Research Explorer

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Researcher

Davy Deduytsche

85 Results

2021

Boron extraction using selective ion exchange resins enables effective magnesium recovery from lithium rich brines with minimal lithium loss

Luiza BoninDavy DeduytscheMariette WolthersVictoria FlexerKorneel Rabaey

A1 Journal Article in SEPARATION AND PURIFICATION TECHNOLOGY

Microwave-assisted synthesis of nanoscale VO2 structures

Matthias Van ZeleHannes RijckaertLaura Van BosseleDavy DeduytscheLenny Van DaeleEmile DrijversChristophe DetavernierIsabel Van DriesscheKlaartje De Buysser

A2 Journal Article in OPEN CERAMICS

Synthesis and deposition of thermochromic VO2 thin films from peroxide-based chemical solutions

Matthias Van ZeleHannes RijckaertDavy DeduytscheChristophe DetavernierIsabel Van DriesscheDirk PoelmanKlaartje De Buysser

2020

Formation and preferential orientation of Au-free Al/Ti-based ohmic contacts on different hexagonal nitride-based heterostructures

Filip GeenenA. ConstantEduardo Solano MinuesaDavy DeduytscheC. MocutaP. CoppensChristophe Detavernier

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

2019

Kinetic and thermodynamic description of intermediary phases formation in Ti-Al system during reactive sintering

Andrea SkolakovaJindrich LeitnerPavel SalvetrPavel NovakDavy DeduytscheJaromir KopecekChristophe DetavernierDalibor Vojtech

A1 Journal Article in MATERIALS CHEMISTRY AND PHYSICS

Mechanism of the Intermediary Phase Formation in Ti-20 wt. % Al Mixture during Pressureless Reactive Sintering

Andrea SkolakovaPavel SalvetrPavel NovakJindrich LeitnerDavy Deduytsche

A1 Journal Article in MATERIALS

2018

Thickness characterization toolbox for transparent protective coatings on polymer substrates

Matthias Van ZeleJonathan WattéJan HasselmeyerHannes RijckaertYannick VercammenSteven VerstuyftDavy DeduytscheDamien P DebeckerClaude PoleunisIsabel Van Driessche et al.

A1 Journal Article in MATERIALS

2017

Formation of Ni-Ti intermetallics during reactive sintering at 800-900 °C

Pavel NovákVladimír VojtěchZuzana PecenováFilip PrůšaPetr PokornýDavy DeduytscheChristophe DetavernierAdriana BernatikováPavel SalvetrAnna Knaislová et al.

A1 Journal Article in MATERIALI IN TEHNOLOGIJE

Investigation of the effect of magnesium on the microstructure and mechanical properties of NiTi shape memory alloy prepared by self-propagating high-temperature synthesis

Andrea ŠkolákovaPavel NovákPavel SalvetrHynek MoravecVáclav ŠeflDavy DeduytscheChristophe Detavernier

A1 Journal Article in METALLURGICAL AND MATERIALS TRANSACTIONS A-PHYSICAL METALLURGY AND MATERIALS SCIENCE

Sensing the framework state and guest molecules in MIL-53(Al) via the electron paramagnetic resonance spectrum of V-IV dopant ions

Irena NevjesticHannes DepauwPeter GastPieter TackDavy DeduytscheKaren LeusMelissa Van LandeghemEtienne GoovaertsLaszlo VinczeChristophe Detavernier et al.

