Research Explorer

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Onderzoeker

Jolien Dendooven

Publicaties & datasets

Prijzen & Erkenningen

297 Resultaten

2026

Characterization of nanoparticle and thin-film texture : pole-figure measurements in grazing-incidence configuration

Arno DepoorterEduardo Solano MinuesaCristian MocutaZhang ZhiweiJolien DendoovenChristophe DetavernierMatthias Filez

A1 Artikel in een tijdschrift in JOURNAL OF APPLIED CRYSTALLOGRAPHY

Comparative analysis of structural, physicochemical, and electrochemical properties of graphene oxide derived from commercial graphite and rice husk biomass for sensing applications

Brice KaboreWalter K. NjorogeEric MasikaMatthias MinjauwJolien DendoovenChristophe DetavernierMieke Adriaens

A2 Artikel in een tijdschrift in RESULTS IN MATERIALS

Polymer assisted area selective ALD of multilayered materials using alkylamine precursors

Nithin PoonkottilAditya ChalishazarHannes RijckaertChao PangDries Van ThourhoutChristophe DetavernierJolien Dendooven

A1 Artikel in een tijdschrift in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Real-time observation and mitigation of Pt nanoparticle sintering during propane dehydrogenation : ALD-based strategies for nanocatalyst stabilization

Zhang ZhiweiEduardo Solano MinuesaNithin PoonkottilJin LiMatthias MinjauwHilde PoelmanMaarten B.J. RoeffaersVladimir GalvitaChristophe DetavernierJolien Dendooven et al.

A1 Artikel in een tijdschrift in APPLIED CATALYSIS B-ENVIRONMENT AND ENERGY

Unravelling nucleation in Pt atomic layer deposition using grazing incidence X-ray total scattering, grazing incidence small- angle X-ray scattering, and X-ray fluorescence

Kinanti AliyahJorden De BolleRobin PetitMartin RosenthalStefano ChecchiaChristophe DetavernierMatthias FilezJolien Dendooven

2025

An X-ray lens on catalysts

Matthias FilezJolien DendoovenChristophe Detavernier

Atomic layer deposition of aluminum phosphate layers using tris(dimethylamino)phosphine as P-precursor

Ruben BlommeAditya ChalishazarLowie HenderickFrans MunnikJohan MeersschautMatthias MinjauwChristophe DetavernierJolien Dendooven

A1 Artikel in een tijdschrift in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Atomic layer deposition of boron-containing layers using a combined trimethylborate- and water-based plasma

Arpan DharaAndreas WerbrouckJin LiTippi VerhelleMatthias MinjauwJohan MeersschautLowie HenderickJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in CHEMISTRY OF MATERIALS

Atomic layer deposition of lithium borate and lithium borophosphate for lithium-ion batteries

Tippi VerhelleArpan DharaLowie HenderickMatthias MinjauwLouis De TaeyeJohan MeersschautJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in CHEMISTRY OF MATERIALS

Atomic layer deposition of ultrathin coatings on metal nanoparticles for catalyst stabilization

Zhang ZhiweiChristophe DetavernierJolien DendoovenMatthias Filez

Deposition and characterization of ALD Ta2O5 coatings for gravitational wave detectors

Jorden De BolleMassimo GranataJessica SteinlechnerJolien DendoovenChristophe Detavernier

Detailing the activity and deactivation of supported Pt-Sn and Pt-In catalysts for CO2-assisted PDH

Lennert D'oogheNadadur Veeraraghavan SrinathValentijn De CosterHilde PoelmanJolien DendoovenMarie-Françoise ReyniersKevin Van GeemVladimir Galvita

A1 Artikel in een tijdschrift in JOURNAL OF CATALYSIS

Detailing the redox ability of supported Pt-Sn and Pt-In catalysts for CO2-assisted PDH

Lennert D'oogheNadadur Veeraraghavan SrinathValentijn De CosterKorneel GeerardynLukas BuelensHilde PoelmanJolien DendoovenMarie-Françoise ReyniersKevin Van GeemVladimir Galvita

A1 Artikel in een tijdschrift in JOURNAL OF CATALYSIS

Een Röntgen-vizier op katalysatoren

Matthias FilezJolien DendoovenChristophe Detavernier

Effect of catalyst ink preparation on formate production from CO2 electroreduction using Sn as electrocatalyst

Asier Grijalvo RodriguezZhiyuan ChenDeepak PantJolien Dendooven

A1 Artikel in een tijdschrift in INTERNATIONAL JOURNAL OF MINERALS METALLURGY AND MATERIALS

Exploring nucleation of ALD-fabricated Pt nanoparticles through X-ray total scattering

Kinanti AliyahJorden De BolleZhang ZhiweiStefano ChecchiaMatthias FilezChristophe DetavernierJolien Dendooven

Fast, in situ gas analysis during atomic layer deposition through optical emission spectroscopy and non-negative matrix factorization

Andreas WerbrouckPhilippe SmetDirk PoelmanJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in ACS SENSORS

Impact of surface treatments on the photocatalytic performance of anodic aluminum oxide templates

Carina HedrichRobin PetitMatthias MinjauwAnna R. BursonStefanie HauggKaline P. FurlanChristophe DetavernierJolien DendoovenRobert H. BlickRobert Zierold

A1 Artikel in een tijdschrift in SCIENTIFIC REPORTS

Investigation of recombination mechanisms in electronic devices using bias-dependent admittance spectroscopy applied to CIGS solar cells

Guy BrammertzRomain ScaffidiSarallah HamtaeiJonathan ParionJessica de WildGizem BirantTim OrisMarc MeurisMaarten van der VleutenMarcel Simor et al.

A1 Artikel in een tijdschrift in ACS APPLIED MATERIALS & INTERFACES

Niet alleen mensen, maar ook materialen kunnen koorts krijgen

Matthias FilezJolien DendoovenChristophe Detavernier

Selectively monitoring the operando temperature of active metal nanoparticles during catalytic reactions by X-ray absorption nanothermometry

Matthias FilezValentijn De CosterHilde PoelmanValerie BrioisAnthony BeauvoisJolien DendoovenMaarten B. J. RoeffaersVladimir GalvitaChristophe Detavernier

A1 Artikel in een tijdschrift in NATURE CATALYSIS

Tuning the crystallization temperature of titanium dioxide thin films by incorporating silicon dioxide via supercycle atomic layer deposition

Carina HedrichDavy DeduytscheRobin PetitTobias KrekelerJun PengMartin RitterJolien DendoovenChristophe DetavernierRobert H. BlickRobert Zierold

A1 Artikel in een tijdschrift in SURFACES AND INTERFACES

Ultra-low loss and large bandwidth fiber-to-chip edge coupler for aluminum oxide photonic platform at UV-visible wavelengths

Chupao LinMax KiewietRobin PetitJolien DendoovenNicolas Le ThomasChristophe DetavernierBart Kuyken

A1 Artikel in een tijdschrift in JOURNAL OF LIGHTWAVE TECHNOLOGY

Understanding how the interfacial properties of ALD-Crafted In2S3 Thin films promote enhanced formate electrosynthesis

Järi Van den HoekFemi MathewLieven HintjensBrend De CoenEduardo Solano MinuesaMatthias MinjauwRuben BlommeNick DaemsDaniel ChoukrounChristophe Detavernier et al.

A1 Artikel in een tijdschrift in ADVANCED ENERGY MATERIALS

Vapour phase deposition of phosphonate-containing alumina thin films using dimethyl vinylphosphonate as precursor

Juan Santo-Domingo PeñarandaArpan DharaAditya ChalishazarMatthias MinjauwJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in DALTON TRANSACTIONS

2024

Advancing beyond Sabatier : strategies for dynamic synthetic catalysis

Matthias FilezJolien DendoovenMaarten B.J. RoeffaersChristophe Detavernier

A1 Artikel in een tijdschrift in CHEM

ALD-fabricated MgO-overcoats to control sintering of model Pt nanoparticle catalysts : the power of synchrotron X-ray scattering tools

Kinanti AliyahMatthias FilezZhang ZhiweiEduardo Solano MinuesaChristophe DetavernierJolien Dendooven

Atomic layer deposition for stable InP-based on-chip quantum dot microLEDs : hybrid quantum dot pockets

Robin PetitResul OzdemirHannes Van AvermaetLuca GiordanoJakob KuhsAndreas WerbrouckMatthias FilezJolien DendoovenZeger HensPhilippe Smet et al.

A1 Artikel in een tijdschrift in ACS APPLIED MATERIALS & INTERFACES

Atomic layer deposition for stable on-chip quantum dot LEDs : hybrid quantum dot pockets

Robin PetitResul OzdemirHannes Van AvermaetLuca GiordanoJakob KuhsAndreas WerbrouckMatthias FilezJolien DendoovenZeger HensPhilippe Smet et al.

Atomic layer deposition for tuning the surface chemical composition of nickel iron phosphates for oxygen evolution reaction in alkaline electrolyzers

Ruben BlommeRahul RameshLowie HenderickMatthias MinjauwPhilippe VereeckenMieke AdriaensChristophe DetavernierJolien Dendooven

A1 Artikel in een tijdschrift in NANOTECHNOLOGY

Atomic layer deposition of aluminum oxide using alkoxide precursors

Li'ao CaoChristophe DetavernierJolien Dendooven

Atomic layer deposition of lithium borate and borophosphate thin films for lithium-ion battery applications

Tippi VerhelleArpan DharaLowie HenderickJohan MeersschautJolien DendoovenChristophe Detavernier

Atomic layer deposition of metal sulfide thin films for energy applications

Femi MathewJolien DendoovenChristophe Detavernier

Catalyst on top? Importance of the final layer of an ALD deposited catalyst : Ni-Fe catalysts deposited by ALD

Ruben BlommeRahul RameshLowie HenderickMatthias MinjauwPhilippe VereeckenMieke AdriaensChristophe DetavernierJolien Dendooven

Catalysts made from vapour

Matthias FilezJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in NATURE CATALYSIS

Chemical triggers behind Pt nanoparticle growth during post-deposition O2 annealing by in situ near-ambient pressure X-ray photoelectron spectroscopy

Matthias FilezMatthias MinjauwEduardo Solano MinuesaGiulio D’AcuntoPayam ShayestehJoachim SchnadtChristophe DetavernierJolien Dendooven

Controlling Pt nanoparticle sintering by sub-monolayer MgO ALD thin films

Zhang ZhiweiMatthias FilezEduardo SolanoNithin PoonkottilJin LiMatthias MinjauwHilde PoelmanMartin RosenthalPhilipp BrünerVladimir Galvita et al.

