Research Explorer

Your browser does not support JavaScript or JavaScript is not enabled. Without JavaScript some functions of this webapplication may be disabled or cause error messages. To enable JavaScript, please consult the manual of your browser or contact your system administrator.

Researcher

Geert Rampelberg

Awards & Distinctions

50 Results

2023

Crystalline tin disulfide by low-temperature plasma-enhanced 2 atomic layer deposition as an electrode material for Li-ion batteries 3 and CO2 electroreduction

Femi MathewJäri Van den HoekNithin PoonkottilBo ZhaoGeert RampelbergDaniel ChoukrounJonas HereijgersZeger HensDirk PoelmanTom Breugelmans et al.

A1 Journal Article in ACS APPLIED ENERGY MATERIALS

Tin and indium sulfide by plasma-enhanced atomic layer deposition for CO2 electroreduction

Femi MathewJäri Van Den HoekNithin PoonkottilGeert RampelbergNick DaemsJonas HereijgersZeger HensTom BreugelmansChristophe DetavernierJolien Dendooven

2020

Atomic layer deposition of yttrium oxide films and their properties of water wettability

Bo ZhaoFelix MattelaerGeert RampelbergJolien DendoovenChristophe Detavernier

Thermal and plasma-enhanced atomic layer deposition of yttrium oxide films and the properties of water wettability

Bo ZhaoFelix MattelaerGeert RampelbergJolien DendoovenChristophe Detavernier

A1 Journal Article in ACS APPLIED MATERIALS & INTERFACES

2019

Atomic layer deposition of Al2O3 using aluminum triisopropoxide (ATIP) : a combined experimental and theoretical study

Ba Tai TruongLi'ao CaoFelix MattelaerGeert RampelbergFatemeh SM HashemiJolien DendoovenJ Ruud van OmmenChristophe DetavernierMarie-Françoise Reyniers

A1 Journal Article in JOURNAL OF PHYSICAL CHEMISTRY C

Atomic layer deposition of vanadium oxides : process and application review

V. P. PrasadamN. BahlawaneFelix MattelaerGeert RampelbergChristophe DetavernierL. FangY. JiangK. MartensI. P. ParkinI. Papakonstantinou

A1 Journal Article in MATERIALS TODAY CHEMISTRY

Corrosion protection of Cu by atomic layer deposition

Véronique CremersGeert RampelbergKitty BaertShoshan AbrahamiNathalie ClaesThais Milagres de OliveiraHerman TerrynSara BalsJolien DendoovenChristophe Detavernier

A1 Journal Article in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Cost-reducing PE-ALD processes for pure and doped SiO2 thin films

Geert RampelbergVéronique CremersAndreas WerbrouckJolien DendoovenChristophe Detavernier

Cost-reducing PE-ALD processes for pure and doped SiO2 thin films

Geert RampelbergVéronique CremersAndreas WerbrouckJolien DendoovenChristophe Detavernier

Stabilizing fluoride phosphors : surface modification by atomic layer deposition

Reinert VerstraeteGeert RampelbergHannes RijckaertIsabel Van DriesscheElizabeth CoetseeMart-Mari DuvenhagePhilippe SmetChristophe DetavernierHendrik SwartDirk Poelman

A1 Journal Article in CHEMISTRY OF MATERIALS

Stabilizing red fluoride phosphors for white LEDs using atomic layer deposition

Reinert VerstraeteHannes RijckaertGeert RampelbergElizabeth CoetseeMart-Mari DuvenhageChristophe DetavernierHendrik SwartPhilippe SmetDirk Poelman

Surface treatment of fluoride phosphors using atomic layer deposition

Reinert VerstraeteHannes RijckaertGeert RampelbergElizabeth CoetseeMart-Mari DuvenhageChristophe DetavernierHendrik SwartPhilippe SmetDirk Poelman

2018

Oxidation barrier of Cu and Fe powder by atomic layer deposition

Véronique CremersGeert RampelbergAhmed BarhoumPerry WaltersNathalie ClaesThais Milagres de OliveiraGuy Van AsscheSara BalsJolien DendoovenChristophe Detavernier

A1 Journal Article in SURFACE & COATINGS TECHNOLOGY

Surface engineering of particles and powders by atomic layer deposition

Geert RampelbergVéronique CremersChristophe Detavernier

Thermal stability of Zr-O-N(:Ti) thin films prepared by magnetron sputtering

CI da Silva-OliveiraD Martinez-MartinezM ApreuteseiGeert RampelbergChristophe DetavernierL Cunha

A1 Journal Article in VACUUM

2017

A new look on ALD vanadium oxides for 3D thin-film lithium-ion batteries

Felix MattelaerKobe GerylThomas DobbelaereGeert RampelbergJolien DendoovenChristophe Detavernier

