Research Explorer

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Researcher

Andreas Werbrouck

Publications & Research Data

Awards & Distinctions

33 Results

2026

Photoquenching-by-photocharging : a single process of failure of oxygen-exposed InP/ZnSe quantum dots

Robin PetitPieter SchiettecatteKorneel MolkensMatthias MinjauwEder Antonio Castillo RuizHannes Van AvermaetLuca GiordanoAndreas WerbrouckPieter GeiregatHenk Vrielinck et al.

A1 Journal Article in ACS NANO

2025

Atomic layer deposition of boron-containing layers using a combined trimethylborate- and water-based plasma

Arpan DharaAndreas WerbrouckJin LiTippi VerhelleMatthias MinjauwJohan MeersschautLowie HenderickJolien DendoovenChristophe Detavernier

A1 Journal Article in CHEMISTRY OF MATERIALS

Fast, in situ gas analysis during atomic layer deposition through optical emission spectroscopy and non-negative matrix factorization

Andreas WerbrouckPhilippe SmetDirk PoelmanJolien DendoovenChristophe Detavernier

A1 Journal Article in ACS SENSORS

Whodunit : EPR unmasks a process-of-failure in InP/ZnSe QDs

Robin PetitPieter SchiettecatteKorneel MolkensMatthias MinjauwEder Antonio Castillo RuizHannes Van AvermaetLuca GiordanoAndreas WerbrouckPieter GeiregatChristophe Detavernier et al.

2024

Atomic layer deposition for stable InP-based on-chip quantum dot microLEDs : hybrid quantum dot pockets

Robin PetitResul OzdemirHannes Van AvermaetLuca GiordanoJakob KuhsAndreas WerbrouckMatthias FilezJolien DendoovenZeger HensPhilippe Smet et al.

A1 Journal Article in ACS APPLIED MATERIALS & INTERFACES

Atomic layer deposition for stable on-chip quantum dot LEDs : hybrid quantum dot pockets

Robin PetitResul OzdemirHannes Van AvermaetLuca GiordanoJakob KuhsAndreas WerbrouckMatthias FilezJolien DendoovenZeger HensPhilippe Smet et al.

Comparison of Al- and Hf-based hybrid photoresists grown by molecular layer deposition for extreme ultraviolet lithography

Ajay RaviLong Viet ThanJacqueline LewisJingwei ShiAndreas WerbrouckJingyi HanMiika MattinenStacey F. Bent

A1 Journal Article in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Enhanced growth in atomic layer deposition of ruthenium metal : the role of surface diffusion and nucleation sites

Amnon RothmanAndreas WerbrouckStacey F. Bent

A1 Journal Article in CHEMISTRY OF MATERIALS

HfO2 area-selective atomic layer deposition with a carbon-free inhibition layer

Yujin LeeSeunggi SeoAlexander B. ShearerAndreas WerbrouckHuyngjun KimStacey F. Bent

A1 Journal Article in CHEMISTRY OF MATERIALS

Molecular layer deposition of polyhydroquinone thin films for Li‐ion battery applications

Nikhila C. ParanamanaAmit K. DattaQuinton K. WyattRyan C. GettlerAndreas WerbrouckMatthias J. Young

A1 Journal Article in AICHE JOURNAL

2022

Atomic layer deposition of metal phosphates

Lowie HenderickArpan DharaAndreas WerbrouckJolien DendoovenChristophe Detavernier

A1 Journal Article in APPLIED PHYSICS REVIEWS

Atomic layer deposition of ruthenium dioxide based on redox reactions between alcohols and ruthenium tetroxide

Nithin PoonkottilMatthias MinjauwAndreas WerbrouckStefano ChecchiaEduardo SolanoMikko NisulaAlexis FranquetChristophe DetavernierJolien Dendooven

A1 Journal Article in CHEMISTRY OF MATERIALS

Atomic layer deposition of ruthenium dioxide thin films using RuO4 and alcohols as reactants

Matthias MinjauwNithin PoonkottilAndreas WerbrouckChristophe DetavernierJolien Dendooven

Selective vapor-phase doping of Pt nanoparticles into phase-controlled nanoalloys

Nithin PoonkottilRanjith Karuparambil RamachandranEduardo Solano MinuesaNadadur Veeraraghavan SrinathJi-Yu FengAndreas WerbrouckMichiel Van DaeleMatthias FilezMatthias MinjauwHilde Poelman et al.