A1 Artikel in een tijdschrift in NANOSCALE

In vacuo XPS study on Pt growth by atomic layer deposition using MeCpPtMe3 and N2/NH3 plasma

Jin LiMatthias MinjauwEduardo SolanoGiulio D’AcuntoPayam ShayestehJoachim SchnadtChristophe DetavernierJolien Dendooven

A1 Artikel in een tijdschrift in JOURNAL OF PHYSICAL CHEMISTRY C

Molecular layer deposition of metal organophosphonate thin films

Aditya ChalishazarArpan DharaJolien DendoovenChristophe Detavernier

Operando monitoring the temperature of active metal nanoparticles during catalytic CO2 conversion

Matthias FilezValentijn De CosterHilde PoelmanJolien DendoovenMaarten RoeffaersVladimir GalvitaChristophe Detavernier

Operando monitoring the temperature of active metal nanoparticles during catalytic CO2 conversion

Matthias FilezValentijn De CosterHilde PoelmanJolien DendoovenMaarten RoeffaersVladimir GalvitaChristophe Detavernier

Role of the oxidizing co-reactant in Pt growth by atomic layer deposition using MeCpPtMe3 and O2/O3/O2-plasma

Jin LiSylwia KlejnaMatthias MinjauwJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in JOURNAL OF PHYSICAL CHEMISTRY C

Thinking outside the box : non-standard methods for atomic/molecular layer deposition

Juan Santo-Domingo PeñarandaJolien DendoovenChristophe Detavernier

2023

Atomic layer deposition of lithium borate and borophosphate thin films for lithium-ion battery applications

Tippi VerhelleArpan DharaLowie HenderickJolien DendoovenChristophe Detavernier

Atomic layer deposition of lithium borate and borophosphate thin films for lithium-ion battery applications

Tippi VerhelleArpan DharaLowie HenderickJolien DendoovenChristophe Detavernier

Atomic layer deposition of yttrium oxide as a protective coating for lithium metal anodes

Bo ZhaoJin LiMaxime GuillaumeVéronique CremersLowie HenderickJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in DALTON TRANSACTIONS

Crystalline tin disulfide by low-temperature plasma-enhanced 2 atomic layer deposition as an electrode material for Li-ion batteries 3 and CO2 electroreduction

Femi MathewJäri Van den HoekNithin PoonkottilBo ZhaoGeert RampelbergDaniel ChoukrounJonas HereijgersZeger HensDirk PoelmanTom Breugelmans et al.

A1 Artikel in een tijdschrift in ACS APPLIED ENERGY MATERIALS

Depositing ALD-oxides on MLD-metalcones : enhancing initial growth through O2 plasma densification

Juan Santo-Domingo PeñarandaMatthias MinjauwSofie VandenbrouckeRobin PetitJin LiJolien DendoovenChristophe Detavernier

Depositing ALD-oxides on MLD-metalcones : enhancing initial growth through O2 plasma densification

Juan Santo-Domingo PeñarandaMatthias MinjauwSofie VandenbrouckeRobin PetitJin LiJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in DALTON TRANSACTIONS

Every step counts : importance of final ALD sequences for oxygen evolution reaction catalysts

Ruben BlommeRahul RameshLowie HenderickChristophe DetavernierJolien Dendooven

In vacuo XPS study of Al2O3 ALD deposition processes on n-GaN

Sofie VandenbrouckeEldad Bahat TreidelLiad TadmorEnrico BrusaterraPaul PlateNicole BickelFrank BrunnerJoachim WürflOliver HiltJolien Dendooven et al.

Interrogating metal nanocatalyst sintering at complementary length scales

Matthias FilezEduardo Solano MinuesaJolien DendoovenMaarten RoeffaersChristophe Detavernier

Low temperature area selective atomic layer deposition of ruthenium dioxide thin films using polymers as inhibition layers

Nithin PoonkottilHannes RijckaertKhannan RajendranRobin PetitLisa MartinDries Van ThourhoutIsabel Van DriesscheChristophe DetavernierJolien Dendooven

A1 Artikel in een tijdschrift in ADVANCED MATERIALS INTERFACES

Metal nanocatalyst sintering interrogated at complementary length scales

Eduardo SolanoJolien DendoovenDavy DeduytscheNithin PoonkottilJi-Yu FengMaarten B. J. RoeffaersChristophe DetavernierMatthias Filez

A1 Artikel in een tijdschrift in SMALL

Metal nanocatalyst sintering interrogated at complementary length scales (Small 5/2023)

Eduardo SolanoJolien DendoovenDavy DeduytscheNithin PoonkottilJi-Yu FengMaarten B. J. RoeffaersChristophe DetavernierMatthias Filez

Optimizing a Ni-Fe phosphate catalyst for the Oxygen Evolution Reaction using ALD

Ruben BlommeRahul RameshLowie HenderickChristophe DetavernierJolien Dendooven

Plasma-enhanced atomic layer deposition of crystalline Ga2S3 thin films

Femi MathewNithin PoonkottilEduardo Solano MinuesaDirk PoelmanZeger HensChristophe DetavernierJolien Dendooven

A1 Artikel in een tijdschrift in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

TAP analysis of single and double peak responses during CO oxidation over Pt

Juan Ignacio Mirena SeguiasDenis ConstalesJohan MartensJolien DendoovenGregory S. YablonskyVladimir Galvita

A1 Artikel in een tijdschrift in CATALYSIS TODAY

Tin and indium sulfide by plasma-enhanced atomic layer deposition for CO2 electroreduction

Femi MathewJäri Van Den HoekNithin PoonkottilGeert RampelbergNick DaemsJonas HereijgersZeger HensTom BreugelmansChristophe DetavernierJolien Dendooven

Transient APXPS as a tool to characterize the kinetics of alloy restructuring : application to Sn-poor PtSn ALD-derived nanoparticles

Evgeniy RedekopE. KokkonenS. UrpelainenJ. KnudsenA. KluyshinS. DiplasJolien DendoovenN. PonkottiChristophe DetavernierVladimir Galvita et al.

2022

Aligning time-resolved kinetics (TAP) and surface spectroscopy (AP-XPS) for a more comprehensive understanding of ALD-derived 2D and 3D model catalysts

Evgeniy A. RedekopHilde PoelmanMatthias FilezRanjith Karuparambil RamachandranJolien DendoovenChristophe DetavernierGuy MarinUnni OlsbyeVladimir Galvita

A1 Artikel in een tijdschrift in FARADAY DISCUSSIONS

An IR spectroscopy study of the degradation of surface bound azido-groups in high vacuum

Sofie VandenbrouckeMikko NisulaRobin PetitRita VosKarolien JansPhilippe VereeckenJolien DendoovenChristophe Detavernier

Atomic layer deposition derived routes for the synthesis of nanostructured materials

Nithin PoonkottilJolien DendoovenChristophe DetavernierEduardo Solano Minuesa

Atomic Layer Deposition for the study of catalysts for water splitting

Ruben BlommeRahul RameshChristophe DetavernierJolien Dendooven

Atomic layer deposition of metal phosphates

Lowie HenderickChristophe DetavernierJolien Dendooven

Atomic layer deposition of metal phosphates

Lowie HenderickArpan DharaAndreas WerbrouckJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in APPLIED PHYSICS REVIEWS

Atomic layer deposition of ruthenium dioxide based on redox reactions between alcohols and ruthenium tetroxide

Nithin PoonkottilMatthias MinjauwAndreas WerbrouckStefano ChecchiaEduardo SolanoMikko NisulaAlexis FranquetChristophe DetavernierJolien Dendooven

A1 Artikel in een tijdschrift in CHEMISTRY OF MATERIALS

Atomic layer deposition of ruthenium dioxide thin films using RuO4 and alcohols as reactants

Matthias MinjauwNithin PoonkottilAndreas WerbrouckChristophe DetavernierJolien Dendooven

Atomic layer deposition of ternary ruthenates by combining metalorganic precursors with RuO4 as the co-reactant

Matthias MinjauwJi-Yu FengTimo SajavaaraChristophe DetavernierJolien Dendooven

A1 Artikel in een tijdschrift in DALTON TRANSACTIONS

Behaviour of Platinum-Tin during CO2-assisted propane dehydrogenation : insights from quick X-ray absorption spectroscopy

Nadadur Veeraraghavan SrinathHilde PoelmanLukas BuelensJolien DendoovenMarie-Françoise ReyniersGuy MarinVladimir Galvita

A1 Artikel in een tijdschrift in JOURNAL OF CATALYSIS

CO2-assisted propane dehydrogenation over Pt-based catalysts : looking inside via in situ X-ray absorption spectroscopy

Nadadur Veeraraghavan SrinathVladimir GalvitaJolien Dendooven

Depositing ALD-oxides on MLD-metalcones : enhancing initial growth through O2 plasma densification

Juan Santo-Domingo PeñarandaMatthias MinjauwSofie VandenbrouckeRobin PetitJin LiJolien DendoovenChristophe Detavernier

How CO2 interacts with Pt-based nanoalloys during CO2-assisted propane dehydrogenation

. Nadadur Veeraraghavan SrinathHilde PoelmanLukas BuelensValentijn De CosterJolien DendoovenMarie-Françoise ReyniersVladimir Galvita

In vacuo XPS investigation of surface engineering for lithium metal anodes with plasma treatment

Bo ZhaoJin LiMaxime GuillaumeJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in JOURNAL OF ENERGY CHEMISTRY

Increasing ALD complexity : how to transform ternary oxide films into tunable bimetallic thin films and nanoparticles

Ji-Yu FengMatthias FilezMatthias MinjauwEduardo Solano MinuesaChristophe DetavernierJolien Dendooven

Low-temperature plasma-enhanced atomic layer deposition of crystalline tin disulfide thin films

Femi MathewNithin PoonkottilRanjith Karuparambil RamachandranBo ZhaoZeger HensChristophe DetavernierJolien Dendooven

Nanoporous silica-alumina films fabricated on silicon photonic chips for selective ammonia sensing

Yanlu LiClaudio BellaniNebiyu Adello YeboJolien DendoovenJin Won SeoChristophe DetavernierRoel BaetsJohan A. MartensSreeprasanth Pulinthanathu Sree

A1 Artikel in een tijdschrift in ACS APPLIED NANO MATERIALS

Plasma-enhanced atomic layer deposition of nickel and cobalt phosphate for lithium ion batteries

Lowie HenderickRuben BlommeMatthias MinjauwJonas KeukelierJohan MeersschautJolien DendoovenPhilippe VereeckenChristophe Detavernier

A1 Artikel in een tijdschrift in DALTON TRANSACTIONS

Research project: Property investigation of Pt clusters deposited by atomic layer deposition

Arnau Basterra ValeraMatthias FilezZhiwei ZhangJolien DendoovenChristophe Detavernier

Ruthenium nanostructures via sequential infiltration synthesis in self-assembled diblock copolymer thin films

Nithin PoonkottilEduardo Solano MinuesaArbresha MuriqiMichael NolanChristophe DetavernierJolien Dendooven

Selective vapor-phase doping of Pt nanoparticles into phase-controlled nanoalloys

Nithin PoonkottilRanjith Karuparambil RamachandranEduardo Solano MinuesaNadadur Veeraraghavan SrinathJi-Yu FengAndreas WerbrouckMichiel Van DaeleMatthias FilezMatthias MinjauwHilde Poelman et al.

