Research Explorer

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Researcher

Christophe Detavernier

Awards & Distinctions

737 Results

2024

Advancing beyond Sabatier: Strategies for dynamic synthetic catalysis

Matthias FilezJolien DendoovenMaarten B.J. RoeffaersChristophe Detavernier

U Journal Article in Chem

Catalysts made from vapour

Matthias FilezJolien DendoovenChristophe Detavernier

U Journal Article in Nature Catalysis

Controlling Pt Nanoparticle Sintering by Sub-Monolayer MgO ALD Thin Films

Zhang ZhiweiMatthias FilezEduardo SolanoNithin PoonkottilJin LiMatthias MinjauwHilde PoelmanMartin RosenthalPhilipp BrünerVladimir Galvita et al.

U Journal Article in Nanoscale

Thinking outside the box : non-standard methods for atomic/molecular layer deposition

Juan Santo-Domingo PeñarandaJolien DendoovenChristophe Detavernier

2023

Atomic layer deposition of yttrium oxide as a protective coating for lithium metal anodes

Bo ZhaoJin LiMaxime GuillaumeVéronique CremersLowie HenderickJolien DendoovenChristophe Detavernier

A1 Journal Article in DALTON TRANSACTIONS

Changing the face of phase change memory with Sb2Te3/TiTe2 superlattices

Seppe Van DyckKiumars AryanaWouter DevulderPatrick HopkinsPieter GeiregatChristophe Detavernier

Colloidal III-V quantum dots in the short-wave infrared : from synthesis to photodetection

Jari LeemansZeger HensChristophe DetavernierGünther Roelkens

Crystalline tin disulfide by low-temperature plasma-enhanced 2 atomic layer deposition as an electrode material for Li-ion batteries 3 and CO2 electroreduction

Femi MathewJäri Van den HoekNithin PoonkottilBo ZhaoGeert RampelbergDaniel ChoukrounJonas HereijgersZeger HensDirk PoelmanTom Breugelmans et al.

A1 Journal Article in ACS APPLIED ENERGY MATERIALS

Depositing ALD-oxides on MLD-metalcones : enhancing initial growth through O2 plasma densification

Juan Santo-Domingo PeñarandaMatthias MinjauwSofie VandenbrouckeRobin PetitJin LiJolien DendoovenChristophe Detavernier

Depositing ALD-oxides on MLD-metalcones : enhancing initial growth through O2 plasma densification

Juan Santo-Domingo PeñarandaMatthias MinjauwSofie VandenbrouckeRobin PetitJin LiJolien DendoovenChristophe Detavernier

A1 Journal Article in DALTON TRANSACTIONS

Effects of post metallization annealing on Al2O3 atomic layer deposition on n-GaN

Liad TadmorEnrico BrusaterraEldad Bahat TreidelFrank BrunnerNicole BickelSofie VandenbrouckeChristophe DetavernierJoachim WürflOliver Hilt

A1 Journal Article in SEMICONDUCTOR SCIENCE AND TECHNOLOGY

High temperature H2S removal via CO2-assisted chemical looping over ZrO2-modified Fe2O3

Jiawei HuHilde PoelmanStavros-Alexandros TheofanidisJonas JoosChristophe DetavernierDirk PoelmanWei WeiVladimir Galvita

A1 Journal Article in APPLIED CATALYSIS B-ENVIRONMENTAL

In vacuo XPS study of Al2O3 ALD deposition processes on n-GaN

Sofie VandenbrouckeEldad Bahat TreidelLiad TadmorEnrico BrusaterraPaul PlateNicole BickelFrank BrunnerJoachim WürflOliver HiltJolien Dendooven et al.

Integrated PbS colloidal quantum dot photodiodes on silicon nitride waveguides

Chao PangYuhao DengEzat KheradmandNithin PoonkottilRobin PetitLukas ElsingerChristophe DetavernierPieter GeiregatZeger HensDries Van Thourhout

A1 Journal Article in ACS PHOTONICS

Integrated spectrometer based on arrayed waveguide grating and PbS colloidal quantum dot photodiode array

Chao PangYuhao DengEzat KheradmandRobin PetitLukas ElsingerChristophe DetavernierPieter GeiregatZeger HensDries Van Thourhout

Intensifying biomass and solid waste pyrolysis by chemical looping

Michiel Van CauwelaertLukas BuelensVarun SinghGuillaume LambertHilde PoelmanChristophe DetavernierKevin Van GeemVladimir Galvita

Interrogating metal nanocatalyst sintering at complementary length scales

Matthias FilezEduardo Solano MinuesaJolien DendoovenMaarten RoeffaersChristophe Detavernier

Low temperature area selective atomic layer deposition of ruthenium dioxide thin films using polymers as inhibition layers

Nithin PoonkottilHannes RijckaertKhannan RajendranRobin PetitLisa MartinDries Van ThourhoutIsabel Van DriesscheChristophe DetavernierJolien Dendooven

A1 Journal Article in ADVANCED MATERIALS INTERFACES

Metal nanocatalyst sintering interrogated at complementary length scales

Eduardo SolanoJolien DendoovenDavy DeduytscheNithin PoonkottilJi-Yu FengMaarten B. J. RoeffaersChristophe DetavernierMatthias Filez

A1 Journal Article in SMALL

Metal nanocatalyst sintering interrogated at complementary length scales (Small 5/2023)

Eduardo SolanoJolien DendoovenDavy DeduytscheNithin PoonkottilJi-Yu FengMaarten B. J. RoeffaersChristophe DetavernierMatthias Filez

Nanocomposite coatings for the stabilization of quantum dots

Robin PetitPhilippe SmetChristophe Detavernier

Nanoscale Chemical Diversity of Coke Deposits on Nanoprinted Metal Catalysts Visualized by Tip‐Enhanced Raman Spectroscopy

Matthias FilezPeter WalkeHai Le‐TheShuichi ToyouchiWannes PeetersPatrick TomkinsJan C. T. EijkelSteven De FeyterChristophe DetavernierDirk E. De Vos et al.

U Journal Article in Advanced Materials

Nanoscale chemical diversity of coke deposits on metal nanocatalysts visualized by tip-enhanced Raman spectroscopy

Matthias FilezChristophe DetavernierHiroshi Uji-IMaarten Roeffaers

Plasma-enhanced atomic layer deposition of crystalline Ga2S3 thin films

Femi MathewNithin PoonkottilEduardo Solano MinuesaDirk PoelmanZeger HensChristophe DetavernierJolien Dendooven

A1 Journal Article in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Surface chemistry of InP quantum dots, amine-halide co- passivation, and binding of Z-type ligands

Kim Corinna DümbgenJari LeemansVic De RooMatthias MinjauwChristophe DetavernierZeger Hens

A1 Journal Article in CHEMISTRY OF MATERIALS

Tin and indium sulfide by plasma-enhanced atomic layer deposition for CO2 electroreduction

Femi MathewJäri Van Den HoekNithin PoonkottilGeert RampelbergNick DaemsJonas HereijgersZeger HensTom BreugelmansChristophe DetavernierJolien Dendooven

Transient APXPS as a tool to characterize the kinetics of alloy restructuring : application to Sn-poor PtSn ALD-derived nanoparticles

Evgeniy RedekopE. KokkonenS. UrpelainenJ. KnudsenA. KluyshinS. DiplasJolien DendoovenN. PonkottiChristophe DetavernierVladimir Galvita et al.

Tuning CO2 methanation selectivity via MgO/Ni interfacial sites

Yufei XieValentijn De CosterLukas BuelensHilde PoelmanBensu TuncaJin-Won SeoChristophe DetavernierVladimir Galvita

A1 Journal Article in JOURNAL OF CATALYSIS

2022

A combinatorial study of SiGeAsTe thin films for application as an Ovonic threshold switch selector

Wouter DevulderDaniele GarbinSergiu ClimaGabriele Luca DonadioAndrea FantiniBogdan GovoreanuChristophe DetavernierLarry ChenMichael MillerLudovic Goux et al.

A1 Journal Article in THIN SOLID FILMS

Aligning time-resolved kinetics (TAP) and surface spectroscopy (AP-XPS) for a more comprehensive understanding of ALD-derived 2D and 3D model catalysts

Evgeniy A. RedekopHilde PoelmanMatthias FilezRanjith Karuparambil RamachandranJolien DendoovenChristophe DetavernierGuy MarinUnni OlsbyeVladimir Galvita

A1 Journal Article in FARADAY DISCUSSIONS

An IR spectroscopy study of the degradation of surface bound azido-groups in high vacuum

Sofie VandenbrouckeMikko NisulaRobin PetitRita VosKarolien JansPhilippe VereeckenJolien DendoovenChristophe Detavernier

An in situ photoluminescence study of atomic layer deposition on polymer embedded InP-based quantum dots

Robin PetitHannes Van AvermaetIurii BabkinResul OzdemirChristian ClasenZeger HensChristophe DetavernierPhilippe Smet

Atomic Layer Deposition for the study of catalysts for water splitting

Ruben BlommeRahul RameshChristophe DetavernierJolien Dendooven

Atomic layer deposition derived routes for the synthesis of nanostructured materials

Nithin PoonkottilJolien DendoovenChristophe DetavernierEduardo Solano Minuesa

Atomic layer deposition of metal phosphates

Lowie HenderickChristophe DetavernierJolien Dendooven

Atomic layer deposition of metal phosphates

Lowie HenderickArpan DharaAndreas WerbrouckJolien DendoovenChristophe Detavernier

A1 Journal Article in APPLIED PHYSICS REVIEWS

Atomic layer deposition of metal phosphates for engineering the interface of lithium ion battery electrodes

Lowie HenderickChristophe Detavernier

Atomic layer deposition of ruthenium dioxide based on redox reactions between alcohols and ruthenium tetroxide

Nithin PoonkottilMatthias MinjauwAndreas WerbrouckStefano ChecchiaEduardo SolanoMikko NisulaAlexis FranquetChristophe DetavernierJolien Dendooven

A1 Journal Article in CHEMISTRY OF MATERIALS

Atomic layer deposition of ruthenium dioxide thin films using RuO4 and alcohols as reactants

Matthias MinjauwNithin PoonkottilAndreas WerbrouckChristophe DetavernierJolien Dendooven

Atomic layer deposition of ternary ruthenates by combining metalorganic precursors with RuO4 as the co-reactant

Matthias MinjauwJi-Yu FengTimo SajavaaraChristophe DetavernierJolien Dendooven

A1 Journal Article in DALTON TRANSACTIONS

Atomic layer deposition on polymer thin films : on the role of precursor infiltration and reactivity

Robin PetitJin LiBabs Van de VoordeSandra Van VlierberghePhilippe SmetChristophe Detavernier

Colloidal III-V quantum dot photodiodes for short-wave infrared photodetection

Jari LeemansVladimir PejovicEpimitheas GeorgitzikisMatthias MinjauwAbu Bakar SiddikJunning DengYinghuan KuangGünther RoelkensChristophe DetavernierItai Lieberman et al.

A1 Journal Article in ADVANCED SCIENCE

Depositing ALD-oxides on MLD-metalcones : enhancing initial growth through O2 plasma densification

Juan Santo-Domingo PeñarandaMatthias MinjauwSofie VandenbrouckeRobin PetitJin LiJolien DendoovenChristophe Detavernier

Determination of optical constants of thin films in the EUV

Richard CiesielskiQais SaadehVicky PhilipsenKarl OpsomerJean-Philippe SoulieMeiyi WuPhilipp NaujokRobbert W. E. van de KruijsChristophe DetavernierMichael Kolbe et al.

A1 Journal Article in APPLIED OPTICS

Hollow structured Fe-based oxygen carriers for chemical looping CO2 conversion

Bo JinHilde PoelmanChristophe DetavernierGuy MarinVladimir Galvita

In vacuo XPS investigation of surface engineering for lithium metal anodes with plasma treatment

Bo ZhaoJin LiMaxime GuillaumeJolien DendoovenChristophe Detavernier

A1 Journal Article in JOURNAL OF ENERGY CHEMISTRY

Increasing ALD complexity : how to transform ternary oxide films into tunable bimetallic thin films and nanoparticles

Ji-Yu FengMatthias FilezMatthias MinjauwEduardo Solano MinuesaChristophe DetavernierJolien Dendooven

Investigation of protective coatings on LiNi0.5Mn1.5O4 by ALD : from thin-film experimental models to application in composite electrodes

Andrea Itziar Pitillas MartinezPhilippe VereeckenChristophe Detavernier

Low-temperature plasma-enhanced atomic layer deposition of crystalline tin disulfide thin films

Femi MathewNithin PoonkottilRanjith Karuparambil RamachandranBo ZhaoZeger HensChristophe DetavernierJolien Dendooven

Monolithic heterogeneous integration of PbS colloidal quantum dot photodiode on silicon nitride

Chao PangYu-Hao DengEzat KheradmandRobin PetitLukas ElsingerChristophe DetavernierPieter GeiregatZeger HensDries Van Thourhout

Nanoporous silica-alumina films fabricated on silicon photonic chips for selective ammonia sensing

Yanlu LiClaudio BellaniNebiyu Adello YeboJolien DendoovenJin Won SeoChristophe DetavernierRoel BaetsJohan A. MartensSreeprasanth Pulinthanathu Sree

A1 Journal Article in ACS APPLIED NANO MATERIALS

Plasma-enhanced atomic layer deposition of nickel and cobalt phosphate for lithium ion batteries

Lowie HenderickRuben BlommeMatthias MinjauwJonas KeukelierJohan MeersschautJolien DendoovenPhilippe VereeckenChristophe Detavernier

A1 Journal Article in DALTON TRANSACTIONS

Research project: Property investigation of Pt clusters deposited by atomic layer deposition

Arnau Basterra ValeraMatthias FilezZhiwei ZhangJolien DendoovenChristophe Detavernier

Ruthenium nanostructures via sequential infiltration synthesis in self-assembled diblock copolymer thin films

Nithin PoonkottilEduardo Solano MinuesaArbresha MuriqiMichael NolanChristophe DetavernierJolien Dendooven

Selective vapor-phase doping of Pt nanoparticles into phase-controlled nanoalloys

Nithin PoonkottilRanjith Karuparambil RamachandranEduardo Solano MinuesaNadadur Veeraraghavan SrinathJi-Yu FengAndreas WerbrouckMichiel Van DaeleMatthias FilezMatthias MinjauwHilde Poelman et al.

A1 Journal Article in JOURNAL OF PHYSICAL CHEMISTRY C

Separate H2 and CO production from CH4-CO2 cycling of Fe-Ni

Bo JinNadadur Veeraraghavan SrinathHilde PoelmanChristophe DetavernierZhiwu LiangGuy MarinVladimir Galvita

A1 Journal Article in AICHE JOURNAL

Shuffling atomic layer deposition gas sequences to modulate bimetallic thin films and nanoparticle properties

Matthias FilezJi-Yu FengMatthias MinjauwEduardo Solano MinuesaNithin PoonkottilMichiel Van DaeleRanjith Karuparambil RamachandranChen LiSara BalsHilde Poelman et al.

A1 Journal Article in CHEMISTRY OF MATERIALS

Spatially templated nanolines of Ru and RuO2 by sequential infiltration synthesis

Nithin PoonkottilEduardo SolanoArbresha MuriqiMatthias MinjauwMatthias FilezMichael NolanChristophe DetavernierJolien Dendooven

A1 Journal Article in CHEMISTRY OF MATERIALS

Strategies to produce boron-containing ALD thin films using trimethyl borate precursor : from thermal to plasma to combined-plasma approach

Arpan DharaAndreas WerbrouckJin LiJolien DendoovenChristophe Detavernier

Surface reactions between LiHMDS, TMA and TMP leading to deposition of amorphous lithium phosphate

Andreas WerbrouckFelix MattelaerArpan DharaMikko NisulaMatthias MinjauwFrans MunnikJolien DendoovenChristophe Detavernier

A1 Journal Article in JOURNAL OF MATERIALS CHEMISTRY A

The trap-dominated conduction mechanism in Ge-Se selectors, studied at cryogenic temperatures

Seppe Van DyckJonas KeukelierWouter DevulderKarl OpsomerChristophe Detavernier

Thickness matters : sintering inhibition in Pt nanoparticle catalysts via step-by-step control of MgO overcoats

Zhiwei ZhangMatthias FilezMatthias MinjauwJin LiChristophe DetavernierJolien Dendooven

Titanium carboxylate MLD hybrid films as protective coatings for lithium-ion batteries

Sofie VandenbrouckeLowie HenderickLouis De TaeyeJin LiKarolien JansPhilippe VereeckenJolien DendoovenChristophe Detavernier

Titanium carboxylate molecular layer deposited hybrid films as protective coatings for lithium-ion batteries

Sofie VandenbrouckeLowie HenderickLouis De TaeyeJin LiKarolien JansPhilippe VereeckenJolien DendoovenChristophe Detavernier

Titanium carboxylate molecular layer deposited hybrid films as protective coatings for lithium-ion batteries

Sofie VandenbrouckeLowie HenderickLouis L. De TaeyeJin LiKarolien JansPhilippe M. VereeckenJolien DendoovenChristophe Detavernier

A1 Journal Article in ACS APPLIED MATERIALS & INTERFACES

UV photonic integrated circuits for far-field structured illumination autofluorescence microscopy

Chupao LinJuan Santo-Domingo PeñarandaJolien DendoovenChristophe DetavernierDavid SchaubroeckNico BoonRoel BaetsNicolas Le Thomas

A1 Journal Article in NATURE COMMUNICATIONS

UV-compatible photonic integrated circuits forlabel-free structured illumination microscopy

Chupao LinJuan Santo-Domingo PeñarandaJolien DendoovenChristophe DetavernierDavid SchaubroeckNico BoonRoel BaetsNicolas Le Thomas

Vapour-phase deposition techniques for lab-on-a-chip devices

Sofie VandenbrouckeChristophe DetavernierKarolien JansPhilippe Vereecken

2021

A limitation map of performance for porous electrodes in lithium-ion batteries

Hamid HamedLowie HenderickBehnam Ghalami ChoobarJan D'HaenChristophe DetavernierAn HardyMohammadhosein Safari

A1 Journal Article in ISCIENCE

ALD Pt nanoparticles and thin-film coatings enhancing the stability and performance of silicon photocathodes for solar water splitting

Christos TrompoukisJi-Yu FengTom BosserezJan RongeJolien DendoovenChristophe DetavernierRoel BaetsJohan A. Martens

A1 Journal Article in SUSTAINABLE ENERGY & FUELS

Acid-base mediated ligand exchange on near-infrared absorbing, indium-based III-V colloidal quantum dots

Jari LeemansKim Corinna DümbgenMatthias MinjauwQiang ZhaoAndre VantommeIvan InfanteChristophe DetavernierZeger Hens

A1 Journal Article in JOURNAL OF THE AMERICAN CHEMICAL SOCIETY

An IR spectroscopy study of the degradation of surface bound azido-groups in high vacuum

Sofie VandenbrouckeMikko NisulaRobin PetitRita De VosKarolien JansPhilippe M. VereeckenJolien DendoovenChristophe Detavernier

A1 Journal Article in LANGMUIR

Atomic layer deposition of metal oxides for applications in lithium-ion and lithium metal batteries

Bo ZhaoChristophe DetavernierJolien Dendooven

Atomic layer deposition of ruthenium dioxide thin films using RuO4 and alcohols as reactants

Nithin PoonkottilMatthias MinjauwAndreas WerbrouckChristophe DetavernierJolien Dendooven

Atomic layer deposition on polymer thin films : on the role of precursor infiltration and reactivity

Robin PetitJin LiBabs Van de VoordeSandra Van VlierberghePhilippe SmetChristophe Detavernier

A1 Journal Article in ACS APPLIED MATERIALS & INTERFACES

Atomic layers deposited nano-mechanical resonators for silicon photonics

Khannan RajendranRobin PetitChristophe DetavernierDries Van Thourhout

Characterization of Ru4-xTax (x = 1,2,3) alloy as material candidate for EUV low-n mask

Meiyi WuJean-Francois de MarneffeKarl OpsomerChristophe DetavernierAnnelies DelabiePhilipp NaujokOezge CanerAndy GoodyearMike CookeQais Saadeh et al.

A2 Journal Article in MICRO AND NANO ENGINEERING

Cobalt and silver nanocoatings for reactor dosimetry

Jonas Vande PitteJ. WagemansA. GusarovI. UytdenhouwenJohan LauwaertChristophe Detavernier

A1 Journal Article in APPLIED RADIATION AND ISOTOPES

Controlled graphite surface functionalization using contact and remote photocatalytic oxidation

Niels R. OstynBarbara ThijsJulian A. SteeleSreeprasanth Pulinthanathu SreeWauter WangermezJoan TeyssandierMatthias MinjauwJin LiChristophe DetavernierMaarten B. J. Roeffaers et al.

