Type
Equipment
Acronym
EVG aligner
Code
APP/00319
Date of commissioning
01 January 2015 → …
Research disciplines
-
Engineering and technology
- Semiconductor devices, nanoelectronics and technology
Keywords
nanoimprint
mask aligner
UV exposure
photolithography
Brand Name/manufacturer
EVG 620
Other information
Description
The mask aligner is used to transfer a pattern to a photosensitive material by selective exposure (through a mask) to a UV radiation source. The equipment supports several modes (proximity, soft / hard / vacuum contact) and can also do bottom side alignment. It can also be used in nano-imprint mode, where the pattern is transferred by imprinting.