A1 Journal Article in PHYSICAL CHEMISTRY CHEMICAL PHYSICS

Ternary silicide formation from Ni-Pt, Ni-Pd and Pt-Pd alloys on Si(100) : nucleation and solid solubility of the monosilicides

A SchrauwenJ DemeulemeesterDavy DeduytscheWouter DevulderChristophe DetavernierCM ComrieK TemstA Vantomme

A1 Journal Article in ACTA MATERIALIA

2016

Molecular layer deposition of 'titanicone', a titanium-based hybrid material, as an electrode for lithium-ion batteries

Kevin Van de KerckhoveFelix MattelaerDavy DeduytschePhilippe M VereeckenJolien DendoovenChristophe Detavernier

A1 Journal Article in DALTON TRANSACTIONS

Plasma-enhanced ALD : a route to hydrophilic, glueable PTFE

Geert RampelbergAmit Kumar RoyJolien DendoovenDavy DeduytscheKilian Devloo-CasierKim RagaertLudwig CardonChristophe Detavernier

Plasma-enhanced ALD on particles and powders

Geert RampelbergDelphine LongrieDavy DeduytscheJohan HaemersChristophe Detavernier

Thermal and plasma enhanced atomic layer deposition on powders and particles

Geert RampelbergVéronique CremersDelphine LongrieDavy DeduytscheJohan HaemersChristophe Detavernier

2015

Combinatorial study of Ag-Te thin films and their application as cation supply layer in CBRAM cells

Wouter DevulderKarl OpsomerJohan MeersschautDavy DeduytscheMalgorzata JurczakLudovic GouxChristophe Detavernier

A1 Journal Article in ACS COMBINATORIAL SCIENCE

Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene

Amit Kumar RoyJolien DendoovenDavy DeduytscheKilian Devloo-CasierKim RagaertLudwig CardonChristophe Detavernier

A1 Journal Article in CHEMICAL COMMUNICATIONS

2014

A Single-Event MicroKinetic assessment of n-alkane hydroconversion on ultrastable Y zeolites after atomic layer deposition of alumina

Bart VandegehuchteJoris ThybautChristophe DetavernierDavy DeduytscheJolien DendoovenJA MartensSP SreeTI KorányiGuy Marin

A1 Journal Article in JOURNAL OF CATALYSIS

Atomic layer deposition : a 3D surface engineering technique for nanomaterials

Geert RampelbergJolien DendoovenDavy DeduytscheChristophe Detavernier

Conformal nanocoatings for surface engineering of particles by thermal and plasma-enhanced atomic layer deposition using a rotary reactor

Geert RampelbergDelphine LongrieDavy DeduytscheJohan HaemersKris DriesenChristophe Detavernier

Controllable nitrogen doping in as deposited TiO₂ film and its effect on post deposition annealing

Shaoren DengSammy W VerbruggenSilvia LenaertsJohan A MartensSven Van den BergheKilian Devloo-CasierWouter DevulderJolien DendoovenDavy DeduytscheChristophe Detavernier

A1 Journal Article in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Crystallization and semiconductor-metal switching behavior of thin VO₂ layers grown by atomic layer deposition

Geert RampelbergDavy DeduytscheBob De SchutterPeter Antony PremkumarMichael ToellerMarc SchaekersKoen MartensIuliana RaduChristophe Detavernier

A1 Journal Article in THIN SOLID FILMS

Plasma enhanced atomic layer deposition on powders

Geert RampelbergDelphine LongrieDavy DeduytscheChristophe Detavernier

Reactor concepts for atomic layer deposition on agitated particles: a review

Delphine LongrieDavy DeduytscheChristophe Detavernier

A1 Journal Article in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Thermal and plasma-enhanced atomic layer deposition of TiN using TDMAT and NH3 on particles agitated in a rotary reactor

Delphine LongrieDavy DeduytscheJohan HaemersPhilippe SmetKris DriesenChristophe Detavernier

A1 Journal Article in ACS APPLIED MATERIALS & INTERFACES

2013

A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects

Delphine LongrieDavy DeduytscheJohan HaemersKris DriesenChristophe Detavernier

Low temperature plasma-enhanced ALD of vanadium nitride as copper diffusion barrier

Geert RampelbergKilian Devloo-CasierDavy DeduytscheMarc SchaekersNicolas BlascoChristophe Detavernier

Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers

Geert RampelbergKilian Devloo-CasierDavy DeduytscheMarc SchaekersNicolas BlascoChristophe Detavernier