A1 Journal Article in CARBON

Controlled synthesis of Fe-Pt nanoalloys using atomic layer deposition

Ranjith Karuparambil RamachandranJolien DendoovenChristophe Detavernier

A1 Journal Article in NANOTECHNOLOGY

Converting molecular layer deposited alucone films into Al2O3/alucone hybrid multilayers by plasma densification

Juan Santo-Domingo PeñarandaMikko NisulaSofie VandenbrouckeMatthias MinjauwJin LiAndreas WerbrouckJonas KeukelierAndrea Itziar Pitillas MartinezJolien DendoovenChristophe Detavernier

Converting molecular layer deposited alucone films into Al2O3/alucone hybrid multilayers by plasma densification

Juan Santo-Domingo PeñarandaMikko NisulaSofie VandenbrouckeMatthias MinjauwJin LiAndreas WerbrouckJonas KeukelierAndrea Itziar Pitillas MartinezJolien DendoovenChristophe Detavernier

A1 Journal Article in DALTON TRANSACTIONS

Covalent graphite modification by low-temperature photocatalytic oxidation using a titanium dioxide thin film prepared by atomic layer deposition

Niels R. OstynSreeprasanth Pulinthanathu SreeJin LiJi-Yu FengMaarten B. J. RoeffaersSteven De FeyterJolien DendoovenChristophe DetavernierJohan A. Martens

A1 Journal Article in CATALYSIS SCIENCE & TECHNOLOGY

Emergence of metallic conductivity in ordered one-dimensional coordination polymer thin films upon reductive doping

Mikko NisulaAntti. KarttunenEduardo Solano MinuesaGirish TewariMaarit KarppinenMatthias MinjauwHimanshu JenaPascal Van Der VoortDirk PoelmanChristophe Detavernier

A1 Journal Article in ACS APPLIED MATERIALS & INTERFACES

Heterostructured plasmonic memristors with tunable opto-synaptic functionalities

Mohammad Karbalaei AkbariRanjith Karuparambil RamachandranChristophe DetavernierJie HuJoondong KimFrancis VerpoortSerge Zhuiykov

A1 Journal Article in JOURNAL OF MATERIALS CHEMISTRY C

Impact of changes in bond structure on ovonic threshold switching behaviour in GeSe2

Jonas KeukelierKarl OpsomerThomas NuyttenStefanie SergeantWouter DevulderSergiu ClimaLudovic GouxGouri Sankar KarChristophe Detavernier

A1 Journal Article in JOURNAL OF MATERIALS CHEMISTRY C

Impact of changes in bond structure on ovonic threshold switching behaviour in GeSe2 (vol 35, pg 151, 2020)

Jonas KeukelierKarl OpsomerThomas NuyttenStefanie SergeantWouter DevulderSergiu ClimaLudovic GouxGouri Sankar KarChristophe Detavernier

Improved reactor monitoring for advanced neutron irradiations

Jonas Vande PitteChristophe DetavernierJohan LauwaertInge Uytdenhouwen

In and ex situ characterization of atomic layer deposition processes for lithium-ion battery applications

Andreas WerbrouckChristophe DetavernierJolien Dendooven

In situ study of noble metal atomic layer deposition processes using grazing incidence small angle X-ray scattering

Jolien DendoovenE. SolanoJi-Yu FengRanjith Karuparambil RamachandranMatthias MinjauwMichiel Van DaeleA. CoatiD. Hermida-MerinoChristophe Detavernier

Influence of alumina addition on the optical properties and the thermal stability of titania thin films and inverse opals produced by atomic layer deposition

Martin WaleczekJolien DendoovenPavel DyachenkoAlexander Y. PetrovManfred EichRobert H. BlickChristophe DetavernierKornelius NielschKaline P. FurlanRobert Zierold

A1 Journal Article in NANOMATERIALS

Ion beam modification of the Ni-Si solid-phase reaction : the influence of substrate damage and nitrogen impurities introduced by ion implantation

K. van StiphoutFilip GeenenN. M. SantosS. M. C. MirandaV. JolyJ. DemeulemeesterC. MocutaC. M. ComrieChristophe DetavernierL. M. C. Pereira et al.

A1 Journal Article in JOURNAL OF PHYSICS D-APPLIED PHYSICS

Irradiation temperature monitoring with SiC for RPV steel at low fluence

Jonas Vande PitteI. UytdenhouwenA. GusarovD. Del SerraS. Van DyckChristophe DetavernierJohan Lauwaert

A1 Journal Article in JOURNAL OF NUCLEAR MATERIALS

Microstructured ZrO2 coating of iron oxide for enhanced CO2 conversion

Bo JinHilde PoelmanChristophe DetavernierZhiwu LiangGuy MarinVladimir Galvita

A1 Journal Article in APPLIED CATALYSIS B-ENVIRONMENTAL

Microwave-assisted synthesis of nanoscale VO2 structures

Matthias Van ZeleHannes RijckaertLaura Van BosseleDavy DeduytscheLenny Van DaeleEmile DrijversChristophe DetavernierIsabel Van DriesscheKlaartje De Buysser

A2 Journal Article in OPEN CERAMICS

Photonic integrated alumina waveguide gratings for far-field structured illumination at UV wavelengths

Chupao LinJuan Santo-Domingo PeñarandaJolien DendoovenChristophe DetavernierDavid SchaubroeckRoel BaetsNicolas Le Thomas

Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries

Lowie HenderickHamid HamedFelix MattelaerMatthias MinjauwMikko NisulaJohan MeersschautJolien DendoovenMohammadhosein SafariPhilippe VereeckenChristophe Detavernier

A1 Journal Article in JOURNAL OF POWER SOURCES

Plasma-enhanced atomic layer deposition : correlating O2 plasma parameters and species to blister formation and conformal film growth

Andreas WerbrouckKevin Van de KerckhoveDiederik DeplaDirk PoelmanPhilippe SmetJolien DendoovenChristophe Detavernier

A1 Journal Article in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Pulsed chemical vapor deposition of conformal GeSe for application as an OTS selector

Ali HaiderShaoren DengWouter DevulderJan Willem MaesJean-Marc GirardGabriel Khalil El HajjamGouri Sankar KarKarl OpsomerChristophe DetavernierMichael Givens et al.

A2 Journal Article in MATERIALS ADVANCES

Synthesis and deposition of thermochromic VO2 thin films from peroxide-based chemical solutions

Matthias Van ZeleHannes RijckaertDavy DeduytscheChristophe DetavernierIsabel Van DriesscheDirk PoelmanKlaartje De Buysser

Tuning of the thermal stability and ovonic threshold switching properties of GeSe with metallic and non-metallic alloying elements

Jonas KeukelierKarl OpsomerWouter DevulderSergiu ClimaLudovic GouxGouri Sankar KarChristophe Detavernier

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Tuning size and coverage of Pd nanoparticles using atomic layer deposition

Ji-Yu FengRanjith Karuparambil RamachandranEduardo Solano MinuesaMatthias MinjauwMichiel Van DaeleAndre VantommeDaniel Hermida-MerinoAlessandro CoatiHilde PoelmanChristophe Detavernier et al.

A1 Journal Article in APPLIED SURFACE SCIENCE

U(Mo) grain refinement induced by irradiation with high energy iodine

Daniele SalvatoJ. ShiH. BreitkreutzW. Van RenterghemB. BaumeisterC. SchwarzA. LeenaersSven Van den BergheChristophe DetavernierW. Petry

A1 Journal Article in JOURNAL OF NUCLEAR MATERIALS

Vapor phase conversion of Pt nanoparticles into Pt-Sn bimetallic nanoparticles

Nithin PoonkottilRanjith Karuparambil RamachandranEduardo Solano MinuesaNadadur Veeraraghavan SrinathJi-Yu FengAndreas WerbrouckMichiel Van DaeleMatthias MinjauwMatthias FilezHilde Poelman et al.

Waveguide‐coupled colloidal quantum dot light emitting diodes and detectors on a silicon nitride platform

Lukas ElsingerRobin PetitFrederik Van AckerNatalia Klaudia ZawackaIvo TangheKristiaan NeytsChristophe DetavernierPieter GeiregatZeger HensDries Van Thourhout

A1 Journal Article in LASER & PHOTONICS REVIEWS

2020

A liquid alkoxide precursor for the atomic layer deposition of aluminum oxide films

Li'ao CaoFelix MattelaerTimo SajavaaraJolien DendoovenChristophe Detavernier

A1 Journal Article in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

A secondary reaction pathway for the alumina atomic layer deposition process with trimethylaluminum and water, revealed by full-range, time-resolved in situ mass spectrometry

Andreas WerbrouckMahdi ShiraziFelix MattelaerSimon D. ElliottJolien DendoovenChristophe Detavernier

A1 Journal Article in JOURNAL OF PHYSICAL CHEMISTRY C

A waveguide-coupled colloidal quantum dot LED on a silicon nitride platform

Lukas ElsingerIvo TangheFrederik Van AckerNatalia Klaudia ZawackaRobin PetitKristiaan NeytsChristophe DetavernierPieter GeiregatZeger HensDries Van Thourhout

ALD encapsulation of QD-polymer composite films for luminescent applications

Natalia Klaudia ZawackaRobin PetitJakob KuhsPhilippe SmetChristophe DetavernierZeger Hens

Area-selective growth and nucleation enhancement during Ru ALD using the RuO4 precursor and H2-gas

Matthias MinjauwHannes RijckaertIsabel Van DriesscheChristophe DetavernierJolien Dendooven

Atomic Layer Deposition of Ru-containing materials using RuO4 as both the co-reactant and the metal source

Matthias MinjauwJi-Yu FengJolien DendoovenChristophe Detavernier

Atomic layer deposition of SnO2-based composite anodes for thin-film lithium-ion batteries

Bo ZhaoArpan DharaJolien DendoovenChristophe Detavernier

A1 Journal Article in FRONTIERS IN ENERGY RESEARCH

Atomic layer deposition of indium‐tin‐oxide as multifunctional coatings on V2O5 thin‐film model electrode for lithium‐ion batteries

Bo ZhaoMikko NisulaArpan DharaLowie HenderickFelix MattelaerJolien DendoovenChristophe Detavernier

A1 Journal Article in ADVANCED MATERIALS INTERFACES

Atomic layer deposition of localized boron- and hydrogen-doped aluminum oxide using trimethyl borate as a dopant precursor

Felix MattelaerMichiel Van DaeleMatthias MinjauwMikko NisulaSimon D. ElliottTimo SajavaaraJolien DendoovenChristophe Detavernier

A1 Journal Article in CHEMISTRY OF MATERIALS

Atomic layer deposition of metal sulphides for the embedding of colloidal quantum dots

Jakob KuhsChristophe DetavernierZeger Hens

Atomic layer deposition of nitrogen-doped Al phosphate coatings for Li-ion battery applications

Lowie HenderickHamid HamedFelix MattelaerMatthias MinjauwJohan MeersschautJolien DendoovenMohammadhosein SafariPhilippe VereeckenChristophe Detavernier

A1 Journal Article in ACS APPLIED MATERIALS & INTERFACES

Atomic layer deposition of palladium and bimetallic materials

Ji-Yu FengJolien DendoovenChristophe DetavernierHilde Poelman

Atomic layer deposition of platinum and gold

Michiel Van DaeleChristophe DetavernierJolien Dendooven

Atomic layer deposition of yttrium oxide films and their properties of water wettability

Bo ZhaoFelix MattelaerGeert RampelbergJolien DendoovenChristophe Detavernier

Boosting room-temperature magneto-ionics in a non-magnetic oxide semiconductor

Julius de RojasAlberto QuintanaAitor LopeandiaJoaquin SalgueroJose L. Costa-KramerLlibertat AbadMaciej O. LiedkeMaik ButterlingAndreas WagnerLowie Henderick et al.

A1 Journal Article in ADVANCED FUNCTIONAL MATERIALS

Conformal coating of complex substrates and powders by atomic layer deposition

Véronique CremersChristophe DetavernierJolien Dendooven

Copper nanocrystals-based conductive inks for printed electronics

Arnau Oliva PuigdomènechZeger HensChristophe Detavernier

Creation of gallium acid and platinum metal sites in bifunctional zeolite hydroisomerization and hydrocracking catalysts by atomic layer deposition

Lisa GeertsRanjith Karuparambil RamachandranJolien DendoovenSambhu RadhakrishnanJin Won SeoChristophe DetavernierJohan MartensSreeprasanth Pulinthanathu Sree

A1 Journal Article in CATALYSIS SCIENCE & TECHNOLOGY

Design of Li-containing layers with LiHMDS

Andreas WerbrouckFelix MattelaerMatthias MinjauwFrans MunnikJaakko JulinJolien DendoovenChristophe Detavernier

Designing nanoparticles and nanoalloys for gas-phase catalysis with controlled surface reactivity using colloidal synthesis and atomic layer deposition

Valentijn De CosterHilde PoelmanJolien DendoovenChristophe DetavernierVladimir Galvita

A1 Journal Article in MOLECULES

Effect of Rh in Ni-based catalysts on sulfur impurities during methane reforming

Stavros-Alexandros TheofanidisJohannis A. Z. PieterseHilde PoelmanAlessandro LongoMaarten SabbeMirella VirginieChristophe DetavernierGuy MarinVladimir Galvita

A1 Journal Article in APPLIED CATALYSIS B-ENVIRONMENTAL

FeO controls the sintering of iron-based oxygen carriers in chemical looping CO2 conversion

Jiawei HuHilde PoelmanGuy MarinChristophe DetavernierSibudjing KawiVladimir Galvita

A1 Journal Article in JOURNAL OF CO2 UTILIZATION

Formation and preferential orientation of Au-free Al/Ti-based ohmic contacts on different hexagonal nitride-based heterostructures

Filip GeenenA. ConstantEduardo Solano MinuesaDavy DeduytscheC. MocutaP. CoppensChristophe Detavernier

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Functionalization of nanostructured tungsten oxide thin films for nanodevices : from optoelectronics, ionics, to iontronics

Zhenyin HaiChristophe DetavernierSerge Zhuiykov

Hierarchical Fe-modified MgAl2O4 as Ni-catalyst support for methane dry reforming

Hao WangNadadur Veeraraghavan SrinathHilde PoelmanChristophe DetavernierPing LiGuy MarinVladimir Galvita

A1 Journal Article in CATALYSIS SCIENCE & TECHNOLOGY

In situ characterization of quantum dot photoluminescence during atomic layer deposition: towards stable Cd-free QD-based devices

Robin PetitNatalia Klaudia ZawackaJakob KuhsPhilippe SmetZeger HensChristophe Detavernier

In situ study of the thermal stability of supported Pt nanoparticles and their stabilization via atomic layer deposition overcoating

Eduardo Solano MinuesaJolien DendoovenJi-Yu FengPhilipp BruenerMatthias MinjauwRanjith Karuparambil RamachandranMichiel Van DaeleKevin Van de KerckhoveThomas DobbelaereAlessandro Coati et al.

A1 Journal Article in NANOSCALE

Mitigation of photon background in nanoplasmonic all-on-chip Raman sensors

Kristof ReynkensStéphane ClemmenAli RazaHaolan ZhaoJuan Santo-Domingo PeñarandaChristophe DetavernierRoel Baets

A1 Journal Article in OPTICS EXPRESS

Molecular layer deposition of 'magnesicone', a magnesium-based hybrid material

Jeroen KintFelix MattelaerSofie VandenbrouckeArbersha MuriqiMatthias MinjauwMikko NisulaPhilippe M. VereeckenMichael NolanJolien DendoovenChristophe Detavernier

A1 Journal Article in CHEMISTRY OF MATERIALS

Nitrogen doping of Al- and Ti-phosphate through plasma-enhanced ALD

Lowie HenderickHamid HamedFelix MattelaerMatthias MinjauwMomo SafariPhilippe VereeckenChristophe Detavernier

Ovonic threshold-switching GexSey chalcogenide materials : stoichiometry, trap nature, and material relaxation from first principles

Sergiu ClimaDaniele GarbinKarl OpsomerNaga S. AvasaralaWouter DevulderIlya ShlyakhovJonas KeukelierGabriele L. DonadioThomas WittersShreya Kundu et al.

A1 Journal Article in PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS

Photocatalytic lithography with atomic layer deposited TiO2 films to tailor biointerface properties

Sofie VandenbrouckeFelix MattelaerKarolien JansChristophe DetavernierTim StakenborgRita Vos

Plasmonic gold-embedded TiO2 thin films as photocatalytic self-cleaning coatings

Hannelore PeetersMaarten KeulemansGert NuytsFrederik VanmeertChen LiMatthias MinjauwChristophe DetavernierSara BalsSilvia LenaertsSammy W. Verbruggen

A1 Journal Article in APPLIED CATALYSIS B-ENVIRONMENTAL

Reaction mechanism of the Me3AuPMe3-H-2 plasma-enhanced ALD process

Michiel Van DaeleMatthew B. E. GriffithsMatthias MinjauwSean T. BarryChristophe DetavernierJolien Dendooven

A1 Journal Article in PHYSICAL CHEMISTRY CHEMICAL PHYSICS

Reaction pathways for atomic layer deposition with lithium hexamethyl disilazide, trimethyl phosphate, and oxygen plasma

Andreas WerbrouckFelix MattelaerMatthias MinjauwMikko NisulaJaakko JulinFrans MunnikJolien DendoovenChristophe Detavernier

A1 Journal Article in JOURNAL OF PHYSICAL CHEMISTRY C

Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy

Sofie VandenbrouckeElisabeth LevrauMatthias MinjauwMichiel Van DaeleEduardo Solano MinuesaRita VosJolien DendoovenChristophe Detavernier

Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy

Sofie VandenbrouckeElisabeth LevrauMatthias MinjauwMichiel Van DaeleEduardo Solano MinuesaRita VosJolien DendoovenChristophe Detavernier

A1 Journal Article in PHYSICAL CHEMISTRY CHEMICAL PHYSICS

Surface mobility and impact of precursor dosing during atomic layer deposition of platinum : in situ monitoring of nucleation and island growth

Jolien DendoovenMichiel Van DaeleEduardo SolanoRanjith Karuparambil RamachandranMatthias MinjauwAndrea RestaAlina VladYves GarreauAlessandro CoatiGiuseppe Portale et al.

