Project

Wafer-scale mapping of sub-micron layer thicknesses for a micro-transfer printing pilot line

Acronym
UniFilm
Code
F2023/IOF-Equip/101
Duration
20 December 2023 → 31 December 2024
Funding
Regional and community funding: Industrial Research Fund
Research disciplines
  • Engineering and technology
    • Other computer engineering, information technology and mathematical engineering not elsewhere classified
Keywords
Heterogeneous integration micro-systems micro-transfer printing
 
Project description

Heterogeneous integration is a hot topic in realizing advanced micro-systems, both in the field of electronics and photonics. It allows the separate manufacturing of small chiplets, that are then efficiently combined to build powerful systems. This enables reducing the innovation cycle time, allows for IP reuse and provides a sustainable path forward for system integration. In the Photonics Research Group we are establishing a micro-transfer printing pilot line to enable a very scalable path to chiplet integration. This involves a whole train of tools to do the patterning, deposition and chiplet integration on a 200mm wafer-scale. The performance of the assembled micro-systems depends strongly on the control of the layer thicknesses of different dielectric layers deposited (and etched) in the process. A tool is necessary that can map these layer thicknesses in an automated way over the full wafer. With this project we want to acquire such a system, to complete the micro-transfer printing pilot line.