamentary switching devices

Tareq AhmadWouter DevulderKarl OpsomerMatthias MinjauwUmberto CelanoThomas HantschelWilfried VandervorstLudovic GouxGouri Sankar KarChristophe Detavernier

A1 Journal Article in ACS APPLIED MATERIALS & INTERFACES

Inherent area-selective growth and nucleation enhancement during Ru ALD using the RuO4-precursor and H2-gas

Matthias MinjauwHannes RijckaertIsabel Van DriesscheChristophe DetavernierJolien Dendooven

Inherent substrate selectivity and nucleation enhancement during Ru ALD using the RuO4-precursor and H2-gas

Matthias MinjauwHannes RijckaertIsabel Van DriesscheChristophe DetavernierJolien Dendooven

2017

Atomic layer deposition of nanoalloys of noble and non-noble metals

Ranjith Karuparambil RamachandranJolien DendoovenMatthias FilezVladimir GalvitaHilde PoelmanEduardo Solano MinuesaMatthias MinjauwGuy MarinChristophe Detavernier

A2 Journal Article in ECS TRANSACTIONS

Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition

Jolien DendoovenRanjith Karuparambil RamachandranEduardo Solano MinuesaMert KurttepeliLisa GeertsGino HeremansJan RongeMatthias MinjauwThomas DobbelaereKilian Devloo-Casier et al.

A1 Journal Article in NATURE COMMUNICATIONS

Key role of surface oxidation and reduction processes in the coarsening of Pt nanoparticles

Eduardo Solano MinuesaJolien DendoovenMatthias MinjauwRanjith Karuparambil RamachandranKevin Van de KerckhoveThomas DobbelaereDaniel Hermida-MerinoChristophe Detavernier

A1 Journal Article in NANOSCALE

Plasma enhanced atomic layer deposition of silver using the Ag(fod)(PEt₃)-precursor and NH₃-plasma

Matthias MinjauwEduardo Solano MinuesaSree Pulinthanathu SreeRamesh AsapuMichiel Van DaeleRanjith Karuparambil RamachandranSammy VerbruggenSilvia LenaertsJohan MartensChristophe Detavernier et al.

Plasma enhanced atomic layer deposition of silver using the Ag(fod)(PEt₃)-precursor and NH₃-plasma

Matthias MinjauwEduardo Solano MinuesaSree Pulinthanathu SreeRamesh AsapuMichiel Van DaeleRanjith Karuparambil RamachandranSammy VerbruggenSilvia LenaertsJohan MartensChristophe Detavernier et al.

Plasma-enhanced atomic layer deposition of silver Using Ag(fod)(PEt3) and NH3-plasma

Matthias MinjauwEduardo Solano MinuesaSreeprasanth Pulinthanathu SreeRamesh AsapuMichiel Van DaeleRanjith Karuparambil RamachandranGino HeremansSammy W VerbruggenSilvia LenaertsJohan A Martens et al.

A1 Journal Article in CHEMISTRY OF MATERIALS

Plasmonic near-field localization of silver core-shell nanoparticle assemblies via wet chemistry nanogap engineering

Ramesh AsapuRadu-George CiocarlanNathalie ClaesNatan BlommaertsMatthias MinjauwTareq AhmadJolien DendoovenPegie CoolSara BalsSiegfried Denys et al.

A1 Journal Article in ACS APPLIED MATERIALS & INTERFACES

Synthesis of Bimetallic Nanoparticles with Tailored Size and Composition

Ranjith Karuparambil RamachandranJolien DendoovenMatthias FilezVladimir GalvitaHilde PoelmanEduardo Solano MinuesaMatthias MinjauwKilian Devloo-CasierE. Fonda

2016

Atomic layer deposition route to tailor nanoalloys of noble and non-noble metals

Ranjith Karuparambil RamachandranJolien DendoovenMatthias FilezVladimir GalvitaHilde PoelmanEduardo Solano MinuesaMatthias MinjauwKilian Devloo-CasierEmiliano FondaDaniel Hermida-Merino et al.

A1 Journal Article in ACS NANO

Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition

Jolien DendoovenEduardo Solano MinuesaMatthias MinjauwKevin Van de KerckhoveAlessandro CoatiEmiliano FondaGiuseppe PortaleYves GarreauChristophe Detavernier

A1 Journal Article in REVIEW OF SCIENTIFIC INSTRUMENTS

Plasma-enhanced atomic layer deposition of zinc phosphate

Thomas DobbelaereMatthias MinjauwTareq AhmadPM VereeckenChristophe Detavernier

A1 Journal Article in JOURNAL OF NON-CRYSTALLINE SOLIDS

Study of amorphous Cu-Te-Si thin films showing high thermal stability for application as a cation supply layer in conductive bridge random access memory devices

Wouter DevulderKarl OpsomerMatthias MinjauwJohan MeersschautMalgorzata JurczakLudovic GouxChristophe Detavernier

A1 Journal Article in RSC ADVANCES

Thin, low roughness Ru films deposited by thermal and plasma enhanced atomic layer deposition using RuO4 and H2 at low temperatures

Matthias MinjauwJolien DendoovenBoris CaponChristian DussaratEduardo Solano MinuesaKilian Devloo-CasierJakob KuhsMarc SchaekersAlessandro CoatiChristophe Detavernier

Thin, low roughness Ru films deposited by thermal and plasma enhanced atomic layer deposition using RuO4 and H2 at low temperatures

Matthias MinjauwJolien DendoovenChristian DussaratEduardo Solano MinuesaKilian Devloo-CasierJakob KuhsMarc SchaekersAlessandro CoatiChristophe Detavernier

Thin, low roughness Ru films deposited by thermal and plasma enhanced atomic layer deposition using RuO4 and H2 at low temperatures

Matthias MinjauwJolien DendoovenBoris CaponChristian DussaratEduardo Solano MinuesaKilian Devloo-CasierJakob KuhsMarc SchaekersAlessandro CoatiChristophe Detavernier

2015

Atomic layer deposition of ruthenium at 100 °C using the RuO4-precursor and H2

Matthias MinjauwJolien DendoovenBoris CaponMarc SchaekersChristophe Detavernier

A1 Journal Article in JOURNAL OF MATERIALS CHEMISTRY C

Low temperature thermal and plasma enhanced atomic layer deposition of ruthenium using RuO4 and H2/H2-plasma

Matthias MinjauwJolien DendoovenBoris CaponChristophe DetavernierMarc Schaekers

Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H-2-plasma

Matthias MinjauwJolien DendoovenBoris CaponMarc SchaekersChristophe Detavernier

A1 Journal Article in JOURNAL OF MATERIALS CHEMISTRY C

Plasma enhanced atomic layer deposition of ruthenium below 100°C using RuO4 and H2-plasma

Matthias MinjauwJolien DendoovenBoris CaponMarc SchaekersChristophe Detavernier

2014

ALD of ruthenium at 100°C using the ToRuS-precursor

Matthias MinjauwBoris CaponJolien DendoovenMarc SchaekersChristophe Detavernier

ALD of ruthenium at 100°C using the ToRuS-precursor

Matthias MinjauwJolien DendoovenBoris CaponMarc SchaekersChristophe Detavernier