A1 Journal Article in PHYSICAL CHEMISTRY CHEMICAL PHYSICS

The co-reactant role during plasma enhanced atomic layer deposition of palladium

Ji-Yu FengMatthias MinjauwRanjith Karuparambil RamachandranMichiel Van DaeleHilde PoelmanTimo SajavaaraJolien DendoovenChristophe Detavernier

A1 Journal Article in PHYSICAL CHEMISTRY CHEMICAL PHYSICS

The influence of fission products on the microstructural evolution of UMo based fuel systems : (nano)bubbles, interaction layers and recrystallization

Daniele SalvatoChristophe DetavernierSven Van den BergheAnn Leenaers

The initial formation stages of a nanobubble lattice in neutron irradiated U(Mo)

Daniele SalvatoA. LeenaersW. Van RenterghemSven Van den BergheChristophe DetavernierJ. H. Evans

A1 Journal Article in JOURNAL OF NUCLEAR MATERIALS

Thermal and plasma-enhanced atomic layer deposition of yttrium oxide films and the properties of water wettability

Bo ZhaoFelix MattelaerGeert RampelbergJolien DendoovenChristophe Detavernier

A1 Journal Article in ACS APPLIED MATERIALS & INTERFACES

Ultra-thin oxide semiconductors for optoelectronic and bioinspired optoelectronic applications

Mohammad Karbalaei AkbariSerge ZhuiykovChristophe Detavernier

Use of neutron absorbers to influence the neutron transmutation doping process in silicon

Jonas Vande PitteJ. WagemansA. GusarovI. UytdenhouwenChristophe DetavernierJohan Lauwaert

A1 Journal Article in NUCLEAR TECHNOLOGY

Waveguide-based detection of protease activity using surface-enhanced Raman spectroscopy

Nina TurkAli RazaPieter WuytensHans DemolMichiel Van DaeleChristophe DetavernierAndre SkirtachKris GevaertRoel Baets

Waveguide-based surface-enhanced Raman spectroscopy detection of protease activity using non-natural aromatic amino acids

Nina TurkAli RazaPieter WuytensHans DemolMichiel Van DaeleChristophe DetavernierAndre SkirtachKris GevaertRoel Baets

A1 Journal Article in BIOMEDICAL OPTICS EXPRESS

2019

3D LiMn2O4 thin-film electrodes for high rate all solid-state lithium and Li-ion microbatteries

Nouha LabyedhFelix MattelaerChristophe DetavernierPhilippe M Vereecken

A1 Journal Article in JOURNAL OF MATERIALS CHEMISTRY A

Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films

Fatemeh SM HashemiLi'ao CaoFelix MattelaerTimo SajavaaraJ Ruud van OmmenChristophe Detavernier

A1 Journal Article in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Assessing stability of metal tellurides as alternative photomask materials for extreme ultraviolet lithography

Vu LuongVicky PhilipsenKarl OpsomerJens RipEric HendrickxMarc HeynsChristophe DetavernierChristian LaubisFrank Scholze

A1 Journal Article in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

Atomic layer deposition of Al2O3 using aluminum triisopropoxide (ATIP) : a combined experimental and theoretical study

Ba Tai TruongLi'ao CaoFelix MattelaerGeert RampelbergFatemeh SM HashemiJolien DendoovenJ Ruud van OmmenChristophe DetavernierMarie-Françoise Reyniers

A1 Journal Article in JOURNAL OF PHYSICAL CHEMISTRY C

Atomic layer deposition of ZnO-SnO2 composite thin film : the influence of structure, composition and crystallinity on lithium-ion battery performance

Bo ZhaoFelix MattelaerJeroen KintAndreas WerbrouckLowie HenderickMatthias MinjauwJolien DendoovenChristophe Detavernier

A1 Journal Article in ELECTROCHIMICA ACTA

Atomic layer deposition of localised boron- and hydrogen-doped aluminium oxide using trimethyl borate as a dopant precursor

Felix MattelaerMichiel Van DaeleMatthias MinjauwTimo SajavaaraJolien DendoovenChristophe Detavernier

Atomic layer deposition of ruthenium and silver

Matthias MinjauwChristophe DetavernierJolien Dendooven

Atomic layer deposition of thin films as model electrodes : a case study of the synergistic effect in Fe2O3-SnO2

Jeroen KintFelix MattelaerMatthias MinjauwBo ZhaoChristophe Detavernier

A1 Journal Article in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Atomic layer deposition of vanadium oxides : process and application review

V. P. PrasadamN. BahlawaneFelix MattelaerGeert RampelbergChristophe DetavernierL. FangY. JiangK. MartensI. P. ParkinI. Papakonstantinou

A1 Journal Article in MATERIALS TODAY CHEMISTRY

Bifunctional earth-abundant phosphate/phosphide catalysts prepared via atomic layer deposition for electrocatalytic water splitting

Jan RongéThomas DobbelaereLowie HenderickMatthias MinjauwSreeprasanth Pulinthanathu SreeJolien DendoovenJohan A MartensChristophe Detavernier

A1 Journal Article in NANOSCALE ADVANCES

CO2 sorption properties of Li4SiO4 with a Li2ZrO3 coating

Lukas BuelensHilde PoelmanChristophe DetavernierGuy MarinVladimir Galvita

A1 Journal Article in JOURNAL OF CO2 UTILIZATION

Characterization of β-silicon carbide and potential use as irradiation temperature monitor

Jonas Vande PitteChristophe DetavernierJohan LauwaertInge UytdenhouwenAndrei GusarovJan Wagemans

Chemical and structural configuration of Pt-doped metal oxide thin films prepared by atomic layer deposition

Ranjith Karuparambil RamachandranMatthias FilezEduardo Solano MinuesaHilde PoelmanMatthias MinjauwMichiel Van DaeleJi-Yu FengAndrea La PortaThomas AltantzisEmiliano Fonda et al.

A1 Journal Article in CHEMISTRY OF MATERIALS

Chemical selectivity and nucleation during ALD of Ru with the RuO4 precursor

Matthias MinjauwHannes RijckaertIsabel Van DriesscheChristophe DetavernierJolien Dendooven

Comparison of free-space and waveguide-based SERS platforms

Nina TurkAli RazaPieter WuytensHans DemolMichiel Van DaeleChristophe DetavernierAndre SkirtachKris GevaertRoel Baets

A1 Journal Article in NANOMATERIALS

Composition optimization and device understanding of Si-Ge-As-Te ovonic threshold switch selector with excellent endurance

D. GarbinW. DevulderR. DegraeveG. L. DonadioS. ClimaK. OpsomerA. FantiniD. CellierW. G. KimM. Pakala et al.

Corrosion protection of Cu by atomic layer deposition

Véronique CremersGeert RampelbergKitty BaertShoshan AbrahamiNathalie ClaesThais Milagres de OliveiraHerman TerrynSara BalsJolien DendoovenChristophe Detavernier

A1 Journal Article in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Cost-reducing PE-ALD processes for pure and doped SiO2 thin films

Geert RampelbergVéronique CremersAndreas WerbrouckJolien DendoovenChristophe Detavernier

Cost-reducing PE-ALD processes for pure and doped SiO2 thin films

Geert RampelbergVéronique CremersAndreas WerbrouckJolien DendoovenChristophe Detavernier

Doped and un-doped GeSe2 for OTS : Raman spectroscopy and electrical measurements

Jonas KeukelierKarl OpsomerThomas NuyttenLudovic GouxGouri Sankar KarChristophe Detavernier

Effectiveness of ligand denticity-dependent oxidation protection in copper MOD inks

W MarchalFelix MattelaerKristof Van HeckeV BrioisA LongoD ReenaersK ElenChristophe DetavernierW DefermeMK Van Bael et al.

A1 Journal Article in LANGMUIR

Electron transfer and near-field mechanisms in plasmonic gold-nanoparticle-modified TiO2 photocatalytic systems

Ramesh AsapuNathalie ClaesRadu-George CiocarlanMatthias MinjauwChristophe DetavernierPegie CoolSara BalsSammy W. Verbruggen

A1 Journal Article in ACS APPLIED NANO MATERIALS

Epitaxial quantum dot superlattices : forcing connections to improve processing and properties

Willem WalravensZeger HensChristophe DetavernierGünther Roelkens

Fe2O3-MgAl2O4 for CO production from CO2 : Mössbauer spectroscopy and in situ X-ray diffraction

Lukas BuelensToon Van AlboomHilde PoelmanChristophe DetavernierGuy MarinVladimir Galvita

A1 Journal Article in ACS SUSTAINABLE CHEMISTRY & ENGINEERING

Fingerprinting of ALD reaction products with time-resolved in situ mass spectrometry

Andreas WerbrouckFelix MattelaerJolien DendoovenChristophe Detavernier

Formation and functioning of bimetallic nanocatalysts : the power of X-ray probes

Matthias FilezEvgeniy A RedekopJolien DendoovenRanjith Karuparambil RamachandranEduardo SolanoUnni OlsbyeBert M WeckhuysenVladimir GalvitaHilde PoelmanChristophe Detavernier et al.

A1 Journal Article in ANGEWANDTE CHEMIE-INTERNATIONAL EDITION

Impact of atomic layer deposition on the photoluminescence of colloidal quantum dots

Jakob KuhsAndreas WerbrouckNatalia Klaudia ZawackaEmile DrijversPhilippe SmetZeger HensChristophe Detavernier

Impurity-enhanced solid-state amorphization : the Ni-Si thin film reaction altered by nitrogen

Koen van StiphoutFilip GeenenNuno M SantosSergio MC MirandaVincent JolyJ DemeulemeesterChristophe DetavernierFelipe KremerLino MC PereiraKristiaan Temst et al.

A1 Journal Article in JOURNAL OF PHYSICS D-APPLIED PHYSICS

In situ X-ray based characterization of atomic layer deposition

Matthias MinjauwChristophe DetavernierJolien Dendooven

In situ photoluminescence of colloidal quantum dots during gas exposure : the role of water and reactive atomic layer deposition precursors

Jakob KuhsAndreas WerbrouckNatalia Klaudia ZawackaEmile DrijversPhilippe SmetZeger HensChristophe Detavernier

A1 Journal Article in ACS APPLIED MATERIALS & INTERFACES

Integrated silicon nitride electro-optic modulators with atomic layer deposited overlays

Artur HermansMichiel Van DaeleJolien DendoovenStéphane ClemmenChristophe DetavernierRoel Baets

A1 Journal Article in OPTICS LETTERS

Kinetic and thermodynamic description of intermediary phases formation in Ti-Al system during reactive sintering

Andrea SkolakovaJindrich LeitnerPavel SalvetrPavel NovakDavy DeduytscheJaromir KopecekChristophe DetavernierDalibor Vojtech

A1 Journal Article in MATERIALS CHEMISTRY AND PHYSICS

Kinetics of lifetime changes in bimetallic nanocatalysts revealed by quick X-ray absorption spectroscopy

Matthias FilezHilde PoelmanEvgeniy RedekopVladimir GalvitaKonstantinos AlexopoulosMaria MeldinaRanjith RamachandranJolien DendoovenChristophe DetavernierGustaaf Van Tendeloo et al.

Ligand binding to copper nanocrystals : amines and carboxylic acids and the role of surface oxides

Arnau Oliva PuigdomènechJonathan De RooJakob KuhsChristophe DetavernierJosé MartinsZeger Hens

A1 Journal Article in CHEMISTRY OF MATERIALS

Mask absorber development to enable next-generation EUVL

Vicky PhilipsenKim Vu LuongKarl OpsomerLaurent SouriauJens RipChristophe DetavernierAndreas ErdmannPeter EvanschitzkyChristian LaubisPhilipp Hoenicke et al.

Micro-Transfer-Printing of Al2O3-Capped Short-Wave-Infrared PbS Quantum Dot Photoconductors

Nayyera MahmoudWillem WalravensJakob KuhsChristophe DetavernierZeger HensGünther Roelkens

A1 Journal Article in ACS APPLIED NANO MATERIALS

Molecular layer deposition for applications in lithium ion batteries

Kevin Van de KerckhoveJolien DendoovenChristophe Detavernier

Multi-spectral SWIR PbS quantum dot pixels realized using transfer printing

Nayyera MahmoudWillem WalravensRobin PetitMichiel Van DaeleChristophe DetavernierZeger HensGünther Roelkens

Near room temperature plasma enhanced atomic layer deposition of gold metal

Michiel Van DaeleMatthew BE GriffithsAli RazaMatthias MinjauwSeán T BarryRoel BaetsChristophe DetavernierJolien Dendooven

Near room temperature plasma enhanced atomic layer deposition of gold metal

Michiel Van DaeleMatthew BE GriffithsAli RazaMatthias MinjauwSeán T BarryRoel BaetsChristophe DetavernierJolien Dendooven

Nitrogen doping of Al- and Ti-phosphate through plasma-enhanced ALD

Lowie HenderickFelix MattelaerMatthias MinjauwChristophe Detavernier

Novel thin-film solid nanocomposite electrolyte for lithium-Ion batteries by combined MLD and ALD

Simon HollevoetKnut Bjarne GandrudMarina Y. TimmermansBrecht PutYousra El AjjouriKevin Van de KerckhoveChristophe DetavernierMaarten MeesPhilippe M. Vereecken

A1 Journal Article in ADVANCED MATERIALS INTERFACES

Nucleation enhancement and area-selective atomic layer deposition of ruthenium using RuO4 and H2 gas

Matthias MinjauwHannes RijckaertIsabel Van DriesscheChristophe DetavernierJolien Dendooven

A1 Journal Article in CHEMISTRY OF MATERIALS

On-chip surface enhanced raman spectroscopy using ALD grown plasmonic nanotrenches integrated with a silicon nitride slot waveguide

Ali RazaStéphane ClemmenMichiel Van DaeleJolien DendoovenMatthew BE GriffithsSean T BarryAndre SkirtachChristophe DetavernierRoel Baets

Photocatalytic lithography with atomic layer-deposited TiO2 films to tailor biointerface properties

Sofie VandenbrouckeFelix MattelaerKarolien JansChristophe DetavernierTim StakenborgRita Vos

A1 Journal Article in ADVANCED MATERIALS INTERFACES

Plasma enhanced atomic layer deposition of gallium sulfide thin films

Jakob KuhsZeger HensChristophe Detavernier

A1 Journal Article in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Plasma-enhanced atomic layer deposition of nanostructured gold near room temperature

Michiel Van DaeleMatthew BE GriffithsAli RazaMatthias MinjauwEduardo SolanoJi-Yu FengRanjith Karuparambil RamachandranStéphane ClemmenRoel BaetsSeán T Barry et al.

A1 Journal Article in ACS APPLIED MATERIALS & INTERFACES

Pressure-induced deactivation of core-shell nanomaterials for catalyst assisted chemical looping

Jiawei HuVladimir GalvitaHilde PoelmanChristophe DetavernierGuy Marin

A1 Journal Article in APPLIED CATALYSIS B-ENVIRONMENTAL

Redox layer deposition of thin films of MnO2 on nanostructured substrates from qqueous solutions

Stanislaw P ZankowskiLaurens van HoeckeFelix MattelaerMarc de RaedtOlivier RichardChristophe DetavernierPhilippe M Vereecken

A1 Journal Article in CHEMISTRY OF MATERIALS

Selective electroless deposition of cobalt using amino-terminated SAMs

Ivan ZyulkovSilvia ArminiKarl OpsomerChristophe DetavernierStefan De Gendt

A1 Journal Article in JOURNAL OF MATERIALS CHEMISTRY C

Setting carriers free : healing faulty interfaces promotes delocalization and transport in nanocrystal solids

Willem WalravensEduardo SolanoFilip GeenenJolien DendoovenOleg GorobtsovAthmane TadjineNayyera MahmoudPatrick Peiwen DingJacob P. C. RuffAndrej Singer et al.

A1 Journal Article in ACS NANO

Sonochemical functionalization of the low-dimensional surface oxide of Galinstan for heterostructured optoelectronic applications

Mohammad Karbalaei AkbariZhenyin HaiZihan WeiRanjith Karuparambil RamachandranChristophe DetavernierMalkeshkumar PatelJoondong KimFrancis VerpoortHongliang LuSerge Zhuiykov

A1 Journal Article in JOURNAL OF MATERIALS CHEMISTRY C

Stabilizing fluoride phosphors : surface modification by atomic layer deposition

Reinert VerstraeteGeert RampelbergHannes RijckaertIsabel Van DriesscheElizabeth CoetseeMart-Mari DuvenhagePhilippe SmetChristophe DetavernierHendrik SwartDirk Poelman

A1 Journal Article in CHEMISTRY OF MATERIALS

Stabilizing red fluoride phosphors for white LEDs using atomic layer deposition

Reinert VerstraeteHannes RijckaertGeert RampelbergElizabeth CoetseeMart-Mari DuvenhageChristophe DetavernierHendrik SwartPhilippe SmetDirk Poelman

Surface reactions during thermal and plasma-enhanced atomic layer deposition of titanium dioxide films using tetrakis(dimethylamino)titanium

Sofie VandenbrouckeElisabeth LevrauMatthias MinjauwKevin Van de KerckhoveKilian Devloo-CasierSreeprasanth Pulinthanathu SreeJohan A MartensRita VosKarolien JansJolien Dendooven et al.

Surface treatment of fluoride phosphors using atomic layer deposition

Reinert VerstraeteHannes RijckaertGeert RampelbergElizabeth CoetseeMart-Mari DuvenhageChristophe DetavernierHendrik SwartPhilippe SmetDirk Poelman

Switchable Piezoresistive SmS thin films on large area

Andreas SousanisDirk PoelmanChristophe DetavernierPhilippe Smet

A1 Journal Article in SENSORS

Time-resolved in-situ mass spectrometry for monitoring and identifying reaction products in ALD processes

Andreas WerbrouckFelix MattelaerJolien DendoovenChristophe Detavernier

Ultra-thin sub-10 nm Ga2O3-WO3 heterostructures developed by atomic layer deposition for sensitive and selective C2H5OH detection on ppm level

Zihan WeiMohammad Karbalaei AkbariZhenyin HaiRanjith Karuparambil RamachandranChristophe DetavernierFrancis VerpoortEugene KatsHongyan XuJie HuSerge Zhuiykov

A1 Journal Article in SENSORS AND ACTUATORS B-CHEMICAL

Wafer-scale fabrication of sub-10 nm TiO2-Ga2O3 n-p heterojunctions with efficient photocatalytic activity by atomic layer deposition

Hongyan XuFeng HanChengkai XiaSiyan WangRanjith Karuparambil RamachandranChristophe DetavernierMinsong WeiLiwei LinSerge Zhuiykov

A1 Journal Article in NANOSCALE RESEARCH LETTERS

Wafer-scale fabrication of sub-10nm TiO2-Ga2O3 n-p heterojunctions with efficient photocatalytic activity by atomic layer deposition (vol 14, 163, 2019)

Hongyan XuFeng HanChengkai XiaSiyan WangRanjith Karuparambil RamachandranChristophe DetavernierMinsong WeiLiwei LinSerge Zhuiykov

2018

A Synchrotron’s View on Birth, Life and Death of Pt-In Catalysts

Hilde PoelmanMatthias FilezEvgeniy RedekopVladimir GalvitaM. MeledinaG. Van TendelooRanjith Karuparambil RamachandranJolien DendoovenChristophe DetavernierGuy Marin

ALD assisted nanoplasmonic slot waveguide for on-chip enhanced Raman spectroscopy

Ali RazaStéphane ClemmenPieter WuytensMuhammad MuneebMichiel Van DaeleJolien DendoovenChristophe DetavernierAndre SkirtachRoel Baets

A1 Journal Article in APL PHOTONICS

ALD deposited thin films as model electrodes : a case study of the synergistic effect in Fe2O3-SnO2

Jeroen KintFelix MattelaerChristophe Detavernier

ALD deposited thin films as model electrodes : a case study of the synergistic effect in Fe2O3-SnO2

Jeroen KintFelix MattelaerChristophe Detavernier

ALD-developed plasmonic two-dimensional Au-WO3-TiO2 heterojunction architectonics for design of photovoltaic devices

Mohammad Karbalaei AkbariZhenyin HaiZihan WeiChristophe DetavernierEduardo Solano MinuesaFrancis VerpoortSerge Zhuiykov

A1 Journal Article in ACS APPLIED MATERIALS & INTERFACES

Annealing of thin 'Tincone' films, a tin-based hybrid material deposited by molecular layer deposition, in reducing, inert, and oxidizing atmospheres

Kevin Van de KerckhoveJolien DendoovenChristophe Detavernier

A1 Journal Article in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Atomic layer deposition for interface engineering of (thin-film) lithium-ion battery

Felix MattelaerMarina Y TimmermansPhilippe M VereeckenJolien DendoovenChristophe Detavernier

Axiotaxy and epitaxial textures in C54-TiSi2 films on Si(001) and Si(111) substrates

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A1 Journal Article in JOURNAL OF PHYSICS D-APPLIED PHYSICS

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A1 Journal Article in APPLIED CATALYSIS B-ENVIRONMENTAL

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A1 Journal Article in APPLIED CATALYSIS B-ENVIRONMENTAL

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Developing of photo-thermally stable QD-polymer composite films for luminescent applications

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E-beam-lithography free plasmonic slot waveguides for on-chip Raman spectroscopy

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A1 Journal Article in ADVANCED ELECTRONIC MATERIALS

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A1 Journal Article in CHEMICAL ENGINEERING JOURNAL

Effect of thermal annealing and chemical treatments on secondary electron emission properties of atomic layer deposited MgO

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Fe-Containing magnesium aluminate support for stability and carbon control during methane reforming

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A1 Journal Article in ACS CATALYSIS

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Natalie Y LabradorEva L SongcuanChathuranga De SilvaHan ChenSophia J KurdzielRanjith Karuparambil RamachandranChristophe DetavernierDaniel V Esposito

A1 Journal Article in ACS CATALYSIS

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A1 Journal Article in ANGEWANDTE CHEMIE-INTERNATIONAL EDITION

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A1 Journal Article in APPLIED CATALYSIS B-ENVIRONMENTAL

Microtransfer printing of Al2O3 -passivated SWIR-PbS QDs photoconductors

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Molecular layer deposition using ring-opening reactions : molecular modeling of the film growth and the effects of hydrogen peroxide

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A1 Journal Article in ACS OMEGA

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A1 Journal Article in APPLIED SCIENCES-BASEL

Novel EUV mask absorber evaluation in support of next-generation EUV imaging

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A1 Journal Article in APPLIED CATALYSIS A-GENERAL

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A1 Journal Article in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Pore pressure estimation in irradiated UMo

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A1 Journal Article in ACS APPLIED MATERIALS & INTERFACES

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Surface species during ALD of platinum observed with in situ reflection IR spectroscopy

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A1 Journal Article in PHYSICAL CHEMISTRY CHEMICAL PHYSICS

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The transformation behaviour of 'alucones', deposited by molecular layer deposition, in nanoporous Al2O3 layers

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A1 Journal Article in DALTON TRANSACTIONS

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A1 Journal Article in VACUUM

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A1 Journal Article in JOURNAL OF MATERIALS CHEMISTRY B

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A1 Journal Article in ACS NANO

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3D Monte Carlo model for simulation of ALD on complex substrates

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3D porous nanostructured platinum prepared using atomic layer deposition

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A1 Journal Article in JOURNAL OF MATERIALS CHEMISTRY A

A USB-controlled potentiostat/galvanostat for thin-film battery characterization

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A2 Journal Article in HARDWAREX

A core-shell structured Fe2O3/ZrO2@ZrO2 nanomaterial with enhanced redox activity and stability for CO2 conversion

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A1 Journal Article in JOURNAL OF CO2 UTILIZATION

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A synchrotron look into the lifecycle Of Pt-In catalysts

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Felix MattelaerKobe GerylThomas DobbelaereGeert RampelbergJolien DendoovenChristophe Detavernier

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A1 Journal Article in ACS APPLIED MATERIALS & INTERFACES

Atomic layer deposition for catalysis

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Bookchapter in Nanotechnology in catalysis : applications in the chemical industry, energy development, and environment protection

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A2 Journal Article in ECS TRANSACTIONS

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A1 Journal Article in APPLIED MATERIALS TODAY

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A1 Journal Article in COMPOSITES COMMUNICATIONS

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A1 Journal Article in THIN SOLID FILMS

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Bookchapter in Atomic layer deposition in energy conversion applications

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A1 Journal Article in APPLIED CATALYSIS B-ENVIRONMENTAL

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Electro-optic modulation in silicon nitride photonic integrated circuits by means of ALD ZnO overlays

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Plasma enhanced atomic layer deposition of aluminium sulphide

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Plasma enhanced atomic layer deposition of zinc sulfide thin films

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Special issue: Materials for advanced metallization 2016 (MAM 2016) : preface

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Editorial material

Te-based chalcogenide materials for selector applications

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A1 Journal Article in SCIENTIFIC REPORTS

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A1 Journal Article in ACTA MATERIALIA

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A1 Journal Article in ADVANCED MATERIALS INTERFACES

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Wet-chemical synthesis of 3D stacked thin film metal-oxides for all-solid-state Li-ion batteries

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A1 Journal Article in MATERIALS

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A1 Journal Article in JOURNAL OF PHYSICS D-APPLIED PHYSICS

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A1 Journal Article in NANOMATERIALS

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A1 Journal Article in RSC ADVANCES

Atomic layer deposition route to tailor nanoalloys of noble and non-noble metals

Ranjith Karuparambil RamachandranJolien DendoovenMatthias FilezVladimir GalvitaHilde PoelmanEduardo Solano MinuesaMatthias MinjauwKilian Devloo-CasierEmiliano FondaDaniel Hermida-Merino et al.

