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Researcher
Diederik Depla
Profile
Projects
Publications
Activities
Awards & Distinctions
294
Results
2025
A python-based approach to sputter deposition simulations in combinatorial materials science
F. Thelen
R. Zehl
J.L. Bürgel
Diederik Depla
A. Ludwig
A1
Journal Article
in
SURFACE & COATINGS TECHNOLOGY
2025
Convergence during feedback controlled reactive magnetron sputtering : mechanisms and classification
Josja Van Bever
Koen Strijckmans
S. Konstantinidis
Diederik Depla
A1
Journal Article
in
SURFACE & COATINGS TECHNOLOGY
2025
Impurity sources and incorporation pathways during sputter deposition of Mg and Al thin films
Shamsa Aliramaji
Philipp Keuter
Stanislav Mráz
Deborah Neuß
Marcus Hans
Daniel Primetzhofer
Diederik Depla
Jochen M. Schneider
U
Journal Article
in
Surface and Coatings Technology
2025
Industrial reactive sputter deposition of TiZrN coatings : the role of nitrogen partial pressure
Sahand Behrangi
Diederik Depla
Pavel Souček
Zsolt Czigány
Vilma Buršíková
Katalin Balázsi
Petr Vašina
A1
Journal Article
in
SURFACE & COATINGS TECHNOLOGY
2025
2024
Calculation of oxide sputter yields
Diederik Depla
Josja Van Bever
A1
Journal Article
in
VACUUM
2024
Floating potential probes for process control during reactive magnetron sputtering
Josja Van Bever
P. Vašina
R. Drevet
Koen Strijckmans
Diederik Depla
A2
Journal Article
in
SURFACE AND COATINGS TECHNOLOGY
2024
Note on the low deposition rate during reactive magnetron sputtering
Diederik Depla
A1
Journal Article
in
VACUUM
2024
PM2.5 and PM10 adsorption onto filters and surfaces functionalized with calcium carbonate particle assembly
Karaneh Eftekhari
Louis Van der Meeren
Diederik Depla
Bogdan Parakhonskiy
Andre Skirtach
A1
Journal Article
in
COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS
2024
Phase composition of sputter deposited tungsten thin films
Farzaneh Ahangarani Farahani
Diederik Depla
A1
Journal Article
in
SURFACE & COATINGS TECHNOLOGY
2024
Plasmonic effects in the neutralization of slow ions at a metallic surface
Marnik Bercx
Selma Mayda
Diederik Depla
Bart Partoens
Dirk Lamoen
A1
Journal Article
in
CONTRIBUTIONS TO PLASMA PHYSICS
2024
The measurement and impact of negative oxygen ions during reactive sputter deposition
Diederik Depla
A1
Journal Article
in
CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES
2024
2023
Analysis of stress in sputter-deposited films using a kinetic model for Cu, Ni, Co, Cr, Mo, W
Tong Su
Zhaoxia Rao
Sarah Berman
Diederik Depla
Eric Chason
A1
Journal Article
in
APPLIED SURFACE SCIENCE
2023
Cell behavior changes and enzymatic biodegradation of hybrid electrospun poly(3-hydroxybutyrate)-based scaffolds with an enhanced piezoresponse after the addition of reduced graphene oxide
Roman Chernozem
Igor Pariy
Maria A. A. Surmeneva
Vladimir V. V. Shvartsman
Guillaume Planckaert
Joost Verduijn
Stef Ghysels
Anatolii Abalymov
Bogdan Parakhonskiy
Eric Gracey
et al.
A1
Journal Article
in
ADVANCED HEALTHCARE MATERIALS
2023
Effect of growth temperature and atmosphere exposure time on impurity incorporation in sputtered Mg, Al, and Ca thin films
Shamsa Aliramaji
Philipp Keuter
Deborah Neuß
Marcus Hans
Daniel Primetzhofer
Diederik Depla
Jochen M. Schneider
A1
Journal Article
in
MATERIALS
2023
Influence of chemisorption on the double hysteresis phenomenon during reactive sputtering
Josja Van Bever
Koen Strijckmans
Diederik Depla
A1
Journal Article
in
APPLIED SURFACE SCIENCE
2023
Linking simulated polycrystalline thin film microstructures to physical vapor deposition conditions
Joseph M. Monti
James A. Stewart
Joyce O. Custer
David P. Adams
Diederik Depla
Rémi Dingreville
A1
Journal Article
in
ACTA MATERIALIA
2023
On the role of chemisorption in the formation of the target surface compound layer during reactive magnetron sputtering
Diederik Depla
A1
Journal Article
in
VACUUM
2023
2022
A computational study of the double hysteresis phenomenon during reactive sputtering
Josja Van Bever
Koen Strijckmans
Diederik Depla
A1
Journal Article
in
JOURNAL OF PHYSICS D-APPLIED PHYSICS
2022
Chemical stability of sputter deposited silver thin films
Diederik Depla
A1
Journal Article
in
COATINGS
2022
Effect of processing conditions on residual stress in sputtered transition metal nitrides (TiN, ZrN and TaN) : experiments and modeling
Zhaoxia Rao
Tong Su
Thomas Koenig
Gregory B. Thompson
Diederik Depla
Eric Chason
A1
Journal Article
in
SURFACE & COATINGS TECHNOLOGY
2022
2021
Influence of impurities on the front velocity of sputter deposited Al/CuO thermite multilayers
Dulmaa Altangerel
Diederik Depla
A1
Journal Article
in
MATERIALS
2021
Influence of the nitrogen content on the structure and properties of MoNbTaVW high entropy alloy thin films
Ao Xia
Robin Dedoncker
Oleksandr Glushko
Megan J. Cordill
Diederik Depla
Robert Franz
A1
Journal Article
in
JOURNAL OF ALLOYS AND COMPOUNDS
2021
Multilayer approach for low temperature sputter deposition
Dulmaa Altangerel
Diederik Depla
Raqchaa Galbadrakh
Dissertation
2021
Nitride formation during reactive sputter deposition of multi-principal element alloys in argon/nitrogen mixtures
Diederik Depla
Robin Dedoncker
Koen Strijckmans
A1
Journal Article
in
THIN SOLID FILMS
2021
On the grain size-thickness correlation for thin films
Dulmaa Altangerel
Florian Cougnon
Robin Dedoncker
Diederik Depla
A1
Journal Article
in
ACTA MATERIALIA
2021
Plasma-enhanced atomic layer deposition : correlating O2 plasma parameters and species to blister formation and conformal film growth
Andreas Werbrouck
Kevin Van de Kerckhove
Diederik Depla
Dirk Poelman
Philippe Smet
Jolien Dendooven
Christophe Detavernier
A1
Journal Article
in
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
2021
Sputter deposited metal layers embedded in composites : from fundamentals to applications
Florian Cougnon
Mathias Kersemans
Wim Van Paepegem
Diederik Depla
A1
Journal Article
in
COATINGS
2021
Sputter deposition with powder targets : an overview
Diederik Depla
A1
Journal Article
in
VACUUM
2021
The growth of a multi-principal element (CoCrFeMnNi) oxynitride film by direct current magnetron sputtering using air as reactive gas
G. Radnóczi
Robin Dedoncker
G.Z. Radnóczi
Zs. Czigány
A. Sulyok
V. Kovács-Kis
Diederik Depla
A1
Journal Article
in
SURFACE & COATINGS TECHNOLOGY
2021
Understanding residual stress in thin films : analyzing wafer curvature measurements for Ag, Cu, Ni, Fe, Ti, and Cr with a kinetic model
Zhaoxia Rao
Sarah Berman
Peilin Yang
Diederik Depla
Eric Chason
A1
Journal Article
in
