Research Explorer

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Kilian Devloo-Casier

Prijzen & Erkenningen

43 Resultaten

2019

Surface reactions during thermal and plasma-enhanced atomic layer deposition of titanium dioxide films using tetrakis(dimethylamino)titanium

Sofie VandenbrouckeElisabeth LevrauMatthias MinjauwKevin Van de KerckhoveKilian Devloo-CasierSreeprasanth Pulinthanathu SreeJohan A MartensRita VosKarolien JansJolien Dendooven et al.

2017

Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition

Jolien DendoovenRanjith Karuparambil RamachandranEduardo Solano MinuesaMert KurttepeliLisa GeertsGino HeremansJan RongeMatthias MinjauwThomas DobbelaereKilian Devloo-Casier et al.

A1 Artikel in een tijdschrift in NATURE COMMUNICATIONS

Synthesis of Bimetallic Nanoparticles with Tailored Size and Composition

Ranjith Karuparambil RamachandranJolien DendoovenMatthias FilezVladimir GalvitaHilde PoelmanEduardo Solano MinuesaMatthias MinjauwKilian Devloo-CasierE. Fonda

2016

A case study of ALD encapsulation of quantum dots: embedding supported CdSe/CdS/ZnS quantum dots in a ZnO matrix

Kilian Devloo-CasierPieter GeiregatKarl F LudwigKoen van StiphoutAndre VantommeZeger HensChristophe DetavernierJolien Dendooven

A1 Artikel in een tijdschrift in JOURNAL OF PHYSICAL CHEMISTRY C

Atomic layer deposition route to tailor nanoalloys of noble and non-noble metals

Ranjith Karuparambil RamachandranJolien DendoovenMatthias FilezVladimir GalvitaHilde PoelmanEduardo Solano MinuesaMatthias MinjauwKilian Devloo-CasierEmiliano FondaDaniel Hermida-Merino et al.

A1 Artikel in een tijdschrift in ACS NANO

In situ synchrotron based fluorescence and scattering techniques : a study of quantum dot encapsulation by atomic layer deposition

Kilian Devloo-CasierChristophe DetavernierJolien Dendooven

Plasma-enhanced ALD : a route to hydrophilic, glueable PTFE

Geert RampelbergAmit Kumar RoyJolien DendoovenDavy DeduytscheKilian Devloo-CasierKim RagaertLudwig CardonChristophe Detavernier

Thin, low roughness Ru films deposited by thermal and plasma enhanced atomic layer deposition using RuO4 and H2 at low temperatures

Matthias MinjauwJolien DendoovenBoris CaponChristian DussaratEduardo Solano MinuesaKilian Devloo-CasierJakob KuhsMarc SchaekersAlessandro CoatiChristophe Detavernier

Thin, low roughness Ru films deposited by thermal and plasma enhanced atomic layer deposition using RuO4 and H2 at low temperatures

Matthias MinjauwJolien DendoovenChristian DussaratEduardo Solano MinuesaKilian Devloo-CasierJakob KuhsMarc SchaekersAlessandro CoatiChristophe Detavernier

Thin, low roughness Ru films deposited by thermal and plasma enhanced atomic layer deposition using RuO4 and H2 at low temperatures

Matthias MinjauwJolien DendoovenBoris CaponChristian DussaratEduardo Solano MinuesaKilian Devloo-CasierJakob KuhsMarc SchaekersAlessandro CoatiChristophe Detavernier

2015

Improved thermal stability and retention properties of Cu-Te based CBRAM by Ge alloying

Wouter DevulderKarl OpsomerGeert RampelbergBob De SchutterKilian Devloo-CasierMalgorzata JurczakLudovic GouxChristophe Detavernier

A1 Artikel in een tijdschrift in JOURNAL OF MATERIALS CHEMISTRY C

Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene

Amit Kumar RoyJolien DendoovenDavy DeduytscheKilian Devloo-CasierKim RagaertLudwig CardonChristophe Detavernier

A1 Artikel in een tijdschrift in CHEMICAL COMMUNICATIONS

2014

Air-stable short-wave infrared PbS colloidal quantum dot photoconductors passivated with Al2O3 atomic layer deposition