A1 Journal Article in ACS NANO

Chemically triggered formation of two-dimensional epitaxial quantum dot superlattices

Willem WalravensJonathan De RooEmile DrijversStephanie ten BrinckEduardo Solano MinuesaJolien DendoovenChristophe DetavernierIvan InfanteZeger Hens

A1 Journal Article in ACS NANO

Controlled formation of epitaxially connected nanocrystal superlattices: an important step towards application in opto-electronic devices

Willem WalravensJonathan De RooEmile DrijversStephanie ten BrinckEduardo Solano MinuesaJolien DendoovenChristophe DetavernierIvan InfanteZeger Hens

Deactivation study of Fe2O3−CeO2 during redox cycles for CO production from CO2

Naga Venkata Ranga Aditya DharanipragadaMaria MeledinaVladimir GalvitaHilde PoelmanStuart TurnerGustaaf Van TendelooChristophe DetavernierGuy Marin

A1 Journal Article in INDUSTRIAL & ENGINEERING CHEMISTRY RESEARCH

Direct imaging of ALD deposited Pt nanoclusters inside the giant pores of MIL-101

Maria MeledinaStuart TurnerMaria FilippousiKaren LeusIvan LobatoRanjith Karuparambil RamachandranJolien DendoovenChristophe DetavernierPascal Van Der VoortGustaaf Van Tendeloo

A1 Journal Article in PARTICLE & PARTICLE SYSTEMS CHARACTERIZATION

Effect of annealing atmosphere on LiMn2O4 for thin film Li-ion batteries from aqueous chemical solution deposition

G MainoJ D'HaenFelix MattelaerChristophe DetavernierA HardyMK Van Bael

A1 Journal Article in JOURNAL OF MATERIALS CHEMISTRY A

Electro-precipitation via oxygen reduction : a new technique for thin film manganese oxide deposition

Gijs VanhoutteMinxian WuStijn SchaltinFelix MattelaerChristophe DetavernierPhilippe M VereeckenKoen BinnemansJan Fransaer

A1 Journal Article in JOURNAL OF MATERIALS CHEMISTRY A

Formation of CuInSe2 films from metal sulfide and selenide precursor nanocrystals by gas-phase selenization, an in-situ XRD study

Boris CaponRuben DierickZeger HensChristophe Detavernier

A1 Journal Article in THIN SOLID FILMS

Formation of nickel silicides in the ultra-thin film regime (<10nm)

Filip GeenenEduardo Solano MinuesaCristian MocutaChristophe Detavernier

Formation of ultrathin, stable and epitaxial silicides for semiconductor contacts

Filip GeenenC MocutaChristophe Detavernier

Hydroisomerization and hydrocracking activity enhancement of a hierarchical ZSM-5 zeolite catalyst via atomic layer deposition of aluminium

Sreeprasanth Pulinthanathu SreeJolien DendoovenPieter CMM MagusinKarine ThomasJean-Pierre GilsonFrancis TaulelleChristophe DetavernierJohan Martens

A1 Journal Article in CATALYSIS SCIENCE & TECHNOLOGY

In situ electron paramagnetic resonance and X-ray diffraction monitoring of temperature-induced breathing and related structural transformations in activated V-doped MIL-53(Al)

Irena NevjesticHannes DepauwKaren LeusGeert RampelbergClaire MurrayChristophe DetavernierPascal Van Der VoortFreddy CallensHenk Vrielinck

A1 Journal Article in JOURNAL OF PHYSICAL CHEMISTRY C

In situ solid-state 13C NMR observation of pore mouth catalysis in etherification of β-citronellene with ethanol on zeolite beta

Sambhu RadhakrishnamPieter-Jan GoossensPieter CMM MagusinSreeprasanth Pulinthanathu SreeChristophe DetavernierEric BreynaertCharlotte MartineauFrancis TaulelleJohan A Martens

A1 Journal Article in JOURNAL OF THE AMERICAN CHEMICAL SOCIETY

In situ synchrotron based fluorescence and scattering techniques : a study of quantum dot encapsulation by atomic layer deposition

Kilian Devloo-CasierChristophe DetavernierJolien Dendooven

Kinetics of multi-step redox processes by time-resolved In situ X-ray diffraction

Lukas BuelensVladimir GalvitaHilde PoelmanChristophe DetavernierGuy Marin

A1 Journal Article in CHEMIE INGENIEUR TECHNIK

Magnetic and electrical characterization of nickel-rich NiFe thin films synthesized by atomic layer deposition and subsequent thermal reduction

Alvaro P EspejoRobert ZieroldJohannes GoothJolien DendoovenChristophe DetavernierJuan EscrigKornelius Nielsch

A1 Journal Article in NANOTECHNOLOGY

Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing

Felix MattelaerTom BosserezJan RongéJohan MartensJolien DendoovenChristophe Detavernier

A1 Journal Article in RSC ADVANCES

Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition

Jolien DendoovenEduardo Solano MinuesaMatthias MinjauwKevin Van de KerckhoveAlessandro CoatiEmiliano FondaGiuseppe PortaleYves GarreauChristophe Detavernier

A1 Journal Article in REVIEW OF SCIENTIFIC INSTRUMENTS

Molecular layer deposition of 'titanicone', a titanium-based hybrid material, as an electrode for lithium-ion batteries

Kevin Van de KerckhoveFelix MattelaerDavy DeduytschePhilippe M VereeckenJolien DendoovenChristophe Detavernier

A1 Journal Article in DALTON TRANSACTIONS

Monte Carlo simulations of ALD on 3D large surface area structures

Véronique CremersFilip GeenenChristophe DetavernierJolien Dendooven

Monte Carlo simulations of atomic layer deposition on 3D large surface area structures

Véronique CremersFilip GeenenChristophe DetavernierJolien Dendooven

Novel method for conformal LiMn2O4 thin films fabrication on planar and 3D microstructure substrates

Nouha LabyedhMarina TimmermansFelix MattelaerMaarten MeesChristophe DetavernierPhilippe M Vereecken

One-pot synthesis of Pt catalysts based on layered double hydroxides: an application in propane dehydrogenation

Matthias FilezEvgeniy RedekopHilde PoelmanVladimir GalvitaM MeledinaS TurnerG Van TendelooChristophe DetavernierGuy Marin

A1 Journal Article in CATALYSIS SCIENCE & TECHNOLOGY

Perpendicular magnetic anisotropy of Co\Pt bilayers on ALD HfO2

Bart F VermeulenJackson WuJohan SwertsSebastien CouetDimitri LintenIuliana P RaduKristiaan TemstGeert RampelbergChristophe DetavernierGuido Groeseneken et al.

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Phase formation and texture of thin film nickel germanides

Bob De SchutterChristophe Detavernier

Phase formation and texture of thin nickel germanides on Ge(001) and Ge(111)

Bob De SchutterK Van StiphoutNM SantosE BladtJ Jordan-SweetS BalsC LavoieCM ComrieA VantommeChristophe Detavernier

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Plasma enhanced atomic layer deposition of zinc sulfide

Jakob KuhsZeger HensChristophe Detavernier

Plasma-enhanced ALD : a route to hydrophilic, glueable PTFE

Geert RampelbergAmit Kumar RoyJolien DendoovenDavy DeduytscheKilian Devloo-CasierKim RagaertLudwig CardonChristophe Detavernier

Plasma-enhanced ALD on particles and powders

Geert RampelbergDelphine LongrieDavy DeduytscheJohan HaemersChristophe Detavernier

Plasma-enhanced atomic layer deposition of iron and titanium phosphates as electrode materials for 3D-structured lithium-ion microbatteries

Thomas DobbelaereFelix MattelaerJolien DendoovenPhilippe M VereeckenChristophe Detavernier

Plasma-enhanced atomic layer deposition of iron phosphate as a positive electrode for 3D lithium-ion microbatteries

Thomas DobbelaereFelix MattelaerJolien DendoovenPhilippe VereeckenChristophe Detavernier

A1 Journal Article in CHEMISTRY OF MATERIALS

Plasma-enhanced atomic layer deposition of zinc phosphate

Thomas DobbelaereMatthias MinjauwTareq AhmadPM VereeckenChristophe Detavernier

A1 Journal Article in JOURNAL OF NON-CRYSTALLINE SOLIDS

Se-containing inks for the formation of CuInSe2 films without gas-phase selenization

Jorick MaesRuben DierickBoris CaponChristophe DetavernierZeger Hens

A1 Journal Article in SOLAR ENERGY MATERIALS AND SOLAR CELLS

Semiconductor-metal transition in ALD deposited vanadium oxide thin films and nanoparticles

Geert RampelbergBob De SchutterWouter DevulderMarc SchaekersKoen MartensChristian DussarratChristophe Detavernier

Stability of switchable SmS for piezoresistive applications

Andreas SousanisPhilippe SmetChristophe DetavernierDirk Poelman

Study of amorphous Cu-Te-Si thin films showing high thermal stability for application as a cation supply layer in conductive bridge random access memory devices

Wouter DevulderKarl OpsomerMatthias MinjauwJohan MeersschautMalgorzata JurczakLudovic GouxChristophe Detavernier

A1 Journal Article in RSC ADVANCES

Study of chalcogenide thin films and their application as a cation supply layer in conductive bridge random access memory devices

Wouter DevulderChristophe Detavernier

Super-dry reforming of methane intensifies CO2 utilization via Le Chatelier's principle

Lukas BuelensVladimir GalvitaHilde PoelmanChristophe DetavernierGuy Marin

A1 Journal Article in SCIENCE

Texture in thin film silicides and germanides : a review

Bob De SchutterKoen De KeyserC LavoieChristophe Detavernier

A1 Journal Article in APPLIED PHYSICS REVIEWS

Thermal and plasma enhanced atomic layer deposition on powders and particles

Geert RampelbergVéronique CremersDelphine LongrieDavy DeduytscheJohan HaemersChristophe Detavernier

Thin film synthesis of VO2 and VN by gas-solid reactions and atomic layer deposition

Geert RampelbergChristophe Detavernier

Thin, low roughness Ru films deposited by thermal and plasma enhanced atomic layer deposition using RuO4 and H2 at low temperatures

Matthias MinjauwJolien DendoovenBoris CaponChristian DussaratEduardo Solano MinuesaKilian Devloo-CasierJakob KuhsMarc SchaekersAlessandro CoatiChristophe Detavernier

Thin, low roughness Ru films deposited by thermal and plasma enhanced atomic layer deposition using RuO4 and H2 at low temperatures

Matthias MinjauwJolien DendoovenChristian DussaratEduardo Solano MinuesaKilian Devloo-CasierJakob KuhsMarc SchaekersAlessandro CoatiChristophe Detavernier

Thin, low roughness Ru films deposited by thermal and plasma enhanced atomic layer deposition using RuO4 and H2 at low temperatures

Matthias MinjauwJolien DendoovenBoris CaponChristian DussaratEduardo Solano MinuesaKilian Devloo-CasierJakob KuhsMarc SchaekersAlessandro CoatiChristophe Detavernier

Visualization and classification of epitaxial alignment at hetero-phase boundaries

Bob De SchutterKoen De KeyserChristophe Detavernier

A1 Journal Article in THIN SOLID FILMS

2015

Alternative design of Pt-based catalysts : an X-ray spectroscopic view

Matthias FilezGuy MarinChristophe Detavernier

Amorphous and perovskite Li3xLa(2/3)-xTiO3 (thin) films via chemical solution deposition : solid electrolytes for all-solid-state Li-ion batteries

EJ van den HamN PeysC De DobbelaereJ D'HaenFelix MattelaerChristophe DetavernierPHL NottenA HardyMK Van Bael

A1 Journal Article in JOURNAL OF SOL-GEL SCIENCE AND TECHNOLOGY

Antimony sulfide as a light absorber in highly ordered, coaxial nanocylindrical arrays: preparation and integration into a photovoltaic device

Yanlin WuLoïc AssaudCarola KryschiBoris CaponChristophe DetavernierLionel SantinacciJulien Bachmann

A1 Journal Article in JOURNAL OF MATERIALS CHEMISTRY A

Atomic layer deposited second-order nonlinear optical metamaterial for back-end integration with CMOS-compatible nanophotonic circuitry

Stéphane ClemmenArtur HermansEduardo Solano MinuesaJolien DendoovenKalle KoskinenMartti KauranenEdouard BrainisChristophe DetavernierRoel Baets

A1 Journal Article in OPTICS LETTERS

Atomic layer deposition of ruthenium at 100 °C using the RuO4-precursor and H2

Matthias MinjauwJolien DendoovenBoris CaponMarc SchaekersChristophe Detavernier

A1 Journal Article in JOURNAL OF MATERIALS CHEMISTRY C

Catalyst-assisted chemical looping for CO2 conversion to CO

Vladimir GalvitaHilde PoelmanChristophe DetavernierGuy Marin

A1 Journal Article in APPLIED CATALYSIS B-ENVIRONMENTAL

Combinatorial study of Ag-Te thin films and their application as cation supply layer in CBRAM cells

Wouter DevulderKarl OpsomerJohan MeersschautDavy DeduytscheMalgorzata JurczakLudovic GouxChristophe Detavernier

A1 Journal Article in ACS COMBINATORIAL SCIENCE

Conductive filaments multiplicity as a variability factor in CBRAM

U CelanoL GouxA BelmonteK OpsomerChristophe DetavernierM JurczakW Vandervorst

Deposition of MnO anode and MnO2 cathode thin films by plasma enhanced atomic layer deposition using the Mn(thd)3 precursor

Felix MattelaerPhilippe VereeckenJolien DendoovenChristophe Detavernier

A1 Journal Article in CHEMISTRY OF MATERIALS

Electrodeposition of thick MnO2 films on restrictive substrates

Marina TimmermansFelix MattelaerChristophe DetavernierPhilippe M Vereecken

Electronic defect study on low temperature processed Cu(In,Ga)Se2 thin-film solar cells and the influence of an Sb layer

Lisanne Van PuyveldeJohan LauwaertA TempezWouter DevulderS NishiwakiF PianezziChristophe DetavernierAN TiwariHenk Vrielinck

A1 Journal Article in JOURNAL OF PHYSICS D-APPLIED PHYSICS

Electropolymerization of poly(phenylene oxide) films with variable thickness

Marina TimmermansStella DeheryanFelix MattelaerChristophe DetavernierPhilippe M Vereecken

Fuel swelling and interaction layer formation in the SELENIUM Si and ZrN coated U(Mo) dispersion fuel plates irradiated at high power in BR2

Ann LeenaersS Van den BergheE KoonenV KuzminovChristophe Detavernier

A1 Journal Article in JOURNAL OF NUCLEAR MATERIALS

Improved thermal stability and retention properties of Cu-Te based CBRAM by Ge alloying

Wouter DevulderKarl OpsomerGeert RampelbergBob De SchutterKilian Devloo-CasierMalgorzata JurczakLudovic GouxChristophe Detavernier

A1 Journal Article in JOURNAL OF MATERIALS CHEMISTRY C

In situ X-ray diffraction study of the controlled oxidation and reduction in the V-O system for the synthesis of VO2 and V2O3 thin films

Geert RampelbergBob De SchutterWouter DevulderKoen MartensIuliana RaduChristophe Detavernier

A1 Journal Article in JOURNAL OF MATERIALS CHEMISTRY C

Influence of alloying elements on the phase formation of ultrathin Ni (<10nm) on Si(001) substrates

Filip GeenenKoen Van StiphoutJean Jordan-SweetAndré VantommeChristian LavoieChristophe Detavernier

Influence of alloying the copper supply layer on the retention of CBRAM

Wouter DevulderKarl OpsomerMalgorzata JurczakLudovic GouxChristophe Detavernier

Low temperature atomic layer deposition of crystalline In2O3 films

Ranjith Karuparambil RamachandranJolien DendoovenHilde PoelmanChristophe Detavernier

A1 Journal Article in JOURNAL OF PHYSICAL CHEMISTRY C

Low temperature thermal and plasma enhanced atomic layer deposition of ruthenium using RuO4 and H2/H2-plasma

Matthias MinjauwJolien DendoovenBoris CaponChristophe DetavernierMarc Schaekers

Metal-insulator transition in ALD VO2 ultrathin films and nanoparticles: morphological control

Anthony P PeterKoen MartensGeert RampelbergMichael ToellerJames M AblettJohan MeersschautDaniel CuypersAlexis FranquetChristophe DetavernierJean-Pascal Rueff et al.

A1 Journal Article in ADVANCED FUNCTIONAL MATERIALS

Modification of ultra low-k dielectric films by O₂ and CO₂ plasmas

Teju Tunde OlawumiElisabeth LevrauMikhail KrishtabChristophe DetavernierJohann W BarthaKaidong XuFrederic LazzarinoMikhail R Baklanov

A1 Journal Article in ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY

Near room temperature plasma enhanced atomic layer deposition of ruthenium using the RuO4-precursor and H-2-plasma

Matthias MinjauwJolien DendoovenBoris CaponMarc SchaekersChristophe Detavernier

A1 Journal Article in JOURNAL OF MATERIALS CHEMISTRY C

Plasma enhanced atomic layer deposition of ruthenium below 100°C using RuO4 and H2-plasma

Matthias MinjauwJolien DendoovenBoris CaponMarc SchaekersChristophe Detavernier

Plasma-enhanced atomic layer deposition: a gas-phase route to hydrophilic, glueable polytetrafluoroethylene

Amit Kumar RoyJolien DendoovenDavy DeduytscheKilian Devloo-CasierKim RagaertLudwig CardonChristophe Detavernier

A1 Journal Article in CHEMICAL COMMUNICATIONS

Porous nanostructured metal oxides synthesized through atomic layer deposition on a carbonaceous template followed by calcination

Shaoren DengMert KurttepeliDaire J CottSara BalsChristophe Detavernier

A1 Journal Article in JOURNAL OF MATERIALS CHEMISTRY A

Pt-Ga catalyst formation studied with in situ XAS using Fourier and wavelet transformed analysis

Matthias FilezHilde PoelmanEvgeniy RedekopVladimir GalvitaChristophe DetavernierGuy Marin

Se-Containing inks for the formation of CuInSe2 films without gas-phase selenization

Jorick MaesRuben DierickBoris CaponChristophe DetavernierZeger Hens

Study of Ni-germanide phase formation in Ge(001) with Pd or Pt interlayer

Sérgio MC MirandaFilip GeenenChristophe DetavernierKristiaan TemstAndré Vantomme

Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films

Yiting SunElisabeth LevrauLiping ZhangJef GeypenJohan MeersschautAlexis FranquetQuoc Le LeJean-François de MarneffeHugo BenderHerbert Struyf et al.