A1 Artikel in een tijdschrift in JOURNAL OF PHYSICAL CHEMISTRY C

Shuffling atomic layer deposition gas sequences to modulate bimetallic thin films and nanoparticle properties

Matthias FilezJi-Yu FengMatthias MinjauwEduardo Solano MinuesaNithin PoonkottilMichiel Van DaeleRanjith Karuparambil RamachandranChen LiSara BalsHilde Poelman et al.

A1 Artikel in een tijdschrift in CHEMISTRY OF MATERIALS

Spatially templated nanolines of Ru and RuO2 by sequential infiltration synthesis

Nithin PoonkottilEduardo SolanoArbresha MuriqiMatthias MinjauwMatthias FilezMichael NolanChristophe DetavernierJolien Dendooven

A1 Artikel in een tijdschrift in CHEMISTRY OF MATERIALS

Strategies to produce boron-containing ALD thin films using trimethyl borate precursor : from thermal to plasma to combined-plasma approach

Arpan DharaAndreas WerbrouckJin LiJolien DendoovenChristophe Detavernier

Surface reactions between LiHMDS, TMA and TMP leading to deposition of amorphous lithium phosphate

Andreas WerbrouckFelix MattelaerArpan DharaMikko NisulaMatthias MinjauwFrans MunnikJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in JOURNAL OF MATERIALS CHEMISTRY A

Thickness matters : sintering inhibition in Pt nanoparticle catalysts via step-by-step control of MgO overcoats

Zhang ZhiweiMatthias FilezMatthias MinjauwJin LiChristophe DetavernierJolien Dendooven

Titanium carboxylate MLD hybrid films as protective coatings for lithium-ion batteries

Sofie VandenbrouckeLowie HenderickLouis De TaeyeJin LiKarolien JansPhilippe VereeckenJolien DendoovenChristophe Detavernier

Titanium carboxylate molecular layer deposited hybrid films as protective coatings for lithium-ion batteries

Sofie VandenbrouckeLowie HenderickLouis L. De TaeyeJin LiKarolien JansPhilippe M. VereeckenJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in ACS APPLIED MATERIALS & INTERFACES

Titanium carboxylate molecular layer deposited hybrid films as protective coatings for lithium-ion batteries

Sofie VandenbrouckeLowie HenderickLouis De TaeyeJin LiKarolien JansPhilippe VereeckenJolien DendoovenChristophe Detavernier

UV photonic integrated circuits for far-field structured illumination autofluorescence microscopy

Chupao LinJuan Santo-Domingo PeñarandaJolien DendoovenChristophe DetavernierDavid SchaubroeckNico BoonRoel BaetsNicolas Le Thomas

A1 Artikel in een tijdschrift in NATURE COMMUNICATIONS

UV-compatible photonic integrated circuits forlabel-free structured illumination microscopy

Chupao LinJuan Santo-Domingo PeñarandaJolien DendoovenChristophe DetavernierDavid SchaubroeckNico BoonRoel BaetsNicolas Le Thomas

2021

ALD Pt nanoparticles and thin-film coatings enhancing the stability and performance of silicon photocathodes for solar water splitting

Christos TrompoukisJi-Yu FengTom BosserezJan RongeJolien DendoovenChristophe DetavernierRoel BaetsJohan A. Martens

A1 Artikel in een tijdschrift in SUSTAINABLE ENERGY & FUELS

An IR spectroscopy study of the degradation of surface bound azido-groups in high vacuum

Sofie VandenbrouckeMikko NisulaRobin PetitRita De VosKarolien JansPhilippe M. VereeckenJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in LANGMUIR

Atomic layer deposition of metal oxides for applications in lithium-ion and lithium metal batteries

Bo ZhaoChristophe DetavernierJolien Dendooven

Atomic layer deposition of ruthenium dioxide thin films using RuO4 and alcohols as reactants

Nithin PoonkottilMatthias MinjauwAndreas WerbrouckChristophe DetavernierJolien Dendooven

Controlled synthesis of Fe-Pt nanoalloys using atomic layer deposition

Ranjith Karuparambil RamachandranJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in NANOTECHNOLOGY

Converting molecular layer deposited alucone films into Al2O3/alucone hybrid multilayers by plasma densification

Juan Santo-Domingo PeñarandaMikko NisulaSofie VandenbrouckeMatthias MinjauwJin LiAndreas WerbrouckJonas KeukelierAndrea Itziar Pitillas MartinezJolien DendoovenChristophe Detavernier

Converting molecular layer deposited alucone films into Al2O3/alucone hybrid multilayers by plasma densification

Juan Santo-Domingo PeñarandaMikko NisulaSofie VandenbrouckeMatthias MinjauwJin LiAndreas WerbrouckJonas KeukelierAndrea Itziar Pitillas MartinezJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in DALTON TRANSACTIONS

Covalent graphite modification by low-temperature photocatalytic oxidation using a titanium dioxide thin film prepared by atomic layer deposition

Niels R. OstynSreeprasanth Pulinthanathu SreeJin LiJi-Yu FengMaarten B. J. RoeffaersSteven De FeyterJolien DendoovenChristophe DetavernierJohan A. Martens

A1 Artikel in een tijdschrift in CATALYSIS SCIENCE & TECHNOLOGY

Gold-induced photothermal background in on-chip surface enhanced stimulated Raman spectroscopy

Kristof ReynkensStéphane ClemmenHaolan ZhaoAli RazaTom VanackereAndim StassenMichiel Van DaeleJolien DendoovenRoel Baets

A1 Artikel in een tijdschrift in OPTICS LETTERS

In and ex situ characterization of atomic layer deposition processes for lithium-ion battery applications

Andreas WerbrouckChristophe DetavernierJolien Dendooven

In situ study of noble metal atomic layer deposition processes using grazing incidence small angle X-ray scattering

Jolien DendoovenE. SolanoJi-Yu FengRanjith Karuparambil RamachandranMatthias MinjauwMichiel Van DaeleA. CoatiD. Hermida-MerinoChristophe Detavernier

In situ XAS/SAXS study of Al2O3-coated PtGa catalysts for propane dehydrogenation

Nadadur Veeraraghavan SrinathAlessandro LongoHilde PoelmanRanjith Karuparambil RamachandranJi-Yu FengJolien DendoovenMarie-Françoise ReyniersVladimir Galvita

A1 Artikel in een tijdschrift in ACS CATALYSIS

Influence of alumina addition on the optical properties and the thermal stability of titania thin films and inverse opals produced by atomic layer deposition

Martin WaleczekJolien DendoovenPavel DyachenkoAlexander Y. PetrovManfred EichRobert H. BlickChristophe DetavernierKornelius NielschKaline P. FurlanRobert Zierold

A1 Artikel in een tijdschrift in NANOMATERIALS

Photonic integrated alumina waveguide gratings for far-field structured illumination at UV wavelengths

Chupao LinJuan Santo-Domingo PeñarandaJolien DendoovenChristophe DetavernierDavid SchaubroeckRoel BaetsNicolas Le Thomas

Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries

Lowie HenderickHamid HamedFelix MattelaerMatthias MinjauwMikko NisulaJohan MeersschautJolien DendoovenMohammadhosein SafariPhilippe VereeckenChristophe Detavernier

A1 Artikel in een tijdschrift in JOURNAL OF POWER SOURCES

Plasma-enhanced atomic layer deposition : correlating O2 plasma parameters and species to blister formation and conformal film growth

Andreas WerbrouckKevin Van de KerckhoveDiederik DeplaDirk PoelmanPhilippe SmetJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Tuning size and coverage of Pd nanoparticles using atomic layer deposition

Ji-Yu FengRanjith Karuparambil RamachandranEduardo Solano MinuesaMatthias MinjauwMichiel Van DaeleAndre VantommeDaniel Hermida-MerinoAlessandro CoatiHilde PoelmanChristophe Detavernier et al.

A1 Artikel in een tijdschrift in APPLIED SURFACE SCIENCE

Vapor phase conversion of Pt nanoparticles into Pt-Sn bimetallic nanoparticles

Nithin PoonkottilRanjith Karuparambil RamachandranEduardo Solano MinuesaNadadur Veeraraghavan SrinathJi-Yu FengAndreas WerbrouckMichiel Van DaeleMatthias MinjauwMatthias FilezHilde Poelman et al.