A1 Journal Article in APPLIED PHYSICS LETTERS

Plasma-enhanced atomic layer deposition of thin vanadium nitride layers as a copper diffusion barrier

Geert RampelbergKilian Devloo-CasierDavy DeduytscheMarc SchaekersNicolas BlascoChristophe Detavernier

Study of Schottky barrier height modulation for NiSi/Si contact with an antimony interlayer

Xiao GuoYang TangYu-Long JiangXin-Ping QuGuo-Ping RuDavid Wei ZhangDavy DeduytscheChristophe Detavernier

A1 Journal Article in MICROELECTRONIC ENGINEERING

Thermal and plasma-enhanced ALD of TiN on powders using a rotary reactor

Delphine LongrieDavy DeduytscheJohan HaemersKris DriesenChristophe Detavernier

Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions

Amit Kumar RoyDavy DeduytscheChristophe Detavernier

A1 Journal Article in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

2012

A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects

Delphine LongrieDavy DeduytscheJohan HaemersKris DriesenChristophe Detavernier

A1 Journal Article in SURFACE & COATINGS TECHNOLOGY

Anisotropic atomic layer deposition profiles of TiO₂ in hierarchical silica material with multiple porosity

Sreeprasanth Pulinthanathu SreeJolien DendoovenJasper JammaerKasper MasschaeleDavy DeduytscheJan D'HaenChristine EA KirschhockJohan A MartensChristophe Detavernier

A1 Journal Article in CHEMISTRY OF MATERIALS

Conformality of thermal and plasma enhanced atomic layer deposition on a non-woven fibrous substrate

Jan MusschootJolien DendoovenDavy DeduytscheJohan HaemersG BuyleChristophe Detavernier

A1 Journal Article in SURFACE & COATINGS TECHNOLOGY

Fermi level depinning failure for Al/GeO₂/Ge contacts

Hao YuQi XieYu-Long JiangDavy DeduytscheChristophe Detavernier

A1 Journal Article in ECS SOLID STATE LETTERS

Germanium surface passivation and atomic layer deposition of high-k dielectrics: a tutorial review on Ge-based MOS capacitors

Qi XieShaoren DengMarc SchaekersDennis LinMatty CaymaxAnnelies DelabieXin-Ping QuYu-Long JiangDavy DeduytscheChristophe Detavernier

A1 Journal Article in SEMICONDUCTOR SCIENCE AND TECHNOLOGY

Improved thermal stability and electrical performance by using PEALD ultrathin Al2O3 film with Ta as Cu diffusion barrier on low k dielectrics

Shao-Feng DingQi XieFei ChenHai-Sheng LuShaoren DengDavy DeduytscheChristophe DetavernierXin-Ping Qu

A1 Journal Article in ECS SOLID STATE LETTERS

Optimization of the annealing conditions for thin VO2 ALD films

Geert RampelbergMarc SchaekersDavy DeduytscheBob De SchutterJorge KittlChristophe Detavernier

Plasma-enhanced ALD of platinum with O₂, N₂ and NH₃ plasmas

Delphine LongrieKilian Devloo-CasierDavy DeduytscheSven Van den BergheKris DriesenChristophe Detavernier

A1 Journal Article in ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY

Semiconductor-metal transition in thin VO2 films deposited by ozone based atomic layer deposition

Geert RampelbergMarc SchaekersKoen MartensQi XieDavy DeduytscheBob De SchutterNicolas BlascoJorge KittlChristophe Detavernier

TaN/Ta as an effective diffusion barrier for direct contact of copper and NiSi

Yu-Long JiangQi XieXin-Ping QuDavid W ZhangDavy DeduytscheChristophe Detavernier

A1 Journal Article in ELECTROCHEMICAL AND SOLID STATE LETTERS

2011

ALD-Modified USY zeolite characterization using single-event microkinetics

Bart VandegehuchteJoris ThybautChristophe DetavernierDavy DeduytscheJ DendoovenJA MartensSP SreeTI KorànyiGuy Marin