A1 Journal Article in MICROELECTRONIC ENGINEERING

Templated synthesis of porous materials via atomic layer deposition

Shaoren DengChristophe Detavernier

The influence of Al alloying on silicide formation, morphology and texture between a thin (<20 nm) Ni film and Si(001)

Filip GeenenKoen Van StiphoutJean Jordan-SweetAndré VantommeChristian LavoieChristophe Detavernier

Understanding the dual nature of the filament dissolution in conductive bridging devices

Umberto CelanoLudovic GouxAttilio BelmonteKarl OpsomerRobin DegraeveChristophe DetavernierMalgorzata JurczakWilfried Vandervorst

A1 Journal Article in JOURNAL OF PHYSICAL CHEMISTRY LETTERS

2014

A Single-Event MicroKinetic assessment of n-alkane hydroconversion on ultrastable Y zeolites after atomic layer deposition of alumina

Bart VandegehuchteJoris ThybautChristophe DetavernierDavy DeduytscheJolien DendoovenJA MartensSP SreeTI KorányiGuy Marin

A1 Journal Article in JOURNAL OF CATALYSIS

ALD of ruthenium at 100°C using the ToRuS-precursor

Matthias MinjauwBoris CaponJolien DendoovenMarc SchaekersChristophe Detavernier

ALD of ruthenium at 100°C using the ToRuS-precursor

Matthias MinjauwJolien DendoovenBoris CaponMarc SchaekersChristophe Detavernier

Air-based photoelectrochemical cell capturing water molecules from ambient air for hydrogen production

J RongeShaoren DengSP SreeT BosserezSW VerbruggenNK SinghJolien DendoovenMBJ RoeffaersF TaulelleM De Volder et al.

A1 Journal Article in RSC ADVANCES

Air-stable short-wave infrared PbS colloidal quantum dot photoconductors passivated with Al2O3 atomic layer deposition

Chen HuAlban GassenqYolanda Justo ZarraquiñosKilian Devloo-CasierHongtao ChenChristophe DetavernierZeger HensGünther Roelkens

A1 Journal Article in APPLIED PHYSICS LETTERS

Annealing of sulfide stabilized colloidal semiconductor nanocrystals

Ruben DierickBoris CaponHanne DammStijn FlaméePieter ArickxEls BruneelDirk Van GenechtenMarlies Van BaelAn HardyChristophe Detavernier et al.

A1 Journal Article in JOURNAL OF MATERIALS CHEMISTRY C

Atomic layer deposition : a 3D surface engineering technique for nanomaterials

Geert RampelbergJolien DendoovenDavy DeduytscheChristophe Detavernier

Atomic layer deposition of aluminum phosphate based on the plasma polymerization of trimethyl phosphate

Thomas DobbelaereAmit Kumar RoyPhilippe VereeckenChristophe Detavernier

A1 Journal Article in CHEMISTRY OF MATERIALS

Atomic layer deposition-based synthesis of photoactive TiO₂ nanoparticle chains by using carbon nanotubes as sacrificial templates

Shaoren DengSammy W VerbruggenZhanbing HeDaire J CottPhilippe M VereeckenJohan A MartensSara BalsSilvia LenaertsChristophe Detavernier

A1 Journal Article in RSC ADVANCES

Atomic layer deposition-based tuning of the pore size in mesoporous thin films studied by in situ grazing incidence small angle X-ray scattering

Jolien DendoovenKilian Devloo-CasierMatthias IdeKathryn GrandfieldMert KurttepeliKarl F LudwigSara BalsPascal Van Der VoortChristophe Detavernier

A1 Journal Article in NANOSCALE

Catalytic activation of OKO zeolite with intersecting pores of 10- and 12-membered rings using atomic layer deposition of aluminium

E VerheyenS Pulinthanathu SreeK ThomasJolien DendoovenM De PrinsG VanbutseleE BreynaertJ-P GilsonCEA KirschhockChristophe Detavernier et al.

A1 Journal Article in CHEMICAL COMMUNICATIONS

Conformal nanocoatings for surface engineering of particles by thermal and plasma-enhanced atomic layer deposition using a rotary reactor

Geert RampelbergDelphine LongrieDavy DeduytscheJohan HaemersKris DriesenChristophe Detavernier

Control of the oxidation state of manganese during plasma enhanced atomic layer deposition with the Mn(thd)3 precursor

Felix MattelaerJolien DendoovenPhilippe VereeckenChristophe Detavernier

Controllable nitrogen doping in as deposited TiO₂ film and its effect on post deposition annealing

Shaoren DengSammy W VerbruggenSilvia LenaertsJohan A MartensSven Van den BergheKilian Devloo-CasierWouter DevulderJolien DendoovenDavy DeduytscheChristophe Detavernier

A1 Journal Article in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Controlling the oxidation state of manganese during plasma enhanced atomic layer deposition using the Mn(thd)3 precursor

Felix MattelaerJolien DendoovenPhilippe VereeckenChristophe Detavernier

Crystallization and semiconductor-metal switching behavior of thin VO₂ layers grown by atomic layer deposition

Geert RampelbergDavy DeduytscheBob De SchutterPeter Antony PremkumarMichael ToellerMarc SchaekersKoen MartensIuliana RaduChristophe Detavernier

A1 Journal Article in THIN SOLID FILMS

Delivering a modifying element to metal nanoparticles via support: Pt-Ga alloying during the reduction of Pt/Mg(Al,Ga)Ox catalysts and its effects on propane dehydrogenation

Evgeniy RedekopVladimir GalvitaHilde PoelmanVitaliy BliznukChristophe DetavernierGuy Marin

A1 Journal Article in ACS CATALYSIS

Factors influencing the conductivity of aqueous sol(ution)-gel-processed Al-doped ZnO films

Hanne DammPeter AdriaensensChristopher De DobbelaereBoris CaponKen ElenJeroen DrijkoningenBert ConingsJean V MancaJan D'HaenChristophe Detavernier et al.

A1 Journal Article in CHEMISTRY OF MATERIALS

Formation and texture of palladium germanides studied by in situ X-ray diffraction and pole figure measurements

Filip GeenenWerner KnaepenKoen De KeyserK OpsomerRoland VanmeirhaegheJ Jordan-SweetC LavoieChristophe Detavernier

A1 Journal Article in THIN SOLID FILMS

In situ IR spectroscopic investigation of alumina ALD on porous silica films: thermal versus plasma-enhanced ALD

Elisabeth LevrauKevin Van de KerckhoveKilian Devloo-CasierSreeprasanth Pulinthanathu SreeJohan A MartensChristophe DetavernierJolien Dendooven

A1 Journal Article in JOURNAL OF PHYSICAL CHEMISTRY C

In situ XAS and XRF study of nanoparticle nucleation during O3-based Pt deposition

Matthias FilezHilde PoelmanRanjith Karuparambil RamachandranJolien DendoovenKilian Devloo-CasierEmiliano FondaChristophe DetavernierGuy Marin

A1 Journal Article in CATALYSIS TODAY

In situ synchrotron based XRF and GISAXS study of ALD encapsulation of supported nanocrystals

Kilian Devloo-CasierJolien DendoovenPieter GeiregatKarl LudwigZeger HensChristophe Detavernier

In situ synchrotron based x-ray techniques as monitoring tools for atomic layer deposition

Kilian Devloo-CasierKarl F LudwigChristophe DetavernierJolien Dendooven

A1 Journal Article in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Influence of carbon content on the copper-telluride phase formation and on the resistive switching behavior of carbon alloyed Cu-Te conductive bridge random access memory cells

Wouter DevulderKarl OpsomerAlexis FranquetJohan MeersschautAttilio BelmonteRobert MullerBob De SchutterSven Van ElshochtMalgorzata JurczakLudovic Goux et al.

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Magnetic characterization and electrical field-induced switching of magnetite thin films synthesized by atomic layer deposition and subsequent thermal reduction

Robert ZieroldCharlie Le LamJolien DendoovenJohannes GoothTim BöhnertPhilip SergeliusFrans MunnikJosep M Montero MorenoDetlef GörlitzChristophe Detavernier et al.

A1 Journal Article in JOURNAL OF PHYSICS D-APPLIED PHYSICS

Nanostructured TiO2/carbon nanosheet hybrid electrode for high-rate thin-film lithium-ion batteries

S MoitzheimCS NimishaShaoren DengDaire J CottChristophe DetavernierPM Vereecken

A1 Journal Article in NANOTECHNOLOGY

On the formation and structural properties of hexagonal rare earth (Y, Gd, Dy, Er and Yb) disilicide thin films

Filip GeenenWerner KnaepenJ DemeulemeesterKoen De KeyserJL Jordan-SweetC LavoieA VantommeChristophe Detavernier

A1 Journal Article in JOURNAL OF ALLOYS AND COMPOUNDS

Phase formation in intermixed Ni-Ge thin films: influence of Ge content and low-temperature nucleation of hexagonal nickel germanides

Bob De SchutterWouter DevulderA SchrauwenK van StiphoutT PerkisasS BalsA VantommeChristophe Detavernier

A1 Journal Article in MICROELECTRONIC ENGINEERING

Photocatalytic acetaldehyde oxidation in air using spacious TiO2 films prepared by atomic layer deposition on supported carbonaceous sacrificial templates

Sammy W VerbruggenShaoren DengMert KurttepeliDaire J CottPhilippe M VereeckenSara BalsJohan A MartensChristophe DetavernierSilvia Lenaerts

A1 Journal Article in APPLIED CATALYSIS B-ENVIRONMENTAL

Plasma enhanced atomic layer deposition of Fe2O3 thin films

Ranjith Karuparambil RamachandranJolien DendoovenChristophe Detavernier

A1 Journal Article in JOURNAL OF MATERIALS CHEMISTRY A

Plasma enhanced atomic layer deposition of Ga2O3 thin films

Ranjith Karuparambil RamachandranJolien DendoovenJonas BottermanSreeprasanth Pulinthanathu SreeDirk PoelmanJohan A MartensHilde PoelmanChristophe Detavernier

A1 Journal Article in JOURNAL OF MATERIALS CHEMISTRY A

Plasma enhanced atomic layer deposition on powders

Geert RampelbergDelphine LongrieDavy DeduytscheChristophe Detavernier

Plasma enhanced atomic layer deposition on powders

Geert RampelbergChristophe Detavernier

Propane dehydrogenation over Pt/Mg(Al,Ga)Ox catalysts

Evgeniy RedekopVladimir GalvitaHilde PoelmanVitaliy BliznukChristophe DetavernierGuy Marin

Pt-Ga catalyst formation studied with in situ XAS using Fourier and wavelet transformed analysis

Matthias FilezHilde PoelmanEvgeniy RedekopVladimir GalvitaChristophe DetavernierGuy Marin

Pt-based bimetallic catalysts for alkane dehydrogenation: structural, spectroscopic, and kinetic characterization

Evgeniy RedekopVladimir GalvitaHilde PoelmanVitaliy BliznukChristophe DetavernierStephanie SaerensMaarten SabbeMarie-Françoise ReyniersGuy Marin

Quantitative clay mineralogy of a Vertic Planosol in southwestern Ethiopia: impact on soil formation hypotheses

Mathijs DumonAlemayehu Regassa TolossaBoris CaponChristophe DetavernierEric Van Ranst

A1 Journal Article in GEODERMA

Reactor concepts for atomic layer deposition on agitated particles: a review

Delphine LongrieDavy DeduytscheChristophe Detavernier

A1 Journal Article in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Scanning probe microscopy as a scalpel to probe filament formation in conductive bridging memory devices

Umberto CelanoLudovic GouxKarl OpsomerMartina IapichinoAttilio BelmonteAlexys FranquetIlse HoflijkChristophe DetavernierMalgorzata JurczakWilfried Vandervorst

A1 Journal Article in MICROELECTRONIC ENGINEERING

Short-wave infrared PbS colloidal quantum dot photodetectors with AlOx atomic layer deposition passivation

Chen HuAlban GassenqYolanda Justo ZarraquiñosKilian Devloo-CasierHongtao ChenHaolan ZhaoChristophe DetavernierZeger HensGünther Roelkens

Structural, spectroscopic, and kinetic characterization of Pt-based bimetallic catalysts for alkane dehydrogenation

Vladimir GalvitaEvgeniy RedekopHilde PoelmanV. BliznukChristophe DetavernierStephanie SaerensMaarten SabbeMarie-Françoise ReyniersGuy Marin

Surface-engineered low-enriched uranium-molybdenum fuel for research reactors: in- and out-of-pile studies for the conversion of research reactors from using high‐enriched to low‐enriched nuclear fuels

Ann LeenaersChristophe Detavernier

Synchrotron based in situ characterization during atomic layer deposition

Jolien DendoovenKilian Devloo-CasierAlessandro CoatiGiuseppe PortaleWim BrasKarl LudwigChristophe Detavernier

Synthesis and characterization of photoreactive TiO2-carbon nanosheet composites

Mert KurttepeliShaoren DengSammy W VerbruggenGiulio GuzzinatiDaire J CottSilvia LenaertsJo VerbeeckGustaaf Van TendelooChristophe DetavernierSara Bals

A1 Journal Article in JOURNAL OF PHYSICAL CHEMISTRY C

Synthesis of a 3D network of Pt nanowires by atomic layer deposition on a carbonaceous template

Shaoren DengMert KurttepeliStella DeheryanDaire J CottPhilippe M VereeckenJohan A MartensSara BalsGustaaf van TendelooChristophe Detavernier

A1 Journal Article in NANOSCALE

Thermal and plasma-enhanced atomic layer deposition of TiN using TDMAT and NH3 on particles agitated in a rotary reactor

Delphine LongrieDavy DeduytscheJohan HaemersPhilippe SmetKris DriesenChristophe Detavernier

A1 Journal Article in ACS APPLIED MATERIALS & INTERFACES

Thermal expansion coefficients of Ni, Pt and Pd germanides and silicides

Filip GeenenWerner KnaepenFilip MoensLena BrondeelAnn LeenaersSven Van den BergheChristophe Detavernier

Three-dimensional observation of the conductive filament in nanoscaled resistive memory devices

Umberto CelanoLudovic GouxAttilio BelmonteKarl OpsomerAlexis FranquetAndreas SchulzeChristophe DetavernierOlivier RichardHugo BenderMalgorzata Jurczak et al.

A1 Journal Article in NANO LETTERS

Transparent conducting oxide films of group V doped titania prepared by aqueous chemical solution deposition

Ken ElenBoris CaponChristopher De DobbelaereDaan DewulfNick PeysChristophe DetavernierAn HardyMarlies K Van Bael

A1 Journal Article in THIN SOLID FILMS

Understanding atomic layer deposition of aluminaover (100) hydroxylated gamma Al2O3 surface using DFT calculations

Aditya Shankar SandupatlaE LevrauChristophe DetavernierMarie-Françoise ReyniersGuy Marin

Unravelling the formation of Pt-Ga alloyed nanoparticles on calcined Ga-modified hydrotalcites by in situ XAS

Matthias FilezEvgeniy RedekopHilde PoelmanVladimir GalvitaRanjith Karuparambil RamachandranJolien DendoovenChristophe DetavernierGuy Marin

A1 Journal Article in CHEMISTRY OF MATERIALS

2013

A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects

Delphine LongrieDavy DeduytscheJohan HaemersKris DriesenChristophe Detavernier

AlSi matrices for U(Mo) dispersion fuel plates

Ann LeenaersS Van den BergheChristophe Detavernier

A1 Journal Article in JOURNAL OF NUCLEAR MATERIALS

Annealing of sulfide stabilized colloidal chalcopyrite nanocrystals

Pieter ArickxRuben DierickBoris CaponHanne DamChristophe DetavernierMarlies Van BaelAn HardyZeger Hens

Annealing of sulfide stabilized colloidal semiconductor nanocrystals

Ruben DierickBoris CaponZeger HensChristophe DetavernierHanne DammAn HardyMarlies Van Bael

Aqueous chemical solution deposition of doped titanium dioxide films as Transparent Conducting Oxide

Ken ElenBoris CaponChristopher De DobbelaereDaan DewulfNick PeysChristophe DetavernierAn HardyMarlies Van Bael

Aqueous solution-gel route for processing of highly c-axis oriented dense transparent conductive Al-doped ZnO films

Hanne DammKen ElenChristopher De DobbelaereBoris CaponFreya VandenbroeckJosé MartinsChristophe DetavernierJan D'HaenPeter AdriaensensAn Hardy et al.

Atomic layer deposition for surface engineering of powders

Delphine LongrieChristophe Detavernier

Atomic layer deposition of TiO₂ on surface modified nanoporous low-k films

Elisabeth LevrauKilian Devloo-CasierJolien DendoovenKarl F LudwigPatrick VerdonckJohan MeersschautMikhail R BaklanovChristophe Detavernier

A1 Journal Article in LANGMUIR

Atomic layer deposition of platinum : GISAXS study of the initial island growth mode

Jolien DendoovenRanjith Karuparambil RamachandranKilian Devloo-CasierKarl LudwigChristophe Detavernier

CeO2-modified Fe2O3 for CO2 utilization via chemical looping

Vladimir GalvitaHilde PoelmanVitaliy BliznukChristophe DetavernierGuy Marin

A1 Journal Article in INDUSTRIAL & ENGINEERING CHEMISTRY RESEARCH

Combining optical and electrical studies to unravel the effect of Sb doping on CIGS solar cell

Lisanne Van PuyveldeJohan LauwaertPhilippe SmetDirk PoelmanChristophe DetavernierFabian PianezziShiro NishiwakiAyodhya N TiwariSamira KhelifiMarc Burgelman et al.

Combining optical and electrical studies to unravel the effect of Sb doping on CIGS solar cell

Lisanne Van PuyveldeJohan LauwaertPhilippe SmetDirk PoelmanChristophe DetavernierFabian PianezziShiro NishiwakiAyodhya N TiwariSamira KhelifiMarc Burgelman et al.

Conductive-AFM tomography for 3D filament observation in resistive switching devices

U CelanoL GouxA BelmonteA SchulzeKarl OpsomerChristophe DetavernierO RichardH BenderM JurczakW Vandervorst

Effect of high temperature deposition on CoSi2 phase formation

CM ComrieH AhmedD SmeetsJ DemeulemeesterS TurnerG Van TendelooChristophe DetavernierA Vantomme

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Electron barrier height at CuxTe1-x/Al₂O₃ interfaces of conducting bridge memory stacks

VV Afanas'evF De StefanoM HoussaA StesmansL GouxK OpsomerChristophe DetavernierJA KittlM Jurczak

A1 Journal Article in THIN SOLID FILMS

Improved diffusion barrier properties and NiSi thermal stability for the Cu contact with the Ru/TaSiN stack on NiSi/Si

Xin-Ping QuXiao-Meng ZhangYing ZhaoShaoren DengChristophe Detavernier

A1 Journal Article in ECS SOLID STATE LETTERS

In situ GISAXS during atomic layer deposition of oxides on ordered quantum dots

Kilian Devloo-CasierJolien DendoovenKarl LudwigPieter GeiregatZeger HensChristophe Detavernier

In situ XAS and XRF study of nanoparticle nucleation during O3-based Pt deposition

Matthias FilezHilde PoelmanRanjith Karuparambil RamachandranJolien DendoovenKilian Devloo-CasierE. FondaChristophe DetavernierGuy Marin

In situ characterization of atomic layer deposition in mesoporous thin films by grazing incidence small angle x-ray scattering

Jolien DendoovenKilian Devloo-CasierMatthias IdeKathryn GrandfieldKarl LudwigPascal Van Der VoortSara BalsChristophe Detavernier

Influence of carbon alloying on the thermal stability and resistive switching behavior of copper-telluride based CBRAM cells

Wouter DevulderKarl OpsomerFelix SeidelAttilio BelmonteRobert MullerBob De SchutterHugo BenderWilfried VandervorstSven Van ElshochtMalgorzata Jurczak et al.

A1 Journal Article in ACS APPLIED MATERIALS & INTERFACES

Low temperature atomic layer deposition of platinum using (methylcyclopentadienyl)trimethylplatinum and ozone

Jolien DendoovenRanjith K RamanchandranKilian Devloo-CasierGeert RampelbergMatthias FilezHilde PoelmanGuy MarinEmiliano FondaChristophe Detavernier

A1 Journal Article in JOURNAL OF PHYSICAL CHEMISTRY C

Low temperature plasma-enhanced ALD of vanadium nitride as copper diffusion barrier

Geert RampelbergKilian Devloo-CasierDavy DeduytscheMarc SchaekersNicolas BlascoChristophe Detavernier

Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers

Geert RampelbergKilian Devloo-CasierDavy DeduytscheMarc SchaekersNicolas BlascoChristophe Detavernier

A1 Journal Article in APPLIED PHYSICS LETTERS

Nucleation and growth of Pt by atomic layer deposition on silica probed with in situ XAS and XRF measurements

Matthias FilezRanjith Karuparambil RamachandranKilian Devloo-CasierJolien DendoovenHilde PoelmanE FondaChristophe DetavernierGuy Marin

On the growth kinetics of Ni(Pt) silicide thin films

J DemeulemeesterD SmeetsCM ComrieNP BarradasA VieiraCharlotte Van BockstaelChristophe DetavernierK TemstA Vantomme

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

On the nucleation of PdSi and NiSi2 during the ternary Ni(Pd)/Si(100) reaction

A SchrauwenJ DemeulemeesterA KumarW VandervorstCM ComrieChristophe DetavernierK TemstA Vantomme

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Optimization of W\Al2O3\Cu(-Te) material stack for high-performance conductive-bridging memory cells

L GouxW KimKarl OpsomerA BelmonteG KarF De StefanoVV Afanas'evU CelanoM HoussaWouter Devulder et al.