2020

A combined TAP and AP-XPS study of carbon deposition on model Pt-In/MgO/SiO2 catalysts during propane dehydrogenation

Evgeniy RedekopHilde PoelmanMatthias FilezVladimir GalvitaRanjith Karuparambil RamachandranJolien DendoovenChristophe DetavernierGuy MarinUnni Olsbye

A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films

Li'ao CaoFelix MattelaerTimo SajavaaraJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

A secondary reaction pathway for the alumina atomic layer deposition process with trimethylaluminum and water, revealed by full-range, time-resolved in situ mass spectrometry

Andreas WerbrouckMahdi ShiraziFelix MattelaerSimon D. ElliottJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in JOURNAL OF PHYSICAL CHEMISTRY C

Area-selective growth and nucleation enhancement during Ru ALD using the RuO4 precursor and H2-gas

Matthias MinjauwHannes RijckaertIsabel Van DriesscheChristophe DetavernierJolien Dendooven

Atomic layer deposition of indium‐tin‐oxide as multifunctional coatings on V2O5 thin‐film model electrode for lithium‐ion batteries

Bo ZhaoMikko NisulaArpan DharaLowie HenderickFelix MattelaerJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in ADVANCED MATERIALS INTERFACES

Atomic layer deposition of localized boron- and hydrogen-doped aluminum oxide using trimethyl borate as a dopant precursor

Felix MattelaerMichiel Van DaeleMatthias MinjauwMikko NisulaSimon D. ElliottTimo SajavaaraJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in CHEMISTRY OF MATERIALS

Atomic layer deposition of nitrogen-doped Al phosphate coatings for Li-ion battery applications

Lowie HenderickHamid HamedFelix MattelaerMatthias MinjauwJohan MeersschautJolien DendoovenMohammadhosein SafariPhilippe VereeckenChristophe Detavernier

A1 Artikel in een tijdschrift in ACS APPLIED MATERIALS & INTERFACES

Atomic layer deposition of palladium and bimetallic materials

Ji-Yu FengJolien DendoovenChristophe DetavernierHilde Poelman

Atomic layer deposition of platinum and gold

Michiel Van DaeleChristophe DetavernierJolien Dendooven

Atomic Layer Deposition of Ru-containing materials using RuO4 as both the co-reactant and the metal source

Matthias MinjauwJi-Yu FengJolien DendoovenChristophe Detavernier

Atomic layer deposition of SnO2-based composite anodes for thin-film lithium-ion batteries

Bo ZhaoArpan DharaJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in FRONTIERS IN ENERGY RESEARCH

Atomic layer deposition of yttrium oxide films and their properties of water wettability

Bo ZhaoFelix MattelaerGeert RampelbergJolien DendoovenChristophe Detavernier

Boosting room-temperature magneto-ionics in a non-magnetic oxide semiconductor

Julius de RojasAlberto QuintanaAitor LopeandiaJoaquin SalgueroJose L. Costa-KramerLlibertat AbadMaciej O. LiedkeMaik ButterlingAndreas WagnerLowie Henderick et al.

A1 Artikel in een tijdschrift in ADVANCED FUNCTIONAL MATERIALS

Conformal coating of complex substrates and powders by atomic layer deposition

Véronique CremersChristophe DetavernierJolien Dendooven

Creation of gallium acid and platinum metal sites in bifunctional zeolite hydroisomerization and hydrocracking catalysts by atomic layer deposition

Lisa GeertsRanjith Karuparambil RamachandranJolien DendoovenSambhu RadhakrishnanJin Won SeoChristophe DetavernierJohan MartensSreeprasanth Pulinthanathu Sree

A1 Artikel in een tijdschrift in CATALYSIS SCIENCE & TECHNOLOGY

Design of Li-containing layers with LiHMDS

Andreas WerbrouckFelix MattelaerMatthias MinjauwFrans MunnikJaakko JulinJolien DendoovenChristophe Detavernier

Designing nanoparticles and nanoalloys for gas-phase catalysis with controlled surface reactivity using colloidal synthesis and atomic layer deposition

Valentijn De CosterHilde PoelmanJolien DendoovenChristophe DetavernierVladimir Galvita

A1 Artikel in een tijdschrift in MOLECULES

In situ study of the thermal stability of supported Pt nanoparticles and their stabilization via atomic layer deposition overcoating

Eduardo Solano MinuesaJolien DendoovenJi-Yu FengPhilipp BruenerMatthias MinjauwRanjith Karuparambil RamachandranMichiel Van DaeleKevin Van de KerckhoveThomas DobbelaereAlessandro Coati et al.

A1 Artikel in een tijdschrift in NANOSCALE

Molecular layer deposition of 'magnesicone', a magnesium-based hybrid material

Jeroen KintFelix MattelaerSofie VandenbrouckeArbersha MuriqiMatthias MinjauwMikko NisulaPhilippe M. VereeckenMichael NolanJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in CHEMISTRY OF MATERIALS

Reaction mechanism of the Me3AuPMe3-H-2 plasma-enhanced ALD process

Michiel Van DaeleMatthew B. E. GriffithsMatthias MinjauwSean T. BarryChristophe DetavernierJolien Dendooven

A1 Artikel in een tijdschrift in PHYSICAL CHEMISTRY CHEMICAL PHYSICS

Reaction pathways for atomic layer deposition with lithium hexamethyl disilazide, trimethyl phosphate, and oxygen plasma

Andreas WerbrouckFelix MattelaerMatthias MinjauwMikko NisulaJaakko JulinFrans MunnikJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in JOURNAL OF PHYSICAL CHEMISTRY C

Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy

Sofie VandenbrouckeElisabeth LevrauMatthias MinjauwMichiel Van DaeleEduardo Solano MinuesaRita VosJolien DendoovenChristophe Detavernier

Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy

Sofie VandenbrouckeElisabeth LevrauMatthias MinjauwMichiel Van DaeleEduardo Solano MinuesaRita VosJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in PHYSICAL CHEMISTRY CHEMICAL PHYSICS

Surface mobility and impact of precursor dosing during atomic layer deposition of platinum : in situ monitoring of nucleation and island growth

Jolien DendoovenMichiel Van DaeleEduardo SolanoRanjith Karuparambil RamachandranMatthias MinjauwAndrea RestaAlina VladYves GarreauAlessandro CoatiGiuseppe Portale et al.

A1 Artikel in een tijdschrift in PHYSICAL CHEMISTRY CHEMICAL PHYSICS

The co-reactant role during plasma enhanced atomic layer deposition of palladium

Ji-Yu FengMatthias MinjauwRanjith Karuparambil RamachandranMichiel Van DaeleHilde PoelmanTimo SajavaaraJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in PHYSICAL CHEMISTRY CHEMICAL PHYSICS

Thermal and plasma-enhanced atomic layer deposition of yttrium oxide films and the properties of water wettability

Bo ZhaoFelix MattelaerGeert RampelbergJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in ACS APPLIED MATERIALS & INTERFACES

2019

Alumina coated PtGa based catalysts for propane dehydrogenation

Nadadur Veeraraghavan SrinathHilde PoelmanAlessandro LongoJi-Yu FengJolien DendoovenMarie-Françoise ReyniersVladimir Galvita

Atomic layer deposition of Al2O3 using aluminum triisopropoxide (ATIP) : a combined experimental and theoretical study

Ba Tai TruongLi'ao CaoFelix MattelaerGeert RampelbergFatemeh SM HashemiJolien DendoovenJ Ruud van OmmenChristophe DetavernierMarie-Françoise Reyniers

A1 Artikel in een tijdschrift in JOURNAL OF PHYSICAL CHEMISTRY C

Atomic layer deposition of localised boron- and hydrogen-doped aluminium oxide using trimethyl borate as a dopant precursor

Felix MattelaerMichiel Van DaeleMatthias MinjauwTimo SajavaaraJolien DendoovenChristophe Detavernier

Atomic layer deposition of ruthenium and silver

Matthias MinjauwChristophe DetavernierJolien Dendooven

Atomic layer deposition of ZnO-SnO2 composite thin film : the influence of structure, composition and crystallinity on lithium-ion battery performance

Bo ZhaoFelix MattelaerJeroen KintAndreas WerbrouckLowie HenderickMatthias MinjauwJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in ELECTROCHIMICA ACTA

Bifunctional earth-abundant phosphate/phosphide catalysts prepared via atomic layer deposition for electrocatalytic water splitting

Jan RongéThomas DobbelaereLowie HenderickMatthias MinjauwSreeprasanth Pulinthanathu SreeJolien DendoovenJohan A MartensChristophe Detavernier

A1 Artikel in een tijdschrift in NANOSCALE ADVANCES

Catalytic carpets : Pt@MOF@electrospun PCL, a surprisingly active and robust hydrogenation catalyst

Karen LeusChidharth KrishnarajVéronique CremersJolien DendoovenRanjith Karuparambil RamachandranPeter DubruelPascal Van Der Voort

Chemical and structural configuration of Pt-doped metal oxide thin films prepared by atomic layer deposition

Ranjith Karuparambil RamachandranMatthias FilezEduardo Solano MinuesaHilde PoelmanMatthias MinjauwMichiel Van DaeleJi-Yu FengAndrea La PortaThomas AltantzisEmiliano Fonda et al.

A1 Artikel in een tijdschrift in CHEMISTRY OF MATERIALS

Chemical selectivity and nucleation during ALD of Ru with the RuO4 precursor

Matthias MinjauwHannes RijckaertIsabel Van DriesscheChristophe DetavernierJolien Dendooven

Conformality in atomic layer deposition : current status overview of analysis and modelling

Véronique CremersRiikka L PuurunenJolien Dendooven

A1 Artikel in een tijdschrift in APPLIED PHYSICS REVIEWS

Corrosion protection of Cu by atomic layer deposition

Véronique CremersGeert RampelbergKitty BaertShoshan AbrahamiNathalie ClaesThais Milagres de OliveiraHerman TerrynSara BalsJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Cost-reducing PE-ALD processes for pure and doped SiO2 thin films

Geert RampelbergVéronique CremersAndreas WerbrouckJolien DendoovenChristophe Detavernier

Cost-reducing PE-ALD processes for pure and doped SiO2 thin films

Geert RampelbergVéronique CremersAndreas WerbrouckJolien DendoovenChristophe Detavernier

Fingerprinting of ALD reaction products with time-resolved in situ mass spectrometry

Andreas WerbrouckFelix MattelaerJolien DendoovenChristophe Detavernier

Formation and functioning of bimetallic nanocatalysts : the power of X-ray probes

Matthias FilezEvgeniy A RedekopJolien DendoovenRanjith Karuparambil RamachandranEduardo SolanoUnni OlsbyeBert M WeckhuysenVladimir GalvitaHilde PoelmanChristophe Detavernier et al.

