Code
05Z40409
Duration
01 January 2010 → 31 December 2015
Funding
Ghent University funding
Promotor
Research disciplines
-
Natural sciences
- Condensed matter physics and nanophysics
- Analytical chemistry
- Macromolecular and materials chemistry
-
Engineering and technology
- Catalysis and reacting systems engineering
- Chemical product design and formulation
- General chemical and biochemical engineering
- Process engineering
- Separation and membrane technologies
- Transport phenomena
- Other (bio)chemical engineering
Keywords
filtration
catalysis
nanoporous materials
ALD
Atomic Layer Deposition (ALD)
Project description
The aim of this project is to explore Atomic Layer Deposition (ALD) for tailoring the interior surface of nanoporous materials. ALD is a self-limited growth method that is characterized by alternating exposure of the growing film to precursor vapors, resulting in the sequential deposition of (sub)monolayers. We aim at using ALD to engineer the presence of catalytic sites on the pore walls of nanoporous materials and/or to tune the pore size.