ALD vanadium oxides for 3D thin-film lithium ion batteries

Felix MattelaerKobe GerylThomas DobbelaereGeert RampelbergJolien DendoovenChristophe Detavernier

Amorphous and crystalline vanadium oxides as high-energy and high-power cathodes for three-dimensional thin-film lithium ion batteries

Felix MattelaerKobe GerylGeert RampelbergJolien DendoovenChristophe Detavernier

A1 Journal Article in ACS APPLIED MATERIALS & INTERFACES

Conformal vanadium oxides beyond crystalline V2O5 as high energy density 3D thin-film electrodes for lithium-ion batteries

Felix MattelaerKobe GerylThomas DobbelaereGeert RampelbergJolien DendoovenChristophe Detavernier

Oxidation barrier for Cu and Fe powder by atomic layer deposition

Véronique CremersGeert RampelbergAhmed BarhoumPerry WaltersNathalie ClaesThais Milagres de OliveiraGuy Van AsscheSara BalsJolien DendoovenChristophe Detavernier

2016

Atomic layer deposition of vanadium oxides for thin-film lithium-ion battery applications

Felix MattelaerKobe GerylGeert RampelbergThomas DobbelaereJolien DendoovenChristophe Detavernier

A1 Journal Article in RSC ADVANCES

In situ electron paramagnetic resonance and X-ray diffraction monitoring of temperature-induced breathing and related structural transformations in activated V-doped MIL-53(Al)

Irena NevjesticHannes DepauwKaren LeusGeert RampelbergClaire MurrayChristophe DetavernierPascal Van Der VoortFreddy CallensHenk Vrielinck

A1 Journal Article in JOURNAL OF PHYSICAL CHEMISTRY C

Perpendicular magnetic anisotropy of Co\Pt bilayers on ALD HfO2

Bart F VermeulenJackson WuJohan SwertsSebastien CouetDimitri LintenIuliana P RaduKristiaan TemstGeert RampelbergChristophe DetavernierGuido Groeseneken et al.

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Plasma-enhanced ALD : a route to hydrophilic, glueable PTFE

Geert RampelbergAmit Kumar RoyJolien DendoovenDavy DeduytscheKilian Devloo-CasierKim RagaertLudwig CardonChristophe Detavernier

Plasma-enhanced ALD on particles and powders

Geert RampelbergDelphine LongrieDavy DeduytscheJohan HaemersChristophe Detavernier

Semiconductor-metal transition in ALD deposited vanadium oxide thin films and nanoparticles

Geert RampelbergBob De SchutterWouter DevulderMarc SchaekersKoen MartensChristian DussarratChristophe Detavernier

Thermal and plasma enhanced atomic layer deposition on powders and particles

Geert RampelbergVéronique CremersDelphine LongrieDavy DeduytscheJohan HaemersChristophe Detavernier

Thin film synthesis of VO2 and VN by gas-solid reactions and atomic layer deposition

Geert RampelbergChristophe Detavernier

2015

Improved thermal stability and retention properties of Cu-Te based CBRAM by Ge alloying

Wouter DevulderKarl OpsomerGeert RampelbergBob De SchutterKilian Devloo-CasierMalgorzata JurczakLudovic GouxChristophe Detavernier

A1 Journal Article in JOURNAL OF MATERIALS CHEMISTRY C

In situ X-ray diffraction study of the controlled oxidation and reduction in the V-O system for the synthesis of VO2 and V2O3 thin films

Geert RampelbergBob De SchutterWouter DevulderKoen MartensIuliana RaduChristophe Detavernier

A1 Journal Article in JOURNAL OF MATERIALS CHEMISTRY C

Metal-insulator transition in ALD VO2 ultrathin films and nanoparticles: morphological control

Anthony P PeterKoen MartensGeert RampelbergMichael ToellerJames M AblettJohan MeersschautDaniel CuypersAlexis FranquetChristophe DetavernierJean-Pascal Rueff et al.

A1 Journal Article in ADVANCED FUNCTIONAL MATERIALS

2014

Atomic layer deposition : a 3D surface engineering technique for nanomaterials

Geert RampelbergJolien DendoovenDavy DeduytscheChristophe Detavernier

Conformal nanocoatings for surface engineering of particles by thermal and plasma-enhanced atomic layer deposition using a rotary reactor

Geert RampelbergDelphine LongrieDavy DeduytscheJohan HaemersKris DriesenChristophe Detavernier

Crystallization and semiconductor-metal switching behavior of thin VO₂ layers grown by atomic layer deposition

Geert RampelbergDavy DeduytscheBob De SchutterPeter Antony PremkumarMichael ToellerMarc SchaekersKoen MartensIuliana RaduChristophe Detavernier