A1 Artikel in een tijdschrift in ANGEWANDTE CHEMIE-INTERNATIONAL EDITION

In situ X-ray based characterization of atomic layer deposition

Matthias MinjauwChristophe DetavernierJolien Dendooven

In situ XAS/SAXS study of Al2O3 coated PtGa/MgAl2O4 catalysts for alkane dehydrogenation

Nadadur Veeraraghavan SrinathHilde PoelmanAlessandro LongoJi-Yu FengJolien DendoovenMarie-Françoise ReyniersVladimir Galvita

Integrated silicon nitride electro-optic modulators with atomic layer deposited overlays

Artur HermansMichiel Van DaeleJolien DendoovenStéphane ClemmenChristophe DetavernierRoel Baets

A1 Artikel in een tijdschrift in OPTICS LETTERS

Molecular layer deposition for applications in lithium ion batteries

Kevin Van de KerckhoveJolien DendoovenChristophe Detavernier

Near room temperature plasma enhanced atomic layer deposition of gold metal

Michiel Van DaeleMatthew BE GriffithsAli RazaMatthias MinjauwSeán T BarryRoel BaetsChristophe DetavernierJolien Dendooven

Near room temperature plasma enhanced atomic layer deposition of gold metal

Michiel Van DaeleMatthew BE GriffithsAli RazaMatthias MinjauwSeán T BarryRoel BaetsChristophe DetavernierJolien Dendooven

Nucleation enhancement and area-selective atomic layer deposition of ruthenium using RuO4 and H2 gas

Matthias MinjauwHannes RijckaertIsabel Van DriesscheChristophe DetavernierJolien Dendooven

A1 Artikel in een tijdschrift in CHEMISTRY OF MATERIALS

On-chip surface enhanced raman spectroscopy using ALD grown plasmonic nanotrenches integrated with a silicon nitride slot waveguide

Ali RazaStéphane ClemmenMichiel Van DaeleJolien DendoovenMatthew BE GriffithsSean T BarryAndre SkirtachChristophe DetavernierRoel Baets

Plasma-enhanced atomic layer deposition of nanostructured gold near room temperature

Michiel Van DaeleMatthew BE GriffithsAli RazaMatthias MinjauwEduardo SolanoJi-Yu FengRanjith Karuparambil RamachandranStéphane ClemmenRoel BaetsSeán T Barry et al.

A1 Artikel in een tijdschrift in ACS APPLIED MATERIALS & INTERFACES

Redox evolution of Pt-Sn alloys studied by time-resolved XAS

Nadadur Veeraraghavan SrinathHilde PoelmanMarie-Françoise ReyniersJolien DendoovenVladimir Galvita

Setting carriers free : healing faulty interfaces promotes delocalization and transport in nanocrystal solids

Willem WalravensEduardo SolanoFilip GeenenJolien DendoovenOleg GorobtsovAthmane TadjineNayyera MahmoudPatrick Peiwen DingJacob P. C. RuffAndrej Singer et al.

A1 Artikel in een tijdschrift in ACS NANO

Surface reactions during thermal and plasma-enhanced atomic layer deposition of titanium dioxide films using tetrakis(dimethylamino)titanium

Sofie VandenbrouckeElisabeth LevrauMatthias MinjauwKevin Van de KerckhoveKilian Devloo-CasierSreeprasanth Pulinthanathu SreeJohan A MartensRita VosKarolien JansJolien Dendooven et al.

Time-resolved in-situ mass spectrometry for monitoring and identifying reaction products in ALD processes

Andreas WerbrouckFelix MattelaerJolien DendoovenChristophe Detavernier

2018

A Synchrotron’s View on Birth, Life and Death of Pt-In Catalysts

Hilde PoelmanMatthias FilezEvgeniy RedekopVladimir GalvitaM. MeledinaG. Van TendelooRanjith Karuparambil RamachandranJolien DendoovenChristophe DetavernierGuy Marin

ALD assisted nanoplasmonic slot waveguide for on-chip enhanced Raman spectroscopy

Ali RazaStéphane ClemmenPieter WuytensMuhammad MuneebMichiel Van DaeleJolien DendoovenChristophe DetavernierAndre SkirtachRoel Baets

A1 Artikel in een tijdschrift in APL PHOTONICS

Annealing of thin 'Tincone' films, a tin-based hybrid material deposited by molecular layer deposition, in reducing, inert, and oxidizing atmospheres

Kevin Van de KerckhoveJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Atomic layer deposition for interface engineering of (thin-film) lithium-ion battery

Felix MattelaerMarina Y TimmermansPhilippe M VereeckenJolien DendoovenChristophe Detavernier

Catalytic carpets : Pt@MIL-101@electrospun PCL, a surprisingly active and robust hydrogenation catalyst

Karen LeusChidharth KrishnarajLuca VerhoevenVéronique CremersJolien DendoovenRanjith Karuparambil RamachandranPeter DubruelPascal Van Der Voort

A1 Artikel in een tijdschrift in JOURNAL OF CATALYSIS

Catalytic carpets : Pt@MOF@electrospun PCL, a surprisingly active and robust hydrogenation catalyst

Karen LeusChidharth KrishnarajVéronique CremersJolien DendoovenRanjith Karuparambil RamachandranPeter DubruelPascal Van Der Voort

E-beam-lithography free plasmonic slot waveguides for on-chip Raman spectroscopy

Ali RazaMichiel Van DaelePieter WuytensJolien DendoovenChristophe DetavernierStéphane ClemmenRoel Baets

Inherent area-selective growth and nucleation enhancement during Ru ALD using the RuO4-precursor and H2-gas

Matthias MinjauwHannes RijckaertIsabel Van DriesscheChristophe DetavernierJolien Dendooven

Inherent substrate selectivity and nucleation enhancement during Ru ALD using the RuO4-precursor and H2-gas

Matthias MinjauwHannes RijckaertIsabel Van DriesscheChristophe DetavernierJolien Dendooven

Kinetics of lifetime changes in bimetallic nanocatalysts revealed by quick X-ray absorption spectroscopy

Matthias FilezHilde PoelmanEvgeniy RedekopVladimir GalvitaKonstantinos AlexopoulosMaria MeledinaRanjith Karuparambil RamachandranJolien DendoovenChristophe DetavernierGustaaf Van Tendeloo et al.

A1 Artikel in een tijdschrift in ANGEWANDTE CHEMIE-INTERNATIONAL EDITION

Oxidation barrier of Cu and Fe powder by atomic layer deposition

Véronique CremersGeert RampelbergAhmed BarhoumPerry WaltersNathalie ClaesThais Milagres de OliveiraGuy Van AsscheSara BalsJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in SURFACE & COATINGS TECHNOLOGY

Setting carriers free : healing faulty interfaces promotes delocalization and transport in nanocrystal solids

Willem WalravensNayyera MahmoudFilip GeenenEduardo SolanoJolien DendoovenAthmane TadjineChristophe DelerueGünther RoelkensChristophe DetavernierZeger Hens

Surface species during ALD of platinum observed with in situ reflection IR spectroscopy

Michiel Van DaeleChristophe DetavernierJolien Dendooven

A1 Artikel in een tijdschrift in PHYSICAL CHEMISTRY CHEMICAL PHYSICS

The comparison of on-chip surface enhanced Raman spectroscopy substrates : nanoplasmonic bowtie antenna vs metal slot waveguide

Ali RazaStéphane ClemmenMichiel Van DaelePieter WuytensJolien DendoovenChristophe DetavernierRoel Baets

The transformation behaviour of 'alucones', deposited by molecular layer deposition, in nanoporous Al2O3 layers

Kevin Van de KerckhoveMaïssa KS BarrLionel SantinacciPhilippe M VereeckenJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in DALTON TRANSACTIONS

TiO2-coated luminescent porous silicon micro-particles as a promising system for nanomedicine

E ChistèA GhafarinazariM DoniniVéronique CremersJolien DendoovenChristophe DetavernierD BenatiM ScarpaS DusiN Daldosso

A1 Artikel in een tijdschrift in JOURNAL OF MATERIALS CHEMISTRY B

Voltage-controlled ON-OFF ferromagnetism at room temperature in a single metal oxide film

Alberto QuintanaEnric MenendezMaciej O LiedkeMaik ButterlingAndreas WagnerVeronica SireusPau TorruellaSonia EstradeFrancesca PeiroJolien Dendooven et al.

A1 Artikel in een tijdschrift in ACS NANO

2017

3D Monte Carlo model for simulation of ALD on complex substrates

Véronique CremersFilip GeenenMartin WaleczekNathalie ClaesThais Milagres de OliveiraRobert ZieroldKornelius NielschSara BalsChristophe DetavernierJolien Dendooven

3D porous nanostructured platinum prepared using atomic layer deposition

Sreeprasanth Pulinthanathu SreeJolien DendoovenL GeertsRanjith Karuparambil RamachandranE JavonF CeyssensE BreynaertCEA KirschhockR PuersT Altantzis et al.