JOURNAL OF APPLIED PHYSICS
2021
2020
Diazonium chemistry surface treatment of piezoelectric polyhydroxybutyrate scaffolds for enhanced osteoblastic cell growth
Roman Chernozem
O. Guselnikova
M. A. Surmeneva
P. S. Postnikov
Anatolii Abalymov
Bogdan Parakhonskiy
Nico De Roo
Diederik Depla
Andre Skirtach
R. A. Surmenev
A1
Journal Article
in
APPLIED MATERIALS TODAY
2020
Mechanical properties of CoCrCuFeNi multi-principal element alloy thin films on Kapton substrates
C. H. Li
Robin Dedoncker
L. W. Li
F. Sedghgooya
F. Zighem
V. Ji
Diederik Depla
P. Djemia
D. Faurie
A1
Journal Article
in
SURFACE & COATINGS TECHNOLOGY
2020
Sputter deposition on composites : interplay between film and substrate properties
Florian Cougnon
Diederik Depla
Wim Van Paepegem
Dissertation
2020
Sputter yield measurements to evaluate the target state during reactive magnetron sputtering
Roeland Schelfhout
Koen Strijckmans
Diederik Depla
A1
Journal Article
in
SURFACE & COATINGS TECHNOLOGY
2020
The role of reactive gases during sputter deposition of complex alloys
Robin Dedoncker
Diederik Depla
Dissertation
2020
2019
Modeling reactive magnetron sputtering : opportunities and challenges
Diederik Depla
Koen Strijckmans
Dulmaa Altangerel
Florian Cougnon
Robin Dedoncker
Roeland Schelfhout
Isabella Schramm
Filip Moens
Roger De Gryse
A1
Journal Article
in
THIN SOLID FILMS
2019
On the electrical properties of sputter deposited thin films : the role of energy and impurity flux
Florian Cougnon
Isabella Schramm
Diederik Depla
A1
Journal Article
in
THIN SOLID FILMS
2019
On the influence of local oxygen addition on the growth of sputter deposited yttrium oxide thin films
Jinjiao Xia
Wenping Liang
Qiang Miao
Diederik Depla
A1
Journal Article
in
SURFACE & COATINGS TECHNOLOGY
2019
On the microstructure of magnesium thin films deposited by magnetron sputtering
Filip Moens
Isabella Schramm
Stéphanos Konstantinidis
Diederik Depla
A1
Journal Article
in
THIN SOLID FILMS
2019
Reactive sputter deposition of CoCrCuFeNi in oxygen/argon mixtures
Robin Dedoncker
G. Radnóczi
G. Abadias
Diederik Depla
A1
Journal Article
in
SURFACE & COATINGS TECHNOLOGY
2019
Sputter deposition of copper oxide films
Dulmaa Altangerel
Henk Vrielinck
Samira Khelifi
Diederik Depla
A1
Journal Article
in
APPLIED SURFACE SCIENCE
2019
Sputter deposition of porous thin films from metal/NaCl powder targets
Robin Dedoncker
Hannes Rijckaert
Diederik Depla
A1
Journal Article
in
APPLIED PHYSICS LETTERS
2019
The Seebeck coefficient of sputter deposited metallic thin films : the role of process conditions
Florian Cougnon
Diederik Depla
A1
Journal Article
in
COATINGS
2019
2018
An X-ray photoelectron spectroscopy study of the target surface composition after reactive magnetron sputtering
Roeland Schelfhout
Koen Strijckmans
Diederik Depla
A1
Journal Article
in
SURFACE & COATINGS TECHNOLOGY
2018
Anomalous effects in the aluminum oxide sputtering yield
Roeland Schelfhout
Koen Strijckmans
Diederik Depla
A1
Journal Article
in
JOURNAL OF PHYSICS D-APPLIED PHYSICS
2018
Development of a new generation of embedded sensors for monitoring structural composites
Alfredo Lamberti
Ang Feng
Florian Cougnon
Jeroen Missinne
Diederik Depla
Wim Van Paepegem
C1
Conference
2018
Impurity controlled thin film growth
Florian Cougnon
Dulmaa Altangerel
Robin Dedoncker
R Galbadrakh
Diederik Depla
A4
Journal Article
in
BELVAC NEWS
2018
Impurity dominated thin film growth
Florian Cougnon
Dulmaa Altangerel
Robin Dedoncker
R Galbadrakh
Diederik Depla
A1
Journal Article
in
APPLIED PHYSICS LETTERS
2018
Reactive sputter deposition of CoCrCuFeNi in nitrogen/argon mixtures
Robin Dedoncker
Ph Djemia
G Radnóczi
F Tétard
L Belliard
G Abadias
N Martin
Diederik Depla
A1
Journal Article
in
JOURNAL OF ALLOYS AND COMPOUNDS
2018
The (in)stability of process control mechanisms in reactive DC sputtering deposition
Koen Strijckmans
Roeland Schelfhout
Diederik Depla
C3
Conference
2018
The effect of energy and momentum transfer during magnetron sputter deposition of yttrium oxide thin films
Jinjiao Xia
Wenping Liang
Qiang Miao
Diederik Depla
A1
Journal Article
in
APPLIED SURFACE SCIENCE
2018
Tutorial: Hysteresis during the reactive magnetron sputtering process
Koen Strijckmans
Roeland Schelfhout
Diederik Depla
A1
Journal Article
in
JOURNAL OF APPLIED PHYSICS
2018
2017
Effect of space charge on the negative oxygen flux during reactive sputtering
Filip Moens
T Kalvas
Sigelinde Van Steenberge
Diederik Depla
A1
Journal Article
in
JOURNAL OF PHYSICS D-APPLIED PHYSICS
2017
Highlights in modeling the reactive magnetron sputtering process
Koen Strijckmans
Roeland Schelfhout
Florian Cougnon
Diederik Depla
C3
Conference
2017
Hydroxyapatite-based coatings deposited by radio frequency magnetron sputtering
Anna Ivanova
Roman Surmenev
Diederik Depla
Dissertation
2017
Impurity-controlled film growth and elastic properties of CoCrCuFeNi thin films
Bert Braeckman
P Djemia
F Tétard
L Belliard
Diederik Depla
A1
Journal Article
in
SURFACE & COATINGS TECHNOLOGY
2017
On the cause of a double hysteresis during reactive magnetron sputtering
Koen Strijckmans
Roeland Schelfhout
Diederik Depla
C3
Conference
2017
Perspective: Is there a hysteresis during reactive High Power Impulse Magnetron Sputtering (R-HiPIMS)?
Koen Strijckmans
Filip Moens
Diederik Depla
A1
Journal Article
in
JOURNAL OF APPLIED PHYSICS
2017
Reactive (HiPIMS) through the eyes of a 'simple' model
Koen Strijckmans
Roeland Schelfhout
Filip Moens
Diederik Depla
C3
Conference
2017
Structural evolution and growth mechanisms of RF-magnetron sputter-deposited hydroxyapatite thin films on the basis of unified principles
Anna A Ivanova
Maria A Surmeneva
Roman A Surmenev
Diederik Depla
A1
Journal Article
in
APPLIED SURFACE SCIENCE
2017
The nanostructure and mechanical properties of nanocomposite Nbx-CoCrCuFeNi thin films
Bert Braeckman
F Misják
G Radnóczi
M Caplovicová
Ph Djemia
F Tétard
L Belliard
Diederik Depla
A1
Journal Article
in
SCRIPTA MATERIALIA
2017
The target material influence on the current pulse during high power pulsed magnetron sputtering
Filip Moens
Stéphanos Konstantinidis
Diederik Depla
A1
Journal Article
in
FRONTIERS IN PHYSICS
2017
2016
A modelling view on the existence of hysteresis during reactive HiPIMS
Koen Strijckmans
Diederik Depla
C3
Conference
2016
Finite element modelling of the ionic conductivity of acceptor doped ceria
Dries Van Laethem
Johan Deconinck
Diederik Depla
Annick Hubin
A1
Journal Article
in
JOURNAL OF THE EUROPEAN CERAMIC SOCIETY
2016
How the process pressure influences the microstructure of YSZ thin films?