A1 Journal Article in JOURNAL OF PHYSICAL CHEMISTRY C

Strategies to produce boron-containing ALD thin films using trimethyl borate precursor : from thermal to plasma to combined-plasma approach

Arpan DharaAndreas WerbrouckJin LiJolien DendoovenChristophe Detavernier

Surface reactions between LiHMDS, TMA and TMP leading to deposition of amorphous lithium phosphate

Andreas WerbrouckFelix MattelaerArpan DharaMikko NisulaMatthias MinjauwFrans MunnikJolien DendoovenChristophe Detavernier

A1 Journal Article in JOURNAL OF MATERIALS CHEMISTRY A

2021

Atomic layer deposition of ruthenium dioxide thin films using RuO4 and alcohols as reactants

Nithin PoonkottilMatthias MinjauwAndreas WerbrouckChristophe DetavernierJolien Dendooven

Converting molecular layer deposited alucone films into Al2O3/alucone hybrid multilayers by plasma densification

Juan Santo-Domingo PeñarandaMikko NisulaSofie VandenbrouckeMatthias MinjauwJin LiAndreas WerbrouckJonas KeukelierAndrea Itziar Pitillas MartinezJolien DendoovenChristophe Detavernier

Converting molecular layer deposited alucone films into Al2O3/alucone hybrid multilayers by plasma densification

Juan Santo-Domingo PeñarandaMikko NisulaSofie VandenbrouckeMatthias MinjauwJin LiAndreas WerbrouckJonas KeukelierAndrea Itziar Pitillas MartinezJolien DendoovenChristophe Detavernier

A1 Journal Article in DALTON TRANSACTIONS

In and ex situ characterization of atomic layer deposition processes for lithium-ion battery applications

Andreas WerbrouckChristophe DetavernierJolien Dendooven

Plasma-enhanced atomic layer deposition : correlating O2 plasma parameters and species to blister formation and conformal film growth

Andreas WerbrouckKevin Van de KerckhoveDiederik DeplaDirk PoelmanPhilippe SmetJolien DendoovenChristophe Detavernier

A1 Journal Article in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Vapor phase conversion of Pt nanoparticles into Pt-Sn bimetallic nanoparticles

Nithin PoonkottilRanjith Karuparambil RamachandranEduardo Solano MinuesaNadadur Veeraraghavan SrinathJi-Yu FengAndreas WerbrouckMichiel Van DaeleMatthias MinjauwMatthias FilezHilde Poelman et al.

2020

A secondary reaction pathway for the alumina atomic layer deposition process with trimethylaluminum and water, revealed by full-range, time-resolved in situ mass spectrometry

Andreas WerbrouckMahdi ShiraziFelix MattelaerSimon D. ElliottJolien DendoovenChristophe Detavernier

A1 Journal Article in JOURNAL OF PHYSICAL CHEMISTRY C

Design of Li-containing layers with LiHMDS

Andreas WerbrouckFelix MattelaerMatthias MinjauwFrans MunnikJaakko JulinJolien DendoovenChristophe Detavernier

Reaction pathways for atomic layer deposition with lithium hexamethyl disilazide, trimethyl phosphate, and oxygen plasma

Andreas WerbrouckFelix MattelaerMatthias MinjauwMikko NisulaJaakko JulinFrans MunnikJolien DendoovenChristophe Detavernier

A1 Journal Article in JOURNAL OF PHYSICAL CHEMISTRY C

2019

Atomic layer deposition of ZnO-SnO2 composite thin film : the influence of structure, composition and crystallinity on lithium-ion battery performance

Bo ZhaoFelix MattelaerJeroen KintAndreas WerbrouckLowie HenderickMatthias MinjauwJolien DendoovenChristophe Detavernier

A1 Journal Article in ELECTROCHIMICA ACTA

Cost-reducing PE-ALD processes for pure and doped SiO2 thin films

Geert RampelbergVéronique CremersAndreas WerbrouckJolien DendoovenChristophe Detavernier

Cost-reducing PE-ALD processes for pure and doped SiO2 thin films

Geert RampelbergVéronique CremersAndreas WerbrouckJolien DendoovenChristophe Detavernier

Fingerprinting of ALD reaction products with time-resolved in situ mass spectrometry

Andreas WerbrouckFelix MattelaerJolien DendoovenChristophe Detavernier

Impact of atomic layer deposition on the photoluminescence of colloidal quantum dots

Jakob KuhsAndreas WerbrouckNatalia Klaudia ZawackaEmile DrijversPhilippe SmetZeger HensChristophe Detavernier

In situ photoluminescence of colloidal quantum dots during gas exposure : the role of water and reactive atomic layer deposition precursors

Jakob KuhsAndreas WerbrouckNatalia Klaudia ZawackaEmile DrijversPhilippe SmetZeger HensChristophe Detavernier

A1 Journal Article in ACS APPLIED MATERIALS & INTERFACES

Time-resolved in-situ mass spectrometry for monitoring and identifying reaction products in ALD processes

Andreas WerbrouckFelix MattelaerJolien DendoovenChristophe Detavernier

2017

PE-ALD of lithium aluminum silicon oxide solid electrolyte layers using LiHMDS

Andreas WerbrouckThomas DobbelaereFelix MattelaerChristophe Detavernier