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Researcher
Elisabeth Levrau
Profile
Projects
Publications
Activities
Awards & Distinctions
13
Results
2020
Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
Sofie Vandenbroucke
Elisabeth Levrau
Matthias Minjauw
Michiel Van Daele
Eduardo Solano Minuesa
Rita Vos
Jolien Dendooven
Christophe Detavernier
C3
Conference
2020
Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
Sofie Vandenbroucke
Elisabeth Levrau
Matthias Minjauw
Michiel Van Daele
Eduardo Solano Minuesa
Rita Vos
Jolien Dendooven
Christophe Detavernier
A1
Journal Article
in
PHYSICAL CHEMISTRY CHEMICAL PHYSICS
2020
2019
Surface reactions during thermal and plasma-enhanced atomic layer deposition of titanium dioxide films using tetrakis(dimethylamino)titanium
Sofie Vandenbroucke
Elisabeth Levrau
Matthias Minjauw
Kevin Van de Kerckhove
Kilian Devloo-Casier
Sreeprasanth Pulinthanathu Sree
Johan A Martens
Rita Vos
Karolien Jans
Jolien Dendooven
et al.
C3
Conference
2019
2015
Modification of ultra low-k dielectric films by O₂ and CO₂ plasmas
Teju Tunde Olawumi
Elisabeth Levrau
Mikhail Krishtab
Christophe Detavernier
Johann W Bartha
Kaidong Xu
Frederic Lazzarino
Mikhail R Baklanov
A1
Journal Article
in
ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY
2015
Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films
Yiting Sun
Elisabeth Levrau
Liping Zhang
Jef Geypen
Johan Meersschaut
Alexis Franquet
Quoc Le Le
Jean-François de Marneffe
Hugo Bender
Herbert Struyf
et al.
A1
Journal Article
in
MICROELECTRONIC ENGINEERING
2015
2014
In situ IR spectroscopic investigation of alumina ALD on porous silica films: thermal versus plasma-enhanced ALD
Elisabeth Levrau
Kevin Van de Kerckhove
Kilian Devloo-Casier
Sreeprasanth Pulinthanathu Sree
Johan A Martens
Christophe Detavernier
Jolien Dendooven
A1
Journal Article
in
JOURNAL OF PHYSICAL CHEMISTRY C
2014
2013
Atomic layer deposition of TiO₂ on surface modified nanoporous low-k films
Elisabeth Levrau
Kilian Devloo-Casier
Jolien Dendooven
Karl F Ludwig
Patrick Verdonck
Johan Meersschaut
Mikhail R Baklanov
Christophe Detavernier
A1
Journal Article
in
LANGMUIR
2013
Pore narrowing of mesoporous silica materials
Frederik Goethals
Elisabeth Levrau
Els De Canck
Mikhail R Baklanov
Christophe Detavernier
Isabel Van Driessche
Pascal Van Der Voort
A1
Journal Article
in
MATERIALS
2013
Sealed ultra low-k organosilica films with improved electrical, mechanical and chemical properties
Frederik Goethals
Elisabeth Levrau
Glenn Pollefeyt
Mikhail R Baklanov
Ivan Ciofi
Kris Vanstreels
Christophe Detavernier
Isabel Van Driessche
Pascal Van Der Voort
A1
Journal Article
in
JOURNAL OF MATERIALS CHEMISTRY C
2013
2012
In situ monitoring of atomic layer deposition in nanoporous thin films using ellipsometric porosimetry
Jolien Dendooven
Kilian Devloo-Casier
Elisabeth Levrau
Robbert Van Hove
Sreeprasanth Pulinthanathu Sree
Mikhail R Baklanov
Johan A Martens
Christophe Detavernier
A1
Journal Article
in
LANGMUIR
2012
Selective and reversible ammonia gas detection with nanoporous film functionalized silicon photonic micro-ring resonator
Nebiyu Adello Yebo
Sreeprasanth Pulinthanathu Sree
Elisabeth Levrau
Christophe Detavernier
Zeger Hens
Johan A Martens
Roel Baets
A1
Journal Article
in
OPTICS EXPRESS
2012
Tuning the pore size of ink-bottle mesopores by atomic layer deposition
Jolien Dendooven
Bart Goris
Kilian Devloo-Casier
Elisabeth Levrau
Ellen Biermans
Mikhail R Baklanov
Karl F Ludwig
Pascal Van Der Voort
Sara Bals
Christophe Detavernier
A1
Journal Article
in
CHEMISTRY OF MATERIALS
2012
2011
In situ x-ray characterization and electron tomography study of ALD coatings in mesoporous thin films
Jolien Dendooven
Ellen Biermans
Elisabeth Levrau
Kilian Devloo-Casier
Karl Ludwig
Pascal Van Der Voort
Sara Bals
Christophe Detavernier
C3
Conference
2011