Diederik Depla
Aurélien Besnard
Jérika Lamas
A4
Journal Article
in
BELVAC NEWS
2016
Hysteresis behavior during facing target magnetron sputtering
Florian Cougnon
Koen Strijckmans
Roeland Schelfhout
Diederik Depla
A1
Journal Article
in
SURFACE & COATINGS TECHNOLOGY
2016
On the amorphous nature of sputtered thin film alloys
Bert Braeckman
Diederik Depla
A1
Journal Article
in
ACTA MATERIALIA
2016
Quantitative correlation between intrinsic stress and microstructure of thin films
Diederik Depla
Bert Braeckman
A1
Journal Article
in
THIN SOLID FILMS
2016
Sputter deposition of Ce(Sm,Y)O2 thin films : linking phase instability to grain size
Sigelinde Van Steenberge
Diederik Depla
A1
Journal Article
in
JOURNAL OF PHYSICS D-APPLIED PHYSICS
2016
Sputter deposition of complex alloy thin films
Bert Braeckman
Diederik Depla
Dissertation
2016
The existence of a double S-shaped process curve during reactive magnetron sputtering
Roeland Schelfhout
Koen Strijckmans
Diederik Depla
A1
Journal Article
in
APPLIED PHYSICS LETTERS
2016
The influence of Ge and In addition on the phase formation of CoCrCuFeNi high-entropy alloy thin films
Bert Braeckman
F Misják
G Radnóczi
Diederik Depla
A1
Journal Article
in
THIN SOLID FILMS
2016
The influence of the pressure on the microstructure of yttria-stabilized zirconia thin films deposited by dual magnetron sputtering
Diederik Depla
A Besnard
Jérika Lamas
A1
Journal Article
in
VACUUM
2016
2015
Bio-based nitriles from the heterogeneously catalyzed oxidative decarboxylation of amino acids
Laurens Claes
Roman Matthessen
Ine Rombouts
Ivo Stassen
Trees De Baerdemaeker
Diederik Depla
Jan A Delcour
Bert Lagrain
Dirk E De Vos
A1
Journal Article
in
CHEMSUSCHEM
2015
High entropy alloy thin films deposited by magnetron sputtering of powder targets
Bert Braeckman
Francis Boydens
H Hidalgo
P Dutheil
M Jullien
A-L Thomann
Diederik Depla
A1
Journal Article
in
THIN SOLID FILMS
2015
Highlights in modeling the reactive magnetron sputtering process with RSD2013
Koen Strijckmans
Roeland Schelfhout
Florian Cougnon
Diederik Depla
C3
Conference
2015
Hydrogenated dimer acid as a corrosion inhibitor for lead metal substrates in acetic acid
Michel De Keersmaecker
Otto van den Berg
Kim Verbeken
Diederik Depla
Mieke Adriaens
A1
Journal Article
in
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
2015
Influence of deposition conditions on the composition, texture and microstructure of RF-magnetron sputter-deposited hydroxyapatite thin films
Anna Ivanova
MA Surmeneva
RA Surmenev
Diederik Depla
A1
Journal Article
in
THIN SOLID FILMS
2015
Modeling target erosion during reactive sputtering
Koen Strijckmans
Diederik Depla
A1
Journal Article
in
APPLIED SURFACE SCIENCE
2015
Modeling the reactive magnetron sputtering process
Koen Strijckmans
Diederik Depla
Dissertation
2015
On the target surface cleanness during magnetron sputtering
Roeland Schelfhout
Diederik Depla
C3
Conference
2015
On the target surface cleanness during magnetron sputtering
Roeland Schelfhout
Koen Strijckmans
Francis Boydens
Diederik Depla
A1
Journal Article
in
APPLIED SURFACE SCIENCE
2015
Structure formation and properties of sputter deposited Nbx-CoCrCuFeNi high entropy alloy thin films
Bert Braeckman
Diederik Depla
A1
Journal Article
in
JOURNAL OF ALLOYS AND COMPOUNDS
2015
Study on reactive sputtering of yttrium oxide: process and thin film properties
Pei Lei
Wouter Leroy
Bing Dai
Jiaqi Zhu
Xiaoting Chen
Jiecai Han
Diederik Depla
A1
Journal Article
in
SURFACE & COATINGS TECHNOLOGY
2015
2014
A time-dependent model for reactive sputter deposition
Koen Strijckmans
Diederik Depla
A1
Journal Article
in
JOURNAL OF PHYSICS D-APPLIED PHYSICS
2014
Base catalytic activity of alkaline earth MOFs: a (micro)spectroscopic study of active site formation by the controlled transformation of structural anions
P Valvekens
D Jonckheere
T De Baerdemaeker
AV Kubarev
Matthias Vandichel
Karen Hemelsoet
Michel Waroquier
Veronique Van Speybroeck
E Smolders
Diederik Depla
et al.
A1
Journal Article
in
CHEMICAL SCIENCE
2014
Dual magnetron sputter deposition of yttria-stabilized zirconia thin films
Jérika Lamas
Diederik Depla
Dissertation
2014
Electrochemical and surface study of neutralized dodecanoic acid on a lead substrate
Michel De Keersmaecker
Diederik Depla
Kim Verbeken
Mieke Adriaens
A1
Journal Article
in
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
2014
Influence of oxygen flow and film thickness on the texture and microstructure of sputtered ceria thin films
Sigelinde Van Steenberge
Wouter Leroy
Diederik Depla
A1
Journal Article
in
THIN SOLID FILMS
2014
Influence of the target-substrate distance on the growth of YSZ thin films
Jérika Lamas
Wouter Leroy
Diederik Depla
A1
Journal Article
in
SURFACE & COATINGS TECHNOLOGY
2014
Kristallen verhelderd
Book editor
2014
Momentum transfer driven textural changes of CeO2 thin films
Sigelinde Van Steenberge
Wouter Leroy
A Hubin
Diederik Depla
A1
Journal Article
in
APPLIED PHYSICS LETTERS
2014
On the effective sputter yield during magnetron sputter deposition
Diederik Depla
A1
Journal Article
in
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
2014
The effect of negative oxygen ions on the growth of sputter deposited ceria thin films
Sigelinde Van Steenberge
Wouter Leroy
Diederik Depla
C3
Conference
2014
The modelling of the reactive magnetron sputter process by RSD2013
Koen Strijckmans
Diederik Depla
C3
Conference
2014
The protective behavior of organic coatings containing carboxylic functional groups on lead metal substrates
Michel De Keersmaecker
Otto van den Berg
Tom Hauffman
Diederik Depla
Kim Verbeken
Filip Du Prez
Annick Hubin
Mieke Adriaens
C3
Conference
2014
The protective behavior of organic coatings containing carboxylic functional groups on lead metal substrates
Michel De Keersmaecker
Otto van den Berg
Tom Hauffman
Diederik Depla
Kim Verbeken
Filip Du Prez
Annick Hubin
Mieke Adriaens
C3
Conference
2014
The reactive sputter model RSD2013
Koen Strijckmans
Diederik Depla
C3
Conference
2014
The role of the erosion groove during reactive sputter deposition
Diederik Depla
Koen Strijckmans
Roger De Gryse
A1
Journal Article
in
SURFACE & COATINGS TECHNOLOGY
2014
Using the macroscopic scale to predict the nano-scale behavior of YSZ thin films
Jérika Lamas
Wouter Leroy
Y-G Lu
J Verbeeck
G Van Tendeloo
Diederik Depla
A1
Journal Article
in
SURFACE & COATINGS TECHNOLOGY
2014
2013
A growth model for sputter deposited ceria thin films
Sigelinde Van Steenberge
Wouter Leroy
Diederik Depla
C3
Conference
2013
A study of the process pressure influence in reactive sputtering aiming at hysteresis elimination
E Sarhammar
Koen Strijckmans
T Nyberg
Sigelinde Van Steenberge
S Berg
Diederik Depla
A1
Journal Article
in
SURFACE & COATINGS TECHNOLOGY
2013
How does redeposition influence reactive sputtering?
Koen Strijckmans
Wouter Leroy
Diederik Depla
C3
Conference
2013
Influence of Al doping on the bandgap of TiOx
Bert Braeckman
Francis Boydens
Diederik Depla
A4
Journal Article
in
BELVAC NEWS
2013
Influence of particle and energy flux on stress and texture development in magnetron sputtered TiN films
Grégory Abadias
Wouter Leroy
Stijn Mahieu
Diederik Depla
A1
Journal Article
in
JOURNAL OF PHYSICS D-APPLIED PHYSICS
2013
Influencing the hysteresis during reactive magnetron sputtering by gas separation
Diederik Depla
Johan Haemers
Roger De Gryse
A1
Journal Article
in
SURFACE & COATINGS TECHNOLOGY
2013
Key aspects of sputtering illustrated by the use of multi-element powder mixtures
Francis Boydens
Diederik Depla
Dissertation
2013
Linking functional properties of transition metals to growth parameters
Wouter Leroy
Diederik Depla
C3
Conference
2013
Magnetrons, reactive gases and sputtering
Diederik Depla
Book
2013
Reactive sputter deposition of Al doped TiOx thin films using titanium targets with aluminium inserts
Bert Braeckman
Francis Boydens
Diederik Depla
Dirk Poelman
A1
Journal Article
in
JOURNAL OF ALLOYS AND COMPOUNDS
2013
The influence of target surface morphology on the deposition flux during direct-current magnetron sputtering
Francis Boydens
Wouter Leroy
Rosita Persoons
Diederik Depla
A1
Journal Article
in
THIN SOLID FILMS
2013
Yttria-stabilized zirconia thin films as oxygen ion conductor for solid oxide fuel cells
Jérika Lamas
Wouter Leroy
Diederik Depla
C3
Conference
2013
2012
A dynamic simulation tool for reactive sputtering
Koen Strijckmans
Wouter Leroy
Diederik Depla
C3
Conference
2012
Adsorption of cobalt (II) 5,10,15,20-tetrakis(2-aminophenyl)-porphyrin onto copper substrates: characterization and impedance studies for corrosion inhibition
Koodlur Sannegowda Lokesh
Michel De Keersmaecker
Alice Elia
Diederik Depla
Peter Dubruel
Peter Vandenabeele
Sandra Van Vlierberghe
Mieke Adriaens
A1
Journal Article
in
CORROSION SCIENCE
2012
Angle-resolved energy flux measurements of a HIPIMS-powered rotating cylindrical magnetron in reactive and nonreactive atmosphere
Stephanos Konstantinidis
Wouter Leroy
Rony Snyders
Diederik Depla
C3
Conference
2012
Composition-crystallinity-property relations in Mg-M-O films
Marta Martins Saraiva
R Persoons
Diederik Depla
A1
Journal Article
in
JOURNAL OF APPLIED PHYSICS
2012
Deposition of thin films by sputtering cold isostatically pressed powder targets: a case study
Francis Boydens
Wouter Leroy
Rosita Persoons
Diederik Depla
A1
Journal Article
in
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE
2012
Indium iron tin oxide: a cheap solution for ITO?
