Project

Pulse generator for ultadense plasma

Duration
15 June 2012 → 30 June 2016
Funding
Regional and community funding: Special Research Fund
Research disciplines
  • Natural sciences
    • Dielectrics, piezoelectrics and ferroelectrics
    • Condensed matter physics and nanophysics not elsewhere classified
    • Materials physics not elsewhere classified
    • Physics of (fusion) plasmas and electric discharges
Keywords
plasma physics HIPIMS thin film deposition
 
Project description

High Power Impulse Magnetron Sputtering (HIPIMS)is a deposition technique for thin films. This technique is based on the more traditional magnetron sputtering, a deposition technique which leans upon a magnetic assisted glow discharge. The ionization degree and plasma density is strongly increased by applying a high power pulse. Moreover, the plasma becomes metal based. By negative polarisation of the substrate, metal ions can be conducted towards the substrate to influence in this way the thin film growth, allowing to optimize the film properties.