Type
Equipment
Acronym
RIE
Code
APP/00286
Date of commissioning
01 January 2000 → …
Research disciplines
-
Engineering and technology
- Semiconductor devices, nanoelectronics and technology
Keywords
plasma etching
reactive ion etching
dry etching
anisotropic etching
microfabrication
thin film patterning
Brand Name/manufacturer
Plasma Therm Batchtop VII
Other information
Description
The Benchtop System VII is a reactive ion etcher (RIE) used for dry etching thin layers at room temperature. It is suitable for etching materials such as silicon dioxide, silicon nitride, and silicon oxynitride. Organic layers, such as polyimides, can also be roughened, thinned, or etched.