Francis Boydens
Guido Huyberechts
Tom De Geyter
Diederik Depla
C3
Conference
2012
Influence of target-substrate distance and composition on the preferential orientation of yttria-stabilized zirconia thin films
Jérika Lamas
Wouter Leroy
Diederik Depla
A1
Journal Article
in
THIN SOLID FILMS
2012
Linking functional properties of transition metals to growth parameters
Wouter Leroy
Diederik Depla
C3
Conference
2012
Magnetron sputter deposition as visualized by Monte Carlo modeling
Diederik Depla
Wouter Leroy
A1
Journal Article
in
THIN SOLID FILMS
2012
Modeling reactive magnetron sputtering: fixing the parameter set
Koen Strijckmans
Wouter Leroy
Roger De Gryse
Diederik Depla
A1
Journal Article
in
SURFACE & COATINGS TECHNOLOGY
2012
Modeling the time dependency of the reactive sputter process
Koen Strijckmans
Wouter Leroy
Diederik Depla
C3
Conference
2012
Nanostructured thin films for solid oxide fuel cells: crystallographic properties
Jérika Lamas
Wouter Leroy
Diederik Depla
C3
Conference
2012
Nanostructured thin films of yttria-stabilized zirconia
Jérika Lamas
Wouter Leroy
Diederik Depla
C3
Conference
2012
Sputter deposition of MgO thin films: the effect of cation substitution
Marta Martins Saraiva
Diederik Depla
Dissertation
2012
Sputter deposition of MgxAlyOz thin films in a dual-magnetron device: a multi-species Monte Carlo model
M Yusupov
Marta Martins Saraiva
Diederik Depla
A Bogaerts
A1
Journal Article
in
NEW JOURNAL OF PHYSICS
2012
Synthesis, characterization and sorption properties of NH₂-MIL-47
Karen Leus
Sarah Couck
Matthias Vandichel
Gauthier Vanhaelewyn
Ying-Ya Liu
Guy Marin
Isabel Van Driessche
Diederik Depla
Michel Waroquier
Veronique Van Speybroeck
et al.
A1
Journal Article
in
PHYSICAL CHEMISTRY CHEMICAL PHYSICS
2012
Synthesis, crystal structures, and luminescence properties of carboxylate based rare-earth coordination polymers
Roel Decadt
Kristof Van Hecke
Diederik Depla
Karen Leus
David Weinberger
Isabel Van Driessche
Pascal Van Der Voort
Rik Van Deun
A1
Journal Article
in
INORGANIC CHEMISTRY
2012
Synthesis, structure and luminescence of novel lanthanide containing coordination polymers
Roel Decadt
Diederik Depla
Kristof Van Hecke
Rik Van Deun
C3
Conference
2012
Texture and microstructure in co-sputtered Mg-M-O (M = Mg, Al, Cr, Ti, Zr, and Y) films
Marta Martins Saraiva
Diederik Depla
A1
Journal Article
in
JOURNAL OF APPLIED PHYSICS
2012
The fictional transition of the preferential orientation of yttria-stabilized zirconia thin films
Jérika Lamas
Wouter Leroy
Diederik Depla
A1
Journal Article
in
THIN SOLID FILMS
2012
The route to heaven for sputter deposited AZO
Diederik Depla
Marta Martins Saraiva
C3
Conference
2012
Thirty years of rotatable magnetrons
Roger De Gryse
Johan Haemers
Wouter Leroy
Diederik Depla
A1
Journal Article
in
THIN SOLID FILMS
2012
Understanding the growth of doped CeO2
Sigelinde Van Steenberge
Wouter Leroy
Diederik Depla
C3
Conference
2012
Understanding the growth of doped ceria thin films
Sigelinde Van Steenberge
Wouter Leroy
Diederik Depla
C3
Conference
2012
2011
A two-dimensional view on the preferential orientation of Yttria-Stabilized zirconia thin films
Jérika Lamas
Wouter Leroy
Diederik Depla
C3
Conference
2011
Angular-resolved energy flux measurements of a dc- and HIPIMS-powered rotating cylindrical magnetron in reactive and non-reactive atmosphere
Wouter Leroy
Stephanos Konstantinidis
Stijn Mahieu
Rony Snyders
Diederik Depla
A1
Journal Article
in
JOURNAL OF PHYSICS D-APPLIED PHYSICS
2011
Behavior of electrons in a dual-magnetron sputter deposition system: a Monte Carlo model
M Yusupov
E Bultinck
Diederik Depla
A Bogaerts
A1
Journal Article
in
NEW JOURNAL OF PHYSICS
2011
Compositional effects on the growth of Mg(M)O films (vol 107, 034902, 2010)
Marta Martins Saraiva
Violeta Georgieva
Stijn Mahieu
Koen Van Aeken
Annemie Bogaerts
Diederik Depla
Correction
2011
Depositie van complexe materialen
Diederik Depla
Wouter Leroy
Editorial material
2011
Elucidating the asymmetric behavior of the discharge in a dual magnetron sputter deposition system
M Yusupov
E Bultinck
Diederik Depla
A Bogaerts
A1
Journal Article
in
APPLIED PHYSICS LETTERS
2011
Extracting organic contaminants from water using the metal-organic framework Cr-III(OH)center dot{O2C-C6H4-CO2}
Michael Maes
Stijn Schouteden
Luc Alaerts
Diederik Depla
Dirk E De Vos
A1
Journal Article
in
PHYSICAL CHEMISTRY CHEMICAL PHYSICS
2011
Field-enhanced electron capture by iron impurities in germanium
Johan Lauwaert
Siegfried Segers
Eddy Simoen
Diederik Depla
Jan Vanhellemont
Paul Clauws
Freddy Callens
Henk Vrielinck
C3
Conference
2011
Fundamental aspects of home made targets for magnetron sputtering
Francis Boydens
Wouter Leroy
Rosita Persoons
Diederik Depla
C3
Conference
2011
Fundamental aspects of mixed oxide thin film growth
Marta Martins Saraiva
V Georgieva
N Jehanathan
Stijn Mahieu
Wouter Leroy
R Persoons
G Van Tendeloo
A Bogaerts
Diederik Depla
C3
Conference
2011
In search for the ultimate model parameters of reactive magnetron sputtering
Koen Strijckmans
Wouter Leroy
Diederik Depla
C3
Conference
2011
Reactive sputtering in 5D
Koen Strijckmans
Wouter Leroy
Diederik Depla
C3
Conference
2011
Rotatable magnetron sputtering: downscaling for better understanding
Roger De Gryse
Diederik Depla
Stijn Mahieu
Johan Haemers
A1
Journal Article
in
MATERIALS TECHNOLOGY
2011
Smart textiles: an explorative study of the use of magnetron sputter deposition
Diederik Depla
Siegfried Segers
Wouter Leroy
Tom Van Hove
Marc Van Parys
A1
Journal Article
in
TEXTILE RESEARCH JOURNAL
2011
Sputter deposited transition metal nitrides as back electrode for CIGS solar cells
Stijn Mahieu
Wouter Leroy
Koen Van Aeken
M Wolter
J Colaux
S Lucas
G Abadias
Paul Matthys
Diederik Depla
A1
Journal Article
in
SOLAR ENERGY
2011
Sputter deposited transition metal nitrides as back electrode for CIGS solar cells
Wouter Leroy
Stijn Mahieu
Diederik Depla
C3
Conference
2011
The energy and particle fluxes during the growth of multifunctional ZrN thin films deposited by reactive magnetron sputtering
Wouter Leroy
Diederik Depla
C3
Conference
2011
The influence of Cr and Y on the micro structural evolution of Mg―Cr―O and Mg-Y-O thin films
N Jehanathan
V Georgieva
Marta Martins Saraiva
Diederik Depla
A Bogaerts
G Van Tendeloo
A1
Journal Article
in
THIN SOLID FILMS
2011
2010
An in-situ monitor to measure the momentum flux during physical vapour deposition
Stijn Mahieu
Diederik Depla
A1
Journal Article
in
SURFACE & COATINGS TECHNOLOGY
2010
Analysis of the behaviour of the reactive species in reactive magnetron sputtering of oxides
Wouter Leroy
Stijn Mahieu
Rosita Persoons
Diederik Depla
C3
Conference
2010
Compositional effects on the growth of Mg(M)O films
Marta Martins Saraiva
Violeta Georgieva
Stijn Mahieu
Koen Van Aeken
Annemie Bogaerts
Diederik Depla
A1
Journal Article
in
JOURNAL OF APPLIED PHYSICS
2010
Experimental determination and simulation of the angular distribution of the metal flux during magnetron sputter deposition