A1 Journal Article in THIN SOLID FILMS

Plasma enhanced atomic layer deposition on powders

Geert RampelbergDelphine LongrieDavy DeduytscheChristophe Detavernier

Plasma enhanced atomic layer deposition on powders

Geert RampelbergChristophe Detavernier

2013

Low temperature atomic layer deposition of platinum using (methylcyclopentadienyl)trimethylplatinum and ozone

Jolien DendoovenRanjith K RamanchandranKilian Devloo-CasierGeert RampelbergMatthias FilezHilde PoelmanGuy MarinEmiliano FondaChristophe Detavernier

A1 Journal Article in JOURNAL OF PHYSICAL CHEMISTRY C

Low temperature plasma-enhanced ALD of vanadium nitride as copper diffusion barrier

Geert RampelbergKilian Devloo-CasierDavy DeduytscheMarc SchaekersNicolas BlascoChristophe Detavernier

Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers

Geert RampelbergKilian Devloo-CasierDavy DeduytscheMarc SchaekersNicolas BlascoChristophe Detavernier

A1 Journal Article in APPLIED PHYSICS LETTERS

Optimizations of pulsed plated p and n-type Bi₂Te₃-based ternary compounds by annealing in different ambient atmospheres

Christian SchumacherKlaus G ReinsbergRaimar RostekLewis AkinsindeSvenja BaesslerSebastian ZastrowGeert RampelbergPeter WoiasChristophe DetavernierJose AC Broekaert et al.

A1 Journal Article in ADVANCED ENERGY MATERIALS

Partially fluorinated MIL-47 and Al-MIL-53 frameworks : influence of functionalization on sorption and breathing properties

Shyam Prosad BiswasTom RémySarah CouckDmitry DenysenkoGeert RampelbergJoeri FM DenayerDirk VolkmerChristophe DetavernierPascal Van Der Voort

A1 Journal Article in PHYSICAL CHEMISTRY CHEMICAL PHYSICS

Plasma-enhanced atomic layer deposition of thin vanadium nitride layers as a copper diffusion barrier

Geert RampelbergKilian Devloo-CasierDavy DeduytscheMarc SchaekersNicolas BlascoChristophe Detavernier

2012

Optimization of electrodeposited p-doped Sb₂Te₃ thermoelectric films by millisecond potentiostatic pulses

Christian SchumacherKlaus G ReinsbergLewis AkinsindeSebastian ZastrowSonja HeiderichWilliam ToellnerGeert RampelbergChristophe DetavernierJosé AC BroekaertKornelis Nielsch et al.

A1 Journal Article in ADVANCED ENERGY MATERIALS

Optimization of the annealing conditions for thin VO2 ALD films

Geert RampelbergMarc SchaekersDavy DeduytscheBob De SchutterJorge KittlChristophe Detavernier

Semiconductor-metal transition in thin VO2 films deposited by ozone based atomic layer deposition

Geert RampelbergMarc SchaekersKoen MartensQi XieDavy DeduytscheBob De SchutterNicolas BlascoJorge KittlChristophe Detavernier

Structural and kinetic study of the reduction of CuO-CeO2/Al2O3 by time-resolved X-ray diffraction

Vladimir GalvitaHilde PoelmanGuy MarinChristophe DetavernierGeert RampelbergBob De Schutter

A1 Journal Article in CATALYSIS LETTERS

2011

Interfacial reactions of Gd- and Nb-oxide based high-k layers deposited by aqueous chemical solution deposition

D DewulfN PeysS Van ElshochtGeert RampelbergChristophe DetavernierS De GendtA HardyMK Van Bael

A1 Journal Article in MICROELECTRONIC ENGINEERING

Semiconductor-metal transition in thin VO2 films grown by ozone based atomic layer deposition

Geert RampelbergMarc SchaekersKoen MartensQi XieDavy DeduytscheBob De SchutterNicolas BlascoJorge KittlChristophe Detavernier

Semiconductor-metal transition in thin VO2 films grown by ozone based atomic layer deposition

Geert RampelbergMarc SchaekersKoen MartensQi XieDavy DeduytscheBob De SchutterNicolas BlascoJorge KittlChristophe Detavernier

A1 Journal Article in APPLIED PHYSICS LETTERS

2009

Composition influence on the physical and electrical properties of SrxTi1-xOy-based metal-insulator-metal capacitors prepared by atomic layer deposition using TiN bottom electrodes

N MenouM PopoviciS ClimaK OpsomerW PolspoelB KaczerGeert RampelbergK TomidaMA PawlakChristophe Detavernier et al.

A1 Journal Article in JOURNAL OF APPLIED PHYSICS