A1 Artikel in een tijdschrift in JOURNAL OF MATERIALS CHEMISTRY A

A new look on ALD vanadium oxides for 3D thin-film lithium-ion batteries

Felix MattelaerKobe GerylThomas DobbelaereGeert RampelbergJolien DendoovenChristophe Detavernier

ALD vanadium oxides for 3D thin-film lithium ion batteries

Felix MattelaerKobe GerylThomas DobbelaereGeert RampelbergJolien DendoovenChristophe Detavernier

Amorphous and crystalline vanadium oxides as high-energy and high-power cathodes for three-dimensional thin-film lithium ion batteries

Felix MattelaerKobe GerylGeert RampelbergJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in ACS APPLIED MATERIALS & INTERFACES

Atomic layer deposition applications 13

Atomic layer deposition for catalysis

Ranjith Karuparambil RamachandranChristophe DetavernierJolien Dendooven

Hoofdstuk in een boek in Nanotechnology in catalysis : applications in the chemical industry, energy development, and environment protection

Atomic layer deposition for lithium-ion batteries

Felix MattelaerChristophe DetavernierJolien Dendooven

Atomic layer deposition of nanoalloys of noble and non-noble metals

Ranjith Karuparambil RamachandranJolien DendoovenMatthias FilezVladimir GalvitaHilde PoelmanEduardo Solano MinuesaMatthias MinjauwGuy MarinChristophe Detavernier

A2 Artikel in een tijdschrift in ECS TRANSACTIONS

Basics of atomic layer deposition : growth characteristics and conformality

Jolien DendoovenChristophe Detavernier

Hoofdstuk in een boek in Atomic layer deposition in energy conversion applications

CMOS-compatible ALD zinc oxide coating for on-chip second-order nonlinear optical functionalities

Artur HermansMichiel Van DaeleC. KieningerJolien DendoovenStéphane ClemmenChristophe DetavernierRoel Baets

Conformal vanadium oxides beyond crystalline V2O5 as high energy density 3D thin-film electrodes for lithium-ion batteries

Felix MattelaerKobe GerylThomas DobbelaereGeert RampelbergJolien DendoovenChristophe Detavernier

Heterogeneous TiO2/V2O5/carbon nanotube electrodes for lithium-ion batteries

Mert KurttepeliShaoren DengFelix MattelaerDaire J CottPhilippe VereeckenJolien DendoovenChristophe DetavernierSara Bals

A1 Artikel in een tijdschrift in ACS APPLIED MATERIALS & INTERFACES

In situ IR spectroscopic investigation of thermal and plasma-enhanced ALD of Pt : temperature dependency of the growth rate

Michiel Van DaeleChristophe DetavernierJolien Dendooven

Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition

Jolien DendoovenRanjith Karuparambil RamachandranEduardo Solano MinuesaMert KurttepeliLisa GeertsGino HeremansJan RongeMatthias MinjauwThomas DobbelaereKilian Devloo-Casier et al.

A1 Artikel in een tijdschrift in NATURE COMMUNICATIONS

Key role of surface oxidation and reduction processes in the coarsening of Pt nanoparticles

Eduardo Solano MinuesaJolien DendoovenMatthias MinjauwRanjith Karuparambil RamachandranKevin Van de KerckhoveThomas DobbelaereDaniel Hermida-MerinoChristophe Detavernier

A1 Artikel in een tijdschrift in NANOSCALE

Molecular layer deposition for applications in lithium-ion batteries

Kevin Van de KerckhoveFelix MattelaerJolien DendoovenChristophe Detavernier

Molecular layer deposition of 'vanadicone', a vanadium-based hybrid material, as an electrode for lithium-ion batteries

Kevin Van de KerckhoveFelix MattelaerJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in DALTON TRANSACTIONS

Monte Carlo simulations of atomic layer deposition on 3D large surface area structures : required precursor exposure for pillar- versus hole-type structures

Véronique CremersFilip GeenenChristophe DetavernierJolien Dendooven

A1 Artikel in een tijdschrift in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

On the determination of χ(2) in thin films : a comparison of one-beam second-harmonic generation measurement methodologies

Artur HermansClemens KieningerKalle KoskinenAndreas WickbergEduardo Solano MinuesaJolien DendoovenMartti KauranenStéphane ClemmenMartin WegenerChristian Koos et al.

A1 Artikel in een tijdschrift in SCIENTIFIC REPORTS

Oxidation barrier for Cu and Fe powder by atomic layer deposition

Véronique CremersGeert RampelbergAhmed BarhoumPerry WaltersNathalie ClaesThais Milagres de OliveiraGuy Van AsscheSara BalsJolien DendoovenChristophe Detavernier

Plasma enhanced atomic layer deposition of silver using the Ag(fod)(PEt₃)-precursor and NH₃-plasma

Matthias MinjauwEduardo Solano MinuesaSree Pulinthanathu SreeRamesh AsapuMichiel Van DaeleRanjith Karuparambil RamachandranSammy VerbruggenSilvia LenaertsJohan MartensChristophe Detavernier et al.

Plasma enhanced atomic layer deposition of silver using the Ag(fod)(PEt₃)-precursor and NH₃-plasma

Matthias MinjauwEduardo Solano MinuesaSree Pulinthanathu SreeRamesh AsapuMichiel Van DaeleRanjith Karuparambil RamachandranSammy VerbruggenSilvia LenaertsJohan MartensChristophe Detavernier et al.

Plasma-enhanced atomic layer deposition of silver Using Ag(fod)(PEt3) and NH3-plasma

Matthias MinjauwEduardo Solano MinuesaSreeprasanth Pulinthanathu SreeRamesh AsapuMichiel Van DaeleRanjith Karuparambil RamachandranGino HeremansSammy W VerbruggenSilvia LenaertsJohan A Martens et al.

A1 Artikel in een tijdschrift in CHEMISTRY OF MATERIALS

Plasmonic near-field localization of silver core-shell nanoparticle assemblies via wet chemistry nanogap engineering

Ramesh AsapuRadu-George CiocarlanNathalie ClaesNatan BlommaertsMatthias MinjauwTareq AhmadJolien DendoovenPegie CoolSara BalsSiegfried Denys et al.

A1 Artikel in een tijdschrift in ACS APPLIED MATERIALS & INTERFACES

Size- and composition-controlled Pt–Sn bimetallic nanoparticles prepared by atomic layer deposition

Ranjith Karuparambil RamachandranMatthias FilezJolien DendoovenVladimir GalvitaHilde PoelmanEduardo Solano MinuesaEmiliano FondaGuy MarinChristophe Detavernier

A1 Artikel in een tijdschrift in RSC ADVANCES

Synthesis of Bimetallic Nanoparticles with Tailored Size and Composition

Ranjith Karuparambil RamachandranJolien DendoovenMatthias FilezVladimir GalvitaHilde PoelmanEduardo Solano MinuesaMatthias MinjauwKilian Devloo-CasierE. Fonda

The influence of ultrathin amorphous ALD alumina and titania on the rate capability of anatase TiO2 and LiMn2O4 lithium ion battery electrodes

Felix MattelaerPhilippe M VereeckenJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in ADVANCED MATERIALS INTERFACES

Unravelling the role of ALD Al2O3 and TiO2 protective coatings on lithium-ion battery electrodes

Felix MattelaerMert KurttepeliShaoren DengDaire J CottPhilippe VereeckenJolien DendoovenSara BalsChristophe Detavernier

2016

A case study of ALD encapsulation of quantum dots: embedding supported CdSe/CdS/ZnS quantum dots in a ZnO matrix

Kilian Devloo-CasierPieter GeiregatKarl F LudwigKoen van StiphoutAndre VantommeZeger HensChristophe DetavernierJolien Dendooven

A1 Artikel in een tijdschrift in JOURNAL OF PHYSICAL CHEMISTRY C

Atomic layer deposition applications 12

Atomic layer deposition of Pt nanoparticles within the cages of MIL-101 : a mild and recyclable hydrogenation catalyst

Karen LeusJolien DendoovenNorini TahirRanjith Karuparambil RamachandranMaria MeledinaStuart TurnerGustaaf Van TendelooJan GoemanJohan Van der EyckenChristophe Detavernier et al.

A1 Artikel in een tijdschrift in NANOMATERIALS

Atomic layer deposition of vanadium oxides for thin-film lithium-ion battery applications

Felix MattelaerKobe GerylGeert RampelbergThomas DobbelaereJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in RSC ADVANCES

Atomic layer deposition route to tailor nanoalloys of noble and non-noble metals

Ranjith Karuparambil RamachandranJolien DendoovenMatthias FilezVladimir GalvitaHilde PoelmanEduardo Solano MinuesaMatthias MinjauwKilian Devloo-CasierEmiliano FondaDaniel Hermida-Merino et al.

A1 Artikel in een tijdschrift in ACS NANO

Chemically triggered formation of two-dimensional epitaxial quantum dot superlattices

Willem WalravensJonathan De RooEmile DrijversStephanie ten BrinckEduardo Solano MinuesaJolien DendoovenChristophe DetavernierIvan InfanteZeger Hens

A1 Artikel in een tijdschrift in ACS NANO

Controlled formation of epitaxially connected nanocrystal superlattices: an important step towards application in opto-electronic devices

Willem WalravensJonathan De RooEmile DrijversStephanie ten BrinckEduardo Solano MinuesaJolien DendoovenChristophe DetavernierIvan InfanteZeger Hens

Direct imaging of ALD deposited Pt nanoclusters inside the giant pores of MIL-101

Maria MeledinaStuart TurnerMaria FilippousiKaren LeusIvan LobatoRanjith Karuparambil RamachandranJolien DendoovenChristophe DetavernierPascal Van Der VoortGustaaf Van Tendeloo

A1 Artikel in een tijdschrift in PARTICLE & PARTICLE SYSTEMS CHARACTERIZATION

Hydroisomerization and hydrocracking activity enhancement of a hierarchical ZSM-5 zeolite catalyst via atomic layer deposition of aluminium

Sreeprasanth Pulinthanathu SreeJolien DendoovenPieter CMM MagusinKarine ThomasJean-Pierre GilsonFrancis TaulelleChristophe DetavernierJohan Martens

A1 Artikel in een tijdschrift in CATALYSIS SCIENCE & TECHNOLOGY

In situ synchrotron based fluorescence and scattering techniques : a study of quantum dot encapsulation by atomic layer deposition

Kilian Devloo-CasierChristophe DetavernierJolien Dendooven

Magnetic and electrical characterization of nickel-rich NiFe thin films synthesized by atomic layer deposition and subsequent thermal reduction

Alvaro P EspejoRobert ZieroldJohannes GoothJolien DendoovenChristophe DetavernierJuan EscrigKornelius Nielsch

A1 Artikel in een tijdschrift in NANOTECHNOLOGY

Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing

Felix MattelaerTom BosserezJan RongéJohan MartensJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in RSC ADVANCES

Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition

Jolien DendoovenEduardo Solano MinuesaMatthias MinjauwKevin Van de KerckhoveAlessandro CoatiEmiliano FondaGiuseppe PortaleYves GarreauChristophe Detavernier

A1 Artikel in een tijdschrift in REVIEW OF SCIENTIFIC INSTRUMENTS

Molecular layer deposition of 'titanicone', a titanium-based hybrid material, as an electrode for lithium-ion batteries

Kevin Van de KerckhoveFelix MattelaerDavy DeduytschePhilippe M VereeckenJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in DALTON TRANSACTIONS