Max Horkel
Koen Van Aeken
Christophe Eisenmenger-Sittner
Diederik Depla
Stijn Mahieu
Wouter Leroy
A1
Journal Article
in
JOURNAL OF PHYSICS D-APPLIED PHYSICS
2010
Fixing the parameter set for reactive sputtering modelling
Koen Strijckmans
Wouter Leroy
Anemie Bogaerts
Diederik Depla
C3
Conference
2010
High power impulse magnetron sputtering using a rotating cylindrical magnetron
Wouter Leroy
Arutiun Ehiasarian
Stijn Mahieu
Diederik Depla
A1
Journal Article
in
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
2010
In search for the limits of rotating cylindrical magnetron sputtering
Wouter Leroy
Stijn Mahieu
Roger De Gryse
Diederik Depla
C3
Conference
2010
Influence of the magnetic field configuration on the reactive sputter deposition of TiN
Francis Boydens
Stijn Mahieu
Johan Haemers
Diederik Depla
A1
Journal Article
in
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE
2010
Powder mixtures as deposition targets for multicomponent thin films: a case study
Francis Boydens
Wouter Leroy
Diederik Depla
C3
Conference
2010
Powder mixtures as deposition targets for multicomponent thin films: a case study
Francis Boydens
Wouter Leroy
Diederik Depla
C3
Conference
2010
Putting a rotatable magnetron to the test with high power impulse magnetron sputtering
Wouter Leroy
Stijn Mahieu
Diederik Depla
Arutiun Ehiasarian
A4
Journal Article
in
BELVAC NEWS
2010
Rotating cylindrical magnetron sputtering: simulation of the reactive process
Diederik Depla
Xiuyang Li
Stijn Mahieu
Koen Van Aeken
Wouter Leroy
Johan Haemers
Roger De Gryse
Annemie Bogaerts
A1
Journal Article
in
JOURNAL OF APPLIED PHYSICS
2010
Simulation of an Ar/O2 magnetron discharge in single and dual configurations with a hybrid model
M Yusupov
E Bultinck
Marta Martins Saraiva
Wouter Leroy
Diederik Depla
A Bogaerts
C3
Conference
2010
Sputter deposition processes
Diederik Depla
Stijn Mahieu
Joseph Greene
Bookchapter
in
Handbook of deposition technologies for films and coatings : science, applications and technology
2010
The origin of Bohm diffusion, investigated by a comparison of different modelling methods
Evi Bultinck
Stijn Mahieu
Diederik Depla
Annemie Bogaerts
A1
Journal Article
in
JOURNAL OF PHYSICS D-APPLIED PHYSICS
2010
2009
Computer modelling of magnetron discharges
Annemie Bogaerts
Evi Bultinck
Ivan Kolev
Laurent Schwaederlé
Koen Van Aeken
Guy Buyle
Diederik Depla
A1
Journal Article
in
JOURNAL OF PHYSICS D-APPLIED PHYSICS
2009
Influence of Al content on the properties of MgO grown by reactive magnetron sputtering
Marta Martins Saraiva
Chen Hong
Wouter Leroy
Stijn Mahieu
Neerushana Jehanathan
Oleg Lebedev
Violetta Georgieva
Rosita Persoons
Diederik Depla
A1
Journal Article
in
PLASMA PROCESSES AND POLYMERS
2009
Influence of the target composition on reactively sputtered titanium oxide films
Tomas Kubart
J Jensen
Tomas Nyberg
L Liljeholm
Diederik Depla
Sören Berg
A1
Journal Article
in
VACUUM
2009
Investigation of the O- ion emission during reactive magnetron sputtering
Stijn Mahieu
Wouter Leroy
Diederik Depla
C3
Conference
2009
Linking reactive sputtering models to experimental reality by determining the real-time parameters
Wouter Leroy
Koen Van Aeken
Koen Strijckmans
Stijn Mahieu
Rosita Persoons
Diederik Depla
C3
Conference
2009
Linking reactive sputtering models to experimental reality by determining the real-time parameters
Wouter Leroy
Koen Van Aeken
Koen Strijckmans
Stijn Mahieu
Rosita Persoons
Diederik Depla
C3
Conference
2009
Magnetron sputter depositie van dunne filmen
Diederik Depla
Stijn Mahieu
Wouter Leroy
Bookchapter
in
Micro, macro, mega : collectie Ocsinberg, keerpunt in de geschiedenis van de microscopie
2009
Magnetron sputter deposition: linking discharge voltage with target properties
Diederik Depla
Stijn Mahieu
Roger De Gryse
A1
Journal Article
in
THIN SOLID FILMS
2009
Method to determine the sticking coefficient of O₂ on deposited Al during reactive magnetron sputtering, using mass spectrometry
Wouter Leroy
Stijn Mahieu
Rosita Persoons
Diederik Depla
A1
Journal Article
in
PLASMA PROCESSES AND POLYMERS
2009
Modeling the flux of high energy negative ions during reactive magnetron sputtering
Stijn Mahieu
Wouter Leroy
Koen Van Aeken
Diederik Depla
A1
Journal Article
in
JOURNAL OF APPLIED PHYSICS
2009
Particle-in-cell/Monte Carlo collisions model for the reactive sputter deposition of nitride layers
Evi Bultinck
Stijn Mahieu
Diederik Depla
Annemie Bogaerts
A1
Journal Article
in
PLASMA PROCESSES AND POLYMERS
2009
Quantification of the incorporation coefficient of a reactive gas on a metallic film during magnetron sputtering : the method and results
Wouter Leroy
Stijn Mahieu
Rosita Persoons
Diederik Depla
C3
Conference
2009
Quantification of the incorporation coefficient of a reactive gas on a metallic film during magnetron sputtering: the method and results
Wouter Leroy
Stijn Mahieu
Rosita Persoons
Diederik Depla
A1
Journal Article
in
THIN SOLID FILMS
2009
Reactive sputter deposition of TiN layers: modelling the growth by characterization of particle fluxes towards the substrate
Stijn Mahieu
Diederik Depla
A1
Journal Article
in
JOURNAL OF PHYSICS D-APPLIED PHYSICS
2009
Reactive sputter deposition of TiNx films, simulated with a particle-in-cell/Monte Carlo collisions model
Evi Bultinck
Stijn Mahieu
Diederik Depla
Annemie Bogaerts
A1
Journal Article
in
New Journal of Physics
2009
Romatex: draaibaar magnetron-sputtertechnologie voor het aanbrengen van anorganische, inclusief metallische nanocoationgs op textieldragers
Marc Van Parys
Tom Van Hove
Diederik Depla
Stijn Mahieu
Ben Minnaert
A4
Journal Article
in
UNITEX. TWEEMAANDELIJKS TIJDSCHRIFT VOOR DE TEXTIELINDUSTRIE
2009
Sputter-deposited Mg-Al-O thin films: linking molecular dynamics simulations to experiments
Violeta Georgieva
Marta Martins Saraiva
Neeru Jehanathan
Oleg Lebelev
Diederik Depla
Annemie Bogaerts
A1
Journal Article
in
Journal of Physics D: Applied Physics
2009
Using Mass Spectrometry to gather some insights in the fundamentals if the reactive magnetron sputtering process of Al with O2
Wouter Leroy
Stijn Mahieu
Rosita Persoons
Diederik Depla
A4
Journal Article
in
Nevac Blad
2009
2008
Characterization of Mg-Al oxides grown by reactive magnetron sputtering
Marta Martins Saraiva
Stijn Mahieu
Wouter Leroy
Rosita Persoons
Diederik Depla
C3
Conference
2008
Characterization of MgxAlyOz thin films grown by reactive magnetron sputtering
Marta Martins Saraiva
Hong Chen
Wouter Leroy
Stijn Mahieu
Neeru Jehanathan
Oleg Lebedev
Violetta Georgieva
Rosita Persoons
Diederik Depla
C3
Conference
2008
Characterization of the hardness and the substrate fluxes during reactive magnetron sputtering of TiN
Stijn Mahieu
Diederik Depla
Roger De Gryse
A1
Journal Article
in
SURFACE & COATINGS TECHNOLOGY
2008
Cobalt thin films on gold : a new reference material for the quantification of cobalt phthalocyanine and cobalt porphyrin modified gold electrodes with synchrotron radiation micro X-ray fluorescence spectroscopy
