The research project focuses mainly on the quantification of the core processes that take place during the growth of thin films by magnetron sputter deposition. To reach this goal, experiments are combined with simulations. The experiments are supported by diagnostic tools to analyse in-situ the film growth and the process conditions. Besides these tools, the film properties are monitored as function of the growth conditions by several analytical techniques. Charaterization of the film texture (X-ray diffraction), microstructure (electron microscopy), and chemical composition (soft X-ray emission spectroscopy, energy dispersive X-ray analysis, and X-ray photo-electron spectroscopy) are the most important analysis tools. This research is supported by simulations of the transport of sputtered atoms through gas phase, and of the target processes that occur during reactive sputtering. Rather unique in this research field is that the research is disconnected from specific applications.