Optimizations of pulsed plated p and n-type Bi₂Te₃-based ternary compounds by annealing in different ambient atmospheres

Christian SchumacherKlaus G ReinsbergRaimar RostekLewis AkinsindeSvenja BaesslerSebastian ZastrowGeert RampelbergPeter WoiasChristophe DetavernierJose AC Broekaert et al.

A1 Journal Article in ADVANCED ENERGY MATERIALS

Partially fluorinated MIL-47 and Al-MIL-53 frameworks : influence of functionalization on sorption and breathing properties

Shyam Prosad BiswasTom RémySarah CouckDmitry DenysenkoGeert RampelbergJoeri FM DenayerDirk VolkmerChristophe DetavernierPascal Van Der Voort

A1 Journal Article in PHYSICAL CHEMISTRY CHEMICAL PHYSICS

Plasma-enhanced atomic layer deposition of thin vanadium nitride layers as a copper diffusion barrier

Geert RampelbergKilian Devloo-CasierDavy DeduytscheMarc SchaekersNicolas BlascoChristophe Detavernier

Pore narrowing of mesoporous silica materials

Frederik GoethalsElisabeth LevrauEls De CanckMikhail R BaklanovChristophe DetavernierIsabel Van DriesschePascal Van Der Voort

A1 Journal Article in MATERIALS

Pt-Ga catalyst formation studied with in situ XAS using Fourier and wavelet transformed analysis

Matthias FilezHilde PoelmanEvgeniy RedekopVladimir GalvitaChristophe DetavernierGuy Marin

Pt-Ga catalyst formation studied with in situ XAS using Fourier and wavelet transformed analysis

Matthias FilezHilde PoelmanEvgeniy RedekopVladimir GalvitaChristophe DetavernierGuy Marin

Quantification of the clay mineralogy of a typical Vertic Planosol in south-western Ethiopia : impact on soil formation hypotheses

Mathijs DumonBoris CaponChristophe DetavernierEric Van Ranst

Sealed ultra low-k organosilica films with improved electrical, mechanical and chemical properties

Frederik GoethalsElisabeth LevrauGlenn PollefeytMikhail R BaklanovIvan CiofiKris VanstreelsChristophe DetavernierIsabel Van DriesschePascal Van Der Voort

A1 Journal Article in JOURNAL OF MATERIALS CHEMISTRY C

Study of Schottky barrier height modulation for NiSi/Si contact with an antimony interlayer

Xiao GuoYang TangYu-Long JiangXin-Ping QuGuo-Ping RuDavid Wei ZhangDavy DeduytscheChristophe Detavernier

A1 Journal Article in MICROELECTRONIC ENGINEERING

Surface engineering of low enriched uranium-molybdenum

Ann LeenaersS Van den BergheChristophe Detavernier

A1 Journal Article in JOURNAL OF NUCLEAR MATERIALS

Swelling of U(Mo) dispersion fuel under irradiation: non-destructive analyses of the SELENIUM plates

S Van den BergheY ParthoensG CornelisA LeenaersE KoonenV KuzminovChristophe Detavernier

A1 Journal Article in JOURNAL OF NUCLEAR MATERIALS

Switching mechanism and reverse engineering of low-power Cu-based resistive switching devices

Umberto CelanoLudovic GouxKarl OpsomerAttillio BelmonteMartina IapichinoChristophe DetavernierMalgorzata JurczakWilfried Vandervorst

A1 Journal Article in NANOSCALE

Synthesis of uniformly dispersed anatase nanoparticles inside mesoporous silica thin films via controlled breakup and crystallization of amorphous TiO2 deposited using atomic layer deposition

Sreeprasanth Pulinthanathu SreeJolien DendoovenKasper MasschaeleHeidari M HamedShaoren DengSara BalsChristophe DetavernierJohan A Martens

A1 Journal Article in NANOSCALE

Thermal and plasma-enhanced ALD of TiN on powders using a rotary reactor

Delphine LongrieDavy DeduytscheJohan HaemersKris DriesenChristophe Detavernier

Thermal-stability optimization of Al₂O₃/Cu-Te based conductive-bridging random access memory systems

L GouxKarl OpsomerA FranquetG KarN JossartO RichardDJ WoutersR MüllerChristophe DetavernierM Jurczak et al.

A1 Journal Article in THIN SOLID FILMS

Three dimensional reciprocal space measurement by x-ray diffraction using linear and area detectors: applications to texture and defects determination in oriented thin films and nanoprecipitates

Simon GaudetKoen De KeyserSamuel Lambert-MilotJean Jordan-SweetChristophe DetavernierChristian LavoiePatrick Desjardins

A1 Journal Article in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Wetting transitions of polymers via thermal and plasma enhanced atomic layer depositions

Amit Kumar RoyDavy DeduytscheChristophe Detavernier

A1 Journal Article in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

2012

A new procedure to seal the pores of mesoporous low-k films with precondensed organosilica oligomers

Frederik GoethalsMikhail R BaklanovIvan CiofiChristophe DetavernierPascal Van Der VoortIsabel Van Driessche

A1 Journal Article in CHEMICAL COMMUNICATIONS

A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects

Delphine LongrieDavy DeduytscheJohan HaemersKris DriesenChristophe Detavernier

A1 Journal Article in SURFACE & COATINGS TECHNOLOGY

A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects

Delphine LongrieKilian Devloo-CasierJohan HaemersKris DriesenChristophe Detavernier

Anisotropic atomic layer deposition profiles of TiO₂ in hierarchical silica material with multiple porosity

Sreeprasanth Pulinthanathu SreeJolien DendoovenJasper JammaerKasper MasschaeleDavy DeduytscheJan D'HaenChristine EA KirschhockJohan A MartensChristophe Detavernier

A1 Journal Article in CHEMISTRY OF MATERIALS

Atomic layer deposition of titanium and vanadium oxide on mesoporous silica and phenol/formaldehyde resins : the effect of the support on the liquid phase epoxidation of cyclohexene

Ilke MuylaertJan MusschootKaren LeusJolien DendoovenChristophe DetavernierPascal Van Der Voort

A1 Journal Article in EUROPEAN JOURNAL OF INORGANIC CHEMISTRY

Band alignment in Ge/GeOx/HfO₂/TiO₂ heterojunctions as measured by hard X-ray photoelectron spectroscopy

AK RumaizJC WoicikC WeilandQi XieDP SiddonsGH JaffariChristophe Detavernier

A1 Journal Article in APPLIED PHYSICS LETTERS

Comparison of three processes for plasma-enhanced ALD of platinum

Delphine LongrieKilian Devloo-CasierSven Van den BergheKris DriesenChristophe Detavernier

Conformality of thermal and plasma enhanced atomic layer deposition on a non-woven fibrous substrate

Jan MusschootJolien DendoovenDavy DeduytscheJohan HaemersG BuyleChristophe Detavernier

A1 Journal Article in SURFACE & COATINGS TECHNOLOGY

Determination of activation energies of the U(Mo)/Si and U(Mo)/Al solid state reaction using in-situ X-ray diffraction and Kissinger analysis

A LeenaersS van den BergheChristophe Detavernier

A1 Journal Article in SOLID STATE SCIENCES

Determination of the dominant diffusing species during nickel and palladium germanide formation

CM ComrieD SmeetsKJ PondoC van der WaltJ DemeulemeesterWerner KnaepenChristophe DetavernierA HabanyamaA Vantomme

A1 Journal Article in THIN SOLID FILMS

Fermi level depinning failure for Al/GeO₂/Ge contacts

Hao YuQi XieYu-Long JiangDavy DeduytscheChristophe Detavernier

A1 Journal Article in ECS SOLID STATE LETTERS

Germanium surface passivation and atomic layer deposition of high-k dielectrics: a tutorial review on Ge-based MOS capacitors

Qi XieShaoren DengMarc SchaekersDennis LinMatty CaymaxAnnelies DelabieXin-Ping QuYu-Long JiangDavy DeduytscheChristophe Detavernier

A1 Journal Article in SEMICONDUCTOR SCIENCE AND TECHNOLOGY

Improved thermal stability and electrical performance by using PEALD ultrathin Al2O3 film with Ta as Cu diffusion barrier on low k dielectrics

Shao-Feng DingQi XieFei ChenHai-Sheng LuShaoren DengDavy DeduytscheChristophe DetavernierXin-Ping Qu

A1 Journal Article in ECS SOLID STATE LETTERS

In situ characterization of ALD in mesoporous thin films by grazing incidence small angle X-ray scattering

Jolien DendoovenKilian Devloo-CasierMatthias IdeKathryn GrandfieldKarl F LudwigPascal Van Der VoortSara BalsChristophe Detavernier

In situ monitoring of atomic layer deposition in nanoporous thin films using ellipsometric porosimetry

Jolien DendoovenKilian Devloo-CasierElisabeth LevrauRobbert Van HoveSreeprasanth Pulinthanathu SreeMikhail R BaklanovJohan A MartensChristophe Detavernier

A1 Journal Article in LANGMUIR

In situ study of ALD processes using synchrotron-based X-ray fluorescence and scattering techniques

Jolien DendoovenKilian Devloo-CasierMatthias IdeKathryn GrandfieldKarl LudwigSara BalsPascal Van Der VoortChristophe Detavernier

In situ study of the growth properties of Ni-rare earth silicides for interlayer and alloy systems on Si(100)

J DemeulemeesterWerner KnaepenD SmeetsA SchrauwenCM ComrieNP BarradasA VieiraChristophe DetavernierK TemstA Vantomme

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Modeling and in situ characterization of the conformality of atomic layer deposition in high aspect ratio structures and nanoporous materials

Jolien DendoovenChristophe Detavernier

Nanoscale area selective ZnO growth between a monolayer of nanocrystals

Kilian Devloo-CasierJolien DendoovenKarl LudwigPieter GeiregatZeger HensChristophe Detavernier

Optimization of electrodeposited p-doped Sb₂Te₃ thermoelectric films by millisecond potentiostatic pulses

Christian SchumacherKlaus G ReinsbergLewis AkinsindeSebastian ZastrowSonja HeiderichWilliam ToellnerGeert RampelbergChristophe DetavernierJosé AC BroekaertKornelis Nielsch et al.

A1 Journal Article in ADVANCED ENERGY MATERIALS

Optimization of the annealing conditions for thin VO2 ALD films

Geert RampelbergMarc SchaekersDavy DeduytscheBob De SchutterJorge KittlChristophe Detavernier

Plasma-enhanced ALD of platinum with O₂, N₂ and NH₃ plasmas

Delphine LongrieKilian Devloo-CasierDavy DeduytscheSven Van den BergheKris DriesenChristophe Detavernier

A1 Journal Article in ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY

Selective and reversible ammonia gas detection with nanoporous film functionalized silicon photonic micro-ring resonator

Nebiyu Adello YeboSreeprasanth Pulinthanathu SreeElisabeth LevrauChristophe DetavernierZeger HensJohan A MartensRoel Baets

A1 Journal Article in OPTICS EXPRESS

Semiconductor-metal transition in thin VO2 films deposited by ozone based atomic layer deposition

Geert RampelbergMarc SchaekersKoen MartensQi XieDavy DeduytscheBob De SchutterNicolas BlascoJorge KittlChristophe Detavernier

Solution derived ZnO:Al films with low resistivity

K SchellensBoris CaponC De DobbelaereChristophe DetavernierA HardyMK Van Bael

A1 Journal Article in THIN SOLID FILMS

Structural and kinetic study of the reduction of CuO-CeO2/Al2O3 by time-resolved X-ray diffraction

Vladimir GalvitaHilde PoelmanGuy MarinChristophe DetavernierGeert RampelbergBob De Schutter

A1 Journal Article in CATALYSIS LETTERS

TaN/Ta as an effective diffusion barrier for direct contact of copper and NiSi

Yu-Long JiangQi XieXin-Ping QuDavid W ZhangDavy DeduytscheChristophe Detavernier

A1 Journal Article in ELECTROCHEMICAL AND SOLID STATE LETTERS

Texture effects in solid-state reactions of thin films

Koen De KeyserChristophe DetavernierJean-Jordan SweetChristian Lavoie

The coordinatively saturated vanadium MIL-47 as a low leaching heterogeneous catalyst in the oxidation of cyclohexene

Karen LeusMatthias VandichelYing-Ya LiuIlke MuylaertJan MusschootSteven PylHenk VrielinckFreddy CallensGuy MarinChristophe Detavernier et al.

A1 Journal Article in JOURNAL OF CATALYSIS

Tuning the pore size of ink-bottle mesopores by atomic layer deposition

Jolien DendoovenBart GorisKilian Devloo-CasierElisabeth LevrauEllen BiermansMikhail R BaklanovKarl F LudwigPascal Van Der VoortSara BalsChristophe Detavernier

A1 Journal Article in CHEMISTRY OF MATERIALS

Ultra low-k cyclic carbon-bridged PMO films with a high chemical resistance

Frederik GoethalsIvan CiofiOreste MadiaKris VanstreelsMikhail R BaklanovChristophe DetavernierPascal Van Der VoortIsabel Van Driessche

A1 Journal Article in JOURNAL OF MATERIALS CHEMISTRY

2011

ALD-Modified USY zeolite characterization using single-event microkinetics

Bart VandegehuchteJoris ThybautChristophe DetavernierDavy DeduytscheJ DendoovenJA MartensSP SreeTI KorànyiGuy Marin

ALD-grown seed layers for electrochemical copper deposition integrated with different diffusion barrier systems

Thomas WaechtlerShao-Feng DingLutz HofmannRobert MothesQi XieSteffen OswaldChristophe DetavernierStefan E SchulzXin-Ping QuHeinrich Lang et al.

A1 Journal Article in MICROELECTRONIC ENGINEERING

Advantages and challenges of plasma enhanced atomic layer deposition

Jan MusschootChristophe Detavernier

Aluminium atomic layer deposition applied to mesoporous zeolites for acid catalytic activity enhancement

Sreeprasanth Pulinthanathu SreeJolien DendoovenTamás I KorányGina VanbutseleKristof HouthoofdDavy DeduytscheChristophe DetavernierJohan A Martens

A1 Journal Article in CATALYSIS SCIENCE & TECHNOLOGY

Annealing effect on the metal gate effective work function modulation for the Al/TiN/SiO2/p-Si structure

Xiao-Rong WangYu-Long JiangQi XieChristophe DetavernierGuo-Ping RuXin-Ping QuBing-Zong Li

A1 Journal Article in MICROELECTRONIC ENGINEERING

Annealing induced hysteresis suppression for TiN/HfO₂/GeON/p-Ge capacitor

Quan-Li LiQi XieYu-Long JiangGuo-Ping RuXin-Ping QuBing-Zong LiDavid W ZhangDavy DeduytscheChristophe Detavernier

A1 Journal Article in SEMICONDUCTOR SCIENCE AND TECHNOLOGY

Characterization of ALD coatings in nanoporous thin films by ellipsometric porosimetry

Jolien DendoovenSreeprasanth Pulinthanathu SreeRobbert Van HoveKilian Devloo-CasierMikhail BaklanovJohan MartensChristophe Detavernier

Effect of electric field on CdSe/CdS/ZnS colloidal quantum dots

Sreeparvathi WarrierKarel LambertJolien DendoovenChristophe DetavernierZeger HensDries Van Thourhout

Effective Schottky Barrier height modulation by an ultrathin passivation layer of GeOxNy for Al/n-Ge(100) contact

Yu-Long JiangQi XieXin-Ping QuGuo-Ping RuDavid W ZhangDavy DeduytscheChristophe Detavernier

A1 Journal Article in ELECTROCHEMICAL AND SOLID STATE LETTERS

Effective electrical passivation of Ge(100) for HfO2 gate dielectric layers using O-2 plasma

Qi XieDavy DeduytscheMarc SchaekersMatty CaymaxAnnelies DelabieXin-Ping QuChristophe Detavernier

A1 Journal Article in ELECTROCHEMICAL AND SOLID STATE LETTERS

Effective reduction of fixed charge densities in germanium based metal-oxide-semiconductor devices

Shaoren DengQi XieDavy DeduytscheMarc SchaekersDennis LinMatty CaymaxAnnelies DelabieSven Van den BergheXinping QuChristophe Detavernier

A1 Journal Article in APPLIED PHYSICS LETTERS

Embedding quantum dot monolayers in Al2O3 using atomic layer deposition

Karel LambertJolien DendoovenChristophe DetavernierZeger Hens

A1 Journal Article in CHEMISTRY OF MATERIALS

Group 5 doped anatase films prepared by aqueous chemical solution deposition

Ken ElenBoris CaponChristopher De DobbelaereDaan DewulfNick PeysChristophe DetavernierAn HardyMarlies Van Bael

High-performance Ge MOS capacitors by O₂ plasma passivation and O₂ ambient annealing

Qi XieShaoRen DengMarc SchaekersDennis LinMatty CaymaxAnnelies DelabieYuLong JiangXinPing QuDavy DeduytscheChristophe Detavernier

A1 Journal Article in IEEE ELECTRON DEVICE LETTERS

In situ GISAXS during atomic layer deposition

Kilian Devloo-CasierJolien DendoovenKarl LudwigChristophe Detavernier

In situ X-ray fluorescence measurements during atomic layer deposition: nucleation and growth of TiO2 on planar substrates and in nanoporous films

Jolien DendoovenSreeprasanth Pulinthanathu SreeKoen De KeyserDavy DeduytscheJohan A MartensKarl F LudwigChristophe Detavernier

A1 Journal Article in JOURNAL OF PHYSICAL CHEMISTRY C

In situ synchrotron based x-ray fluorescence and scattering measurements during atomic layer deposition: initial growth of HfO2 on Si and Ge substrates

Kilian Devloo-CasierJolien DendoovenKF LudwigG LekensJ D'HaenChristophe Detavernier

A1 Journal Article in APPLIED PHYSICS LETTERS

In situ x-ray characterization and electron tomography study of ALD coatings in mesoporous thin films

Jolien DendoovenEllen BiermansElisabeth LevrauKilian Devloo-CasierKarl LudwigPascal Van Der VoortSara BalsChristophe Detavernier

Influence of the Cu-Te composition and microstructure on the resistive switching of Cu-Te/Al(2)O(3)/Si cells

L GouxKarl OpsomerR DegraeveR MullerChristophe DetavernierDJ WoutersM JurczakL AltimimeJA Kittl

A1 Journal Article in APPLIED PHYSICS LETTERS

Interfacial reactions of Gd- and Nb-oxide based high-k layers deposited by aqueous chemical solution deposition

D DewulfN PeysS Van ElshochtGeert RampelbergChristophe DetavernierS De GendtA HardyMK Van Bael

A1 Journal Article in MICROELECTRONIC ENGINEERING

Investigation of ultra-thin Al₂O₃ film as Cu diffusion barrier on low-k (k=2.5) dielectrics

Shao-Feng DingQi XieFei ChenHai-Sheng LuShao-Ren DengChristophe DetavernierGuo-Ping RuYu-Long JiangXin-Ping Qu

Phase formation and texture of nickel silicides on Si1-xCx epilayers

Koen De KeyserBob De SchutterChristophe DetavernierV MachkaoutsanM BauerSG ThomasJJ SweetC Lavoie

A1 Journal Article in MICROELECTRONIC ENGINEERING

Semiconductor-metal transition in thin VO2 films grown by ozone based atomic layer deposition

Geert RampelbergMarc SchaekersKoen MartensQi XieDavy DeduytscheBob De SchutterNicolas BlascoJorge KittlChristophe Detavernier

Semiconductor-metal transition in thin VO2 films grown by ozone based atomic layer deposition

Geert RampelbergMarc SchaekersKoen MartensQi XieDavy DeduytscheBob De SchutterNicolas BlascoJorge KittlChristophe Detavernier

A1 Journal Article in APPLIED PHYSICS LETTERS

Sn diffusion during Ni germanide growth on Ge1-xSnx

J DemeulemeesterA SchrauwenO NakatsukaS ZaimaM AdachiY ShimuraCM ComrieC FleischmannChristophe DetavernierK Temst et al.