Mieke Adriaens
Karolien De Wael
David Bogaert
Hans Buschop
Tom Schoonjans
Bart Vekemans
Diederik Depla
Laszlo Vincze
A1
Journal Article
in
SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY
2008
Dependence of the sticking coefficient of sputtered atoms on the target-substrate distance
Stijn Mahieu
Koen Van Aeken
Diederik Depla
D SMEETS
A VANTOMME
A1
Journal Article
in
JOURNAL OF PHYSICS D-APPLIED PHYSICS
2008
Depositie van deklagen met magnetron sputteren
Diederik Depla
Stijn Mahieu
A4
Journal Article
in
VOM
2008
Depositing Aluminium Oxide: a case study of recative magnetron sputtering
Diederik Depla
Stijn Mahieu
Roger De Gryse
Bookchapter
in
Reactive Sputter Deposition
2008
Determination of the effective electron emission yields of compound materials
Diederik Depla
XY Li
Stijn Mahieu
Roger De Gryse
A1
Journal Article
in
JOURNAL OF PHYSICS D-APPLIED PHYSICS
2008
Diagnostics of an argon/oxygen magnetron plasma and comparison with Monte Carlo simulation
Mireille Gaillard
Laurent Schwaederlé
Stijn Mahieu
Wouter Leroy
Diederik Depla
Annemie Bogaerts
C3
Conference
2008
High rate reactive magnetron sputter deposition of titanium oxide
Tomas Kubart
Diederik Depla
D. Martin
Tomas Nyberg
Soren Berg
A1
Journal Article
in
Applied Physics Letters
2008
Influence of deposition on the reactive sputter behaviour during rotating cylindrical magnetron sputtering
XiuYang Li
Diederik Depla
Wouter Leroy
Johan Haemers
Roger De Gryse
A1
Journal Article
in
JOURNAL OF PHYSICS D-APPLIED PHYSICS
2008
Investigation of the sustaining mechanisms of dc magnetron discharges and consequences for I-V characteristics
Jan Musschoot
Diederik Depla
Guy Buyle
Johan Haemers
Roger De Gryse
A1
Journal Article
in
Journal of Phyics D: Applied Physics
2008
Modelling the growth of transition metal nitrides
Stijn Mahieu
Diederik Depla
Roger De Gryse
P1
Conference
2008
Noble gas retention in the target during rotating cylindrical magnetron sputtering
Stijn Mahieu
Wouter Leroy
Diederik Depla
S Schreiber
W Möller
A1
Journal Article
in
APPLIED PHYSICS LETTERS
2008
Observation of hysteresis in a non-reactive magnetron discharge
Jan Musschoot
Diederik Depla
Johan Haemers
Roger De Gryse
A1
Journal Article
in
Plasma Sources Science and Technology
2008
Proceedings of ICTF 14 & RSD 2008
Book editor
2008
Quantification of the ion and momentum fluxes toward the substrate during reactive magnetron sputtering
Stijn Mahieu
Koen Van Aeken
Diederik Depla
A1
Journal Article
in
Journal of applied physics
2008
Reactive Sputter Deposition
Book editor
2008
Relation between hardness of TiN sputtered coatings and the substrate fluxes
Stijn Mahieu
Koen Van Aeken
Diederik Depla
Roger De Gryse
A4
Journal Article
in
BELVAC NEWS
2008
Some more equations describing reactive magnetron sputtering
Diederik Depla
Stijn Mahieu
Wouter Leroy
Johan Haemers
Roger De Gryse
C3
Conference
2008
Studying the reactive magnetron sputtering deposition of oxides, with mass spectrometry
Wouter Leroy
Stijn Mahieu
Yolanda Aranda-Gonzalvo
Diederik Depla
C3
Conference
2008
Templated growth of europium-doped sulfide thin films by a solvothermal method
Philippe Smet
Dirk Poelman
C3
Conference
2008
The importance of an external circuit in a Particle-In-Cell/Monte Carlo Collisions model for a direct current planar magnetron
Evi Bultinck
Ivan Kolev
Annemie Bogaerts
Diederik Depla
A1
Journal Article
in
Journal of Applied Physics
2008
The metal flux from a rotating cylindrical magnetron: a Monte Carlo simulation
Koen Van Aeken
Stijn Mahieu
Diederik Depla
A1
Journal Article
in
JOURNAL OF PHYSICS D-APPLIED PHYSICS
2008
Transport of sputtered particles through the gas phase
Stijn Mahieu
Diederik Depla
Koen Van Aeken
Bookchapter
in
Reactive Sputter Deposition
2008
Using mass spectrometry to gather some insights in the fundamentals of the reactive magnetron sputtering process of Al with O2
Wouter Leroy
Stijn Mahieu
R Persoons
Diederik Depla
A4
Journal Article
in
BELVAC NEWS
2008
2007
Correlation between electron and negative O- ion emission during reactive sputtering of oxides
Stijn Mahieu
Diederik Depla
A1
Journal Article
in
APPLIED PHYSICS LETTERS
2007
Depositing aluminium oxide to study reactive magnetron sputtering
Wouter Leroy
Stijn Mahieu
Diederik Depla
C3
Conference
2007
Magnetron sputter deposition for catalyst synthesis
Hilde Poelman
Karin Eufinger
Diederik Depla
Dirk Poelman
Roger De Gryse
BF Sels
Guy Marin
A1
Journal Article
in
APPLIED CATALYSIS A-GENERAL
2007
Physico-chemical characterization of nanofiltration membranes
K BOUSSU
Jérémie De Baerdemaeker
Charles Dauwe
M WEBER
KG LYNN
Diederik Depla
S ALDEA
IFJ VANKELECOM
C VANDECASTEELE
B VAN DER BRUGGEN
A1
Journal Article
in
CHEMPHYSCHEM
2007
Towards a more complete model for reactive magnetron sputtering
Diederik Depla
Sarah Heirwegh
Stijn Mahieu
Roger De Gryse
A1
Journal Article
in
JOURNAL OF PHYSICS D-APPLIED PHYSICS
2007
Understanding the discharge voltage behavior during reactive sputtering of oxides
Diederik Depla
Sarah Heirwegh
Stijn Mahieu
Johan Haemers
Roger De Gryse
A1
Journal Article
in
JOURNAL OF APPLIED PHYSICS
2007
2006
A Monte Carlo simulation of the erosion profile of a rotating cylindrical magnetron
Jan Musschoot
Diederik Depla
G Buyle
Johan Haemers
Roger De Gryse
A4
Journal Article
in
BELVAC NEWS
2006
A comparative XPS and UPS study of VOx layers on mineral TiO2(001)-anatase supports
Geert Silversmit
Hilde Poelman
Diederik Depla
N BARRETT
Guy Marin
Roger De Gryse
A1
Journal Article
in
SURFACE AND INTERFACE ANALYSIS
2006
A fit procedure to determine the mean vanadium oxidation state from V2p phtotelectron spectra
Geert Silversmit
Diederik Depla
Hilde Poelman
Guy Marin
Roger De Gryse
A4
Journal Article
in
BELVAC NEWS
2006
An XPS study on the surface reduction of V2O5(001) induced by Ar+ ion bombardment
Geert Silversmit
Diederik Depla
Hilde Poelman
Guy Marin
Roger De Gryse
A1
Journal Article
in
SURFACE SCIENCE
2006
Biaxial alignment in sputter deposited thin films
Stijn Mahieu
Pieter Ghekiere
Diederik Depla
Roger De Gryse
A1
Journal Article
in
THIN SOLID FILMS
2006
Biaxially aligned titanium nitride thin films deposited by reactive unbalanced magnetron sputtering
Stijn Mahieu
Pieter Ghekiere
Griet De Winter
Roger De Gryse
Diederik Depla
G VAN TENDELOO
OI LEBEDEV
A1
Journal Article
in
SURFACE & COATINGS TECHNOLOGY
2006
Chemical and morphological changes of historical lead objects as a result of the use of electrolytic reduction as a stabilization treatment
Bart Schotte
Mieke Adriaens
Frederik Dhooghe
Diederik Depla
Manuel Dierick
M DOWSETT
E LEHMANN
P VONTOBEL
A1
Journal Article
in
ANALYTICAL CHEMISTRY
2006
Discharge voltage measurements during magnetron sputtering
Diederik Depla
G BUYLE
Johan Haemers
Roger De Gryse
A1
Journal Article
in
SURFACE & COATINGS TECHNOLOGY
2006
Discharge voltage measurements during reactive sputtering of oxides
Diederik Depla
Johan Haemers
Roger De Gryse
A1
Journal Article
in
THIN SOLID FILMS
2006