Chen HuAlban GassenqYolanda Justo ZarraquiñosKilian Devloo-CasierHongtao ChenChristophe DetavernierZeger HensGünther Roelkens

A1 Artikel in een tijdschrift in APPLIED PHYSICS LETTERS

Atomic layer deposition-based tuning of the pore size in mesoporous thin films studied by in situ grazing incidence small angle X-ray scattering

Jolien DendoovenKilian Devloo-CasierMatthias IdeKathryn GrandfieldMert KurttepeliKarl F LudwigSara BalsPascal Van Der VoortChristophe Detavernier

A1 Artikel in een tijdschrift in NANOSCALE

Controllable nitrogen doping in as deposited TiO₂ film and its effect on post deposition annealing

Shaoren DengSammy W VerbruggenSilvia LenaertsJohan A MartensSven Van den BergheKilian Devloo-CasierWouter DevulderJolien DendoovenDavy DeduytscheChristophe Detavernier

A1 Artikel in een tijdschrift in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

In situ IR spectroscopic investigation of alumina ALD on porous silica films: thermal versus plasma-enhanced ALD

Elisabeth LevrauKevin Van de KerckhoveKilian Devloo-CasierSreeprasanth Pulinthanathu SreeJohan A MartensChristophe DetavernierJolien Dendooven

A1 Artikel in een tijdschrift in JOURNAL OF PHYSICAL CHEMISTRY C

In situ XAS and XRF study of nanoparticle nucleation during O3-based Pt deposition

Matthias FilezHilde PoelmanRanjith Karuparambil RamachandranJolien DendoovenKilian Devloo-CasierEmiliano FondaChristophe DetavernierGuy Marin

A1 Artikel in een tijdschrift in CATALYSIS TODAY

In situ synchrotron based XRF and GISAXS study of ALD encapsulation of supported nanocrystals

Kilian Devloo-CasierJolien DendoovenPieter GeiregatKarl LudwigZeger HensChristophe Detavernier

In situ synchrotron based x-ray techniques as monitoring tools for atomic layer deposition

Kilian Devloo-CasierKarl F LudwigChristophe DetavernierJolien Dendooven

A1 Artikel in een tijdschrift in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Short-wave infrared PbS colloidal quantum dot photodetectors with AlOx atomic layer deposition passivation

Chen HuAlban GassenqYolanda Justo ZarraquiñosKilian Devloo-CasierHongtao ChenHaolan ZhaoChristophe DetavernierZeger HensGünther Roelkens

Synchrotron based in situ characterization during atomic layer deposition

Jolien DendoovenKilian Devloo-CasierAlessandro CoatiGiuseppe PortaleWim BrasKarl LudwigChristophe Detavernier

2013

Atomic layer deposition of TiO₂ on surface modified nanoporous low-k films

Elisabeth LevrauKilian Devloo-CasierJolien DendoovenKarl F LudwigPatrick VerdonckJohan MeersschautMikhail R BaklanovChristophe Detavernier

A1 Artikel in een tijdschrift in LANGMUIR

Atomic layer deposition of platinum : GISAXS study of the initial island growth mode

Jolien DendoovenRanjith Karuparambil RamachandranKilian Devloo-CasierKarl LudwigChristophe Detavernier

In situ GISAXS during atomic layer deposition of oxides on ordered quantum dots

Kilian Devloo-CasierJolien DendoovenKarl LudwigPieter GeiregatZeger HensChristophe Detavernier

In situ XAS and XRF study of nanoparticle nucleation during O3-based Pt deposition

Matthias FilezHilde PoelmanRanjith Karuparambil RamachandranJolien DendoovenKilian Devloo-CasierE. FondaChristophe DetavernierGuy Marin

In situ characterization of atomic layer deposition in mesoporous thin films by grazing incidence small angle x-ray scattering

Jolien DendoovenKilian Devloo-CasierMatthias IdeKathryn GrandfieldKarl LudwigPascal Van Der VoortSara BalsChristophe Detavernier

Low temperature atomic layer deposition of platinum using (methylcyclopentadienyl)trimethylplatinum and ozone

Jolien DendoovenRanjith K RamanchandranKilian Devloo-CasierGeert RampelbergMatthias FilezHilde PoelmanGuy MarinEmiliano FondaChristophe Detavernier