Aluminium atomic layer deposition applied to mesoporous zeolites for acid catalytic activity enhancement

Sreeprasanth Pulinthanathu SreeJolien DendoovenTamás I KorányGina VanbutseleKristof HouthoofdDavy DeduytscheChristophe DetavernierJohan A Martens

A1 Journal Article in CATALYSIS SCIENCE & TECHNOLOGY

Annealing induced hysteresis suppression for TiN/HfO₂/GeON/p-Ge capacitor

Quan-Li LiQi XieYu-Long JiangGuo-Ping RuXin-Ping QuBing-Zong LiDavid W ZhangDavy DeduytscheChristophe Detavernier

A1 Journal Article in SEMICONDUCTOR SCIENCE AND TECHNOLOGY

Effective Schottky Barrier height modulation by an ultrathin passivation layer of GeOxNy for Al/n-Ge(100) contact

Yu-Long JiangQi XieXin-Ping QuGuo-Ping RuDavid W ZhangDavy DeduytscheChristophe Detavernier

A1 Journal Article in ELECTROCHEMICAL AND SOLID STATE LETTERS

Effective electrical passivation of Ge(100) for HfO2 gate dielectric layers using O-2 plasma

Qi XieDavy DeduytscheMarc SchaekersMatty CaymaxAnnelies DelabieXin-Ping QuChristophe Detavernier

A1 Journal Article in ELECTROCHEMICAL AND SOLID STATE LETTERS

Effective reduction of fixed charge densities in germanium based metal-oxide-semiconductor devices

Shaoren DengQi XieDavy DeduytscheMarc SchaekersDennis LinMatty CaymaxAnnelies DelabieSven Van den BergheXinping QuChristophe Detavernier

A1 Journal Article in APPLIED PHYSICS LETTERS

High-performance Ge MOS capacitors by O₂ plasma passivation and O₂ ambient annealing

Qi XieShaoRen DengMarc SchaekersDennis LinMatty CaymaxAnnelies DelabieYuLong JiangXinPing QuDavy DeduytscheChristophe Detavernier

A1 Journal Article in IEEE ELECTRON DEVICE LETTERS

In situ X-ray fluorescence measurements during atomic layer deposition: nucleation and growth of TiO2 on planar substrates and in nanoporous films

Jolien DendoovenSreeprasanth Pulinthanathu SreeKoen De KeyserDavy DeduytscheJohan A MartensKarl F LudwigChristophe Detavernier

A1 Journal Article in JOURNAL OF PHYSICAL CHEMISTRY C

Semiconductor-metal transition in thin VO2 films grown by ozone based atomic layer deposition

Geert RampelbergMarc SchaekersKoen MartensQi XieDavy DeduytscheBob De SchutterNicolas BlascoJorge KittlChristophe Detavernier

A1 Journal Article in APPLIED PHYSICS LETTERS

Semiconductor-metal transition in thin VO2 films grown by ozone based atomic layer deposition

Geert RampelbergMarc SchaekersKoen MartensQi XieDavy DeduytscheBob De SchutterNicolas BlascoJorge KittlChristophe Detavernier

Spacious and mechanically flexible mesoporous silica thin film composed of an open network of interlinked nanoslabs

Sreeprasanth Pulinthanathu SreeJolien DendoovenDries SmeetsDavy DeduytscheAlexander AertsKris VanstreelsMikhail R BaklanovJin Won SeoKristiaan TemstAndré Vantomme et al.

