Fundamental study of the growth kinetics and conformality of thermal and plasma-enhanced atomic layer deposition

01 October 2008 → 30 September 2012
Regional and community funding: Special Research Fund, Research Foundation - Flanders (FWO)
Research disciplines
  • Natural sciences
    • Condensed matter physics and nanophysics
plasma-enhanced atomic layer deposition Atomic Layer Deposition (ALD) growth kinetics conformality kinetic model
Project description

Growth kinetics of ALD and PE-ALD: this work studies fundamental questions about initial nucleation, the evolution of the surface roughness and crystallinity of the films during deposition. Conformality of ALD and PE-ALD: this study aims to characterize the conformality as a function of aspect ratio, temperature and pulse times. A second goal is to model the conformality.