Atomic layer deposition (ALD) is a technique used to apply thin layers with atomic precision on substrates and powders. The technique has applications in microelectronics and for functionalizing/stabilizing battery electrodes and (electro)catalytic materials. The COCOON research group at Ghent University has developed expertise and infrastructure to study surface reactions during ALD 'in situ,' without exposing the growth surface to air. The goal of this project involves using techniques such as X-ray photoelectron spectroscopy to study the growth mechanism of ALD layers.