A1 Journal Article in APPLIED PHYSICS LETTERS

Spacious and mechanically flexible mesoporous silica thin film composed of an open network of interlinked nanoslabs

Sreeprasanth Pulinthanathu SreeJolien DendoovenDries SmeetsDavy DeduytscheAlexander AertsKris VanstreelsMikhail R BaklanovJin Won SeoKristiaan TemstAndré Vantomme et al.

A1 Journal Article in JOURNAL OF MATERIALS CHEMISTRY

TaCN growth with PDMAT and H-2/Ar plasma by plasma enhanced atomic layer deposition

Qi XieDavy DeduytscheJan MusschootRoland VanmeirhaegheChristophe DetavernierShao-Feng DingXin-Ping Qu

A1 Journal Article in MICROELECTRONIC ENGINEERING

Tailoring nanoporous materials by atomic layer deposition

Christophe DetavernierJolien DendoovenSreeprasanth Pulinthanathu SreeKarl F LudwigJohan A Martens

A1 Journal Article in CHEMICAL SOCIETY REVIEWS

Texture of thin silicide and germanide films

Koen De KeyserChristophe DetavernierRoland Vanmeirhaeghe

The 2010 International workshop on 'Materials for Advanced Metallization', MAM 2010 Mechelen (Malines), Belgium: preface

Youssef TravalyChristophe Detavernier

Editorial material

The inhibition of enhanced Cu oxidation on ruthenium/diffusion barrier layers for Cu interconnects by carbon alloying into Ru

Shao-Feng DingQi XieSteve MüellerThomas WaechtlerHai-Sheng LuStefan E SchulzChristophe DetavernierXin-Ping QuThomas Gessner

A1 Journal Article in JOURNAL OF THE ELECTROCHEMICAL SOCIETY

TiO2/HfO2 bi-layer gate stacks grown by atomic layer deposition for germanium-based metal-oxide-semiconductor devices using GeOxNy passivation layer

Qi XieJan MusschootMarc SchaekersMatty CaymaxAnnelies DelabieDennis LinXin-Ping QuYu-Long JiangSven Van den BergheChristophe Detavernier

A1 Journal Article in ELECTROCHEMICAL AND SOLID STATE LETTERS

2010

Characterization of solid state reactions and crystallization in thin films using in situ X-ray diffraction

Werner KnaepenChristophe DetavernierRoland Vanmeirhaeghe

Conformality of Al2O3 and AlN deposited by plasma-enhanced atomic layer deposition

Jolien DendoovenDavy DeduytscheJan MusschootRoland VanmeirhaegheChristophe Detavernier

A1 Journal Article in JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Conformality of Al2O3 deposited by thermal, plasma-enhanced and ozone-based atomic layer deposition

Jolien DendoovenDavy DeduytscheJan MusschootChristophe Detavernier

Effect of electric field on CdSe/CdS/ZnS nanocrystals

Sreeparvathi WarrierKarel LambertJolien DendoovenChristophe DetavernierZeger HensDries Van Thourhout

Implementing TiO2 as gate dielectric for Ge-channel complementary metal-oxide-semiconductor devices by using HfO2/GeO2 interlayer

Qi XieDavy DeduytscheMarc SchaekersMatty CaymaxAnnelies DelabieXiin-Ping QuChristophe Detavernier

A1 Journal Article in APPLIED PHYSICS LETTERS

In situ X-ray diffraction study of thin film Ir/Si solid state reactions

Werner KnaepenJ DemeulemeesterDavy DeduytscheJL Jordan-SweetA VantommeRoland VanmeirhaegheChristophe DetavernierC Lavoie

A1 Journal Article in MICROELECTRONIC ENGINEERING

In situ and ex situ investigation on the annealing performance of the ZnO film grown by ion beam deposition

Tao ChenShu-Yi LiuQi XieChristophe DetavernierRoland VanmeirhaegheXin-Ping Qu

A1 Journal Article in JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS

In situ study of the formation and properties of nickel silicides

Charlotte Van BockstaelChristophe Detavernier

In situ study of the formation of silicide phases in amorphous Co-Si mixed layers

Charlotte Van BockstaelKoen De KeyserJelle DemeulemeesterAndré VantommeRoland VanmeirhaegheChristophe DetavernierJean Jordan-SweetChristian Lavoie

A1 Journal Article in MICROELECTRONIC ENGINEERING

In situ x-ray diffraction study of Ni-Yb interlayer and alloy systems on Si(100)

Werner KnaepenJ DemeulemeesterJ Jordan-SweetA VantommeChristophe DetavernierRoland VanmeirhaegheC Lavoie

A1 Journal Article in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

In situ x-ray fluorescence measurements during ALD on flat substrates and in nanoporous

Jolien DendoovenDavy DeduytscheSreeprasanth Pulinthanathu SreeTamás I KorányiGina VanbutseleJohan A MartensKarl F LudwigChristophe Detavernier

Non-linear dielectric constant increase with Ti composition in high-k ALD-HfTiOx films after O2 crystallization annealing

K TomidaM PopoviciKarl OpsomerN MenouWC WangA DelabieJ SwertsJ SteenbergenB KaczerSV Elshocht et al.

Phase formation and thermal stability of ultrathin nickel-silicides on Si(100)

Koen De KeyserCharlotte Van BockstaelRoland VanmeirhaegheChristophe DetavernierE VerleysenH BenderW VandervorstJ Jordan-SweetC Lavoie

A1 Journal Article in APPLIED PHYSICS LETTERS

Seed layer and multistack approaches to reduce leakage in SrTiO3-based metal-insulator-metal capacitors using TiN bottom electrode

Nicolas MenouMihaela PopoviciKarl OpsomerBen KaczerMalgorzata A PawlakChristoph AdelmannAlexis FranquetPaola FaviaHugo BenderChristophe Detavernier et al.

A1 Journal Article in JAPANESE JOURNAL OF APPLIED PHYSICS

Single-event microkinetic model based design of tailored zeolite catalysts through atomic layer deposition

Bart VandegehuchteJoris ThybautChristophe DetavernierDavy DeduytscheJolien DendoovenJOHAN MARTENSPS SreeprasanthTI KorányiGuy Marin

Texture of CoSi2 films on Si(111), (110) and (001) substrates

Koen De KeyserChristophe DetavernierJ Jordan-SweetC Lavoie

A1 Journal Article in THIN SOLID FILMS

Texture of atomic layer deposited ruthenium

Jan MusschootQi XieDavy DeduytscheKoen De KeyserDelphine LongrieJohan HaemersSven Van den BergheRoland Van MeirhaegheJan D'HaenChristophe Detavernier

A1 Journal Article in MICROELECTRONIC ENGINEERING

Texture of cobalt germanides on Ge(100) and Ge(111) and its influence on the formation temperature

Koen De KeyserRoland VanmeirhaegheChristophe DetavernierJ Jordan-SweetC Lavoie

A1 Journal Article in JOURNAL OF THE ELECTROCHEMICAL SOCIETY

The effect of sputtered W-based carbide diffusion barriers on the thermal stability and void formation in copper thin films

Qi XieYu-Long JiangKoen De KeyserChristophe DetavernierDavy DeduytscheGuo-Ping RuXin-Ping QuKN Tu

A1 Journal Article in MICROELECTRONIC ENGINEERING

The effects of deposition temperature and ambient on the physical and electrical performance of DC-sputtered n-ZnO/p-Si heterojunction

Tao ChenShu-Yi LiuQi XieChristophe DetavernierRoland VanmeirhaegheXin-Ping Qu

A1 Journal Article in APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING

The influence of Pt redistribution on Ni1-xPtxSi growth properties

J DemeulemeesterD SmeetsCM ComrieCharlotte Van BockstaelWerner KnaepenChristophe DetavernierK TemstA Vantomme

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Ultrathin GeOxNy interlayer formed by in situ NH3 plasma pretreatment for passivation of germanium metal-oxide-semiconductor devices

Qi XieJan MusschootMarc SchaekersMatty CaymaxAnnelies DelabieXin-Ping QuYy-Long JiangSven Van den BergheJunHu LiuChristophe Detavernier

A1 Journal Article in APPLIED PHYSICS LETTERS

2009

Atomic layer deposition of titanium nitride from TDMAT precursor

Jan MusschootQi XieDavy DeduytscheSven Van den BergheRoland Van MeirhaegheChristophe Detavernier

A1 Journal Article in MICROELECTRONIC ENGINEERING

Comparison of thermal and plasma enhanced ALD/CVD of vanadium pentoxide

Jan MusschootDavy DeduytscheHilde PoelmanJohan HaemersRoland VanmeirhaegheSven Van den BergheChristophe Detavernier

A1 Journal Article in JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Composition influence on the physical and electrical properties of SrxTi1-xOy-based metal-insulator-metal capacitors prepared by atomic layer deposition using TiN bottom electrodes

N MenouM PopoviciS ClimaK OpsomerW PolspoelB KaczerGeert RampelbergK TomidaMA PawlakChristophe Detavernier et al.

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Crystallization resistance of barium titanate zirconate ultrathin films from aqueous CSD: a study of cause and effect

An HardySven Van ElshochtWerner KnaepenJan D'HaenThierry ConardBert BrijsWilfred VandervorstGeoffrey PourtoisJorge KittlChristophe Detavernier et al.

A1 Journal Article in JOURNAL OF MATERIALS CHEMISTRY

Growth and Material Characterization of Hafnium Titanates Deposited by Atomic Layer Deposition

M PopoviciA DelabieS Van ElshochtS ClimaG PourtoisL NynsK TomidaN MenouK OpsomerJ Swerts et al.

A1 Journal Article in JOURNAL OF THE ELECTROCHEMICAL SOCIETY

High-k dielectrics and metal gates for future generation memory devices

Jorge A KittlKarl OpsomerM PopoviciN MenouBen KaczerXP WangC AdelmannMA PawlakK TomidaAude Rothschild et al.

High-k dielectrics for future generation memory devices (Invited Paper)

JA KittlK OpsomerM PopoviciN MenouB KaczerXP WangC AdelmannMA PawlakK TomidaA Rothschild et al.

A1 Journal Article in MICROELECTRONIC ENGINEERING

In situ study of the formation of silicide phases in amorphous Ni-Si mixed layers

Charlotte Van BockstaelChristophe DetavernierRoland VanmeirhaegheJean Jordan-SweetChristian Lavoie

A1 Journal Article in Journal of Applied Physics

In situ x-ray diffraction study of metal induced crystallization of amorphous germanium

Werner KnaepenS GaudetChristophe DetavernierRoland VanmeirhaegheJ SweetC Lavoie

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Influence of a transient hexagonal phase on the microstructure and morphological stability of NiSi films

Charlotte Van BockstaelKoen De KeyserRoland Van MeirhaegheChristophe DetavernierJean Jordan-SweetChristian Lavoie

A1 Journal Article in Applied Physics Letters

Interdiffusion and crystallization in HfO2/Al2O3 superlattices

C AdelmannJ KestersK OpsomerChristophe DetavernierJ KittlS Van Elshocht

A1 Journal Article in APPLIED PHYSICS LETTERS

Microencapsulation of Moisture-Sensitive CaS:Eu2+ Particles with Aluminum Oxide

Nursen AvciJan MusschootPhilippe SmetKatleen KorthoutAykut AvciChristophe DetavernierDirk Poelman

A1 Journal Article in JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Modeling the conformality of atomic layer deposition: the effect of sticking probability

Jolien DendoovenJan MusschootDavy DeduytscheRoland VanmeirhaegheChristophe Detavernier

Modeling the conformality of atomic layer deposition: the effect of sticking probability

Jolien DendoovenDavy DeduytscheJan MusschootRoland VanmeirhaegheChristophe Detavernier

A1 Journal Article in JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Ru thin film grown on TaN by plasma enhanced atomic layer deposition

Qi XieYL JiangJan MusschootDavy DeduytscheChristophe DetavernierRoland VanmeirhaegheS Van den BergheGP RuBZ LiXP Qu

A1 Journal Article in THIN SOLID FILMS

The texture of thin NiSi films and its effect on agglomeration

Koen De KeyserChristophe DetavernierRoland VanmeirhaegheJean Jordan-SweetChristian Lavoie

2008

0.5 nm EOT low leakage ALD SrTiO3 on TiN MIM capacitors for DRAM applications

N MenouXP WangB KaczerW PolspoelM PopoviciK OpsomerMA PawlakWerner KnaepenChristophe DetavernierT Blomberg et al.

Conformality of thermal and plasma enhanced ALD

Jolien DendoovenJan MusschootDavy DeduytscheRoland VanmeirhaegheChristophe Detavernier

Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N-2 or NH3 plasma

Qi XieJan MusschootChristophe DetavernierDavy DeduytscheRoland Van MeirhaegheSven Van den BergheYu-Long JiangGuo-Ping RuBing-Zong LiXin-Ping Qu

A1 Journal Article in MICROELECTRONIC ENGINEERING

Effect of Pt addition on growth stress and thermal stress of NiSi films

Charlotte Van BockstaelKoen De KeyserDavy DeduytscheRoland Van MeirhaegheChristophe DetavernierJL JORDAN-SWEETC LAVOIE

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Epitaxial formation of a metastable hexagonal nickel-silicide

Koen De KeyserCharlotte Van BockstaelChristophe DetavernierRoland VanmeirhaegheJ JORDAN-SWEETC LAVOIE

A1 Journal Article in ELECTROCHEMICAL AND SOLID STATE LETTERS

Formation and stability of NiSi in the presence of Co and Fe alloying elements

Davy DeduytscheChristophe DetavernierRoland VanmeirhaegheJean Jordan-SweetChristian Lavoie

A1 Journal Article in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

Growth kinetics and crystallization behavior of TiO2 films prepared by plasma enhanced atomic layer deposition

Q XIEJan MusschootDavy DeduytscheRoland VanmeirhaegheChristophe DetavernierS VAN DEN BERGHEYL JIANGGP RUBZ LIXP QU

A1 Journal Article in JOURNAL OF THE ELECTROCHEMICAL SOCIETY

In-situ X-ray Diffraction study of Metal Induced Crystallization of amorphous silicon

Werner KnaepenChristophe DetavernierRoland VanmeirhaegheJJ SWEETC LAVOIE

A1 Journal Article in THIN SOLID FILMS

Metal in-diffusion during Fe and co-germanidation of germanium

E SIMOENK OPSOMERC CLAEYSK MAEXChristophe DetavernierRoland VanmeirhaeghePaul Clauws

Nucleation and diffusion during growth of ternary Co1-xNixSi2 thin films studied by complementary techniques in real time

Dries SmeetsJelle DemeulemeesterKoen De KeyserDavy DeduytscheChristophe DetavernierCM ComrieCC TheronChristian LavoieAndré Vantomme

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Physical and optical properties of ZnO thin films grown by DC sputtering deposition

T ChenSY LiuChristophe DetavernierRoland VanmeirhaegheXP Qu

Pt redistribution during Ni(Pt) silicide formation

Jelle DemeulemeesterDries SmeetsCharlotte Van BockstaelChristophe DetavernierCraig ComrieN BarradasArmando VieiraAndré Vantomme

A1 Journal Article in Applied Physics Letters

Simultaneous real-time x-ray diffraction spectroscopy, Rutherford backscattering spectrometry, and sheet resistance measurements to study thin film growth kinetics by Kissinger plots

Dries SmeetsJelle DemeulemeesterDavy DeduytscheChristophe DetavernierCM ComrieCC TheronChristian LavoieAndré Vantomme

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Study of metal-related deep-level defects in germanide Schottky barriers on n-type germanium

E SIMOENK OPSOMERC CLAEYSK MAEXChristophe DetavernierRoland VanmeirhaeghePaul Clauws

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Texture of NiSi films on Si(001), (111), and (110) substrates

Christophe DetavernierJ JORDAN-SWEETC LAVOIE

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

The effect of silicon on the interaction between metallic uranium and aluminum: A 50 year long diffusion experiment

An LeenaersChristophe DetavernierSven Van den Berghe

A1 Journal Article in JOURNAL OF NUCLEAR MATERIALS

The role of lattice mismatch and kinetics in texture development: Co1-xNixSi2 thin films on Si(100)

D SMEETSA VANTOMMEKoen De KeyserChristophe DetavernierC LAVOIE

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Thermal versus plasma-enhanced ALD : growth kinetics and conformality

Christophe DetavernierJolien DendoovenDavy DeduytscheJan Musschoot

Yttrium silicide formation and its contact properties on Si(100)

W HUANGGP RUChristophe DetavernierRoland VanmeirhaegheYL JIANGXP QUBZ LI

A1 Journal Article in MICROELECTRONIC ENGINEERING

2007

Atomic layer deposition of TiO2 from tetrakis-dimethyl-amido titanium or Ti isopropoxide precursors and H2O

Q XIEYL JIANGChristophe DetavernierDavy DeduytscheRoland VanmeirhaegheGP RUBZ LIXP QU

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Axiotaxy of CrSi/sub 2/ on Si(001); from the micrometer- to the angstrom-scale

M. FALKEH. SCHLETTERO. FILONENKOA. MOGILATENKOG. BEDDIESS. SCHULZEM. HIETSCHOLDA. BLELOCHKoen De KeyserChristophe Detavernier

Characterization of the texture of silicide films using electron backscattered diffraction

Koen De KeyserChristophe DetavernierRoland Vanmeirhaeghe

A1 Journal Article in APPLIED PHYSICS LETTERS

Effect of Pt addition on the stress of NiSi film formed on Si(100).

GP RUChristophe DetavernierRoland VanmeirhaegheLI BING-ZONG

A2 Journal Article in CHINESE JOURNAL OF SEMICONDUCTORS

Formation and morphological stability of NiSi in the presence of W, Ti, and Ta alloying elements

Davy DeduytscheChristophe DetavernierRoland VanmeirhaegheJL JORDAN-SWEETC LAVOIE

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Fundamentals of intrinsic stress during silicide formation

A ÖzcelikCharlotte Van BockstaelChristophe DetavernierRoland Vanmeirhaeghe

Growth of pinhole-free ytterbium silicide film by solid-state reaction on Si(001) with a thin amorphous Si interlayer

YL JIANGQ XIEChristophe DetavernierGP RUXP QUBZ LIPK CHURoland Vanmeirhaeghe

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Influence of Ge substrate crystallinity on Co germanide formation in solid-state reactions

K OPSOMERDavy DeduytscheChristophe DetavernierRoland VanmeirhaegheA LAUWERSK MAEXC LAVOIE

A1 Journal Article in APPLIED PHYSICS LETTERS

Kinetics of Ni3Si2 formation in the Ni2Si-NiSi thin film reaction from in situ measurements

JA KITTLMA PAWLAKC TORREGIANIA LAUWERSC DEMEURISSEC VRANCKENPP ABSILS BIESEMANSChristophe DetavernierJ JORDAN-SWEET et al.

A1 Journal Article in APPLIED PHYSICS LETTERS

Oxidation suppression in ytterbium silicidation by Ti/TiN bicapping layer

YL JianQ XieChristophe DetavernierRoland VanmeirhaegheGP RuXP QuBZ LiAP HuangPK Chu

A1 Journal Article in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Plasma-enhanced chemical vapour deposition growth of Si nanowires with low melting point metal catalysts: an effective alternative to Au-mediated growth

F IACOPIPM VEREECKENM SCHAEKERSM CAYMAXN MOELANSB BLANPAINO RICHARDChristophe DetavernierH GRIFFITHS

A1 Journal Article in NANOTECHNOLOGY

Point-defect generation in ni-, pd-, and pt-germanide Schottky barriers on n-type germanium

Eddy R SimoenKarl OpsomerCL ClaeysKaren MaexChristophe DetavernierRoland VanmeirhaeghePaul Clauws

A1 Journal Article in JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Stress evolution during Ni-Si compound formation for fully silicided (FUSI) gates

C TORREGIANICharlotte Van BockstaelChristophe DetavernierC LAVOIEA LAUWERSK MAEXJA KITTL

A1 Journal Article in MICROELECTRONIC ENGINEERING

Thin film solid-state reactions forming carbides as contact materials for carbon-containing semiconductors

Wouter LeroyChristophe DetavernierRoland VanmeirhaegheC LAVOIE

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Transient and end silicide phase formation in thin film Ni/polycrystalline-Si reactions for fully silicided gate applications

JA KITTLMA PAWLAKC TORREGIANIA LAUWERSC DEMEURISSEC VRANCKENPP ABSILS BIESEMANSC COIAChristophe Detavernier et al.