Hydrogen-plasma-induced plate-like cavity clusters in single-crystalline germanium
Johan Lauwaert
ML DAVID
MF BEAUFORT
E SIMOEN
Diederik Depla
Paul Clauws
A1
Journal Article
in
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
2006
Hysteresis behavior during reactive magnetron sputtering of A(2)O(3) using a rotating cylindrical magnetron
Diederik Depla
Johan Haemers
G BUYLE
Roger De Gryse
A1
Journal Article
in
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
2006
Influence of the geometrical configuration on the plasma ionization distribution and erosion profile of a rotating cylindrical magnetron: a Monte Carlo simulation
Jan Musschoot
Diederik Depla
G BUYLE
Johan Haemers
Roger De Gryse
A1
Journal Article
in
JOURNAL OF PHYSICS D-APPLIED PHYSICS
2006
Influence of the target composition on the discharge voltage during magnetron sputtering
Diederik Depla
H TOMASZEWSKI
G BUYLE
Roger De Gryse
A1
Journal Article
in
SURFACE & COATINGS TECHNOLOGY
2006
Lage druk sputterdepositie van hoge-temperatuursupergeleiders met draaibaar magnetron
Ilse De Roeck
Diederik Depla
Roger De Gryse
Dissertation
2006
Magnetron sputter deposition for catalyst synthesis
Hilde Poelman
Karin Eufinger
Diederik Depla
Dirk Poelman
Roger De Gryse
B SELS
Guy Marin
C3
Conference
2006
Mechanism of biaxial alignment in thin films, deposited by magnetron sputtering
Stijn Mahieu
Greta Buyle
Pieter Ghekiere
Sarah Heirwegh
Roger De Gryse
Diederik Depla
A1
Journal Article
in
THIN SOLID FILMS
2006
Mechanism of in-plane alignment in magnetron sputtered biaxially aligned yttria-stabilized zirconia
Stijn Mahieu
Pieter Ghekiere
Diederik Depla
Roger De Gryse
OI LEBEDEV
G VAN TENDELOO
A1
Journal Article
in
JOURNAL OF CRYSTAL GROWTH
2006
Monte Carlo simulation of the transport of atoms in DC magnetron sputtering
Stijn Mahieu
Guy Buyle
Diederik Depla
Sarah Heirwegh
Pieter Ghekiere
Roger De Gryse
A1
Journal Article
in
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
2006
Structure evolution of the biaxial alignment in sputter-deposited MgO and Cr
Pieter Ghekiere
Stijn Mahieu
Roger De Gryse
Diederik Depla
A1
Journal Article
in
THIN SOLID FILMS
2006
The d.c. magnetron sputtering behavior of TiO2-x targets with added Fe2O3 or Nd2O3
Karin Eufinger
H Tomaszewski
Diederik Depla
Hilde Poelman
Dirk Poelman
Roger De Gryse
A1
Journal Article
in
THIN SOLID FILMS
2006
2005
A fully oxidized V2O5/TiO2(001)-anatase system studied with in situ synchrotron photoelectron spectroscopy
Geert Silversmit
Hilde Poelman
Diederik Depla
N BARRETT
Guy Marin
Roger De Gryse
A1
Journal Article
in
SURFACE SCIENCE
2005
Biaxially aligned yttria stabilized zirconia and titanium nitride layers deposited by unbalanced magnetron sputtering
Stijn Mahieu
Pieter Ghekiere
Griet De Winter
Roger De Gryse
Diederik Depla
OI LEBEDEV
A1
Journal Article
in
TEXTURE AND ANISOTROPY OF POLYCRYSTALS II
2005
Growth and optimization of biaxially aligned MgO deposited by unbalanced magnetron sputtering
Pieter Ghekiere
Stijn Mahieu
Griet De Winter
Roger De Gryse
Diederik Depla
A4
Journal Article
in
BELVAC NEWS
2005
Growth mechanism of biaxially aligned magnesium oxide deposited by unbalanced magnetron sputtering
Pieter Ghekiere
Stijn Mahieu
Griet De Winter
Roger De Gryse
Diederik Depla
OI LEBEDEV
A1
Journal Article
in
TEXTURE AND ANISOTROPY OF POLYCRYSTALS II
2005
Influence of the Ar/O-2 ratio on the growth and biaxial alignment of yttria stabilized zirconia layers during reactive unbalanced magnetron sputtering
Stijn Mahieu
Pieter Ghekiere
Griet De Winter
Diederik Depla
Roger De Gryse
OI LEBEDEV
G VAN TENDELOO
A1
Journal Article
in
THIN SOLID FILMS
2005
Mechanism of preferential orientation in sputter deposited titanium nitride and yttria-stabilized zirconia layers
Stijn Mahieu
Pieter Ghekiere
Griet De Winter
Sarah Heirwegh
Diederik Depla
Roger De Gryse
OI LEBEDEV
G VAN TENDELOO
A1
Journal Article
in
JOURNAL OF CRYSTAL GROWTH
2005
Monte Carlo Simulation of Anomalous Erosion in Large Area Sputter Magnetrons
G BUYLE
Diederik Depla
Karin Eufinger
Roger De Gryse
W DE BOSSCHER
C1
Conference
2005
Scanning electron microscopy study of the growth mechanism of biaxially aligned magnesium oxide layers grown by unbalanced magnetron sputtering
Pieter Ghekiere
Stijn Mahieu
Griet De Winter
Roger De Gryse
Diederik Depla
A1
Journal Article
in
THIN SOLID FILMS
2005
Simplified model for the d.c. planar magnetron discharge
Guy Buyle
Roger De Gryse
Diederik Depla
Dissertation
2005
Study of the deposition and Raman and XPS characterization of a metal ion tetrasulphonated phthalocyanine layer at gold surfaces : density functional theory calculations to model the vibrational spectra
Karolien De Wael
Philippe Westbroek
Patrick Bultinck
Diederik Depla
Peter Vandenabeele
Mieke Adriaens
Eduard Temmerman
A1
Journal Article
in
ELECTROCHEMISTRY COMMUNICATIONS
2005
The d.c. magnetron sputtering behavior of TiO2-x targets with added Fe2O3 or Nd2O3
H Tomaszewski
K Eufinger
Diederik Depla
Hilde Poelman
Dirk Poelman
Roger De Gryse
C3
Conference
2005
Transport of DC sputtered atoms: a Monte Carlo simulation
Stijn Mahieu
Guy Buyle
Diederik Depla
Sarah Heirwegh
Pieter Ghekiere
Roger De Gryse
A4
Journal Article
in
BELVAC NEWS
2005
UPS study of the thermal reduction of fully oxidized V2O5/TiO2(001)-anatase model catalysts
Geert Silversmit
Hilde Poelman
Diederik Depla
Dirk Poelman
N BARRETT
Guy Marin
Roger De Gryse
A1
Journal Article
in
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA
2005
2004
A model for the development of biaxial alignment in yttria stabilized zirconia layers, deposited by unbalanced magnetron sputtering
Stijn Mahieu
Griet De Winter
Diederik Depla
Roger De Gryse
J DENUL
A1
Journal Article
in
SURFACE & COATINGS TECHNOLOGY
2004
Biaxially aligned YSZ layers deposited by unbalanced magnetron sputtering: a model
Stijn Mahieu
Griet De Winter
Pieter Ghekiere
Diederik Depla
Roger De Gryse
J DENUL
A4
Journal Article
in
Belgische vacuum vereniging
2004
Calculation of the effective gas interaction probabilities of the secondary electrons in a dc magnetron discharge
Guy Buyle
Diederik Depla
Karin Eufinger
Roger De Gryse
A1
Journal Article
in
JOURNAL OF PHYSICS D-APPLIED PHYSICS
2004
Characterization of the Electron Movement in Varying Magnetic Fields and the Resulting Anomalous Erosion
Guy Buyle
Diederik Depla
Karin Eufinger
Johan Haemers
Roger De Gryse
W DE BOSSCHER
C1
Conference
2004
Determination of the V2p XPS binding energies for different vanadium oxidation states (V5+ to V0+)
Geert Silversmit
Diederik Depla
Hilde Poelman
Guy Marin
Roger De Gryse
A1
Journal Article
in
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA
2004
Effect of the oxyzen deficiency of ceramic TiO2-x targets on the deposition of TiO2 thin films by DC magnetron sputtering
Hilde Poelman
H TOMASZEWSKI
Dirk Poelman
Diederik Depla
Roger De Gryse
A1
Journal Article
in
SURFACE AND INTERFACE ANALYSIS
2004
Influence of the deposition parameters on the biaxial alignment of MgO grown by unbalanced magnetron sputtering