Monte Carlo simulations of ALD on 3D large surface area structures

Véronique CremersFilip GeenenChristophe DetavernierJolien Dendooven

Monte Carlo simulations of atomic layer deposition on 3D large surface area structures

Véronique CremersFilip GeenenChristophe DetavernierJolien Dendooven

Plasma-enhanced ALD : a route to hydrophilic, glueable PTFE

Geert RampelbergAmit Kumar RoyJolien DendoovenDavy DeduytscheKilian Devloo-CasierKim RagaertLudwig CardonChristophe Detavernier

Plasma-enhanced atomic layer deposition of iron and titanium phosphates as electrode materials for 3D-structured lithium-ion microbatteries

Thomas DobbelaereFelix MattelaerJolien DendoovenPhilippe M VereeckenChristophe Detavernier

Plasma-enhanced atomic layer deposition of iron phosphate as a positive electrode for 3D lithium-ion microbatteries

Thomas DobbelaereFelix MattelaerJolien DendoovenPhilippe VereeckenChristophe Detavernier

A1 Artikel in een tijdschrift in CHEMISTRY OF MATERIALS

Thin, low roughness Ru films deposited by thermal and plasma enhanced atomic layer deposition using RuO4 and H2 at low temperatures

Matthias MinjauwJolien DendoovenBoris CaponChristian DussaratEduardo Solano MinuesaKilian Devloo-CasierJakob KuhsMarc SchaekersAlessandro CoatiChristophe Detavernier

Thin, low roughness Ru films deposited by thermal and plasma enhanced atomic layer deposition using RuO4 and H2 at low temperatures

Matthias MinjauwJolien DendoovenChristian DussaratEduardo Solano MinuesaKilian Devloo-CasierJakob KuhsMarc SchaekersAlessandro CoatiChristophe Detavernier

Thin, low roughness Ru films deposited by thermal and plasma enhanced atomic layer deposition using RuO4 and H2 at low temperatures

Matthias MinjauwJolien DendoovenBoris CaponChristian DussaratEduardo Solano MinuesaKilian Devloo-CasierJakob KuhsMarc SchaekersAlessandro CoatiChristophe Detavernier

2015

Atomic layer deposited second-order nonlinear optical metamaterial for back-end integration with CMOS-compatible nanophotonic circuitry

Stéphane ClemmenArtur HermansEduardo Solano MinuesaJolien DendoovenKalle KoskinenMartti KauranenEdouard BrainisChristophe DetavernierRoel Baets

A1 Artikel in een tijdschrift in OPTICS LETTERS

Atomic layer deposition of ruthenium at 100 °C using the RuO4-precursor and H2

Matthias MinjauwJolien DendoovenBoris CaponMarc SchaekersChristophe Detavernier

A1 Artikel in een tijdschrift in JOURNAL OF MATERIALS CHEMISTRY C

Deposition of MnO anode and MnO2 cathode thin films by plasma enhanced atomic layer deposition using the Mn(thd)3 precursor

Felix MattelaerPhilippe VereeckenJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in CHEMISTRY OF MATERIALS

Functionalization of silica nanoparticles and native silicon oxide with tailored boron-molecular precursors for efficient and predictive p-doping of silicon

Laurent MatheyThibault AlphazanMaxence VallaLaurent VeyreHervé FontaineVirginie EnyediKarim YckacheMarianne DanielouSébastien KerdilesJean Guerrero et al.

A1 Artikel in een tijdschrift in JOURNAL OF PHYSICAL CHEMISTRY C

Low temperature atomic layer deposition of crystalline In2O3 films

Ranjith Karuparambil RamachandranJolien DendoovenHilde PoelmanChristophe Detavernier

A1 Artikel in een tijdschrift in JOURNAL OF PHYSICAL CHEMISTRY C

Low temperature thermal and plasma enhanced atomic layer deposition of ruthenium using RuO4 and H2/H2-plasma

Matthias MinjauwJolien DendoovenBoris CaponChristophe DetavernierMarc Schaekers

Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H-2-plasma

Matthias MinjauwJolien DendoovenBoris CaponMarc SchaekersChristophe Detavernier

A1 Artikel in een tijdschrift in JOURNAL OF MATERIALS CHEMISTRY C

Plasma enhanced atomic layer deposition of ruthenium below 100°C using RuO4 and H2-plasma

Matthias MinjauwJolien DendoovenBoris CaponMarc SchaekersChristophe Detavernier

Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene

Amit Kumar RoyJolien DendoovenDavy DeduytscheKilian Devloo-CasierKim RagaertLudwig CardonChristophe Detavernier

A1 Artikel in een tijdschrift in CHEMICAL COMMUNICATIONS

2014

A Single-Event MicroKinetic assessment of n-alkane hydroconversion on ultrastable Y zeolites after atomic layer deposition of alumina

Bart VandegehuchteJoris ThybautChristophe DetavernierDavy DeduytscheJolien DendoovenJA MartensSP SreeTI KorányiGuy Marin

A1 Artikel in een tijdschrift in JOURNAL OF CATALYSIS

Air-based photoelectrochemical cell capturing water molecules from ambient air for hydrogen production

J RongeShaoren DengSP SreeT BosserezSW VerbruggenNK SinghJolien DendoovenMBJ RoeffaersF TaulelleM De Volder et al.

A1 Artikel in een tijdschrift in RSC ADVANCES

ALD of ruthenium at 100°C using the ToRuS-precursor

Matthias MinjauwBoris CaponJolien DendoovenMarc SchaekersChristophe Detavernier

ALD of ruthenium at 100°C using the ToRuS-precursor

Matthias MinjauwJolien DendoovenBoris CaponMarc SchaekersChristophe Detavernier

Atomic layer deposition : a 3D surface engineering technique for nanomaterials

Geert RampelbergJolien DendoovenDavy DeduytscheChristophe Detavernier

Atomic layer deposition in nanoporous catalyst materials

Jolien Dendooven

Hoofdstuk in een boek in Atomically-precise methods for synthesis of solid catalysts

Atomic layer deposition-based tuning of the pore size in mesoporous thin films studied by in situ grazing incidence small angle X-ray scattering

Jolien DendoovenKilian Devloo-CasierMatthias IdeKathryn GrandfieldMert KurttepeliKarl F LudwigSara BalsPascal Van Der VoortChristophe Detavernier

A1 Artikel in een tijdschrift in NANOSCALE

Catalytic activation of OKO zeolite with intersecting pores of 10- and 12-membered rings using atomic layer deposition of aluminium

E VerheyenS Pulinthanathu SreeK ThomasJolien DendoovenM De PrinsG VanbutseleE BreynaertJ-P GilsonCEA KirschhockChristophe Detavernier et al.

A1 Artikel in een tijdschrift in CHEMICAL COMMUNICATIONS

Control of the oxidation state of manganese during plasma enhanced atomic layer deposition with the Mn(thd)3 precursor

Felix MattelaerJolien DendoovenPhilippe VereeckenChristophe Detavernier

Controllable nitrogen doping in as deposited TiO₂ film and its effect on post deposition annealing

Shaoren DengSammy W VerbruggenSilvia LenaertsJohan A MartensSven Van den BergheKilian Devloo-CasierWouter DevulderJolien DendoovenDavy DeduytscheChristophe Detavernier

A1 Artikel in een tijdschrift in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Controlling the oxidation state of manganese during plasma enhanced atomic layer deposition using the Mn(thd)3 precursor

Felix MattelaerJolien DendoovenPhilippe VereeckenChristophe Detavernier

Enzymatic mineralization of silk scaffolds

Sangram Keshari SamalMamoni DashHeidi DeclercqTom GheysensJolien DendoovenPascal Van Der VoortMaria CornelissenPeter DubruelDavid L Kaplan

A1 Artikel in een tijdschrift in MACROMOLECULAR BIOSCIENCE

In situ IR spectroscopic investigation of alumina ALD on porous silica films: thermal versus plasma-enhanced ALD

Elisabeth LevrauKevin Van de KerckhoveKilian Devloo-CasierSreeprasanth Pulinthanathu SreeJohan A MartensChristophe DetavernierJolien Dendooven

A1 Artikel in een tijdschrift in JOURNAL OF PHYSICAL CHEMISTRY C

In situ synchrotron based x-ray techniques as monitoring tools for atomic layer deposition

Kilian Devloo-CasierKarl F LudwigChristophe DetavernierJolien Dendooven

A1 Artikel in een tijdschrift in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

In situ synchrotron based XRF and GISAXS study of ALD encapsulation of supported nanocrystals

Kilian Devloo-CasierJolien DendoovenPieter GeiregatKarl LudwigZeger HensChristophe Detavernier

In situ XAS and XRF study of nanoparticle nucleation during O3-based Pt deposition

Matthias FilezHilde PoelmanRanjith Karuparambil RamachandranJolien DendoovenKilian Devloo-CasierEmiliano FondaChristophe DetavernierGuy Marin

A1 Artikel in een tijdschrift in CATALYSIS TODAY

Magnetic characterization and electrical field-induced switching of magnetite thin films synthesized by atomic layer deposition and subsequent thermal reduction

Robert ZieroldCharlie Le LamJolien DendoovenJohannes GoothTim BöhnertPhilip SergeliusFrans MunnikJosep M Montero MorenoDetlef GörlitzChristophe Detavernier et al.