A1 Journal Article in APPLIED PHYSICS LETTERS

2006

A deep-level transient spectroscopy study of Co- and Ni-germanided n-type germanium

K OPSOMERE SIMOENC CLAEYSK MAEXChristophe DetavernierRoland VanmeirhaegheStefaan FormentPaul Clauws

A1 Journal Article in MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING

A fundamental study of advanced metal/semiconductor contacts

Wouter LeroyRoland VanmeirhaegheChristophe Detavernier

An in situ study of the stability of thin Ni-silicide layers

Davy DeduytscheRoland VanmeirhaegheChristophe Detavernier

Deep level transient spectroscopy study of Pd and Pt sputtering damage in n-type germanium

E SIMOENK OPSOMERC CLAEYSK MAEXChristophe DetavernierRoland VanmeirhaeghePaul Clauws

A1 Journal Article in APPLIED PHYSICS LETTERS

Deep level transient spectroscopy study of nickel-germanide Schottky barriers on n-type germanium

E SIMOENK OPSOMERC CLAEYSK MAEXChristophe DetavernierRoland VanmeirhaegheStefaan FormentPaul Clauws

A1 Journal Article in APPLIED PHYSICS LETTERS

Edge-to-edge matching in thin films

Christophe DetavernierC LAVOIE

A1 Journal Article in METALLURGICAL AND MATERIALS TRANSACTIONS A-PHYSICAL METALLURGY AND MATERIALS SCIENCE

Effects of additive elements on the phase formation and morphological stability of nickel monosilicide films

C LAVOIEChristophe DetavernierC CABRALFM D'HEURLEAJ KELLOCKJ JORDAN-SWEETJME HARPER

A1 Journal Article in MICROELECTRONIC ENGINEERING

General discussion session of the 2004 Hume-Rothery Symposium on "The structure and diffusional growth mechanisms of irrational interphase boundaries"

BC MUDDLEHI AARONSONGR SRINIVASANPM KELLYDE LAUGHLINWT REYNOLDSM BRAUNG PURDYWZ ZHANGJM HOWE et al.

Editorial material

Germanide phase formation and texture

S. GAUDETC. LAVOIEChristophe DetavernierP. DESJARDINS

In-situ X-ray diffraction measurements for monitoring carbide and silicide phase formation

Wouter LeroyDavy DeduytscheChristophe DetavernierRoland VanmeirhaegheDirk PoelmanC LAVOIE

In-situ X-ray diffraction measurements for monitoring carbide and silicide phase formation

Wouter LeroyDavy DeduytscheChristophe DetavernierRoland VanmeirhaegheDirk PoelmanC LAVOIE

Linear growth of Ni2Si thin film on n+/p junction at low temperature

YL JIANGGP RUXP QUBZ LIChristophe DetavernierRoland Vanmeirhaeghe

A1 Journal Article in JOURNAL OF MATERIALS RESEARCH

Point-defect generation in Ni-,Pd-, and Pt-germanided Schottky barriers on n-type germanium

Eddy R SimoenKarl OpsomerCL ClaeysKaren MaexChristophe DetavernierRoland VanmeirhaegheStefaan FormentPaul Clauws

Reaction of thin Ni films with Ge: Phase formation and texture

S GAUDETChristophe DetavernierC LAVOIEP DESJARDINS

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Solid-state formation of titanium carbide and molybdenum carbide as contacts for carbon-containing semiconductors

Wouter LeroyChristophe DetavernierRoland VanmeirhaegheAJ KELLOCKC LAVOIE

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Thin film reaction of transition metals with germanium

S GAUDETChristophe DetavernierAJ KELLOCKP DESJARDINSC LAVOIE

A1 Journal Article in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Tungsten carbides as a diffusion barrier for Cu metallization

Christophe DetavernierRoland Vanmeirhaeghe

Understanding of epitaxial alignment in NiSi thin films on a (001) /sub Si/ surface using edge-to-edge matching model

M.X. ZHANGP.M. KELLYChristophe Detavernier

2005

Applications of synchrotron X-rays in microelectronics industry research

JL JORDAN-SWEETChristophe DetavernierC LAVOIEPM MOONEYMF TONEY

A1 Journal Article in NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS

Effect of metal liner on electromigration in Cu Damascene lines

CK HULM GIGNACE LINIGERChristophe DetavernierSG MALHOTRAA SIMON

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Electrical characterization of NiSi/Si interfaces formed by a single and a two-step rapid thermal silicidation

YL JIANGGP RUW HUANGXP QUBZ LIA AGARWALG CAIJ POATEChristophe DetavernierRoland Vanmeirhaeghe

A1 Journal Article in SEMICONDUCTOR SCIENCE AND TECHNOLOGY

High-temperature degradation of NiSi films: Agglomeration versus NiSi2 nucleation

Davy DeduytscheChristophe DetavernierRoland VanmeirhaegheC LAVOIE

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Reactive diffusion in the Ni-Si system – influence of Ni thickness on the phase formation sequence

C COïAC LAVOIEF D'HEURLEChristophe DetavernierP DESJARDINSA KELLOCK

Reactive diffusion in the Ni-Si system: phase sequence and formation of metal-rich phases

C LAVOIEC COIAFM D'HEURLEChristophe DetavernierC CABRALP DESJARDINSAJ KELLOCK

A1 Journal Article in DIFFUSION IN MATERIALS: DIMAT 2004, PT 1AND 2

Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition

H KIMChristophe DetavernierO VAN DER STRATENSM ROSSNAGELAJ KELLOCKDG PARK

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Texture in thin films

Christophe DetavernierC LAVOIE

A1 Journal Article in ICOTOM 14: TEXTURES OF MATERIALS, PTS 1AND 2

Understanding of epitaxial alignment in NiSi thin films on a (001)(Si) surface using edge-to-edge matching model

MX ZHANGPM KELLYChristophe Detavernier

Understanding of epitaxial alignment in NiSi thin films on a (001)Si surface using edge-to-edge matching model

M ZHANGP KELLYChristophe Detavernier

2004

Axiotaxy of CoSi2 thin films on Si(100) substrates and the effects of Ti alloying

AS OZCANKF LUDWIGChristophe DetavernierC LAVOIEJL JORDAN-SWEET

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

CoSi2 formation in the presence of Ti, Ta or W

Christophe DetavernierC LAVOIERoland Vanmeirhaeghe

A1 Journal Article in THIN SOLID FILMS

Defect characterization of the structure-growth zone-model for sputter deposited Cu films

Jérémie De BaerdemaekerCharles DauweDanny SegersChristophe DetavernierD DEDUYTSCHEW EGGERP SPERR

A1 Journal Article in POSITRON ANNIHILATION, ICPA-13, PROCEEDINGS

Influence of Pt addition on the texture of NiSi on Si(001)

Christophe DetavernierC LAVOIE

A1 Journal Article in APPLIED PHYSICS LETTERS

Influence of processing conditions on CoSi2 formation in the presence of a Ti capping layer

Christophe DetavernierRoland VanmeirhaegheW VANDERVORSTK MAEX

A1 Journal Article in MICROELECTRONIC ENGINEERING

Low-temperature formation of CoSi2 in the presence of Au

Christophe DetavernierC LAVOIEFM D'HEURLEH BENDERRoland Vanmeirhaeghe

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Nickel Silicide Technology

C LAVOIEChristophe DetavernierP BESSER

Bookchapter in Silicide Technology for Integrated Circuits

Texture of silicide films on Si(001): the occurrence of axiotaxy in cubic CoSi2, tetragonal alpha-FeSi2 and orthorhombic NiSi

Christophe DetavernierC LAVOIE

Texture of silicide films on Si(001): the occurrence of axiotaxy in cubic CoSi2, tetragonal alpha-FeSi2 and orthorhombic NiSi

Christophe DetavernierC LAVOIE

Texture of tetragonal α-FeSi2 films on Si(001)

Christophe DetavernierC LavoieJ Jordan-SweetAS Ozcan

A1 Journal Article in PHYSICAL REVIEW B

Thermal stability, phase and interface uniformity of Ni-silicide formed by Ni-Si solid-state reaction

XP QUYL JIANGGP RUF LUBZ LIChristophe DetavernierRoland Vanmeirhaeghe

A1 Journal Article in THIN SOLID FILMS

2003

An off-normal fibre-like texture in thin films on single-crystal substrates

Christophe DetavernierAS OZCANJ JORDAN-SWEETEA STACHJ TERSOFFFM ROSSC LAVOIE

A1 Journal Article in NATURE

Does line edge roughness matter ? FEOL and BEOL perspectives

Q LINChristopher BlackChristophe DetavernierL GIGNACK GUARINIB HERBSTH KIMP OLDIGESK PETRILLOM SANCHEZ

Does line edge roughness matter? FEOL and BEOL perspectives

QH LINChristopher BlackChristophe DetavernierL GIGNACK GUARINIB HERBSTH KIMP OLDIGESK PETRILLOM SANCHEZ

In-situ monitoring of thin film reactions during rapid thermal annealing: nickel silicide formation

C LAVOIER PURTELLC COIAChristophe DetavernierP DESJARDINSJ JORDAN-SWEETC CABRALF D'HEURLEJ HARPER

Kinetics of agglomeration of NiSi and NiSi2 phase formation

Christophe DetavernierA OZCANC LAVOIEJ HARPERJ JORDAN-SWEET

Kinetics of agglomeration of NiSi and NiSi2 phase formation

Christophe DetavernierA OZCANC LAVOIEJJ SWEETJME HARPER

Mixing entropy and the nucleation of silicides: Ni-Pd-Si and Co-Mn-Si ternary systems

Christophe DetavernierXP QURoland VanmeirhaegheBZ LIK MAEX

A1 Journal Article in JOURNAL OF MATERIALS RESEARCH

Room temperature grain growth in sputtered Cu films

Davy DeduytscheChristophe DetavernierJérémie De BaerdemaekerRoland VanmeirhaegheCharles Dauwe

Room temperature grain growth in sputtered Cu films

Davy DeduytscheChristophe DetavernierJ DEBAERDEMAEKERRoland VanmeirhaegheCharles DauweTS KUAN

Room-temperature grain growth in sputter-deposited Cu films

Christophe DetavernierDavy DeduytscheRoland VanmeirhaegheJérémie De BaerdemaekerCharles Dauwe

A1 Journal Article in APPLIED PHYSICS LETTERS

Structural characterisation of advanced silicides

H BENDERO RICHARDL NISTORA GUTAKOVSKIIC STUERChristophe Detavernier

A1 Journal Article in MICROSCOPY OF SEMICONDUCTING MATERIALS

Thermal expansion of the isostructural PtSi and NiSi: Negative expansion coefficient in NiSi and stress effects in thin films

Christophe DetavernierC LAVOIEFM D'HEURLE

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Thermodynamics and kinetics of room-temperature microstructural evolution in copper films

Christophe DetavernierS ROSSNAGELC NOYANS GUHAC CABRALC LAVOIE

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Towards implementation of a nickel silicide process for CMOS technologies

C LAVOIEFM D'HEURLEChristophe DetavernierC CABRAL

A1 Journal Article in MICROELECTRONIC ENGINEERING

2002

A BEEM study on the effects of the annealing temperature on barrier height inhomogeneity of CoSi2/Si contact formed in Co-Ti-Si systems.

SY ZHUXP QUGP RUBZ LIChristophe DetavernierRoland VanmeirhaegheFelix Cardon

A2 Journal Article in CHINESE JOURNAL OF SEMICONDUCTORS

CoSi/sub 2/ formation using a Ti capping layer-the influence of processing conditions on CoSi/sub 2/ nucleation

Christophe DetavernierRoland VanmeirhaegheK. MAEX

CoSi2 formation in the presence of carbon.

Christophe DetavernierRoland VanmeirhaegheH BENDERO RICHARDB BRIJSK MAEX

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

CoSi2 formation using a Ti capping layer-Influence of processing conditions on CoSi2 nucleation

Christophe DetavernierRoland VanmeirhaegheK MAEX

Double threshold behaviour of I-V characteristics of CoSi2/Si Schottky contacts.

SY ZHUGP RUXP QUBZ LIRoland VanmeirhaegheChristophe DetavernierFelix Cardon

A1 Journal Article in CHINESE PHYSICS

In situ monitoring of thin film reactions during rapid thermal annealing: Nickel silicide formation

C LAVOIER PURTELLC COIAChristophe DetavernierP DESJARDINSJ JORDAN-SWEETC CABRALFM D'HEURLEJME HARPER

Silicide formation for Ni and Pd bilayers on Si (100) substrates

Christophe DetavernierRoland VanmeirhaegheFelix Cardon

Sillicide formation for Ni and Pd bilayers on Si(100) substrates

XP QUChristophe DetavernierRoland VanmeirhaegheFelix Cardon

The influence of Ti and TiN on the thermal stability of CoSi/sub 2 /

Christophe DetavernierRoland VanmeirhaegheK. MAEX

The influence of Ti and TiN on the thermal stability of cobaltdisilicide

Christophe DetavernierGP RURoland VanmeirhaegheK MAEX

2001

CoSi2 formation through SiO2

Christophe DetavernierRoland VanmeirhaegheFelix CardonK MAEX

A1 Journal Article in THIN SOLID FILMS

CoSi2 nucleation in the presence of Ge.

Christophe DetavernierRoland VanmeirhaegheFelix CardonK MAEX

A1 Journal Article in THIN SOLID FILMS

Electrical characterization of Ar-ion-bombardment-induced damage in Au/Si and PtSi/Si Schottky barrier contacts.

SY ZHUChristophe DetavernierRoland VanmeirhaegheFelix CardonAnja BlondeelPaul ClauwsGP RUBZ LI

A1 Journal Article in SEMICONDUCTOR SCIENCE AND TECHNOLOGY

Formation of epitaxial CoSi2 by a Cr or Mo interlayer: Comparison with a Ti interlayer.

Christophe DetavernierRoland VanmeirhaegheFelix CardonK MAEXH BENDERB BRIJSW VANDERVORST

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Fundamental study of nucleation and epitaxial growth of CoSi2

Christophe DetavernierRoland Vanmeirhaeghe

Nanometer patterning of thin CoSi2-films by application of local stress

P KLUTHQT ZHAOChristophe DetavernierJ XUL KAPPIUSH BAYS LENKS MANTL

A1 Journal Article in MICROELECTRONIC ENGINEERING

Nucleation of COSi2 and MnSi1.7 in the Co/Mn/Si ternary system

Christophe DetavernierRoland VanmeirhaegheX QUG RUS ZHUB LI

Nucleation of CoSi/sub 2/ and MnSi/sub 1.7/ in the Co/Mn/Si ternary system

Christophe DetavernierRoland VanmeirhaegheZHU SHI-YANGLI BING-ZONG

Orientation-dependent stress build-up during the formation of epitaxial CoSi2.

A STEEGENChristophe DetavernierAlbert LauwersK MAEXRoland VanmeirhaegheFelix Cardon

A1 Journal Article in MICROELECTRONIC ENGINEERING

Physical characterisation of high-k gate stacks deposited on HF-last surfaces

H. BENDERT. CONARDH. NOHIRAJ. PETRYO. RICHARDC. ZHAOB. BRIJSW. BESLINGChristophe DetavernierW. VANDERVORST et al.

The dependence of the etching property of CoSi2 films in diluted HF solutions on the formation conditions.

SY ZHUGP RUChristophe DetavernierRoland VanmeirhaegheE CARDONBZ LI

A1 Journal Article in APPLIED SURFACE SCIENCE

The effect of Pd addition on silicide formation for Ni/Pd bilayers on silicon

XP QUChristophe DetavernierRoland VanmeirhaegheGP RUBZ LI

The effect of Pd addition on silicide formation for Ni/Pd bilayers on silicon

Christophe DetavernierR.L. MEIRHAEGHELI BING-ZONG

2000

A BEEM study of Schottky barrier height distributions of ultrathin CoSi2/n-Si(100) formed by solid phase epitaxy.

SY ZHUChristophe DetavernierRoland VanmeirhaegheXP QUGP RUFelix CardonBZ LI

A1 Journal Article in SEMICONDUCTOR SCIENCE AND TECHNOLOGY

Ballistic Electron Emission icroscopy (BEEM).

Christophe Detavernier

A2 Journal Article in Physicalia Magazine

Ballistic electron emission microscopy studies of the temperature dependence of Schottky barrier height distribution in CoSi2/n-Si(1 0 0) diodes formed by solid phase reaction

Shiyang ZhuXin-Ping QuRoland VanmeirhaegheChristophe DetavernierGuo-Ping RuFelix CardonBing-Zong Li

A1 Journal Article in SOLID-STATE ELECTRONICS

Barrier height inhomogeneities of epitaxial CoSi2 Schottky contacts on n-Si (100) and (111).

SY ZHURoland VanmeirhaegheChristophe DetavernierFelix CardonGP RUXP QUBZ LI

A1 Journal Article in SOLID-STATE ELECTRONICS

CoSi2 formation in the Ti/Co/SiO2/Si system

Christophe DetavernierRoland VanmeirhaegheFelix CardonK MAEXH BENDERSY ZHU

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Electrical characteristics of CoSi2/n-Si(100) Schottky barrier contacts formed by solid state reaction.

SY ZHUChristophe DetavernierRoland VanmeirhaegheFelix CardonGP RUXP QUBZ LI

A1 Journal Article in SOLID-STATE ELECTRONICS

Growth of patterned thin epitaxial CoSi2-films by a titanium oxide mediated epitaxy process

PC KLUTHChristophe DetavernierQT ZHAOJ XUHP BOCHEMS LENKS MANTL

A1 Journal Article in THIN SOLID FILMS

Influence of Ti on CoSi2 nucleation.

Christophe DetavernierRoland VanmeirhaegheFelix CardonK MAEXW VANDERVORSTB BRIJS

A1 Journal Article in APPLIED PHYSICS LETTERS

Influence of mixing entropy on the nucleation of CoSi2

Christophe DetavernierRoland VanmeirhaegheFelix CardonK Maex

A1 Journal Article in PHYSICAL REVIEW B

Ion-bombardment effects on PtSi/n-Si Schottky contacts studied by ballistic electron emission microscopy.

GP RUXP QUSY ZHUBZ LIChristophe DetavernierRoland VanmeirhaegheFelix CardonRA DONATONK MAEX

A1 Journal Article in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

Nondestructive characterization of thin silicides using x-ray reflectivity.

Christophe DetavernierRoger De GryseRoland VanmeirhaegheFelix CardonGP RUXP QUBZ LIRA DONATONK MAEX

A1 Journal Article in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS

The influence of Ti cappings layes on CoSi2 formation.

Christophe DetavernierRoland VanmeirhaegheFelix CardonRA DONATONK MAEX

A1 Journal Article in MICROELECTRONIC ENGINEERING

The influence of mixing entropy on the nucleationof CoSi2.

Christophe DetavernierRoland VanmeirhaegheFelix CardonK MAEX

A2 Journal Article in PHYSICAL REVIEW B

1999

A BEEM study of PtSi Schottky contacts on ion-milled Si

GP RUChristophe DetavernierRA DONATONAnja BlondeelPaul ClauwsRoland VanmeirhaegheFelix CardonK MAEXXP QUSY ZHU et al.

A BEEM study of the temperature dependence of the barrier height distribution in PtSi/n-Si Schottky diodes.

S ZHURoland VanmeirhaegheChristophe DetavernierGP RUBZ LIFelix Cardon

A1 Journal Article in SOLID STATE COMMUNICATIONS

CoSi2 formation in the presence of interfacial silicon oxide.

Christophe DetavernierRoland VanmeirhaegheFelix CardonRA DONATONK MAEX

A1 Journal Article in APPLIED PHYSICS LETTERS

Formation and characterization of SPE grown ultra-thin cobalt disilicide film

XP QUGP RUBZ LIChristophe DetavernierRoland VanmeirhaegheFelix Cardon

Formation and characterization of spe grown ultra-thin cobalt disilicide film.

GP RULI BING-ZONGChristophe DetavernierR VANMEIRHAEGHEFelix Cardon

The influence of Ti capping layers on CoSi/sub 2/ formation in the presence of interfacial oxide

Christophe DetavernierR.A. DONATONK. MAEXS. JINH. BENDERRoland VanmeirhaegheFelix Cardon

The influence of Ti capping layers on CoSi2 formation in tee presence of interfacial oxide

Christophe DetavernierR DONATONK MAEXS JINH BENDERRoland VanmeirhaegheFelix Cardon

1998

An atomic force microscopy study of thin CoSi2 films formed by solid state reaction

GP RUJ LIUXP QUBZ LIChristophe DetavernierRoland VanmeirhaegheFelix Cardon

Ballistic electron emission microscopy study of barrier height inhomogeneities introduced in Au/n-Si Schottky contacts by a HF pretreatment.

Christophe DetavernierRoland VanmeirhaegheR DONATONK MAEXFelix Cardon

A1 Journal Article in JOURNAL OF APPLIED PHYSICS

Non-destructive characterization of thin silicides using X-ray reflectivity

Christophe DetavernierR DEGRYSERoland VanmeirhaegheFelix CardonGP RUBZ LI