Pieter Ghekiere
Stijn Mahieu
Griet De Winter
Roger De Gryse
Diederik Depla
A1
Journal Article
in
JOURNAL OF CRYSTAL GROWTH
2004
Mechanisms of target poisoning during magnetron sputtering as investigated by real-time in situ analysis and collisional computer simulation
D GUTTLER
B ABENDROTH
R GROTZSCHEL
W MOLLER
Diederik Depla
A1
Journal Article
in
APPLIED PHYSICS LETTERS
2004
Modeling of the target surface modification by reactive ion implantation during magnetron sputtering
Diederik Depla
ZY CHEN
A BOGAERTS
V IGNATOVA
Roger De Gryse
R GIJBELS
A1
Journal Article
in
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
2004
Simplified model for the DC planar magnetron discharge
Guy Buyle
Diederik Depla
Karin Eufinger
Johan Haemers
W DE BOSSCHER
Roger De Gryse
A1
Journal Article
in
VACUUM
2004
Target poisoning during reactive magnetron sputtering: Part I: the influence of ion implantation
Diederik Depla
Roger De Gryse
A1
Journal Article
in
SURFACE & COATINGS TECHNOLOGY
2004
Target poisoning during reactive magnetron sputtering: Part II: the influence of chemisorption and gettering
Diederik Depla
Roger De Gryse
A1
Journal Article
in
SURFACE & COATINGS TECHNOLOGY
2004
Target poisoning during reactive magnetron sputtering: Part III: the prediction of the critical reactive gas mole fraction
Diederik Depla
Roger De Gryse
A1
Journal Article
in
SURFACE & COATINGS TECHNOLOGY
2004
The preparation of fully oxidized V2O5/TiO2(001)(anatase) model catalysts studied with photoelectron spectroscopy
Geert Silversmit
Hilde Poelman
Diederik Depla
Dirk Poelman
N BARETT
Guy Marin
Roger De Gryse
C1
Conference
2004
UPS study of the thermal reduction of fully oxidized V2O5/TiO2 (001-anatase) model catalysts
Geert Silversmit
Hilde Poelman
Diederik Depla
Nick BARETT
Guy Marin
Roger De Gryse
C3
Conference
2004
2003
A heterogeneous Ru-hydroxyapatite catalyst for mild racemization of alcohols
S WUYTS
DE DE VOS
Francis Verpoort
Diederik Depla
Roger De Gryse
PA JACOBS
A1
Journal Article
in
JOURNAL OF CATALYSIS
2003
Dissection of the Planar Magnetron Discharge
Guy Buyle
Diederik Depla
Karin Eufinger
Johan Haemers
Roger De Gryse
W DE BOSSCHER
C1
Conference
2003
Dynamic Monte Carlo simulation for reactive sputtering of aluminium
ZY CHEN
A BOGAERTS
Diederik Depla
V IGNATOVA
A1
Journal Article
in
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
2003
Implantation of the sputtering gas as a factor in the target voltage behaviour during reactive sputtering
Roger De Gryse
Diederik Depla
Johan Haemers
A4
Journal Article
in
BELVAC NEWS
2003
Instabilities in the reactive sputtering of electrical insulating compounds
A Segers
Diederik Depla
Karin Eufinger
Johan Haemers
Roger De Gryse
A4
Journal Article
in
BELVAC NEWS
2003
Simplified model for calculating the pressure dependence of a direct current planar magnetron discharge
Guy Buyle
Diederik Depla
Karin Eufinger
Johan Haemers
Roger De Gryse
W DE BOSSCHER
A1
Journal Article
in
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
2003
Simplified model for the DC planar magnetron discharge
Guy Buyle
Diederik Depla
Johan Haemers
Roger De Gryse
A4
Journal Article
in
BELVAC NEWS
2003
Target voltage measurements during DC sputtering of silver in a nitrogen/argon plasma
Diederik Depla
Roger De Gryse
A1
Journal Article
in
VACUUM
2003
2002
Arc Discharges in the Reactive Sputtering of Electrical Insulating Compounds.
Anneke Segers
Diederik Depla
Karin Eufinger
Johan Haemers
Roger De Gryse
C1
Conference
2002
Cross section for removing chemisorbed oxygen from an aluminum target by sputtering.
Diederik Depla
Roger De Gryse
A1
Journal Article
in
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
2002
Importance of recapture of secondary electrons in cylindrical and planar magnetron discharges.
Guy Buyle
Diederik Depla
Karin Eufinger
Johan Haemers
Roger De Gryse
W DE BOSSCHER
A1
Journal Article
in
CZECHOSLOVAK JOURNAL OF PHYSICS
2002
Influence of recapture of secondary electrons on the magnetron sputtering deposition process.
Guy Buyle
Diederik Depla
Karin Eufinger
Johan Haemers
Roger De Gryse
C1
Conference
2002
Low pressure Behaviour of the sputter magnetron discharge
Guy Buyle
Diederik Depla
W DE BOSSCHER
Karin Eufinger
Johan Haemers
Roger De Gryse
C1
Conference
2002
Poisoning during sputtering of an Al-target in a mixture of Ar and O2.
Roger De Gryse
Diederik Depla
Johan Haemers
A2
Journal Article
in
VACUUM TECHNOLOGY AND COATING
2002
Reactive DC sputtering of silver in a nitrogen/argon mixture
Roger De Gryse
Diederik Depla
Johan Haemers
A4
Journal Article
in
BELVAC NEWS
2002
Sputtering of an Al-target in a mixture of Ar and O2
Roger De Gryse
Diederik Depla
Johan Haemers
A4
Journal Article
in
BELVAC NEWS
2002
Target surface condition during reactive glow discharge sputtering of copper.
Diederik Depla
Johan Haemers
Roger De Gryse
A1
Journal Article
in
PLASMA SOURCES SCIENCE & TECHNOLOGY
2002
Target voltage behaviour during DC sputtering of silicon in an argon/nitrogen mixture.
Diederik Depla
A COLPAERT
Karin Eufinger
Anneke Segers
Johan Haemers
Roger De Gryse
A1
Journal Article
in
VACUUM
2002
TiO2 films prepared by DC magnetron sputtering from ceramic targets.
H TOMASZEWSKI
Hilde Poelman
Diederik Depla
Dirk Poelman
Roger De Gryse
Lucien Fiermans
Marie-Françoise Reyniers
Geraldine Heynderickx
Guy Marin
A1
Journal Article
in
VACUUM
2002
2001
Electronic and optical characterisation of TiO2 films deposited from ceramic targets.
Hilde Poelman
Dirk Poelman
Diederik Depla
H TOMASZEWSKI
Lucien Fiermans
Roger De Gryse
A1
Journal Article
in
SURFACE SCIENCE
2001
Extensive XPS study of VOx\TiO2(001) (anatase) model catalysts
Geert Silversmit
Hilde Poelman
Diederik Depla
Lucien Fiermans
Roger De Gryse
Nick Barrett
C3
Conference
2001
Influence of oxygen addition on the target voltage during reactive sputtering of aluminium.
Diederik Depla
Roger De Gryse
A1
Journal Article
in
PLASMA SOURCES SCIENCE & TECHNOLOGY
2001
2000
Poisoning in reactive sputtering as seen from the target voltage behaviour
Roger De Gryse
Diederik Depla
Karin Eufinger
P1
Conference
2000
1997
Modelling of reactive spray drying of precursors for high T-c superconducting ceramics
Diederik Depla
R Mouton
Serge Hoste
A1
Journal Article
in
JOURNAL OF THE EUROPEAN CERAMIC SOCIETY
1997
1996
Spuitdrogen van precursoren voor keramische supergeleiders
Diederik Depla
S. Hoste
Dissertation
1996
1994
Superconducting thick-films based on Bi-Pb-Sr-Ca-Cu nitrate pastes, screen-printed on alumina and ZrO2 buffered alumina
Isabel Van Driessche
Diederik Depla
Jurgen Denul
Nico De Roo
Roger De Gryse
Serge Hoste
A1
Journal Article
in
APPLIED SUPERCONDUCTIVITY
1994
1991
The determination of the oxygen content in YBa2Cu3O7_5 superconductors using thermal analysis. Advances in Superconductivity IV - proceedings of the 4th International Symposium on Superconductivity (ISS 91), Tokyo, 1991, pp. 271-277, Eds. H. Hayakawa, N. Koshizuka.
Hilde Vlaeminck
Diederik Depla
Serge Hoste
C1
Conference
1991