A1 Artikel in een tijdschrift in JOURNAL OF PHYSICS D-APPLIED PHYSICS

Plasma enhanced atomic layer deposition of Fe2O3 thin films

Ranjith Karuparambil RamachandranJolien DendoovenChristophe Detavernier

A1 Artikel in een tijdschrift in JOURNAL OF MATERIALS CHEMISTRY A

Plasma enhanced atomic layer deposition of Ga2O3 thin films

Ranjith Karuparambil RamachandranJolien DendoovenJonas BottermanSreeprasanth Pulinthanathu SreeDirk PoelmanJohan A MartensHilde PoelmanChristophe Detavernier

A1 Artikel in een tijdschrift in JOURNAL OF MATERIALS CHEMISTRY A

Synchrotron based in situ characterization during atomic layer deposition

Jolien DendoovenKilian Devloo-CasierAlessandro CoatiGiuseppe PortaleWim BrasKarl LudwigChristophe Detavernier

Unravelling the formation of Pt-Ga alloyed nanoparticles on calcined Ga-modified hydrotalcites by in situ XAS

Matthias FilezEvgeniy RedekopHilde PoelmanVladimir GalvitaRanjith Karuparambil RamachandranJolien DendoovenChristophe DetavernierGuy Marin

A1 Artikel in een tijdschrift in CHEMISTRY OF MATERIALS

2013

Atomic layer deposition of platinum : GISAXS study of the initial island growth mode

Jolien DendoovenRanjith Karuparambil RamachandranKilian Devloo-CasierKarl LudwigChristophe Detavernier

Atomic layer deposition of TiO₂ on surface modified nanoporous low-k films

Elisabeth LevrauKilian Devloo-CasierJolien DendoovenKarl F LudwigPatrick VerdonckJohan MeersschautMikhail R BaklanovChristophe Detavernier

A1 Artikel in een tijdschrift in LANGMUIR

In situ characterization of atomic layer deposition in mesoporous thin films by grazing incidence small angle x-ray scattering

Jolien DendoovenKilian Devloo-CasierMatthias IdeKathryn GrandfieldKarl LudwigPascal Van Der VoortSara BalsChristophe Detavernier

In situ GISAXS during atomic layer deposition of oxides on ordered quantum dots

Kilian Devloo-CasierJolien DendoovenKarl LudwigPieter GeiregatZeger HensChristophe Detavernier

In situ XAS and XRF study of nanoparticle nucleation during O3-based Pt deposition

Matthias FilezHilde PoelmanRanjith Karuparambil RamachandranJolien DendoovenKilian Devloo-CasierE. FondaChristophe DetavernierGuy Marin

Low temperature atomic layer deposition of platinum using (methylcyclopentadienyl)trimethylplatinum and ozone

Jolien DendoovenRanjith K RamanchandranKilian Devloo-CasierGeert RampelbergMatthias FilezHilde PoelmanGuy MarinEmiliano FondaChristophe Detavernier

A1 Artikel in een tijdschrift in JOURNAL OF PHYSICAL CHEMISTRY C

Nucleation and growth of Pt by atomic layer deposition on silica probed with in situ XAS and XRF measurements

Matthias FilezRanjith Karuparambil RamachandranKilian Devloo-CasierJolien DendoovenHilde PoelmanE FondaChristophe DetavernierGuy Marin

Synthesis of uniformly dispersed anatase nanoparticles inside mesoporous silica thin films via controlled breakup and crystallization of amorphous TiO2 deposited using atomic layer deposition

Sreeprasanth Pulinthanathu SreeJolien DendoovenKasper MasschaeleHeidari M HamedShaoren DengSara BalsChristophe DetavernierJohan A Martens

A1 Artikel in een tijdschrift in NANOSCALE

2012

Anisotropic atomic layer deposition profiles of TiO₂ in hierarchical silica material with multiple porosity

Sreeprasanth Pulinthanathu SreeJolien DendoovenJasper JammaerKasper MasschaeleDavy DeduytscheJan D'HaenChristine EA KirschhockJohan A MartensChristophe Detavernier

A1 Artikel in een tijdschrift in CHEMISTRY OF MATERIALS

Atomic layer deposition of titanium and vanadium oxide on mesoporous silica and phenol/formaldehyde resins : the effect of the support on the liquid phase epoxidation of cyclohexene

Ilke MuylaertJan MusschootKaren LeusJolien DendoovenChristophe DetavernierPascal Van Der Voort

A1 Artikel in een tijdschrift in EUROPEAN JOURNAL OF INORGANIC CHEMISTRY

Conformality of thermal and plasma enhanced atomic layer deposition on a non-woven fibrous substrate

Jan MusschootJolien DendoovenDavy DeduytscheJohan HaemersG BuyleChristophe Detavernier

A1 Artikel in een tijdschrift in SURFACE & COATINGS TECHNOLOGY

In situ characterization of ALD in mesoporous thin films by grazing incidence small angle X-ray scattering

Jolien DendoovenKilian Devloo-CasierMatthias IdeKathryn GrandfieldKarl F LudwigPascal Van Der VoortSara BalsChristophe Detavernier

In situ monitoring of atomic layer deposition in nanoporous thin films using ellipsometric porosimetry

Jolien DendoovenKilian Devloo-CasierElisabeth LevrauRobbert Van HoveSreeprasanth Pulinthanathu SreeMikhail R BaklanovJohan A MartensChristophe Detavernier

A1 Artikel in een tijdschrift in LANGMUIR

In situ study of ALD processes using synchrotron-based X-ray fluorescence and scattering techniques

Jolien DendoovenKilian Devloo-CasierMatthias IdeKathryn GrandfieldKarl LudwigSara BalsPascal Van Der VoortChristophe Detavernier

Modeling and in situ characterization of the conformality of atomic layer deposition in high aspect ratio structures and nanoporous materials

Jolien DendoovenChristophe Detavernier

Nanoscale area selective ZnO growth between a monolayer of nanocrystals

Kilian Devloo-CasierJolien DendoovenKarl LudwigPieter GeiregatZeger HensChristophe Detavernier

Tuning the pore size of ink-bottle mesopores by atomic layer deposition

Jolien DendoovenBart GorisKilian Devloo-CasierElisabeth LevrauEllen BiermansMikhail R BaklanovKarl F LudwigPascal Van Der VoortSara BalsChristophe Detavernier

A1 Artikel in een tijdschrift in CHEMISTRY OF MATERIALS

2011

Aluminium atomic layer deposition applied to mesoporous zeolites for acid catalytic activity enhancement

Sreeprasanth Pulinthanathu SreeJolien DendoovenTamás I KorányGina VanbutseleKristof HouthoofdDavy DeduytscheChristophe DetavernierJohan A Martens

A1 Artikel in een tijdschrift in CATALYSIS SCIENCE & TECHNOLOGY

Characterization of ALD coatings in nanoporous thin films by ellipsometric porosimetry

Jolien DendoovenSreeprasanth Pulinthanathu SreeRobbert Van HoveKilian Devloo-CasierMikhail BaklanovJohan MartensChristophe Detavernier

Effect of electric field on CdSe/CdS/ZnS colloidal quantum dots

Sreeparvathi WarrierKarel LambertJolien DendoovenChristophe DetavernierZeger HensDries Van Thourhout

Embedding quantum dot monolayers in Al2O3 using atomic layer deposition

Karel LambertJolien DendoovenChristophe DetavernierZeger Hens

A1 Artikel in een tijdschrift in CHEMISTRY OF MATERIALS

In situ GISAXS during atomic layer deposition

Kilian Devloo-CasierJolien DendoovenKarl LudwigChristophe Detavernier

In situ synchrotron based x-ray fluorescence and scattering measurements during atomic layer deposition: initial growth of HfO2 on Si and Ge substrates

Kilian Devloo-CasierJolien DendoovenKF LudwigG LekensJ D'HaenChristophe Detavernier

A1 Artikel in een tijdschrift in APPLIED PHYSICS LETTERS

In situ x-ray characterization and electron tomography study of ALD coatings in mesoporous thin films

Jolien DendoovenEllen BiermansElisabeth LevrauKilian Devloo-CasierKarl LudwigPascal Van Der VoortSara BalsChristophe Detavernier

In situ X-ray fluorescence measurements during atomic layer deposition: nucleation and growth of TiO2 on planar substrates and in nanoporous films

Jolien DendoovenSreeprasanth Pulinthanathu SreeKoen De KeyserDavy DeduytscheJohan A MartensKarl F LudwigChristophe Detavernier

A1 Artikel in een tijdschrift in JOURNAL OF PHYSICAL CHEMISTRY C

Spacious and mechanically flexible mesoporous silica thin film composed of an open network of interlinked nanoslabs

Sreeprasanth Pulinthanathu SreeJolien DendoovenDries SmeetsDavy DeduytscheAlexander AertsKris VanstreelsMikhail R BaklanovJin Won SeoKristiaan TemstAndré Vantomme et al.

A1 Artikel in een tijdschrift in JOURNAL OF MATERIALS CHEMISTRY

Tailoring nanoporous materials by atomic layer deposition

Christophe DetavernierJolien DendoovenSreeprasanth Pulinthanathu SreeKarl F LudwigJohan A Martens

A1 Artikel in een tijdschrift in CHEMICAL SOCIETY REVIEWS

2010

Conformality of Al2O3 and AlN deposited by plasma-enhanced atomic layer deposition

Jolien DendoovenDavy DeduytscheJan MusschootRoland VanmeirhaegheChristophe Detavernier

A1 Artikel in een tijdschrift in JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Conformality of Al2O3 deposited by thermal, plasma-enhanced and ozone-based atomic layer deposition

Jolien DendoovenDavy DeduytscheJan MusschootChristophe Detavernier

Effect of electric field on CdSe/CdS/ZnS nanocrystals

Sreeparvathi WarrierKarel LambertJolien DendoovenChristophe DetavernierZeger HensDries Van Thourhout

In situ x-ray fluorescence measurements during ALD on flat substrates and in nanoporous

Jolien DendoovenDavy DeduytscheSreeprasanth Pulinthanathu SreeTamás I KorányiGina VanbutseleJohan A MartensKarl F LudwigChristophe Detavernier

Single-event microkinetic model based design of tailored zeolite catalysts through atomic layer deposition

Bart VandegehuchteJoris ThybautChristophe DetavernierDavy DeduytscheJolien DendoovenJOHAN MARTENSPS SreeprasanthTI KorányiGuy Marin

2009

Modeling the conformality of atomic layer deposition: the effect of sticking probability

Jolien DendoovenJan MusschootDavy DeduytscheRoland VanmeirhaegheChristophe Detavernier

Modeling the conformality of atomic layer deposition: the effect of sticking probability

Jolien DendoovenDavy DeduytscheJan MusschootRoland VanmeirhaegheChristophe Detavernier

A1 Artikel in een tijdschrift in JOURNAL OF THE ELECTROCHEMICAL SOCIETY

2008

Conformality of thermal and plasma enhanced ALD

Jolien DendoovenJan MusschootDavy DeduytscheRoland VanmeirhaegheChristophe Detavernier

Thermal versus plasma-enhanced ALD : growth kinetics and conformality

Christophe DetavernierJolien DendoovenDavy DeduytscheJan Musschoot