In situ XRF and XAS study of Atomic Layer Deposition on flat and porous sustrates - deposition of bimetallic materials.

01 January 2011 → 31 December 2014
Research Foundation - Flanders (FWO)
Research disciplines
  • Natural sciences
    • Condensed matter physics and nanophysics
thin film growth XAS bimetallic materials Atomic Layer Deposition (ALD) XRF
Project description

The research involves the development of synchrotron based measuring techniques for the in situ characterisation of an atomic deposition process of inorganic materials in/onto solids. As specific application the deposition and formation of bimetallic materilas are studied.