A1 Journal Article in JOURNAL OF MATERIALS CHEMISTRY

TaCN growth with PDMAT and H-2/Ar plasma by plasma enhanced atomic layer deposition

Qi XieDavy DeduytscheJan MusschootRoland VanmeirhaegheChristophe DetavernierShao-Feng DingXin-Ping Qu

A1 Journal Article in MICROELECTRONIC ENGINEERING

2010

Conformality of Al2O3 and AlN deposited by plasma-enhanced atomic layer deposition

Jolien DendoovenDavy DeduytscheJan MusschootRoland VanmeirhaegheChristophe Detavernier

A1 Journal Article in JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Conformality of Al2O3 deposited by thermal, plasma-enhanced and ozone-based atomic layer deposition

Jolien DendoovenDavy DeduytscheJan MusschootChristophe Detavernier

Implementing TiO2 as gate dielectric for Ge-channel complementary metal-oxide-semiconductor devices by using HfO2/GeO2 interlayer

Qi XieDavy DeduytscheMarc SchaekersMatty CaymaxAnnelies DelabieXiin-Ping QuChristophe Detavernier

A1 Journal Article in APPLIED PHYSICS LETTERS

In situ X-ray diffraction study of thin film Ir/Si solid state reactions

Werner KnaepenJ DemeulemeesterDavy DeduytscheJL Jordan-SweetA VantommeRoland VanmeirhaegheChristophe DetavernierC Lavoie

A1 Journal Article in MICROELECTRONIC ENGINEERING

In situ x-ray fluorescence measurements during ALD on flat substrates and in nanoporous

Jolien DendoovenDavy DeduytscheSreeprasanth Pulinthanathu SreeTamás I KorányiGina VanbutseleJohan A MartensKarl F LudwigChristophe Detavernier

Single-event microkinetic model based design of tailored zeolite catalysts through atomic layer deposition

Bart VandegehuchteJoris ThybautChristophe DetavernierDavy DeduytscheJolien DendoovenJOHAN MARTENSPS SreeprasanthTI KorányiGuy Marin

Texture of atomic layer deposited ruthenium

Jan MusschootQi XieDavy DeduytscheKoen De KeyserDelphine LongrieJohan HaemersSven Van den BergheRoland Van MeirhaegheJan D'HaenChristophe Detavernier

A1 Journal Article in MICROELECTRONIC ENGINEERING

The effect of sputtered W-based carbide diffusion barriers on the thermal stability and void formation in copper thin films

Qi XieYu-Long JiangKoen De KeyserChristophe DetavernierDavy DeduytscheGuo-Ping RuXin-Ping QuKN Tu

A1 Journal Article in MICROELECTRONIC ENGINEERING

2009

Atomic layer deposition of titanium nitride from TDMAT precursor

Jan MusschootQi XieDavy DeduytscheSven Van den BergheRoland Van MeirhaegheChristophe Detavernier

A1 Journal Article in MICROELECTRONIC ENGINEERING

Comparison of thermal and plasma enhanced ALD/CVD of vanadium pentoxide

Jan MusschootDavy DeduytscheHilde PoelmanJohan HaemersRoland VanmeirhaegheSven Van den BergheChristophe Detavernier

A1 Journal Article in JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Modeling the conformality of atomic layer deposition: the effect of sticking probability

Jolien DendoovenJan MusschootDavy DeduytscheRoland VanmeirhaegheChristophe Detavernier

Modeling the conformality of atomic layer deposition: the effect of sticking probability

Jolien DendoovenDavy DeduytscheJan MusschootRoland VanmeirhaegheChristophe Detavernier

A1 Journal Article in JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Ru thin film grown on TaN by plasma enhanced atomic layer deposition

Qi XieYL JiangJan MusschootDavy DeduytscheChristophe DetavernierRoland VanmeirhaegheS Van den BergheGP RuBZ LiXP Qu

A1 Journal Article in THIN SOLID FILMS

2008

Conformality of thermal and plasma enhanced ALD

Jolien DendoovenJan MusschootDavy DeduytscheRoland VanmeirhaegheChristophe Detavernier

Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N-2 or NH3 plasma

Qi XieJan MusschootChristophe DetavernierDavy DeduytscheRoland Van MeirhaegheSven Van den BergheYu-Long JiangGuo-Ping RuBing-Zong LiXin-Ping Qu