A1 Artikel in een tijdschrift in JOURNAL OF PHYSICAL CHEMISTRY C

Low temperature plasma-enhanced ALD of vanadium nitride as copper diffusion barrier

Geert RampelbergKilian Devloo-CasierDavy DeduytscheMarc SchaekersNicolas BlascoChristophe Detavernier

Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers

Geert RampelbergKilian Devloo-CasierDavy DeduytscheMarc SchaekersNicolas BlascoChristophe Detavernier

A1 Artikel in een tijdschrift in APPLIED PHYSICS LETTERS

Nucleation and growth of Pt by atomic layer deposition on silica probed with in situ XAS and XRF measurements

Matthias FilezRanjith Karuparambil RamachandranKilian Devloo-CasierJolien DendoovenHilde PoelmanE FondaChristophe DetavernierGuy Marin

Plasma-enhanced atomic layer deposition of thin vanadium nitride layers as a copper diffusion barrier

Geert RampelbergKilian Devloo-CasierDavy DeduytscheMarc SchaekersNicolas BlascoChristophe Detavernier

2012

A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects

Delphine LongrieKilian Devloo-CasierJohan HaemersKris DriesenChristophe Detavernier

Comparison of three processes for plasma-enhanced ALD of platinum

Delphine LongrieKilian Devloo-CasierSven Van den BergheKris DriesenChristophe Detavernier

In situ characterization of ALD in mesoporous thin films by grazing incidence small angle X-ray scattering

Jolien DendoovenKilian Devloo-CasierMatthias IdeKathryn GrandfieldKarl F LudwigPascal Van Der VoortSara BalsChristophe Detavernier

In situ monitoring of atomic layer deposition in nanoporous thin films using ellipsometric porosimetry

Jolien DendoovenKilian Devloo-CasierElisabeth LevrauRobbert Van HoveSreeprasanth Pulinthanathu SreeMikhail R BaklanovJohan A MartensChristophe Detavernier

A1 Artikel in een tijdschrift in LANGMUIR

In situ study of ALD processes using synchrotron-based X-ray fluorescence and scattering techniques

Jolien DendoovenKilian Devloo-CasierMatthias IdeKathryn GrandfieldKarl LudwigSara BalsPascal Van Der VoortChristophe Detavernier

Nanoscale area selective ZnO growth between a monolayer of nanocrystals

Kilian Devloo-CasierJolien DendoovenKarl LudwigPieter GeiregatZeger HensChristophe Detavernier

Plasma-enhanced ALD of platinum with O₂, N₂ and NH₃ plasmas

Delphine LongrieKilian Devloo-CasierDavy DeduytscheSven Van den BergheKris DriesenChristophe Detavernier

A1 Artikel in een tijdschrift in ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY

Tuning the pore size of ink-bottle mesopores by atomic layer deposition

Jolien DendoovenBart GorisKilian Devloo-CasierElisabeth LevrauEllen BiermansMikhail R BaklanovKarl F LudwigPascal Van Der VoortSara BalsChristophe Detavernier

A1 Artikel in een tijdschrift in CHEMISTRY OF MATERIALS

2011

Characterization of ALD coatings in nanoporous thin films by ellipsometric porosimetry

Jolien DendoovenSreeprasanth Pulinthanathu SreeRobbert Van HoveKilian Devloo-CasierMikhail BaklanovJohan MartensChristophe Detavernier

In situ GISAXS during atomic layer deposition

Kilian Devloo-CasierJolien DendoovenKarl LudwigChristophe Detavernier

In situ synchrotron based x-ray fluorescence and scattering measurements during atomic layer deposition: initial growth of HfO2 on Si and Ge substrates

Kilian Devloo-CasierJolien DendoovenKF LudwigG LekensJ D'HaenChristophe Detavernier

A1 Artikel in een tijdschrift in APPLIED PHYSICS LETTERS

In situ x-ray characterization and electron tomography study of ALD coatings in mesoporous thin films

Jolien DendoovenEllen BiermansElisabeth LevrauKilian Devloo-CasierKarl LudwigPascal Van Der VoortSara BalsChristophe Detavernier