High Power Impulse Magnetron Sputtering (HIPIMS)is a deposition technique for thin films. This technique is based on the more traditional magnetron sputtering, a deposition technique which leans upon a magnetic assisted glow discharge. The ionization degree and plasma density is strongly increased by applying a high power pulse. Moreover, the plasma becomes metal based. By negative polarisation of the substrate, metal ions can be conducted towards the substrate to influence in this way the thin film growth, allowing to optimize the film properties.