A1 Journal Article in MICROELECTRONIC ENGINEERING

Effect of Pt addition on growth stress and thermal stress of NiSi films

Charlotte Van BockstaelKoen De KeyserDavy DeduytscheRoland Van MeirhaegheChristophe DetavernierJL JORDAN-SWEETC LAVOIE

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Formation and stability of NiSi in the presence of Co and Fe alloying elements

Davy DeduytscheChristophe DetavernierRoland VanmeirhaegheJean Jordan-SweetChristian Lavoie

A1 Journal Article in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

Growth kinetics and crystallization behavior of TiO2 films prepared by plasma enhanced atomic layer deposition

Q XIEJan MusschootDavy DeduytscheRoland VanmeirhaegheChristophe DetavernierS VAN DEN BERGHEYL JIANGGP RUBZ LIXP QU

A1 Journal Article in JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Nucleation and diffusion during growth of ternary Co1-xNixSi2 thin films studied by complementary techniques in real time

Dries SmeetsJelle DemeulemeesterKoen De KeyserDavy DeduytscheChristophe DetavernierCM ComrieCC TheronChristian LavoieAndré Vantomme

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Simultaneous real-time x-ray diffraction spectroscopy, Rutherford backscattering spectrometry, and sheet resistance measurements to study thin film growth kinetics by Kissinger plots

Dries SmeetsJelle DemeulemeesterDavy DeduytscheChristophe DetavernierCM ComrieCC TheronChristian LavoieAndré Vantomme

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Thermal versus plasma-enhanced ALD : growth kinetics and conformality

Christophe DetavernierJolien DendoovenDavy DeduytscheJan Musschoot

2007

Atomic layer deposition of TiO2 from tetrakis-dimethyl-amido titanium or Ti isopropoxide precursors and H2O

Q XIEYL JIANGChristophe DetavernierDavy DeduytscheRoland VanmeirhaegheGP RUBZ LIXP QU

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Formation and morphological stability of NiSi in the presence of W, Ti, and Ta alloying elements

Davy DeduytscheChristophe DetavernierRoland VanmeirhaegheJL JORDAN-SWEETC LAVOIE

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Influence of Ge substrate crystallinity on Co germanide formation in solid-state reactions

K OPSOMERDavy DeduytscheChristophe DetavernierRoland VanmeirhaegheA LAUWERSK MAEXC LAVOIE

A1 Journal Article in APPLIED PHYSICS LETTERS

2006

An in situ study of the stability of thin Ni-silicide layers

Davy DeduytscheRoland VanmeirhaegheChristophe Detavernier

In-situ X-ray diffraction measurements for monitoring carbide and silicide phase formation

Wouter LeroyDavy DeduytscheChristophe DetavernierRoland VanmeirhaegheDirk PoelmanC LAVOIE

In-situ X-ray diffraction measurements for monitoring carbide and silicide phase formation

Wouter LeroyDavy DeduytscheChristophe DetavernierRoland VanmeirhaegheDirk PoelmanC LAVOIE

2005

High-temperature degradation of NiSi films: Agglomeration versus NiSi2 nucleation

Davy DeduytscheChristophe DetavernierRoland VanmeirhaegheC LAVOIE

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

2003

Room temperature grain growth in sputtered Cu films

Davy DeduytscheChristophe DetavernierJ DEBAERDEMAEKERRoland VanmeirhaegheCharles DauweTS KUAN

Room temperature grain growth in sputtered Cu films

Davy DeduytscheChristophe DetavernierJérémie De BaerdemaekerRoland VanmeirhaegheCharles Dauwe

Room-temperature grain growth in sputter-deposited Cu films

Christophe DetavernierDavy DeduytscheRoland VanmeirhaegheJérémie De BaerdemaekerCharles Dauwe

A1 Journal Article in APPLIED PHYSICS LETTERS